公开(公告)号：US20060141267A1

公开(公告)日：2006-06-29

申请号：US11357800

申请日：2006-02-16

Applicant: Takahiro Okura ,  Kazuya Shimizu ,  Masakazu Takei

Inventor： Takahiro Okura ,  Kazuya Shimizu ,  Masakazu Takei

IPC: B32B17/06 ,  B32B15/04 ,  B32B19/00 ,  B22F3/26 ,  B32B9/00

CPC classification number: C23C14/081 ,  C23C14/0021 ,  C23C14/0694 ,  C23C14/08 ,  C23C14/083 ,  C23C14/10 ,  C23C14/14 ,  C23C14/32 ,  C30B23/02 ,  C30B29/02 ,  G02B5/0858 ,  G21K1/06 ,  G21K2201/06 ,  Y10T428/12174 ,  Y10T428/12736 ,  Y10T428/12896 ,  Y10T428/12993 ,  Y10T428/31678

Abstract: The metal film of the present invention is a dense film of a single crystal that has very low surface roughness and very good crystal orientation because an arithmetic mean roughness of the surface is not larger than 2 nm and a (111) peak intensity of X-ray diffraction is not less than 20 times the sum of all other peaks. Also the metal oxide film of the present invention is a dense film that includes less oxygen defects and almost no voids therein because a content of a non-oxidized metal is not higher than 1 mole % of a metal component that constitutes the metal oxide and a packing density is 0.98 or higher.

公开(公告)号：US07064806B2

公开(公告)日：2006-06-20

申请号：US10768896

申请日：2004-01-30

Applicant: Toshihiko Tsuji

Inventor： Toshihiko Tsuji

IPC: G03B27/54 ,  G03B27/72

CPC classification number: G03F7/702 ,  G21K2201/06

Abstract: An exposure apparatus includes an illumination optical system for illuminating a reflection mask that forms a pattern, by using light from a light source, wherein the illumination optical system includes a field stop that defines an illuminated area on the reflection mask, and has an opening, and an imaging system for introducing the light from the opening in the field stop into the reflection mask, the imaging system being a coaxial optical system, wherein a principal ray of the imaging system at a side of the reflection mask forming an inclination angle to a common axis of the coaxial optical system, the inclination angle being approximately equal to an angle between a principal ray of the projection optical system at the side of the reflection mask and a normal to a surface of the reflection mask.

Abstract translation: 曝光装置包括：照明光学系统，用于通过使用来自光源的光照射形成图案的反射掩模，其中所述照明光学系统包括限定所述反射掩模上的照明区域的场停止件，并且具有开口， 以及成像系统，用于将来自所述场停止件中的开口的光引入所述反射掩模中，所述成像系统是同轴光学系统，其中，所述成像系统在所述反射掩模侧的主光线形成与所述反射掩模的倾斜角度 同轴光学系统的公共轴，倾斜角度近似等于投影光学系统在反射掩模侧面的主光线与反射掩模表面法线之间的角度。

公开(公告)号：US20050269529A1

公开(公告)日：2005-12-08

申请号：US11174442

申请日：2005-06-29

Applicant: Alexander Ershov ,  William Marx ,  Norbert Bowering ,  Bjorn Hansson ,  Oleh Khodykin ,  Igor Fomenkov ,  William Partlo

Inventor： Alexander Ershov ,  William Marx ,  Norbert Bowering ,  Bjorn Hansson ,  Oleh Khodykin ,  Igor Fomenkov ,  William Partlo

IPC: G03F7/20 ,  G01J1/00

CPC classification number: B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/7085 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

Abstract translation: 公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。 在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。 在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。 在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。 在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

公开(公告)号：US20050057737A1

公开(公告)日：2005-03-17

申请号：US10768896

申请日：2004-01-30

Applicant: Toshihiko Tsuji

Inventor： Toshihiko Tsuji

IPC: G03B27/54 ,  G03F7/20 ,  G21K1/00 ,  H01L21/027

CPC classification number: G03F7/702 ,  G21K2201/06

Abstract: An exposure apparatus includes an illumination optical system for illuminating a reflection mask that forms a pattern, by using light from a light source, wherein the illumination optical system includes a field stop that defines an illuminated area on the reflection mask, and has an opening, and an imaging system for introducing the light from the opening in the field stop into the reflection mask, the imaging system being a coaxial optical system, wherein a principal ray of the imaging system at a side of the reflection mask forming an inclination angle to a common axis of the coaxial optical system, the inclination angle being approximately equal to an angle between a principal ray of the projection optical system at the side of the reflection mask and a normal to a surface of the reflection mask.

Abstract translation: 曝光装置包括：照明光学系统，用于通过使用来自光源的光照射形成图案的反射掩模，其中所述照明光学系统包括限定所述反射掩模上的照明区域的场停止件，并且具有开口， 以及成像系统，用于将来自所述场停止件中的开口的光引入所述反射掩模中，所述成像系统是同轴光学系统，其中，所述成像系统在所述反射掩模侧的主光线形成与所述反射掩模的倾斜角度 同轴光学系统的公共轴，倾斜角度近似等于投影光学系统在反射掩模侧面的主光线与反射掩模表面法线之间的角度。

公开(公告)号：US06195410B1

公开(公告)日：2001-02-27

申请号：US09491956

申请日：2000-01-26

Applicant: Webster C. Cash, Jr.

Inventor： Webster C. Cash, Jr.

IPC: G01N2306

CPC classification number: G01N23/04 ,  G21K2201/06

Abstract: An interferometer that uses plane mirrors at grazing incidence to create interference fringes in the extreme ultraviolet and x-ray portions of the spectrum. X-ray interferometry has historically been implemented through narrow band, diffractive systems that split the wavefront. By using two separate optical channels at grazing incidence to create interference from two areas of the wavefront, this system has broad band response and much higher efficiency. The interferometer has applications to telescopes, microscopes and spectrometers in the extreme ultraviolet and x-ray, and high contrast imaging in the visible.

Abstract translation: 使用平面镜在掠射入射处的干涉仪在光谱的极紫外和X射线部分产生干涉条纹。 历史上，X射线干涉测量是通过分裂波前的窄带衍射系统实现的。 通过在掠射入射处使用两个独立的光学通道来产生来自波前两个区域的干扰，该系统具有宽带响应和更高的效率。 该干涉仪可用于望远镜，显微镜和光谱仪中的极紫外和X射线以及可见光的高对比度成像。

公开(公告)号：US5882369A

公开(公告)日：1999-03-16

申请号：US702721

申请日：1996-11-04

Applicant: Anders Rindby ,  Bengt Stocklassa ,  Sture Larsson ,  Per Engstrom

Inventor： Anders Rindby ,  Bengt Stocklassa ,  Sture Larsson ,  Per Engstrom

IPC: G21K1/00 ,  B22D25/02 ,  B29C53/22 ,  C03B17/04 ,  C03B19/02 ,  C03B23/047 ,  C03B23/207 ,  G21K1/06 ,  C03B23/04 ,  B29C55/00

CPC classification number: C03B19/025 ,  B22D25/02 ,  B29C53/22 ,  C03B17/04 ,  C03B19/02 ,  C03B23/047 ,  C03B23/207 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/067 ,  Y10S65/08

Abstract: A method for producing at least one capillary in a moldable material. The capillary has a large length in relation to its cross-section. A closed cavity is created within the moldable material and the material is stretched in at least one direction so that the cavity forms a substantially elliptical or parabolic capillary whose length is large in relationship to its cross-section. The material may be heated before stretching so that the cavity is expanded and shaped into an essentially spherical form. Suitable materials for the practice of the invention include glass, plastic, quartz, silicon, or metal.

Abstract translation: PCT No.PCT / SE95 / 00227 Sec。 371日期：1996年11月4日 102（e）日期1996年11月4日PCT提交1995年3月3日PCT公布。 公开号WO95 / 23770 日期1995年9月8日一种用于在可模制材料中生产至少一种毛细管的方法。 毛细管相对于其横截面具有大的长度。 在可模制材料内产生闭合腔，并且材料在至少一个方向上被拉伸，使得空腔形成基本上椭圆或抛物线的毛细管，其长度与其横截面相关。 材料可以在拉伸之前被加热，使得空腔膨胀并成形为基本上球形。 用于实施本发明的合适材料包括玻璃，塑料，石英，硅或金属。

公开(公告)号：US5802137A

公开(公告)日：1998-09-01

申请号：US596188

申请日：1996-02-15

Applicant: Stephen W. Wilkins

Inventor： Stephen W. Wilkins

IPC: G01N23/04 ,  G01N23/05 ,  G01N23/205 ,  G01N23/207 ,  G01T1/29 ,  G01T1/36 ,  G03B42/02 ,  G21K1/06 ,  G21K1/02

CPC classification number: A61B6/484 ,  G01N23/04 ,  G01N23/05 ,  G01N23/205 ,  G01N23/207 ,  G01T1/2914 ,  G01T1/36 ,  G03B42/02 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/062 ,  G21K2201/068 ,  G21K2207/005

Abstract: An x-ray or neutron optic configuration includes a plurality of single crystal portions (25) formed with respective spaced x-ray or neutron reflection faces (21,22,23) formed at predetermined asymmetry angles to a Bragg diffraction plane in the respective crystal portion. The crystal portions are interconnected (25) to maintain a first and second (21,22) of these faces spaced apart for receipt of a sample (8) between them and to allow small adjustments of the relative angle of the faces about the normal to the plane of diffraction while maintaining the normals to the Bragg planes for the first and second faces (21,22) substantially in the plane of diffraction. First face (21) is arranged to be a monochromator and collimator with respect to x-rays or neutrons of appropriate wavelength incident reflected through the sample for receipt by the second face (22), which thereby serves as an analyzer face.

Abstract translation: PCT No.PCT / AU94 / 00480 Sec。 371日期：1996年2月15日 102（e）日期1996年2月15日PCT 1994年8月16日PCT PCT。 第WO95 / 05725号公报 日期1995年2月23日X射线或中子光学配置包括多个单晶部分（25），其形成有以与布拉格衍射的预定不对称角度形成的相应的间隔开的x射线或中子反射面（21,22,23） 在相应的晶体部分中。 晶体部分互连（25）以保持这些面的第一和第二（21,22）间隔开，以便在它们之间接收样品（8），并允许小面积相对于法线相对角度 衍射平面，同时维持基本上在衍射平面中的第一和第二面（21,22）的布拉格平面的法线。 第一面（21）被配置为相对于通过样品反射的x射线或适当波长的中子的单色仪和准直器，由第二面（22）接收，从而用作分析器面。

公开(公告)号：US5684852A

公开(公告)日：1997-11-04

申请号：US736680

申请日：1996-10-25

Applicant: Toshihisa Tomie

Inventor： Toshihisa Tomie

IPC: G02B3/00 ,  G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/06 ,  G21K2201/067

Abstract: An X-ray lens includes a plurality of hollow cylinders of prescribed radius bored in a lens material piece having a phase lag coefficient appropriate for the wavelength of the X-rays to be focused such that the axes of the hollow cylinders are parallel and perpendicularly intersect a straight array axis.

Abstract translation: X射线透镜包括多个在透镜材料片上钻孔的具有规定半径的中空圆柱体，该中空圆柱体具有适于待聚焦的X射线波长的相位滞后系数，使得中空圆柱体的轴线平行并垂直相交 直线阵列轴。

公开(公告)号：US5594773A

公开(公告)日：1997-01-14

申请号：US389503

申请日：1995-02-16

Applicant: Toshihisa Tomie

Inventor： Toshihisa Tomie

IPC: G02B3/00 ,  G21K1/06 ,  G21K1/00

CPC classification number: G21K1/06 ,  G21K2201/06 ,  G21K2201/067

Abstract: An X-ray lens includes a plurality of hollow cylinders of prescribed radius bored in a lens material piece having a phase lag coefficient appropriate for the wavelength of the X-rays to be focused such that the axes of the hollow cylinders are parallel and perpendicularly intersect a straight array axis.

公开(公告)号：US5524040A

公开(公告)日：1996-06-04

申请号：US169656

申请日：1993-12-17

Applicant: Ercan E. Alp ,  Timothy M. Mooney ,  Thomas Toellner

Inventor： Ercan E. Alp ,  Timothy M. Mooney ,  Thomas Toellner

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/06 ,  G21K2201/062

Abstract: A 4-bounce dispersive crystal monochromator reduces the bandpass of synchrotron radiation to a 10-50 meV range without sacrificing angular acceptance. The monochromator includes the combination of an asymmetrical channel-cut single crystal of lower order reflection and a symmetrical channel-cut single crystal of higher order reflection in a nested geometric configuration. In the disclosed embodiment, a highly asymmetrically cut (.alpha.=20) outer silicon crystal (4 2 2) with low order reflection is combined with a symmetrically cut inner silicon crystal (10 6 4) with high order reflection to condition a hard x-ray component (5-30 keV) of synchrotron radiation down to the .mu.eV-neV level. Each of the crystals is coupled to the combination of a positioning inchworm and angle encoder via a respective rotation stage for accurate relative positioning of the crystals and precise energy tuning of the monochromator.

Abstract translation: 4反弹色散式单色仪将同步加速器辐射的带通降低到10-50meV范围，而不牺牲角接收。 单色器包括嵌套几何配置中低阶反射的不对称通道切割单晶和高阶反射的对称通道切割单晶的组合。 在所公开的实施例中，具有低阶反射的高度非对称切割的（α= 20）外硅晶体（4 2 2）与具有高阶反射的对称切割的内部硅晶体（106 6）组合以调节硬x- 射线成分（5-30 keV）的同步辐射降至mu eV-neV水平。 每个晶体经由相应的旋转台耦合到定位蚯蚓和角度编码器的组合，用于晶体的精确相对定位和单色仪的精确能量调谐。