公开(公告)号：US20190212130A1

公开(公告)日：2019-07-11

申请号：US16328309

申请日：2017-06-01

Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY

Inventor： Qinghua WANG ,  Shien RI ,  Hiroshi TSUDA

IPC: G01B11/16 ,  G01J9/02 ,  G01B11/25

CPC classification number: G01B11/161 ,  G01B11/16 ,  G01B11/25 ,  G01B11/254 ,  G01J9/02 ,  G01J2009/0234 ,  G01N21/45

Abstract: In a conventional moiré method, achieving both measurement accuracy and dynamic measurement and balancing field of view and measurement accuracy have been difficult. The present invention makes it possible to handle conventional moiré fringes as a grating for generating phase-shifted second-order moiré fringes, use a spatial phase shift method algorithm to accurately analyze the phases of the second-order moiré fringes before and after deformation, and determine shape from the phase differences between gratings projected onto the surface of an object of measurement and a reference surface and determine deformation and strain from the phase differences between the second-order moiré fringes, before and after deformation, of a repeating pattern on the object surface or a produced grating. As a result, it is possible to measure the three-dimensional shape and deformation distribution of an object accurately and with a wide field of view or dynamically and with a high degree of accuracy.

公开(公告)号：US20180292748A1

公开(公告)日：2018-10-11

申请号：US16003723

申请日：2018-06-08

Applicant: CANON KABUSHIKI KAISHA

Inventor： Hiroshi Sato

IPC: G03F7/00 ,  G03F9/00

CPC classification number: G03F7/0002 ,  G01J2009/0234 ,  G03F9/7042 ,  G03F9/7049 ,  G03F9/7065

Abstract: This disclosure provides an imprint apparatus configured to form a pattern with an imprint material by bringing the imprint material on a substrate and a pattern of the mold into contact with each other including a drive unit to bring part of the pattern of the mold into contact with the imprint material, and bring the pattern into contact with the imprint material so a contact surface area between the pattern of the mold and the imprint material increases, an interference fringe detecting unit to detect an interference fringe generated by reflected light from the pattern of the mold and reflected light from the substrate, and a state detecting unit to detect a contact state between the pattern of the mold and the imprint material on the basis of the interference fringe.

公开(公告)号：US09618369B2

公开(公告)日：2017-04-11

申请号：US13060033

申请日：2009-08-25

Applicant: Jonathan Mark Ralph Weaver ,  Phillip Stephen Dobson ,  David Paul Burt ,  Stephen Thoms ,  Kevin Edward Docherty ,  Yuan Zhang

Inventor： Jonathan Mark Ralph Weaver ,  Phillip Stephen Dobson ,  David Paul Burt ,  Stephen Thoms ,  Kevin Edward Docherty ,  Yuan Zhang

IPC: G01B11/02 ,  G01D5/26 ,  G01D5/38 ,  G01D11/00 ,  G01J9/02 ,  G01N21/45 ,  G03H1/00

CPC classification number: G01D5/266 ,  G01D5/38 ,  G01D11/00 ,  G01J9/0246 ,  G01J2009/0234 ,  G01N21/45 ,  G03H1/0005

Abstract: Various uses of visible light interference patterns are provided. Suitable interference patterns are those formed by diffraction from patterns of apertures. Typical uses disclosed herein relate to spatial metrology, such as a translational and/or angular position determination system. Further uses include the analysis of properties of the light itself (such as the determination of the wavelength of the electromagnetic radiation). Still further uses include the analysis of one or more properties (e.g. refractive index) of the matter through which the light passes. Part of the interference pattern is captured at a pixellated detector, such as a CCD chip, and the captured pattern compared with a calculated pattern. Very precise measurements of the spacing between maxima is possible, thus allowing very precise measurements of position of the detector in the interference pattern.

公开(公告)号：US20080174786A1

公开(公告)日：2008-07-24

申请号：US12005882

申请日：2007-12-28

Applicant: Hideo Takizawa ,  Koji Miyazaki ,  Haruhiko Kusunose

Inventor： Hideo Takizawa ,  Koji Miyazaki ,  Haruhiko Kusunose

IPC: G01B9/02

CPC classification number: G03F1/84 ,  G01J9/0215 ,  G01J2009/0234 ,  G01N21/45 ,  G03F1/32

Abstract: A phase shift amount measurement apparatus able to further correctly measure a phase shift amount of a phase shifter, wherein a laterally offset interference image of a phase shift mask is formed by a shearing interferometer, the interference image is captured by a two-dimensional imaging device, an output signal output from each light receiving element of the two-dimensional imaging device is supplied to a signal processing device, the phase shift amount is calculated for each light receiving element, the light receiving area of the light receiving element is very small, therefore the phase shift amount of any light receiving element outputting a peculiar phase amount due to incidence of diffraction light or multi-reflection light is excluded and the phase shift amount is determined based on the phase shift amount found from output signals of the remaining light receiving elements.

Abstract translation: 一种相移量测量装置，其能够进一步正确地测量移相器的相移量，其中通过剪切干涉仪形成相移掩模的横向偏移干涉图像，所述干涉图像由二维成像装置 从二维成像装置的每个光接收元件输出的输出信号被提供给信号处理装置，针对每个光接收元件计算相移量，光接收元件的光接收面积非常小， 因此排除由于衍射光或多反射光的入射而输出特殊相位量的任何光接收元件的相移量，并且基于从剩余的光接收的输出信号中发现的相移量来确定相移量 元素。

公开(公告)号：US07359063B2

公开(公告)日：2008-04-15

申请号：US11193999

申请日：2005-07-29

Applicant: Douglas R. Jungwirth

Inventor： Douglas R. Jungwirth

IPC: G01B9/02

CPC classification number: G01B9/02097 ,  G01B9/02051 ,  G01B2290/70 ,  G01J9/02 ,  G01J2009/0234

Abstract: A method and apparatus for correcting an input beam (102) that uses an array of detectors (114) sensing a scanning fringe pattern to generate phase error information which can be corrected by a physically adjacent beam correction device such as an array of micro-electrical-mechanical-system (MEMS) mirrors (116).

Abstract translation: 一种用于校正使用感测扫描条纹图案的检测器阵列（114）的输入光束（102）的方法和装置，以产生相位误差信息，所述相位误差信息可由物理上相邻的光束校正装置校正，例如微电子阵列 机械系统（MEMS）镜（116）。

公开(公告)号：US07324207B1

公开(公告)日：2008-01-29

申请号：US11112245

申请日：2005-04-22

Applicant: Sean Kirkpatrick ,  Ali A. Said ,  Mark Allen Dugan ,  Thomas Sosnowski ,  Philippe Bado

Inventor： Sean Kirkpatrick ,  Ali A. Said ,  Mark Allen Dugan ,  Thomas Sosnowski ,  Philippe Bado

IPC: G01B9/02

CPC classification number: G01J11/00 ,  G01J9/02 ,  G01J2009/023 ,  G01J2009/0234

Abstract: An optical device is useful for analyzing an optical signal pulse to determine information related to the pulse, such as information related to its temporal coherence length. The optical device generally includes a plurality of interferometric devices to generate one or more respective interference patterns from the optical signal pulse, and a plurality of detectors associated with each respective interferometric device to receive the one or more respective interference patterns. At least one of the plurality of interferometric devices is disposed in a glass substrate. The optical device may be integrated in an optical correlation system having an analyzer coupled to the plurality of detectors to determine the temporal coherence length or other pulse-related information for the optical signal pulse based on the received interference patterns.

Abstract translation: 光学装置用于分析光信号脉冲以确定与脉冲相关的信息，例如与其时间相干长度相关的信息。 光学装置通常包括多个干涉装置以从光信号脉冲产生一个或多个相应的干涉图案，以及与每个相应的干涉仪装置相关联的多个检测器，以接收一个或多个相应的干涉图案。 多个干涉仪中的至少一个设置在玻璃基板中。 光学装置可以集成在具有耦合到多个检测器的分析器的光学相关系统中，以基于所接收的干涉图案来确定用于光信号脉冲的时间相干长度或其它脉冲相关信息。

公开(公告)号：US07268885B2

公开(公告)日：2007-09-11

申请号：US11073712

申请日：2005-03-08

Applicant: Kinpui Chan ,  Masahiro Akiba ,  Yasufumi Fukuma ,  Hiroyuki Otsuka ,  Hisashi Tsukada

Inventor： Kinpui Chan ,  Masahiro Akiba ,  Yasufumi Fukuma ,  Hiroyuki Otsuka ,  Hisashi Tsukada

IPC: G01B9/02

CPC classification number: G01B9/02007 ,  G01B9/02003 ,  G01B9/02041 ,  G01B9/02069 ,  G01B2290/45 ,  G01J2009/0234

Abstract: An optical image measuring apparatus capable of effectively obtaining a direct current component of a heterodyne signal which is composed of background light of interference light is provided. The optical image measuring apparatus includes: an optical interference system in which a light beam from a light source is divided into signal light and reference light by a beam splitter, a frequency of the reference light is shifted by a frequency shifter, and the signal light propagating through an object to be measured and the reference light reflected on a mirror are superimposed on each other by the beam splitter to produce interference light; beam splitters for dividing the interference light into interference light beams; shutters serving as an intensity modulating unit for modulating intensities of the respective interference light beams at predetermined intervals; CCDs for receiving the respective interference light beams whose intensities are modulated and outputting electrical signals; and a signal processing portion serving as a calculating unit for calculating an intensity of the direct current component corresponding to the background light of the interference light based on the outputted electrical signals.

Abstract translation: 提供一种能够有效地获得由干涉光的背景光组成的外差信号的直流分量的光学图像测量装置。 光学图像测量装置包括：光学干涉系统，其中来自光源的光束被分束器分成信号光和参考光，参考光的频率被移频器偏移，并且信号光 通过被测量物体传播并且通过分束器将反射在反射镜上的参考光彼此叠加以产生干涉光; 分束器，用于将干涉光分成干涉光束; 用作强度调制单元的快门，用于以预定间隔调制各个干涉光束的强度; 用于接收其强度被调制并输出电信号的各个干涉光束的CCD; 以及信号处理部分，用作计算单元，用于基于输出的电信号计算与干涉光的背景光相对应的直流分量的强度。

公开(公告)号：US20230144290A1

公开(公告)日：2023-05-11

申请号：US17915434

申请日：2020-12-11

Applicant: Beijing RSLaser Opto-Electronics Technology Co., Ltd.

Inventor： Guangyi LIU ,  Rui JIANG ,  Xiaoquan HAN ,  Jiangshan ZHAO ,  Pengfei SHA ,  Qingqing YIN ,  Hua ZHANG

IPC: G01J9/02

CPC classification number: G01J9/0246 ,  G01J2009/0234 ,  G01J2009/0257

Abstract: According to the present disclosure, there is provided a device (2) and a method for measuring a wavelength for a laser device. The device (2) for measuring a wavelength for a laser device includes: a first optical path assembly and a second optical path assembly. The first optical path assembly and the second optical path assembly constitute a laser wavelength measurement optical path. The second optical path assembly includes: an FP etalon assembly (11) and an optical classifier (13). The homogenized laser beam passes through the FP etalon assembly (11) to generate an interference fringe. The optical classifier (13) is arranged after the FP etalon assembly (11) in the laser wavelength measurement optical path, and configured to deflect the laser beam passing through the FP etalon assembly (11). The FP etalon assembly (11) allows two FP etalons (FP1, FP2) to share the same optical path for an interference imaging, and therefore a compact structure having a small volume, a simple design, and a high stability are achieved. In cooperation with the optical classifier (13), a precise measurement for a laser wavelength may be achieved, and at the same time a wavelength measurement range is large. It is suitable for an online measurement for a laser wavelength and a corresponding closed-loop control feedback.

公开(公告)号：US08294903B2

公开(公告)日：2012-10-23

申请号：US12864760

申请日：2009-09-29

Applicant: Hirotoshi Oikaze ,  Takashi Urashima

Inventor： Hirotoshi Oikaze ,  Takashi Urashima

IPC: G01B11/02

CPC classification number: G01B11/2441 ,  G01B9/02007 ,  G01B9/02069 ,  G01B9/02083 ,  G01B9/0209 ,  G01J2009/0234

Abstract: The measurement accuracy of an apparatus for measuring the surface shape of an object utilizing a two-wavelength phase-shift interferometry is improved. A low-coherence light source, a plurality of wavelength filters with different transmission wavelengths, an angle control unit and an analysis unit are provided. When performing a two-wavelength phase shift method, the analysis unit detects the wavelength difference between two wavelengths, and corrects a calculated wavelength value and a calculated phase value of one of the wavelengths for preventing a fringe-order calculation error. Next, the angle of the wavelength filters is controlled for making the actual wavelength difference coincident with a designed value. Thus, the wavelength difference between the two wavelengths is continuously controlled to be constant, which enables measurements of surface shapes with high accuracy, even when there are wavelength fluctuations due to the temperature change or the time elapse.

Abstract translation: 提高了利用双波长相移干涉法测量物体的表面形状的装置的测量精度。 提供了低相干光源，具有不同透射波长的多个波长滤光器，角度控制单元和分析单元。 当执行双波长相移方法时，分析单元检测两个波长之间的波长差，并校正计算的波长值和计算出的波长之一的相位值，以防止边缘阶计算误差。 接下来，控制波长滤波器的角度，使实际波长差与设计值一致。 因此，即使当由于温度变化或时间经过而导致波长波动时，两个波长之间的波长差被连续地控制为恒定，这使得能够高精度地测量表面形状。

公开(公告)号：US20090219494A1

公开(公告)日：2009-09-03

申请号：US12392746

申请日：2009-02-25

Applicant: Osamu Kakuchi

Inventor： Osamu Kakuchi

IPC: G03B27/00 ,  G01B11/03 ,  G01B9/02 ,  G06F15/00

CPC classification number: G01M11/0271 ,  G01J2009/0234 ,  G03B27/00 ,  G03F7/706

Abstract: An evaluation method of evaluating an optical characteristic of an optical system to be evaluated using an interferometer, comprises a first acquisition step of acquiring a first interference fringe formed by the interferometer when a location of a movable element of the interferometer in an optical axis direction of the optical system is a first location, a second acquisition step of acquiring a second interference fringe formed by the interferometer when the location of the movable element in the optical axis direction is a second location different from the first location, a determination step of determining a pupil-center coordinate of the optical system based on the acquired first interference fringe and the acquired second interference fringe, and a computation step of computing the optical characteristic of the optical system using the pupil-center coordinate determined in the determination step.

Abstract translation: 使用干涉仪评价光学系统的光学特性的评价方法包括：第一获取步骤，当干涉仪的可动元件的位置在光轴方向上时，获取由干涉仪形成的第一干涉条纹 光学系统是第一位置，第二采集步骤，当可移动元件在光轴方向上的位置是不同于第一位置的第二位置时，获取由干涉仪形成的第二干涉条纹;确定步骤，确定 基于获取的第一干涉条纹和获取的第二干涉条纹，光学系统的瞳孔中心坐标，以及计算步骤，使用在确定步骤中确定的瞳孔中心坐标来计算光学系统的光学特性。