公开(公告)号：US20060251547A1

公开(公告)日：2006-11-09

申请号：US11122965

申请日：2005-05-05

Applicant: Larry Windes ,  William Murdoch ,  Thomas Yount ,  Paul Scherrer ,  Richard Bonner ,  Christopher Slaughter

Inventor： Larry Windes ,  William Murdoch ,  Thomas Yount ,  Paul Scherrer ,  Richard Bonner ,  Christopher Slaughter

IPC: B01J19/00

CPC classification number: B01J19/247 ,  B01J10/02 ,  B01J19/006 ,  B01J19/32 ,  B01J19/325 ,  B01J2219/00768 ,  B01J2219/32206 ,  B01J2219/32213 ,  B01J2219/32227 ,  B01J2219/32237 ,  B01J2219/32255 ,  B01J2219/32272 ,  B01J2219/32275 ,  B01J2219/32286 ,  B01J2219/32289 ,  B01J2219/32408 ,  B01J2219/32416 ,  B01J2219/32491 ,  C08G63/785

Abstract: A bundle assembly for vertical, gravity flow driven polymerization reactors for combinations of high viscosity, high throughput, and thin polymer films is provided. The bundle assembly includes static internal components that provide large areas of free liquid surfaces in contact with the atmosphere of the reactor while still attaining sufficient liquid holdup times for polymerization to take place. The bundle assembly includes one or more stationary film generators. The bundle assembly further includes one or more stationary arrays of film support structures. Each of the film support structures has a first side and a second side. Both sides of the film support structure are coated with flowing polymer. The vertical arrangement of components in the bundle assembly cause the polymeric melt to cascade down the vertical length of a reaction vessel interior that incorporates the bundle assembly. The present invention also provides a polymerization reactor that incorporates the assembly of the invention and a method of increasing the degree of polymerization of a polymer melt by using the assembly of the invention.

Abstract translation: 提供了用于高粘度，高通量和薄聚合物膜的组合的垂直重力流驱动聚合反应器的束组件。 束组件包括静态内部部件，其提供与反应器的气氛接触的大面积的游离液体表面，同时仍然获得足够的液体滞留时间以进行聚合。 束组件包括一个或多个固定膜发生器。 束组件还包括一个或多个静止的膜支撑结构阵列。 每个膜支撑结构具有第一侧和第二侧。 薄膜支撑结构的两侧涂有流动的聚合物。 束组件中的部件的垂直布置使得聚合物熔体沿着并入束组件的反应容器内部的垂直长度逐渐下降。 本发明还提供一种聚合反应器，其包含本发明的组合物和通过使用本发明的组合物提高聚合物熔体的聚合度的方法。

公开(公告)号：US06972113B1

公开(公告)日：2005-12-06

申请号：US09913904

申请日：2000-02-17

Applicant: Colin Ramshaw ,  Roshan Jeet Jee Jachuck

Inventor： Colin Ramshaw ,  Roshan Jeet Jee Jachuck

IPC: B01D9/02 ,  B01F5/00 ,  B01F5/22 ,  B01F13/10 ,  B01J4/00 ,  B01J10/02 ,  B01J19/00 ,  B01J19/08 ,  B01J19/10 ,  B01J19/12 ,  B01J19/18 ,  B01J35/02 ,  B01J35/04 ,  C08F2/01 ,  C08F10/02 ,  C08G63/78 ,  B10J19/08

CPC classification number: C08G63/785 ,  B01F5/22 ,  B01F5/223 ,  B01F2005/0011 ,  B01F2005/0022 ,  B01F2005/0037 ,  B01F2005/0097 ,  B01F2013/1091 ,  B01J10/02 ,  B01J19/12 ,  B01J19/123 ,  B01J19/125 ,  B01J19/126 ,  B01J19/128 ,  B01J19/1887 ,  B01J2219/00076 ,  C08F10/02 ,  C08F2/00 ,  C08F2/01

Abstract: A reactor including a rotatable disc (3) having a surface (5) onto which reactant (15) is supplied by way of a feed (4). The disc (3) is rotated at high speed, and the reactant (15) spills over the surface (5) so as to form a film (17). The surface (5) is provided with features to enhance its surface area, such as a metal mesh (60), thereby helping to increase the residence time of the reactant (15) on the surface (5) and to help mixing.

Abstract translation: 一种包括具有表面（5）的可旋转盘（3）的反应器，反应物（15）通过进料（4）供应到所述表面上。 盘（3）以高速旋转，反应物（15）溢出表面（5）以形成膜（17）。 表面（5）具有增强其表面积的特征，例如金属网（60），从而有助于增加反应物（15）在表面（5）上的停留时间并帮助混合。

公开(公告)号：US20050211168A1

公开(公告)日：2005-09-29

申请号：US11132173

申请日：2005-05-19

Applicant: Takakazu Yamada ,  Takeshi Masuda ,  Masahiko Kajinuma ,  Masaki Uematsu ,  Koukou Suu

Inventor： Takakazu Yamada ,  Takeshi Masuda ,  Masahiko Kajinuma ,  Masaki Uematsu ,  Koukou Suu

IPC: B01F3/02 ,  B01F5/02 ,  B01J4/00 ,  B01J10/02 ,  B01J19/24 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  H01L21/00 ,  C23C16/00

CPC classification number: C23C16/45502 ,  B01F3/02 ,  B01F5/0256 ,  B01F2215/0427 ,  B01J4/001 ,  B01J10/02 ,  B01J19/247 ,  C23C16/4412 ,  C23C16/45512 ,  C23C16/45519 ,  C23C16/4558 ,  C23C16/4585 ,  H01L21/67017

Abstract: A thin film manufacturing system, wherein a stage for placing a substrate thereon is disposed within a vacuum reactor and a gas head for supplying a film forming gas to a central area on a top face of the vacuum reactor is arranged so that the gas head is opposed to the stage. A cylindrical sleeve member is disposed and comes in close contact with a side wall of the stage to surround a periphery of the stage. The height of the stage can be established at the position where the volume of a second space formed below the stage and connected to a vacuum discharge means is larger than that of a first space formed above the stage, in such a manner that an exhaust gas is isotropically discharged from the first space without causing any convection current therein through the interstice between the sleeve member and an inner wall surface constituting the reactor.

Abstract translation: 一种薄膜制造系统，其中用于将基板放置在其上的载物台设置在真空反应器内，并且将用于将成膜气体供应到真空反应器的顶面上的中心区域的气体头设置为使得气体头 反对舞台。 圆柱形套筒构件设置成与舞台的侧壁紧密接触以围绕舞台的周边。 该台架的高度可以在形成在载物台下方并连接到真空排出装置的第二空间的体积大于形成在载物台上方的第一空间的体积的位置上， 从第一空间各向同性地排出，而不会通过套筒构件和构成反应器的内壁面之间的间隙引起任何对流。

公开(公告)号：US20040089235A1

公开(公告)日：2004-05-13

申请号：US10466324

申请日：2003-07-29

Inventor： Takakazu Yamada ,  Takeshi Masuda ,  Masahiko Kajinuma ,  Masaki Uematsu ,  Koukou Suu

IPC: C23C016/00

CPC classification number: C23C16/45502 ,  B01F3/02 ,  B01F5/0256 ,  B01F2215/0427 ,  B01J4/001 ,  B01J10/02 ,  B01J19/247 ,  C23C16/4412 ,  C23C16/45512 ,  C23C16/45519 ,  C23C16/4558 ,  C23C16/4585 ,  H01L21/67017

Abstract: A mixing box 1 comprises a stirring chamber 2 in which two gas-introduction pipes 5, 6 for introducing gases are arranged in such a manner that the gas-introduction inlets 5a, 6a thereof are opposed to one another and a diffusion chamber 3 for diffusing a gas mixture, wherein a partition plate 4 having a specific shape is positioned between the stirring chamber and the diffusion chamber in such a manner that the volume of the diffusion chamber is larger than that of the stirring chamber, wherein a gas-supply opening 7 is arranged, on the partition plate, at a desired position on the lower side of the direction perpendicular to the straight line connecting the two gas-introduction inlets, the box being able to uniformly admix gases having different masses and having a simple structure. The partition plate has a shape of a curve of second degree, which is convex with respect to the bottom of the mixing box. The present invention also relates to a thin film-manufacturing system equipped with the mixing box 1 and a method for preparing a film using a film-forming gas, which is uniformly admixed together in the mixing box. The present invention also relates to a thin film-manufacturing system, which has a simple structure and can be manufactured at a low cost and which also permits the inhibition of the generation of any turbulent flow, convection current and heat convection and the formation of a uniform gas stream of a mixed gas, wherein a stage 53 for placing a substrate thereon is disposed within the vacuum reactor 2 and a gas head 57 for supplying the film-forming gas to the central area on the top face of the vacuum reactor 2 is arranged in such a manner that the head is opposed to the stage 53. A cylindrical sleeve member 61 having a desired length is disposed while it comes in close contact with the side wall of the stage 53 to thus surround the periphery of the stage and the height of the stage can be established at the position at which the volume of a second space formed below the stage and connected to a vacuum discharge means is larger than that of the first space, in such a manner that an exhaust gas is isotropically discharged from a first space formed by the gas head and the upper face of the stage without causing any convection current therein through the interstice between the sleeve member and the inner wall surface constituting the reactor.

公开(公告)号：US20040055869A1

公开(公告)日：2004-03-25

申请号：US10645587

申请日：2003-08-22

Inventor： Robert R. Moore

IPC: B01J019/08

CPC classification number: H01L21/6719 ,  B01D53/323 ,  B01D53/75 ,  B01D2259/818 ,  B01J6/008 ,  B01J10/02 ,  B01J19/088 ,  B01J2219/00013 ,  B01J2219/0002 ,  B01J2219/0875 ,  B01J2219/0879 ,  B01J2219/0884 ,  B01J2219/0894 ,  C10B53/00 ,  F23G2204/201 ,  F23G2209/14 ,  F23J15/006 ,  H01J37/32009 ,  H01J37/32348 ,  H01J37/32532 ,  H01L21/6708 ,  H01L21/67196 ,  H05H1/2406 ,  H05H2001/2412 ,  H05H2001/245

Abstract: A falling film plasma reactor (FFPR) provides a number of benefits for the treatment of process gases. The falling film plasma reactor uses high voltage alternating current or pulsed direct current which is applied to radially separated electrodes to thereby create a dielectric breakdown of the process gas that is flowing within the large radial gap between the two electrodes. Typical plasma reactors often utilize fixed dielectric construction which can result in potential failure of the device by arcing between the electrodes as portions of the dielectric fail. Such failures are prevented by using a dielectric liquid that constantly flows over the electrodes, or over a fixed dielectric barrier over the electrodes.

Abstract translation: 降膜等离子体反应器（FFPR）为处理工艺气体提供了许多益处。 降膜等离子体反应器使用施加到径向分离的电极的高压交流电或脉冲直流电，从而产生在两个电极之间的大径向间隙内流动的工艺气体的电介质击穿。 典型的等离子体反应器通常采用固定的介电结构，这可能导致器件在电介质之间的电弧失效的电弧故障。 通过使用不断地流过电极的电介质液体，或在电极上方的固定电介质阻挡层上，可以防止这种故障。

公开(公告)号：US20030161767A1

公开(公告)日：2003-08-28

申请号：US10204331

申请日：2002-12-09

Inventor： Colin Ramshaw ,  Roshan Jeet Jee Jachuck ,  Michael Jones ,  Ian Henderson

IPC: B01J019/12 ,  B01J019/08

CPC classification number: B01J19/1887 ,  B01J10/007 ,  B01J10/02 ,  B01J16/005 ,  B01J19/10 ,  B01J19/123 ,  B01J19/125 ,  B01J19/126 ,  B01J19/128 ,  B01J19/129 ,  B01J2219/0877 ,  B01J2219/0884 ,  B01J2219/0888 ,  B01J2219/0892

Abstract: A reactor including a rotatable disc (3) having a region (13) in an upper surface (5) thereof. Reactant (15) is supplied to the region (13) by way of a feed (4), the disc (3) is rotated at high speed, and the reactant (15) moves from the region (13) so as to form a film (17) on the surface (5). As the reactant (15) traverses the surface (5) of the disc (3), it undergoes chemical or physical processes before being thrown from the periphery of the disc (3) into collector means (7).

Abstract translation: 一种反应器，包括在其上表面（5）中具有区域（13）的可旋转盘（3）。 反应物（15）通过进料（4）供给到区域（13），盘（3）以高速旋转，反应物（15）从区域（13）移动，形成 表面（5）上的薄膜（17）。 当反应物（15）穿过盘（3）的表面（5）时，它在从盘（3）的周边被投入到收集器装置（7）之前经历化学或物理过程。

公开(公告)号：US5535989A

公开(公告)日：1996-07-16

申请号：US323914

申请日：1994-12-02

Applicant: Dipak K. Sen

Inventor： Dipak K. Sen

IPC: B01D3/00 ,  B01D3/20 ,  B01D53/78 ,  B01J10/02 ,  B01J19/32 ,  F28C3/06 ,  B01F3/04

CPC classification number: F28C3/06 ,  B01D3/008 ,  B01D3/20 ,  B01D53/78 ,  B01J10/02 ,  B01J19/32

Abstract: Processess and apparatus are provided to generate and use continuous and controlled liquid film for industrial and commercial applications requiring fluid-liquid contacts. In one version, a housing has a bottom and a tray mounted therein. The tray separates an upper section for holding liquid from a lower section for liquid-fluid interaction. Uniformly spaced, thin, straight film guides in close proximity extend downwardly from the tray towards the bottom. A narrow slit is formed in the tray along each line of film guides for enabling liquid in the upper section to flow to the lower section in the form of a flowing liquid curtain. The fluid can be a gas entering and exiting the housing through ports provided therein. In a preferred embodiment, a vertically extending tubular member is mounted centrally within several closed loops of film guides and extends through the tray. An adjustable sleeve is mounted on top of the tubular member and the tops of the film guides are secured to this sleeve. The invention may be used in a liquid-gas contacting column that comprises an upright vessel with a liquid inlet at the top and liquid outlet in a bottom portion. A series of trays are mounted one above the other in the vessel.

Abstract translation: 提供过程和设备以产生和使用需要流体 - 液体接触的工业和商业应用的连续和受控液膜。 在一个版本中，壳体具有安装在其中的底部和托盘。 托盘分离用于保持液体的上部用于液体 - 液体相互作用的下部。 均匀间隔的，细薄的，直接的薄膜导向器紧密地从托盘向下延伸到底部。 沿着每条胶片导向器，在托盘中形成狭窄的狭缝，以使上部液体能够以流动的液幕的形式流到下部。 流体可以是通过设置在其中的端口进入和离开壳体的气体。 在优选实施例中，垂直延伸的管状构件中心地安装在胶片引导件的几个闭合环中并延伸穿过托盘。 可调节的套筒安装在管状构件的顶部上，胶片引导件的顶部固定到该套筒上。 本发明可以用于液体 - 气体接触塔，其包括在顶部具有液体入口的直立容器和在底部中的液体出口。 一系列托盘一个在另一个托盘上安装。

公开(公告)号：US5196626A

公开(公告)日：1993-03-23

申请号：US787185

申请日：1991-11-04

Applicant: Jonathan E. Child ,  Tomas R. Melli

Inventor： Jonathan E. Child ,  Tomas R. Melli

IPC: B01J10/02 ,  C07C2/62

CPC classification number: B01J19/247 ,  B01J10/02 ,  B01J19/2425 ,  C07C2/62 ,  B01J2219/00085

Abstract: The present invention includes an isoparaffin:olefin alkylation process and apparatus in which liquid acid inventory is reduced and temperature control is improved by reacting the isoparaffin:olefin feed with a thin film of liquid acid catalyst supported on a heat exchange surface.

Abstract translation: 本发明包括异链烷烃：烯烃烷基化方法和其中通过使异链烷烃：烯烃进料与支撑在热交换表面上的液体酸催化剂薄膜反应来降低液态酸存量并提高温度控制的装置。

公开(公告)号：US4241043A

公开(公告)日：1980-12-23

申请号：US20288

申请日：1979-03-14

Applicant: Hartmut Hetzel

Inventor： Hartmut Hetzel

IPC: B01D1/22 ,  B01D1/06 ,  B01J10/02 ,  B01J14/00 ,  B01J19/24 ,  F28D7/02 ,  B01J19/00 ,  F28D7/04 ,  F28D7/10

CPC classification number: F28D7/022 ,  B01D1/065 ,  B01J10/02 ,  B01J19/243 ,  B01J2219/00094 ,  F28F2240/00 ,  Y10S165/914

Abstract: The invention relates to a multiple phase flow tube for evaporating and reacting components in compound mixtures in which a spiral pipe is arranged within a multiple phase flow pipe. The components are propelled by means of an internally flowing gas stream in an annular shaped passage formed by a spiral tube and a second tube arranged as a core of the spiral tube. The second tube contains a heat exchange medium. The spiral tube is arranged within a cylindrical casing which contains a heat exchange medium. A gaseous stream of a reduced amount is then sufficient for carrying out the particular chemical process desired.

Abstract translation: 本发明涉及一种用于蒸发和反应复合混合物中的组分的多相流管，其中螺旋管布置在多相流管内。 部件通过内部流动的气流在由螺旋管和布置为螺旋管的芯的第二管形成的环形通道中推进。 第二管含有热交换介质。 螺旋管布置在包含热交换介质的圆柱形壳体内。 减少量的气流足以进行所需的特定化学过程。

公开(公告)号：US4198360A

公开(公告)日：1980-04-15

申请号：US948989

申请日：1978-10-04

Applicant: Alexandr V. Shafranovsky ,  Viktor M. Olevsky ,  Vladimir K. Chubukov ,  Jury A. Baskov

Inventor： Alexandr V. Shafranovsky ,  Viktor M. Olevsky ,  Vladimir K. Chubukov ,  Jury A. Baskov

IPC: B01D1/16 ,  B01D1/22 ,  B01D3/08 ,  B01D3/30 ,  B01D47/16 ,  B01D53/18 ,  B01J4/00 ,  B01J10/02 ,  B01J19/18 ,  F28D3/00 ,  F28D5/00 ,  B01F3/04

CPC classification number: F28D5/00 ,  B01D1/16 ,  B01D1/226 ,  B01D3/08 ,  B01D3/30 ,  B01D47/16 ,  B01D53/18 ,  B01J10/02 ,  B01J19/18 ,  B01J4/001 ,  F28D3/00 ,  B01J2219/182

Abstract: The invention relates to an apparatus for heat-mass exchange processes with participation of a liquid, comprising at least one sprinkling device installed in the casing with a provision for rotation around its own axis and made up from chutes curved into a multiple-start spiral diverging from the axis of the sprinkling device. At least the peripheral portions of at least two chutes, as they gradually recede from the axis of the sprinkling device, are displaced in a direction parallel to the axis of the sprinkling device so that the peripheral ends of the chutes are arranged in different planes which are perpendicular to the axis of the sprinkling device.

Abstract translation: 本发明涉及一种具有液体参与的热质量交换过程的装置，其包括至少一个安装在壳体中的喷洒装置，其具有围绕其自身轴线旋转的装置，并由弯曲成多重起始螺旋发散的斜槽 从喷洒装置的轴线。 至少两个滑槽的周边部分，当它们从喷洒装置的轴线逐渐退去时，沿着平行于喷洒装置的轴线的方向移位，使得滑槽的周边端部布置在不同的平面内 垂直于喷洒装置的轴线。