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公开(公告)号：US12045009B2
公开(公告)日：2024-07-23
申请号：US17716257
申请日：2022-04-08
Applicant: Samsung Electronics Co., Ltd.
Inventor： Myungjun Lee , Wookrae Kim , Gwangsik Park , Changhoon Choi
CPC classification number: G03H1/0443 , G02B21/361 , G03H1/0465 , G03H2001/005 , G03H2001/0469
Abstract: A low-cost digital holography microscope (DHM) that is capable of performing inspection at high speed while accurately inspecting an inspection object at high resolution, an inspection method using the DHM, and a method of manufacturing a semiconductor device by using the DHM are provided. The DHM includes: a light source configured to generate and output light; a beam splitter configured to cause the light to be incident on an inspection object and output reflected light from the inspection object; and a detector configured to detect the reflected light, wherein, when the reflected light includes interference light, the detector generates a hologram of the interference light, and wherein no lens is present in a path from the light source to the detector.
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公开(公告)号：US20220276607A1
公开(公告)日：2022-09-01
申请号：US17716257
申请日：2022-04-08
Applicant: Samsung Electronics Co., Ltd.
Inventor： Myungjun Lee , Wookrae Kim , Gwangsik Park , Changhoon Choi
Abstract: A low-cost digital holography microscope (DHM) that is capable of performing inspection at high speed while accurately inspecting an inspection object at high resolution, an inspection method using the DHM, and a method of manufacturing a semiconductor device by using the DHM are provided. The DHM includes: a light source configured to generate and output light; a beam splitter configured to cause the light to be incident on an inspection object and output reflected light from the inspection object; and a detector configured to detect the reflected light, wherein, when the reflected light includes interference light, the detector generates a hologram of the interference light, and wherein no lens is present in a path from the light source to the detector.
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公开(公告)号：US20220074867A1
公开(公告)日：2022-03-10
申请号：US17225275
申请日：2021-04-08
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jaehwang Jung , Hyejin Shin , Wookrae Kim , Gwangsik Park , Myungjun Lee , Yongju Jeon
Abstract: An imaging apparatus includes a light source configured to generate and output light, a stage having a measurement target thereon, a line-scan spectral imaging (SI) optical system configured to measure the measurement target using a first scale and to slopingly irradiate the light from the light source onto the measurement target in a line beam shape, divide light reflected by the measurement target, and perform imaging of the divided light, and an angle-resolved SI optical system configured to measure the measurement target at a second scale that is smaller than the first scale and configured to divide the light from the light source into monochromatic light, slopingly irradiate the monochromatic light onto the measurement target by using a reflective objective lens, and perform imaging of light reflected by the measurement target.
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公开(公告)号：US11264256B2
公开(公告)日：2022-03-01
申请号：US16849631
申请日：2020-04-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang Jung , Gwangsik Park , Wookrae Kim , Juntaek Oh
IPC: G01N21/21 , H01L21/67 , G02B27/28 , G02B27/42 , G02B27/30 , G01N21/25 , G01N21/27 , G01N21/88 , G01N21/95 , G02B27/10 , G06T7/00 , G01N21/17
Abstract: Provided is a wafer inspection apparatus including a monochromator that extracts monochromatic light, a collimator that outputs the monochromatic light as parallel light, a first polarization assembly that polarizes the parallel light and radiates the polarized light to a wafer, an imaging optical system that condenses light reflected from the wafer, a spectroscope that splits the condensed light into a plurality of spectrums, a first lens that condenses the plurality of spectrums, a second polarization assembly that outputs the plurality of spectrums as a plurality of polarized lights having different diffraction orders and a difference of 90°, a second lens that condenses the plurality of polarized lights, a third polarization assembly that outputs common polarized light based on the plurality of polarized interfering with each other, a camera that generates a phase difference image based on the common polarized light, and a signal processor that analyzes the phase difference image.
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15.发明授权公开(公告)号：US10699927B1
公开(公告)日：2020-06-30
申请号：US16509835
申请日：2019-07-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Wookrae Kim , Kwangsoo Kim , Gwangsik Park
Abstract: An inspection apparatus includes a first optical module including a first light source configured to emit first light to a semiconductor structure, a second light source configured to emit second light different from the first light to a portion adjacent to a portion to which the first light is emitted in the semiconductor structure, a detector configured to detect the second light reflected toward the second light source, and a lock-in amplifier connected to the first optical module and the detector.
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Patent Agency Ranking
公开(公告)号：US12222282B2
公开(公告)日：2025-02-11
申请号：US18082040
申请日：2022-12-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Seoyeon Jeong , Seungwoo Lee , Inho Shin , Wookrae Kim , Myungjun Lee , Jaehwang Jung
IPC: G01N21/21 , G01B11/24 , G01N21/956 , G02B27/28
Abstract: A semiconductor measurement apparatus includes an illumination unit configured to provide illumination light including linearly polarized light beams having different wavelengths, an optical unit including an objective lens configured to allow the illumination light to be incident on a sample, the optical unit being configured to transmit reflection light generated when the illumination light is reflected from the sample, a self-interference generator configured to self-interfere the reflection light transmitted from the optical unit and transmit the reflection light to a first image sensor, for each wavelength, and a controller. The controller is configured to process a measurement image output by the image sensor to divide the measurement image into a first image representing an intensity ratio of a polarization component of the reflection light and a second image representing a phase difference of the polarization component of the reflection light, for each wavelength.
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公开(公告)号：US20240288265A1
公开(公告)日：2024-08-29
申请号：US18372391
申请日：2023-09-25
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jinyong Kim , Yasuhiro Hidaka , Wookrae Kim , Ingi Kim , Jinseob Kim
IPC: G01B11/02
CPC classification number: G01B11/02 , G01B2210/56
Abstract: Provided is a semiconductor measurement apparatus that includes: a lighting unit comprising a light source, and a light modulator configured to decompose a light output by the light source into a plurality of wavelength bands and generate an output light of at least two selected wavelength bands; a first optical unit comprising an illumination polarizing element disposed in a path of the output light; a second optical unit comprising a beam splitter, an objective lens configured to allow light having passed through the first optical unit to be incident onto a sample, and a self-interference generator disposed on a path of a reflected light; a sensor configured to output an original image representing an interference pattern of light having passed through the self-interference generator; and a controller configured to process the original image and determine a selected critical dimension of a structure included in the sample.
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公开(公告)号：US20240219315A1
公开(公告)日：2024-07-04
申请号：US18493226
申请日：2023-10-24
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jangwoon Sung , Lei Tian , Hao Wang , Jiabei Zhu , Myungjun Lee , Wookrae Kim , Seungbeom Park , Junho Shin , Hojun Lee
IPC: G01N21/95 , G01N21/88 , G01N21/956
CPC classification number: G01N21/9501 , G01N21/8806 , G01N21/956
Abstract: A substrate inspection apparatus includes a light irradiator including an objective lens and a plurality of optical fibers. The objective lens is configured to irradiate light to an illumination area on a semiconductor substrate having a plurality of circuit pattern layers, the plurality of optical fibers are adjacent a periphery of the objective lens and are configured to irradiate the light to a peripheral area adjacent the illumination area. A light generator is configured to generate the light. The light generator is configured to change an irradiation angle of the light to selectively irradiate the light to one or more of the objective lens and the plurality of optical fibers. A light analyzer is configured to obtain images of the circuit pattern layers from the light reflected from the illumination area and the peripheral area. The light analyzer is configured to model each of the circuit pattern layers of the semiconductor substrate to obtain image models and to measure an overlay between the circuit pattern layers through the images and the image models.
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公开(公告)号：US11726046B2
公开(公告)日：2023-08-15
申请号：US17225275
申请日：2021-04-08
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jaehwang Jung , Hyejin Shin , Wookrae Kim , Gwangsik Park , Myungjun Lee , Yongju Jeon
CPC classification number: G01N21/9501 , G01B11/254 , G01B2210/56
Abstract: An imaging apparatus includes a light source configured to generate and output light, a stage having a measurement target thereon, a line-scan spectral imaging (SI) optical system configured to measure the measurement target using a first scale and to slopingly irradiate the light from the light source onto the measurement target in a line beam shape, divide light reflected by the measurement target, and perform imaging of the divided light, and an angle-resolved SI optical system configured to measure the measurement target at a second scale that is smaller than the first scale and configured to divide the light from the light source into monochromatic light, slopingly irradiate the monochromatic light onto the measurement target by using a reflective objective lens, and perform imaging of light reflected by the measurement target.
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公开(公告)号：US20210028035A1
公开(公告)日：2021-01-28
申请号：US16833903
申请日：2020-03-30
Applicant: Samsung Electronics Co., Ltd.
Inventor： Myungjun Lee , Wookrae Kim , Jaehwang Jung , Myoungki Ahn
Abstract: Provided is an imaging ellipsometry (IE)-based inspection method including selecting a mode from among a first mode of an IE-based inspection device having a first field of view (FOV) and a second mode of an IE-based inspection device having a second FOV, measuring an inspection target by the IE-based inspection device based on the selected mode, and determining whether the inspection target is normal based on a result of the measuring, wherein the measuring of the inspection target comprises simultaneously measuring patterns included in a plurality of cells provided in a region of the inspection target, the region corresponding to an FOV of the selected mode.
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