Abstract:
Methods and systems for determining one or more parameters of a wafer inspection process are provided. One method includes acquiring metrology data for a wafer generated by a wafer metrology system. The method also includes determining one or more parameters of a wafer inspection process for the wafer or another wafer based on the metrology data.
Abstract:
In a sample observation device, an image capturing unit includes an area image sensor that performs image capturing by the rolling shutter method in which a start of an exposure period of pixel columns in the pixel region is shifted by predetermined time, and a control unit controls the image capturing unit so that an exposure order in each of the pixel columns is reversed between a period in which a scanning unit scans a sample in a first direction and a period in which the scanning unit scans the sample in a second direction.
Abstract:
This invention concerns spectroscopy apparatus comprising a light source arranged to generate a light profile on a sample, a photodetector having at least one photodetector element for detecting characteristic light generated from interaction of the sample with light from the light source, a support for supporting the sample, the support movable relative to the light profile, and a processing unit. The processing unit is arranged to associate a spectral value recorded by the photodetector element at a particular time with a point on the sample predicted to have generated the characteristic light recorded by the photodetector element at the particular time based on relative motion anticipated to have occurred between the support and the light profile.
Abstract:
Provided is an optical element rotation type Mueller-matrix ellipsometer for solving a problem of measurement accuracy and measurement precision occurring due to residual polarization of a light source, polarization dependence of a photo-detector, measurement values of Fourier coefficients of a high order term in dual optical element rotation type Mueller-matrix ellipsometers according to the related art capable of measuring some or all of components of a Mueller-matrix for any sample.
Abstract:
The invention relates to a data acquisition method using a laser scanner for the pixel-precise imaging of fluorescent samples which are on object carriers and have been treated with fluorescent dyes. Such a laser scanner comprises a sample table; at least one laser and a first optical system for providing at least one laser beam for exciting the fluorescent samples; a scanner head (50) having an optical deflecting element for scanning this sample in at least one direction of movement (75); a first lens; a second optical system for forwarding emission beams, which are triggered by the laser beams on the sample and are deflected by the first lens and the deflecting element, to at least one detector; a position encoder (91) which emits position encoder signals (92) which indicate the instantaneous location of the scanner head (50) in relation to a zero point; an electronic element for filtering the detector signals (93) with a defined time constant; and an A/D converter for digitizing the filtered detector signals (93). The data acquisition method according to the invention is characterized in that the filtered detector signals (93) from the A/D converter and the position encoder signals (92) are acquired independently, in a parallel manner and continuously by a computer unit or a controller (40) and are related to a common time base (94), wherein the A/D conversion is carried out so often that each pixel (95) of an image is always assigned more than one data point of the A/D converter.