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    Photobase Generator, Compound, Photoreactive Composition, and Reaction Product
    12.
    发明申请
    Photobase Generator, Compound, Photoreactive Composition, and Reaction Product 有权

    公开(公告)号：US20220340528A1

    公开(公告)日：2022-10-27

    申请号：US17641589

    申请日：2020-09-10

    Applicant: Tokyo University of Science Foundation

    Inventor： Koji Arimitsu

    IPC: C07D211/94

    Abstract: A photobase generator includes a compound including: first skeletons represented by the following formula (a); and a second skeleton including nitrogen atoms bonding to bonding positions of the first skeletons to form amide groups, wherein, in a molecule, a number of the first skeletons is two or more, a number of the nitrogen atoms, configuring the amide groups, in the second skeleton is the same as the number of the first skeletons, and at least one of the nitrogen atoms configuring the amide groups is converted into a nitrogen atom configuring a secondary amine or a tertiary amine by light irradiation. In the formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.

    Active energy ray-curable composition
    14.
    发明授权
    Active energy ray-curable composition 有权

    公开(公告)号：US11180579B2

    公开(公告)日：2021-11-23

    申请号：US16771453

    申请日：2018-11-30

    Applicant: TOKYO UNIVERSITY OF SCIENCE FOUNDATION ,  TOAGOSEI CO., LTD.

    Inventor： Koji Arimitsu ,  Kento Oomura

    IPC: C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  C09D7/63 ,  C08F20/26 ,  C09D4/00 ,  C09D11/101 ,  C09J4/00 ,  C09J11/06

    Abstract: An active energy ray-curable composition is disclosed including: an anionically polymerizable compound represented by (1): wherein EWG represents an electron-withdrawing group, X represents a single bond or an oxygen atom (—O—), R represents an n-valent organic group, and n represents an integer of 1 to 6; when n is an integer of 2 to 6, the respective EWG and the respective X may be the same or different; and when n is 1, EWG and R may be bonded; and a compound (photobase generator) represented by (2): wherein ring A represents an aromatic ring that may be substituted or a heteroaromatic ring that may be substituted; R1 and R2 are the same or different and each represents a hydrogen atom or an alkyl group; R1 and R2 may be bonded to each other to form a ring together with an adjacent nitrogen atom; and the ring may be substituted.

    ACTIVE ENERGY RAY-CURABLE COMPOSITION
    15.
    发明申请
    ACTIVE ENERGY RAY-CURABLE COMPOSITION 有权

    公开(公告)号：US20210070893A1

    公开(公告)日：2021-03-11

    申请号：US16771453

    申请日：2018-11-30

    Applicant: TOKYO UNIVERSITY OF SCIENCE FOUNDATION ,  TOAGOSEI CO., LTD.

    Inventor： Koji Arimitsu ,  Kento Oomura

    IPC: C08F2/46 ,  C08F20/26 ,  C09D11/101 ,  C09D4/00 ,  C09D7/63 ,  C09J11/06 ,  C09J4/00

    Abstract: An active energy ray-curable composition is disclosed including: an anionically polymerizable compound represented by (1): wherein EWG represents an electron-withdrawing group, X represents a single bond or an oxygen atom (—O—), R represents an n-valent organic group, and n represents an integer of 1 to 6; when n is an integer of 2 to 6, the respective EWG and the respective X may be the same or different; and when n is 1, EWG and R may be bonded; and a compound (photobase generator) represented by (2): wherein ring A represents an aromatic ring that may be substituted or a heteroaromatic ring that may be substituted; R1 and R2 are the same or different and each represents a hydrogen atom or an alkyl group; R1 and R2 may be bonded to each other to form a ring together with an adjacent nitrogen atom; and the ring may be substituted.

    Photobase Generator, Compound, Photoreactive Composition and Reaction Product
    18.
    发明申请
    Photobase Generator, Compound, Photoreactive Composition and Reaction Product 有权

    公开(公告)号：US20230089021A1

    公开(公告)日：2023-03-23

    申请号：US17788770

    申请日：2020-12-24

    Applicant: Tokyo University of Science Foundation

    Inventor： Koji Arimitsu

    IPC: G03F7/004 ,  C07D213/75 ,  C08K5/3432

    Abstract: A photobase generator, includes a compound including a first skeleton represented by the following formula (a); and a second skeleton including a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group, and a pyridine skeleton in addition to the nitrogen atom, in which the compound generates a base in which a hydrogen atom is bonded with the nitrogen atom of the second skeleton by light irradiation. In formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.

    Photoreactive Composition, Reaction Product, and Method of Producing Reaction Product
    19.
    发明申请
    Photoreactive Composition, Reaction Product, and Method of Producing Reaction Product 有权

    公开(公告)号：US20210253826A1

    公开(公告)日：2021-08-19

    申请号：US17053431

    申请日：2019-05-07

    Applicant: Tokyo University of Science Foundation

    Inventor： Koji Arimitsu

    IPC: C08K5/3435 ,  C07D295/192 ,  C07D307/88 ,  C08F20/32

    Abstract: A photoreactive composition including a base-reactive compound, a photobase generator that is represented by the following Formula (1) and that generates a base when irradiated with light, and at least one compound selected from the group consisting of a polycyclic aromatic compound having a fused ring structure having two or more rings and a polycyclic aromatic compound having three or more aromatic rings and having a conjugated structure including any two or more of the three or more aromatic rings, in which the base-reactive compound is a compound having two or more groups that will have their polarity converted by the action of a base and that exhibit reactivity, in one molecule, or a compound having two or more groups that will react under the action of a base, in one molecule.

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