SYSTEM FOR ALIGNING PATTERNS ON A SUBSTRATE
    11.
    发明申请
    SYSTEM FOR ALIGNING PATTERNS ON A SUBSTRATE 有权
    在基板上对准图案的系统

    公开(公告)号:US20150276640A1

    公开(公告)日:2015-10-01

    申请号:US14230114

    申请日:2014-03-31

    Abstract: A system for aligning a first and second pattern based on alignment structures is disclosed. The system comprises a first substrate including the first alignment structure. The alignment structure has a different magnitude of the electrical characteristic than the substrate. The system also includes an electrical probe and a controller for controlling the relative position of the probe with respect to the substrate to measure the electrical characteristic at a plurality of positions proximate the substrate. The measured electrical characteristics are used to identify the location of the alignment structure by identifying a difference between the measured electrical characteristic at pairs of the plurality of positions. A controller identifies the location of a second alignment structure formed on a second substrate. A registration mechanism aligns the two substrates using the identified locations of the first and second alignment structures.

    Abstract translation: 公开了一种用于基于对准结构对准第一和第二图案的系统。 该系统包括包括第一对准结构的第一基板。 对准结构具有与衬底不同的电特性。 该系统还包括电探针和控制器,用于控制探针相对于基底的相对位置以测量靠近基底的多个位置的电特性。 测量的电特性用于通过识别所测量的多个位置对的电特性之间的差异来识别对准结构的位置。 控制器识别形成在第二基板上的第二对准结构的位置。 注册机构使用第一和第二对准结构的识别位置对准两个基板。

    Alignment structure for registering patterns on a substrate
    15.
    发明授权
    Alignment structure for registering patterns on a substrate 有权
    用于在衬底上登记图案的对准结构

    公开(公告)号:US09274431B2

    公开(公告)日:2016-03-01

    申请号:US14230153

    申请日:2014-03-31

    CPC classification number: G03F7/20 G03F9/7053 G03F9/7076

    Abstract: A system for determining an alignment location associated with a pattern formed on a substrate is disclosed. Electrical measurements are made as the substrate is moved along an advancement direction. An alignment structure is formed on the substrate. The alignment structure has a first member extending along a first direction that is not parallel to the advancement direction and a second member extending along a second direction that is not parallel to either the advancement direction or to the first member. The first member and the second member are electrically conductive and substantially transparent. One or more probes are used to identify portions of the first and second members of the alignment structure and produce signals in response to relative motion between the substrate and the probes. A controller, responsive to signals produced by the probe, determines an alignment location associated with the pattern formed on the substrate.

    Abstract translation: 公开了一种用于确定与形成在衬底上的图案相关联的对准位置的系统。 当基板沿着前进方向移动时进行电测量。 在基板上形成对准结构。 对准结构具有沿着与前进方向不平行的第一方向延伸的第一构件和沿着与前进方向不平行的第二方向延伸的第二构件或第一构件。 第一构件和第二构件是导电的并且基本上是透明的。 使用一个或多个探针来识别对准结构的第一和第二构件的部分并且响应于衬底和探针之间的相对运动而产生信号。 响应于由探针产生的信号的控制器确定与在衬底上形成的图案相关联的对准位置。

    METHOD FOR ALIGNING PATTERNS ON A SUBSTRATE
    16.
    发明申请
    METHOD FOR ALIGNING PATTERNS ON A SUBSTRATE 有权
    在基板上对准图案的方法

    公开(公告)号:US20150279748A1

    公开(公告)日:2015-10-01

    申请号:US14230107

    申请日:2014-03-31

    Abstract: A method for aligning a second pattern to a first pattern based on a first alignment structure on a first substrate is disclosed. The alignment structure has a different magnitude of the electrical characteristic than the substrate. A controller controls the relative position of an electrical probe with respect to the substrate to measure the electrical characteristic corresponding at a plurality of positions proximate the substrate. The measured electrical characteristics are used to identify the location of the alignment structure by identifying a difference between the measured electrical characteristic at a pair of the plurality of positions exceeding a predetermined threshold. A second substrate having the second pattern including a second alignment structure formed thereon is aligned to the first substrate by a controller based on the identified locations of the first and second alignment structures.

    Abstract translation: 公开了一种基于第一基板上的第一对准结构将第二图案与第一图案对准的方法。 对准结构具有与衬底不同的电特性。 控制器控制电探头相对于基板的相对位置,以测量在靠近基板的多个位置对应的电特性。 测量的电特性用于通过识别超过预定阈值的多个位置对的测量电特性之间的差异来识别对准结构的位置。 具有包括形成在其上的第二对准结构的第二图案的第二基板通过基于所识别的第一和第二对准结构的位置的控制器与第一基板对准。

    SYSTEM FOR FORMING ALIGNED PATTERNS ON A SUBSTRATE
    17.
    发明申请
    SYSTEM FOR FORMING ALIGNED PATTERNS ON A SUBSTRATE 有权
    在基板上形成对准图案的系统

    公开(公告)号:US20150276639A1

    公开(公告)日:2015-10-01

    申请号:US14230140

    申请日:2014-03-31

    Abstract: A system for forming a second pattern in registration with a first pattern on a substrate is disclosed. The system comprises the substrate having a first magnitude of an associated electrical characteristic and at least one alignment structure. The alignment structure has a second magnitude of the electrical characteristic different from that of the substrate. An advancing mechanism is used for moving the substrate. A probe is used for measuring an electrical characteristic at a plurality of positions proximate the moving substrate. A controller is used for interpreting the measured electrical characteristic as a function of position for identifying a location of the alignment structure. A first patterning station is used for forming the second pattern on a surface of the substrate in registration with the first pattern based on the identified location of the alignment structure.

    Abstract translation: 公开了一种用于形成与衬底上的第一图案对准的第二图案的系统。 该系统包括具有相关电特性的第一大小的基板和至少一个对准结构。 对准结构具有不同于衬底的电特性的第二幅度。 使用推进机构来移动基板。 探头用于测量靠近移动基板的多个位置处的电特性。 控制器用于将测量的电特性解释为用于识别对准结构的位置的位置的函数。 基于识别的对准结构的位置,使用第一图案化台来在基板的与第一图案对准的表面上形成第二图案。

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