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公开(公告)号：US20240418645A1
公开(公告)日：2024-12-19
申请号：US18408247
申请日：2024-01-09
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Hojun Lee , Jangwoon Sung , Wookrae Kim , Hyungjin Kim , Seungbeom Park , Junho Shin , Myungjun Lee
Abstract: An example semiconductor measurement apparatus includes a light source, a pattern generator, a stage, an image sensor, and a controller. The light source is configured to output light in a predetermined wavelength band. The pattern generator is configured to generate light including a speckle pattern by scattering the light output from the light source. The stage is disposed on a movement path of the light including the speckle pattern, and a sample reflecting the light including the speckle pattern is seated on the stage. The image sensor is configured to receive light reflected from the sample and generate an original image representing a diffractive pattern of light reflected from the sample. The controller is configured to generate a prediction image for estimating diffractive characteristics of light incident on the image sensor.
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公开(公告)号：US11624699B2
公开(公告)日：2023-04-11
申请号：US17081568
申请日：2020-10-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang Jung , Wookrae Kim , Myoungki Ahn , Changhyeong Yoon
Abstract: A measurement system is disclosed. A measurement system includes an illumination module, a mirror module, a stage, and a detector. The illumination module includes a light source, an optical fiber, a collimating mirror, a polarization state generator, a beam control mirror, and a relay mirror. The mirror module includes a first beam splitter and a reflective objective mirror. The beam control mirror is movable to relay light received from the polarization state generator to various positions on the relay mirror.
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公开(公告)号：US20250012556A1
公开(公告)日：2025-01-09
申请号：US18403801
申请日：2024-01-04
Applicant: Samsung Electronics Co., Ltd.
Inventor： Younguk Jin , Wookrae Kim , Jinseob Kim , Jinyong Kim , Garam Choi , Daehoon Han
IPC: G01B9/02 , G01B9/02001 , G01B9/02056
Abstract: A semiconductor measurement apparatus includes lighting unit; a light receiving unit; and a control unit configured to: generate a prediction equation representing the original image, where the prediction equation is based on a plurality of elements of a Mueller matrix, approximate each of the plurality of elements of the Mueller matrix to a polynomial including bases of a Zernike polynomial and coefficients, generate optimization coefficients based on a sum of the coefficients and a difference between the prediction equation and the original image, determine whether an optimization condition is satisfied based on the optimization coefficients and a minimum value, and select a dimension based on the optimization coefficients and the bases when the optimization condition is satisfied.
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公开(公告)号：US11972960B2
公开(公告)日：2024-04-30
申请号：US16833903
申请日：2020-03-30
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Myungjun Lee , Wookrae Kim , Jaehwang Jung , Myoungki Ahn
CPC classification number: H01L21/67288 , G01N21/211 , G01N21/9501 , G06T7/001 , H01L22/12 , G01N2021/1765 , G01N2201/12 , G01N2201/13 , G06T2207/30148
Abstract: Provided is an imaging ellipsometry (IE)-based inspection method including selecting a mode from among a first mode of an IE-based inspection device having a first field of view (FOV) and a second mode of an IE-based inspection device having a second FOV, measuring an inspection target by the IE-based inspection device based on the selected mode, and determining whether the inspection target is normal based on a result of the measuring, wherein the measuring of the inspection target comprises simultaneously measuring patterns included in a plurality of cells provided in a region of the inspection target, the region corresponding to an FOV of the selected mode.
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公开(公告)号：US20210082725A1
公开(公告)日：2021-03-18
申请号：US16849631
申请日：2020-04-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang JUNG , Gwangsik Park , Wookrae Kim , Juntaek Oh
IPC: H01L21/67 , G02B27/28 , G02B27/42 , G02B27/30 , G01N21/25 , G01N21/27 , G01N21/21 , G01N21/88 , G01N21/95 , G02B27/10 , G06T7/00
Abstract: Provided is a wafer inspection apparatus including a monochromator that extracts monochromatic light, a collimator that outputs the monochromatic light as parallel light, a first polarization assembly that polarizes the parallel light and radiates the polarized light to a wafer, an imaging optical system that condenses light reflected from the wafer, a spectroscope that splits the condensed light into a plurality of spectrums, a first lens that condenses the plurality of spectrums, a second polarization assembly that outputs the plurality of spectrums as a plurality of polarized lights having different diffraction orders and a difference of 90°, a second lens that condenses the plurality of polarized lights, a third polarization assembly that outputs common polarized light based on the plurality of polarized interfering with each other, a camera that generates a phase difference image based on the common polarized light, and a signal processor that analyzes the phase difference image.
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Patent Agency Ranking
公开(公告)号：US12228499B2
公开(公告)日：2025-02-18
申请号：US18111229
申请日：2023-02-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang Jung , Yasuhiro Hidaka , Mitsunori Numata , Wookrae Kim , Jinseob Kim , Myungjun Lee
Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.
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公开(公告)号：US12002698B2
公开(公告)日：2024-06-04
申请号：US17174731
申请日：2021-02-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Myungjun Lee , Changhyeong Yoon , Wookrae Kim , Jaehwang Jung , Jinseob Kim
CPC classification number: H01L21/67288 , G01N21/4788 , G01N21/8851 , G01N21/9501 , G01N2201/021 , G01N2201/0636 , G06N20/00
Abstract: Provided are a diffraction-based metrology apparatus having high measurement sensitivity, a diffraction-based metrology method capable of accurately performing measurement on a semiconductor device, and a method of manufacturing a semiconductor device using the metrology method. The diffraction-based metrology apparatus includes a light source that outputs a light beam, a stage on which an object is placed, a reflective optical element that irradiates the light beam onto the object through reflection, such that the light beam is incident on the object at an inclination angle, the inclination angle being an acute angle, a detector that detects a diffracted light beam that is based on the light beam reflected and diffracted by the object and a processor that measures a 3D pupil matrix for the diffracted light beam and analyze the object based on the 3D pupil matrix.
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公开(公告)号：US20230400404A1
公开(公告)日：2023-12-14
申请号：US18154990
申请日：2023-01-16
Applicant: Samsung Electronics Co., Ltd.
Inventor： Garam Choi , Wookrae Kim , Jinseob Kim , Jinyong Kim , Sungho Jang , Daehoon Han
CPC classification number: G01N21/21 , G01B11/24 , G01B2210/56
Abstract: A semiconductor measurement apparatus includes an illumination unit including a light source and at least one illumination polarization element, a light receiving unit including at least one light-receiving polarization element disposed on a path of light reflected by a sample, and an image sensor positioned to receive light passing through the at least one light-receiving polarization element and configured to output an original image, and a control unit configured to determine, by processing the original image, a selected critical dimension among critical dimensions of a structure included in a region of the sample. The control unit is configured to obtain a plurality of sample images by selecting regions of the original image in which a peak due to interference appears, to determine a plurality of elements included in a Mueller matrix using the plurality of sample images, and to determine the selected critical dimension based on the plurality of elements.
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公开(公告)号：US11604136B2
公开(公告)日：2023-03-14
申请号：US17204059
申请日：2021-03-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang Jung , Yasuhiro Hidaka , Mitsunori Numata , Wookrae Kim , Jinseob Kim , Myungjun Lee
Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.
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公开(公告)号：US11314205B2
公开(公告)日：2022-04-26
申请号：US16225638
申请日：2018-12-19
Applicant: Samsung Electronics Co., Ltd.
Inventor： Myungjun Lee , Wookrae Kim , Gwangsik Park , Changhoon Choi
Abstract: A low-cost digital holography microscope (DHM) that is capable of performing inspection at high speed while accurately inspecting an inspection object at high resolution, an inspection method using the DHM, and a method of manufacturing a semiconductor device by using the DHM are provided. The DHM includes: a light source configured to generate and output light; a beam splitter configured to cause the light to be incident on an inspection object and output reflected light from the inspection object; and a detector configured to detect the reflected light, wherein, when the reflected light includes interference light, the detector generates a hologram of the interference light, and wherein no lens is present in a path from the light source to the detector.
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