Abstract:
An apparatus and a method for measuring and monitoring the properties of a fluid, for example, pressure, temperature, and chemical properties, within a sample holder for an electron microscope. The apparatus includes at least one fiber optic sensor used for measuring temperature and/or pressure and/or pH positioned in proximity of the sample.
Abstract:
Methods and apparatus are disclosed for the preparation of microscopic samples using light pulses. Material volumes greater than 100 μm3 are removed. The methods include inspecting an object with a scanning electron microscope (SEM) or a focused ion beam (FIB). The inspection includes recording an image of the object. The methods also includes delineating within the object a region to be investigated, and delineating a laser-machining path based on the image of the object so that a sample can be prepared out of the object. The methods further include using laser-machining along the delineated laser-machining path to remove a volume that is to be ablated, and inspecting the object with the scanning electron microscope (SEM) or a focused ion beam (FIB).
Abstract:
An electrical connector for use in electron microscopy sample holders. The electrical connector provides electrical contacts to the sample support devices which are positioned in the sample holders for electrical, temperature and/or electrochemical control.
Abstract:
To realize a focused-ion-beam machining apparatus capable of machining a thin sample with a wide area and a uniform film thickness and a needle-like sample with a sharp tip, in a focused-ion-beam machining apparatus including: an ion source (1); an electronic lens (3) focusing an ion beam extracted from the ion source (1) and irradiating the ion beam to a sample (5); and a sample holder (13) holding the sample (5), the sample holder (13) is provided with a shield electrode (7) arranged in a manner such as to cover the sample (5), and the sample (5) and the shield electrode (7) are insulated from each other in a manner such that voltages can be applied to them separately from each other.
Abstract:
The electron beam apparatus sample holding means has a diaphragm which is placed on upper and lower sides of a sample to form a cell for separating a gas atmosphere and a vacuum atmosphere of a sample chamber and sealing an ambient atmosphere of the sample; a gas supply means for supplying gas to an inside of the cell; and exhaust means for exhausting gas. The exhaust means includes a gas exhaust pipe provided in the inside of the cell and an openable/closable exhaust hole provided in a sidewall of the sample holding means so as to pass through the cell. The diaphragm is an amorphous film made of light elements which can transmit an electron beam, such as carbon films, oxide films, and nitride films.
Abstract:
The present invention relates to modular system for micro-nano manipulation of samples. The modular system of the present invention comprises changeable tool tips which may be provided in an array, and a tool body. Each changeable tool tip comprises an end effector connected to a base having mating structures. The tool body includes an arm having slits having dimensions and being disposed on the arm so as to detachably couple with the mating structures of the tool tip. The slits may include an opening with rounded corners for receiving the mating structures, and tapered side walls for frictionally fitting the mating structures. The present invention relates also to a connection system for connecting a micro-dimensional tool body to a changeable micro-dimensional tool tip and to a manipulation tool for use with changeable tool tips of the present invention.
Abstract:
A method of processing a TEM-sample, wherein the method comprises: mounting an object in a particle beam system such that the object is disposed, in an object region of the particle beam system; directing of a first particle beam onto the object region from a first direction, wherein the first particle beam is an ion beam; and then rotating the object about an axis by 180°, wherein the following relation is fulfilled: 35°≦α≦55°, wherein α denotes a first angle between the first direction and the axis; and then directing of the first particle beam onto the object region from the first direction; wherein material is removed from the object during the directing of the first particle beam onto the object region. Furthermore, a second particle beam may be directed onto the object region, and particles emanating from the object region can be detected.
Abstract:
A method of examining a sample using a charged-particle microscope, comprising mounting the sample on a sample holder; using a particle-optical column to direct at least one beam of particulate radiation onto a surface S of the sample, thereby producing an interaction that causes emitted radiation to emanate from the sample; using a detector arrangement to detect at least a portion of said emitted radiation, the method of which comprises embodying the detector arrangement to detect electrons in the emitted radiation; recording an output On of said detector arrangement as a function of kinetic energy En of said electrons, thus compiling a measurement set M={(On, En)} for a plurality of values of En; using computer processing apparatus to automatically deconvolve the measurement set M and spatially resolve it into a result set R={(Vk, Lk)}, in which a spatial variable V demonstrates a value Vk at an associated discrete depth level Lk referenced to the surface S, whereby n and k are members of an integer sequence, and spatial variable V represents a physical property of the sample as a function of position in its bulk.
Abstract:
A sample for electron microscopy includes a base member and a sensor. The sensor is configured to measure data on the sample. The sensor includes an insulating member and a measuring element. The insulating member is deposited in or near an area of observation that is defined on a surface of the base member. The measuring element is deposited on a surface of the insulating member or over the surface of the base member and the surface of the insulating member.
Abstract:
The electron beam apparatus sample holding means has a diaphragm which is placed on upper and lower sides of a sample to form a cell for separating a gas atmosphere and a vacuum atmosphere of a sample chamber and sealing an ambient atmosphere of the sample; a gas supply means for supplying gas to an inside of the cell; and exhaust means for exhausting gas. The exhaust means includes a gas exhaust pipe provided in the inside of the cell and an openable/closable exhaust hole provided in a sidewall of the sample holding means so as to pass through the cell. The diaphragm is an amorphous film made of light elements which can transmit an electron beam, such as carbon films, oxide films, and nitride films.