公开(公告)号：US11513079B2

公开(公告)日：2022-11-29

申请号：US17086281

申请日：2020-10-30

Applicant: FEI Company

Inventor： Roger Alvis ,  John Fretwell ,  Laurens Kwakman ,  Tomas Vystavel

IPC: G01N21/95 ,  G01N21/88 ,  G06T7/00

Abstract: Methods for locating and characterizing defects can include performing a first scan of a substrate to produce a first defect map including a first set of coordinates of one or more defects of the substrate and performing a second scan of one or more regions of the substrate associated with the defects based on the first defect map to produce one or more electron channeling contrast (ECC) images of the defects. Characterization of the defects can be based on the ECC images alone or in combination with other techniques. Such methods can include determining a second set of coordinates associated with the one or more defects based on the ECC images and directing an ion beam toward the substrate and milling the substrate based on the second set of coordinates.

公开(公告)号：US20220113262A1

公开(公告)日：2022-04-14

申请号：US17086281

申请日：2020-10-30

Applicant: FEI Company

Inventor： Roger Alvis ,  John Fretwell ,  Laurens Kwakman ,  Tomas Vystavel

IPC: G01N21/95 ,  G01N21/88 ,  G06T7/00

Abstract: Methods for locating and characterizing defects can include performing a first scan of a substrate to produce a first defect map including a first set of coordinates of one or more defects of the substrate and performing a second scan of one or more regions of the substrate associated with the defects based on the first defect map to produce one or more electron channeling contrast (ECC) images of the defects. Characterization of the defects can be based on the ECC images alone or in combination with other techniques. Such methods can include determining a second set of coordinates associated with the one or more defects based on the ECC images and directing an ion beam toward the substrate and milling the substrate based on the second set of coordinates.

公开(公告)号：US09741527B2

公开(公告)日：2017-08-22

申请号：US14977436

申请日：2015-12-21

Applicant: FEI Company

Inventor： Tomas Vystavel ,  Josef Sestak ,  Pavel Poloucek ,  Lubomir Tuma ,  Michal Hrouzek ,  Tomas Trnkocy ,  Martin Cafourek

IPC: H01J37/20 ,  H01J37/26 ,  H01J37/16

CPC classification number: H01J37/16 ,  H01J37/20 ,  H01J37/26 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20278 ,  H01J2237/204 ,  H01J2237/206

Abstract: A specimen holder for a Charged Particle Microscope is disclosed. The holder has a support structure with an elongated member including a specimen mounting zone. The specimen mounting zone comprises a rotor with an axis perpendicular to the elongated member with a paddle connected to it which may be rotated. Specimens may be mounted on the paddle so that rotation of the paddle allows specimens to be rotated and/or inverted for microscopic observation on both sides. Specimens may either be directly mounted on the paddle, or on a grid, half-moon grid, lift-out grid, aperture frame, dielectric film, etc.