公开(公告)号：US11450445B2

公开(公告)日：2022-09-20

申请号：US16895704

申请日：2020-06-08

Applicant: TOKYO UNIVERSITY OF SCIENCE FOUNDATION ,  NISSAN CHEMICAL INDUSTRIES, LTD.

Inventor： Koji Arimitsu ,  Makoto Wakabayashi

IPC: G03F7/16 ,  G03F7/09 ,  G03F7/004 ,  G03F7/20 ,  G03F7/34 ,  H01B1/12 ,  H01B13/00 ,  H01L51/00 ,  C03C17/28 ,  H01B5/14

Abstract: A method for manufacturing an electroconductive pattern 40, provided with: a lamination step for laminating an acid generation film 10 containing an acid proliferation agent and a photoacid generator on a polymer film 20 containing an electroconductive polymer formed on a substrate 21; a masking step for masking the top of the acid generation film 10; a light irradiation step for irradiating the laminate from the acid-generation-film 10 side; a doping step for doping the electroconductive polymer with an acid generated and proliferated in the acid generation film 10 by the light irradiation; and a releasing step for releasing the acid generation film 10 from the polymer film 20. This method makes it possible to provide an electroconductive film and a method for manufacturing an electroconductive pattern in which photoacid generation and acid proliferation effects are utilized.

公开(公告)号：US12099297B2

公开(公告)日：2024-09-24

申请号：US17452343

申请日：2021-10-26

Applicant: TOKYO OHKA KOGYO CO., LTD. ,  Tokyo University of Science Foundation

Inventor： Kunihiro Noda ,  Dai Shiota ,  Koji Arimitsu

IPC: G03F7/004 ,  C07D233/60 ,  C07D311/86 ,  C07F9/06 ,  G03F7/075

CPC classification number: G03F7/0045 ,  C07D233/60 ,  C07D311/86 ,  C07F9/067 ,  G03F7/0757

Abstract: An energy-sensitive composition including a polysilane, a base generator, and a solvent, the base generator including a compound represented by formula (b1) and a photo base generator:




in which Rb1 to Rb3 each independently represents a hydrogen atom, halogen atom, hydroxyl group, mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfonato group, phosphino group, phosphinyl group, phosphonato group or organic group; Rb4 and Rb5 each independently represent a hydrogen atom, halogen atom, hydroxyl group, mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfino group, sulfo group, sulfonato group, phosphino group, phosphinyl group, phosphono group, phosphonato group or aliphatic group; and Rb6 represents a hydrogen atom, alkyl group or alkoxy group.

公开(公告)号：US11873380B2

公开(公告)日：2024-01-16

申请号：US17053431

申请日：2019-05-07

Applicant: Tokyo University of Science Foundation

Inventor： Koji Arimitsu

IPC: C08K5/34 ,  C08K5/3435 ,  C07D295/192 ,  C07D307/88 ,  C08F20/32

CPC classification number: C08K5/3435 ,  C07D295/192 ,  C07D307/88 ,  C08F20/32

Abstract: A photoreactive composition including a base-reactive compound, a photobase generator that is represented by the following Formula (1) and that generates a base when irradiated with light, and at least one compound selected from the group consisting of a polycyclic aromatic compound having a fused ring structure having two or more rings and a polycyclic aromatic compound having three or more aromatic rings and having a conjugated structure including any two or more of the three or more aromatic rings, in which the base-reactive compound is a compound having two or more groups that will have their polarity converted by the action of a base and that exhibit reactivity, in one molecule, or a compound having two or more groups that will react under the action of a base, in one molecule.

公开(公告)号：US11106132B2

公开(公告)日：2021-08-31

申请号：US16390429

申请日：2019-04-22

Applicant: TOKYO OHKA KOGYO CO., LTD. ,  Tokyo University of Science Foundation

Inventor： Kunihiro Noda ,  Dai Shiota ,  Koji Arimitsu

IPC: G03F7/004 ,  C08G77/12 ,  C07C257/10 ,  C07F9/22

Abstract: An energy-sensitive composition including at least one of a silane compound monomer capable of forming a polysilane compound, a silane compound oligomer and the polysilane compound, and a base generator (B) represented by the following formula (1): in which R1 to R11 each independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, an arylalkyl group or an alkoxy group, R5 and R6 may be connected to each other via a single bond or a divalent linking group, Zq+ represents a q-valent counter cation composed of a base having a pKa of 24 or more, and q represents an integer of 1 or more.

公开(公告)号：US11873354B2

公开(公告)日：2024-01-16

申请号：US17641574

申请日：2020-09-10

Applicant: Tokyo University of Science Foundation

Inventor： Koji Arimitsu

IPC: C08F2/50 ,  C08F122/10 ,  C07C59/11 ,  C07C69/732 ,  C07C279/04 ,  C07C279/22 ,  C07D233/06 ,  C07D295/185 ,  C07D311/86 ,  C08G59/50

CPC classification number: C08F2/50 ,  C07C59/11 ,  C07C69/732 ,  C07C279/04 ,  C07C279/22 ,  C07D233/06 ,  C07D295/185 ,  C07D311/86 ,  C08F122/1006 ,  C08G59/5046

Abstract: A photobase generator includes a compound including a first skeleton represented by the following formula (a), and a second skeleton including a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group, wherein the compound generates a base, in which a hydrogen atom is bonding with the nitrogen atom of the second skeleton, by light irradiation, and the pKa of a conjugate acid of the base in water is 12 or more. In formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.

公开(公告)号：US20220146929A1

公开(公告)日：2022-05-12

申请号：US17452343

申请日：2021-10-26

Applicant: TOKYO OHKA KOGYO CO., LTD. ,  Tokyo University of Science Foundation

Inventor： Kunihiro Noda ,  Dai Shiota ,  Koji Arimitsu

IPC: G03F7/004 ,  G03F7/075 ,  C07D233/60 ,  C07D311/86 ,  C07F9/06

Abstract: An energy-sensitive composition including a polysilane, a base generator, and a solvent, the base generator including a compound represented by formula (b1) and a photo base generator: in which Rb1 to Rb3 each independently represents a hydrogen atom, halogen atom, hydroxyl group, mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfonato group, phosphino group, phosphinyl group, phosphonato group or organic group; Rb4 and Rb5 each independently represent a hydrogen atom, halogen atom, hydroxyl group, mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfino group, sulfo group, sulfonato group, phosphino group, phosphinyl group, phosphono group, phosphonato group or aliphatic group; and Rb6 represents a hydrogen atom, alkyl group or alkoxy group.

公开(公告)号：US10774062B2

公开(公告)日：2020-09-15

申请号：US16072794

申请日：2017-01-25

Applicant: FUJIFILM Wako Pure Chemical Corporation ,  Tokyo University of Science Foundation

Inventor： Nobuhiko Sakai ,  Kosuke Yanaba ,  Shigeaki Imazeki ,  Koji Arimitsu

IPC: C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  C07D335/16 ,  C08G75/045 ,  C07C59/84 ,  C07D311/86 ,  C08F299/08 ,  C07C66/02 ,  C07C279/26 ,  C08G77/20 ,  C08G77/28 ,  G03F7/004

Abstract: An object of the present invention is to provide a photocuring method, which makes it possible to rapidly and efficiently obtain a crosslinked product (resin), a compound used in the photocuring method, and a photocuring resin composition containing the compound.The present invention relates to a photocuring method, which comprises a step 1 and a step 2 performed after the step 1, a compound used in the photocuring method, and a photocuring resin composition containing the compound.Step 1: this is a step in which in the presence of (A) compound having a carbonyl group generating a radical by photoirradiation and a carboxyl group decarboxylated by photoirradiation, (B) silane coupling agent having a mercapto group or a (meth)acryl group is reacted with (C) water under acidic conditions to obtain (D) silane compound having a mercapto group or a (meth)acryl group and at least one silanol group.Step 2: this is a step in which in the presence of the compound (A) and (E) compound having a carbonyl group generating a radical by photoirradiation and a group generating a base by being decarboxylated by photoirradiation, the compound (A) and the compound (E) are irradiated with light to create alkaline conditions in a reaction system by decarboxylating the carboxyl group of the compound (A) and generating a base from the compound (E), and radicals are generated from the compound (A) and the compound (E) to generate a crosslinked product containing a constitutional unit derived from the silane compound (D) from the silane compound (D) and, if necessary, from (F) compound having two or more polymerizable unsaturated groups.

公开(公告)号：US10508078B2

公开(公告)日：2019-12-17

申请号：US15781623

申请日：2016-12-07

Applicant: TOKYO UNIVERSITY OF SCIENCE FOUNDATION ,  NIPPON KAYAKU KABUSHIKI KAISHA

Inventor： Kiwamu Terada ,  Kazuyoshi Yamamoto ,  Koji Arimitsu

IPC: C07C271/24 ,  C08F2/50 ,  G03F7/031 ,  C07C269/02 ,  C08K5/205 ,  C08L63/00 ,  G03F7/20 ,  G03F7/004 ,  G03F7/038

Abstract: The purpose of the present invention is to provide: a novel compound which can generate a base and radical upon the irradiation with an active energy ray; a photopolymerization initiator which comprises the novel compound; and a photosensitive resin composition which contains the photopolymerization initiator, has high sensitivity and excellent storage stability, and can be formed into a cured article that does not have a metal-corrosive property. The novel compound is represented by formula (1): (wherein R1 to R6 independently represent a hydrogen atom, a hydroxy group, an alkoxy group, an organic group other than the aforementioned substituents, or the like; X represents a residue having a structure such that n hydrogen atoms are removed from a saturated hydrocarbon containing a ring structure; and n represents an integer of 1 to 6).

公开(公告)号：US20190332010A1

公开(公告)日：2019-10-31

申请号：US16390429

申请日：2019-04-22

Applicant: TOKYO OHKA KOGYO CO., LTD. ,  Tokyo University of Science Foundation

Inventor： Kunihiro NODA ,  Dai SHIOTA ,  Koji Arimitsu

IPC: G03F7/004 ,  C07F9/22 ,  C07C257/10 ,  C08G77/12

Abstract: An energy-sensitive composition including at least one of a silane compound monomer capable of forming a polysilane compound, a silane compound oligomer and the polysilane compound, and a base generator (B) represented by the following formula (1): in which R1 to R11 each independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, an arylalkyl group or an alkoxy group, R5 and R6 may be connected to each other via a single bond or a divalent linking group, Zq+ represents a q-valent counter cation composed of a base having a pKa of 24 or more, and q represents an integer of 1 or more.

公开(公告)号：US10197913B2

公开(公告)日：2019-02-05

申请号：US15516116

申请日：2015-09-29

Applicant: Tokyo University of Science Foundation ,  NIPPON KAYAKU KABUSHIKI KAISHA

Inventor： Koji Arimitsu ,  Kiwamu Terada

IPC: G03F7/16 ,  G06F7/20 ,  G03F7/32 ,  G03F7/38 ,  G03F7/004 ,  G03F7/038 ,  G03F7/20

Abstract: Provided is a photosensitive resin composition that contains (A) a photobase generator and (B) an alkali-soluble epoxy compound, wherein the photobase generator (A) contains a compound represented by formula (2-1): and the alkali-soluble epoxy compound (B) is an epoxy compound obtained by reacting (c) a polybasic acid anhydride with a product of a reaction between (a) an epoxy compound having two or more epoxy groups in the molecule and (b) a compound having one or more hydroxyl groups and one carboxyl group in the molecule.