Abstract:
A semiconductor device includes a substrate, an insulating layer on a bottom surface of the substrate, a portion of a top surface of the insulating layer that faces the substrate being exposed outside a side surface of the substrate, a through via penetrating the substrate, an interconnection structure in the insulating layer, and a dummy pattern on the portion of the top surface of the insulating layer that is exposed by the substrate.
Abstract:
An interconnection structure includes a dielectric layer, and a wiring pattern in the dielectric layer. The wiring pattern includes a via body, a first pad body that vertically overlaps the via body, and a line body that extends from the first pad body. The via body, the first pad body, and the line body are integrally connected to each other, and a level of a bottom surface of the first pad body is lower than a level of a bottom surface of the line body.
Abstract:
A conductive via of a semiconductor device is provided extending in a vertical direction through a substrate, a first end of the conductive via extending through a first surface of the substrate, so that the first end protrudes in the vertical direction relative to the first surface of the substrate. An insulating layer is provided on the first end of the conductive via and on the first surface of the substrate. An upper portion of a mask layer pattern is removed so that a capping portion of the insulating layer that is on the first end of the conductive via is exposed. A portion of the insulating layer at a side of, and spaced apart from, the conductive via, is removed, to form a recess in the insulating layer. The capping portion of the insulating layer on the first end of the conductive via is simultaneously removed.
Abstract:
A semiconductor package includes: a lower package including a lower semiconductor chip, a molding layer on a side surface of the lower semiconductor chip, a conductive post in the molding layer and having a concave top surface, a lower redistribution pattern electrically connecting the lower semiconductor chip to the conductive post, and an upper redistribution electrically connected the conductive post; and an upper package on the lower package, the upper package including an upper semiconductor chip. A first portion of an inner wall of the molding layer contacts a sidewall of the conductive post, and a second portion of the inner wall of the molding layer extends vertically above the top surface of the conductive post, wherein the first and second portions of the inner wall of the molding layer are vertically coplanar with each other and with the sidewall of the conductive post.
Abstract:
A semiconductor chip includes: a semiconductor substrate; a pad insulating layer on the semiconductor substrate; a through electrode which penetrates the semiconductor substrate and the pad insulating layer and includes a conductive plug and a conductive barrier layer surrounding a sidewall of the conductive plug; and a bonding pad which surrounds a sidewall of the through electrode and is spaced apart from the conductive plug with the conductive barrier layer disposed therebetween.
Abstract:
A ring assembly is used in a semiconductor wafer etching device in which a plasma gas flow stream line is not uniform and which surrounds a wafer support plate supporting a semiconductor wafer. The ring assembly includes: an edge ring protruding from at least one side of the semiconductor wafer to have an upper surface higher than an upper surface of the semiconductor wafer; and a shadow ring movable up and down above the edge ring and configured to be tilted with respect to the semiconductor wafer.
Abstract:
A semiconductor package includes an interposer having a first surface and a second surface opposite to the first surface and including a plurality of bonding pads, and first and second semiconductor devices on the interposer. Each of the plurality of bonding pads includes a first pad pattern provided to be exposed from the first surface and having a first width and a second pad pattern provided on the first pad pattern and having a second width greater than the first width.
Abstract:
Disclosed are semiconductor packages and methods of fabricating the same. The semiconductor package includes a redistribution substrate including redistribution line patterns in a dielectric layer, and a semiconductor chip on the redistribution substrate. The semiconductor chip includes chip pads electrically connected to the redistribution line patterns. Each of the redistribution line patterns has a substantially planar top surface and a nonplanar bottom surface. Each of the redistribution line patterns includes a central portion and edge portions on opposite sides of the central portion. Each of the redistribution line patterns has a first thickness as a minimum thickness at the central portion and a second thickness as a maximum thickness at the edge portions.
Abstract:
A semiconductor chip stack structure includes: a first semiconductor chip including a first semiconductor substrate, a first redistribution layer on the first semiconductor substrate and including a first redistribution pattern, and a first pad on an outermost side of the first redistribution layer; a second semiconductor chip including a second semiconductor substrate, a second redistribution layer on the second semiconductor substrate and including a second redistribution pattern, and a second pad on an outermost side of the second redistribution layer, and an area of the second semiconductor chip being smaller than an area of the first semiconductor chip; a first metal wire on the first semiconductor chip; a second metal wire on the second semiconductor chip; and a molding member on the first semiconductor chip and at least a portion of each of the second semiconductor chip, the first metal wire, and the second metal wire.
Abstract:
A semiconductor package includes a first semiconductor chip having a first substrate, a first insulating layer on the first substrate, and a plurality of first bonding pads on the first insulating layer, and having a flat upper surface by an upper surface of the first insulating layer and upper surfaces of the plurality of first bonding pads; and a second semiconductor chip on the upper surface of the first semiconductor chip and having a second substrate, a second insulating layer below the second substrate and in contact with the first insulating layer, and a plurality of second bonding pads on the second insulating layer and in contact with the first bonding pads, respectively, wherein the first insulating layer includes an insulating interfacial layer in contact with the second insulating layer, embedded in the first insulating layer, and spaced apart from the plurality of first bonding pads.