公开(公告)号：US20150203677A1

公开(公告)日：2015-07-23

申请号：US14674718

申请日：2015-03-31

Applicant: KANEKA CORPORATION

Inventor： Yoshitaka Nishiyama ,  Hiroyuki Tanaka ,  Satoshi Sugiyama ,  Takao Manabe

IPC: C08L43/04

CPC classification number: C08L43/04 ,  C08G77/20 ,  C08G77/38 ,  C08K5/5425 ,  C08K2201/008 ,  C08L83/00 ,  C08L83/14 ,  C08L2201/02 ,  C08L2201/14 ,  C08L2203/206 ,  C08L2205/025 ,  H01L33/56

Abstract: The present invention aims to provide a polysiloxane composition which exhibits high heat and light resistance, and excellent gas-barrier properties. The polysiloxane composition of the present invention includes: (A) a modified polyhedral polysiloxane which is obtained by modifying (a) an alkenyl group-containing polyhedral polysiloxane compound with (b) a hydrosilyl group-containing compound; and (B) an organopolysiloxane containing at least two alkenyl groups in a molecule, wherein the polysiloxane composition after curing has a water vapor permeability of not more than 30 g/m2/24 h, and the polysiloxane composition includes (B1) an aryl group-containing organopolysiloxane as the organopolysiloxane (B), and/or (C) a component which is (C1) an organosilicon compound that contains one alkenyl or hydrosilyl group in a molecule, or (C2) a cyclic olefin compound that contains one carbon-carbon double bond in a molecule.

Abstract translation: 本发明的目的在于提供耐热耐光性高，阻气性优异的聚硅氧烷组合物。 本发明的聚硅氧烷组合物包括：（A）通过（a）含链烯基的多面体聚硅氧烷化合物（b）含氢化甲硅烷基化合物改性而获得的改性多面体聚硅氧烷; 和（B）分子中含有至少两个烯基的有机聚硅氧烷，其中，所述聚硅氧烷组合物在固化后的透湿度为30g / m 2 / 24h以下，所述聚硅氧烷组合物包含（B1）芳基 作为有机聚硅氧烷（B）的有机聚硅氧烷，和/或（C）分子中含有一个烯基或氢硅烷基的（C1）有机硅化合物的成分，或（C2）含有一个碳 - 碳双键。

公开(公告)号：US20130192491A1

公开(公告)日：2013-08-01

申请号：US13796186

申请日：2013-03-12

Applicant: Kaneka Corporation

Inventor： Yoshitaka Nishiyama ,  Masahito Ide ,  Takao Manabe ,  Hiroyuki Tanaka

IPC: C09D4/00

CPC classification number: C09D4/00

Abstract: A modified polyhedral polysiloxane obtained by hydrosilylation of an alkenyl group-containing polyhedral polysiloxane compound (a), a hydrosilyl group-containing compound (b), and a cyclic olefin compound (c) having one carbon-carbon double bond in its molecule.

Abstract translation: 通过在其分子中含有含烯基的多面体聚硅氧烷化合物（a），含氢化甲硅烷基的化合物（b）和具有一个碳 - 碳双键的环状烯烃化合物（c）的氢化硅烷化获得的改性多面体聚硅氧烷。

公开(公告)号：US09494861B2

公开(公告)日：2016-11-15

申请号：US14410438

申请日：2013-07-02

Applicant: KANEKA CORPORATION

Inventor： Masahito Ide ,  Hirofumi Inari ,  Aki Kitajima ,  Komei Tahara ,  Takao Manabe

IPC: G03F7/004 ,  G03F7/027 ,  C08K5/549 ,  C08G77/388 ,  G03F7/039 ,  G03F7/075 ,  G03F7/40 ,  H01L51/00 ,  H01L51/05 ,  C07F7/18 ,  H01L21/02 ,  H01L21/033

CPC classification number: G03F7/0755 ,  C07F7/1804 ,  C08G77/388 ,  C08K5/549 ,  G03F7/027 ,  G03F7/0392 ,  G03F7/0757 ,  G03F7/162 ,  G03F7/20 ,  G03F7/322 ,  G03F7/40 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/0332 ,  H01L21/441 ,  H01L23/293 ,  H01L29/42364 ,  H01L29/51 ,  H01L29/66969 ,  H01L29/7869 ,  H01L51/0094 ,  H01L51/0508

Abstract: The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to a first aspect of the present invention is characterized by including (A) a compound that contains an alkenyl group or a SiH group within a molecule and has a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; (B) a compound that contains a SiH group or an alkenyl group within a molecule; (C) a hydrosilylation catalyst; and (D) a photoacid generator.

Abstract translation: 本发明的目的在于提供具有优异的图案化特性的正型光敏组合物，并且在固化时（作为薄膜）可以表现出优异的电绝缘可靠性。 根据本发明第一方面的正型光敏组合物的特征在于包括（A）在分子内含有烯基或SiH基的化合物，并且具有在酸存在下分解以产生酸性基团的结构 或羟基; （B）分子内含有SiH基或烯基的化合物; （C）氢化硅烷化催化剂; 和（D）光致酸产生剂。

公开(公告)号：US20150192850A1

公开(公告)日：2015-07-09

申请号：US14410438

申请日：2013-07-02

Applicant: KANEKA CORPORATION

Inventor： Masahito Ide ,  Hirofumi Inari ,  Aki Kitajima ,  Komei Tahara ,  Takao Manabe

IPC: G03F7/027 ,  H01L51/00 ,  H01L51/05

CPC classification number: G03F7/0755 ,  C07F7/1804 ,  C08G77/388 ,  C08K5/549 ,  G03F7/027 ,  G03F7/0392 ,  G03F7/0757 ,  G03F7/162 ,  G03F7/20 ,  G03F7/322 ,  G03F7/40 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/0332 ,  H01L21/441 ,  H01L23/293 ,  H01L29/42364 ,  H01L29/51 ,  H01L29/66969 ,  H01L29/7869 ,  H01L51/0094 ,  H01L51/0508

Abstract: The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to a first aspect of the present invention is characterized by including (A) a compound that contains an alkenyl group or a SiH group within a molecule and has a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; (B) a compound that contains a SiH group or an alkenyl group within a molecule; (C) a hydrosilylation catalyst; and (D) a photoacid generator.

Abstract translation: 本发明的目的在于提供具有优异的图案化特性的正型光敏组合物，并且在固化时（作为薄膜）可以表现出优异的电绝缘可靠性。 根据本发明第一方面的正型光敏组合物的特征在于包括（A）在分子内含有烯基或SiH基的化合物，并且具有在酸存在下分解以产生酸性基团的结构 或羟基; （B）分子内含有SiH基或烯基的化合物; （C）氢化硅烷化催化剂; 和（D）光致酸产生剂。