公开(公告)号：US06211525B1

公开(公告)日：2001-04-03

申请号：US09214007

申请日：1998-12-23

Applicant: Michael John Cowham

Inventor： Michael John Cowham

IPC: H01J3728

CPC classification number: H01J37/244 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/2482

Abstract: In a Scanning Electron Microscope (SEM) a spot made from a very narrow beam of electrons (11) is scanned in fine strips across the specimen (18), and an image is built up from the electrons (e) that backscattered from area of specimen being scanned. To gather these back-scattered electrons it is presently common to employ a scintillator layer on the front face of a light guide that directs the generated light to a photomultiplier tube (23). However, having the scintillator layer on the front face means that the light has to pass through the layer to enter the guide, which necessarily wastes light by absorption within the thickness of layer material; the invention proposes instead that the light guide (22) have on its back side a scintillator layer (34) angled as though to reflect received electrons along the guide to the PMT (23). In this way the PMT is actually “looking at”, and so receiving light directly from, the front, or input side, of the scintillator layer, and thus the light emitted by the layer does not need to travel through the layer to get to the PMT, and is therefore not attenuated by that layer—and a detector system of the invention is therefore several, even tens, of times more sensitive that one of the Art.

Abstract translation: 在扫描电子显微镜（SEM）中，由非常窄的电子束（11）制成的光斑在细条纹上扫过样品（18），并且从电子（e）构建图像，该电子从e 正在扫描的样本 为了收集这些反向散射的电子，目前普遍的是在光导的前表面上使用闪烁体层，其将所产生的光引导到光电倍增管（23）。 然而，在正面上具有闪烁体层意味着光必须通过该层进入导向器，这必然通过吸收在层材料的厚度内浪费光; 本发明提出，导光体（22）在其背侧上具有倾斜的闪烁体层（34），以将接收的电子沿引导件反射到PMT（23）。 以这种方式，PMT实际上是“看”，因此从闪烁体层的正面或输入侧直接接收光，因此层发射的光不需要穿过该层，以达到 PMT，因此不被该层衰减，因此本发明的检测器系统因此是本领域技术人员之一的几倍甚至几十倍。

公开(公告)号：US06809319B2

公开(公告)日：2004-10-26

申请号：US10629567

申请日：2003-07-30

Applicant: Yasunari Sohda ,  Hiroya Ohta ,  Osamu Kamimura ,  Susumu Gotoh

Inventor： Yasunari Sohda ,  Hiroya Ohta ,  Osamu Kamimura ,  Susumu Gotoh

IPC: H01J3728

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/3045

Abstract: Electron beam writing equipment has an electron source and an electron optics system for scanning an electron beam emitted from the electron source on a sample via deflection means having at least two different deflection speeds. An objective lens is used to form a desired pattern on the sample. The electron beam is moved by high speed scanning with the deflection means to repeat formation of a patterned beam. The electron beam is moved on the mark for beam correction by low speed scanning with the deflection means in synchronization with one cycle of the repetition. The position or the deflection distance of the electron beam or blanking time is corrected using detectors for back scattered or secondary electrons.

Abstract translation: 电子束写入设备具有电子源和电子光学系统，用于通过具有至少两个不同偏转速度的偏转装置扫描从电子源在样品上发射的电子束。 物镜用于在样品上形成所需的图案。 用偏转装置通过高速扫描来移动电子束以重复形成图案化的束。 电子束通过与偏转装置的低速扫描同步于重复的一个周期而在标记上移动以进行光束校正。 使用用于背散射或二次电子的检测器校正电子束的位置或偏转距离或消隐时间。

公开(公告)号：US06791084B2

公开(公告)日：2004-09-14

申请号：US10246453

申请日：2002-09-19

Applicant: Goroku Shimoma ,  Tadashi Otaka ,  Mitsugu Sato ,  Hideo Todokoro ,  Shunichi Watanabe ,  Tadanori Takahashi ,  Masahiro Kawawa ,  Masanori Gunji ,  Terumichi Nishino

Inventor： Goroku Shimoma ,  Tadashi Otaka ,  Mitsugu Sato ,  Hideo Todokoro ,  Shunichi Watanabe ,  Tadanori Takahashi ,  Masahiro Kawawa ,  Masanori Gunji ,  Terumichi Nishino

IPC: H01J3728

CPC classification number: H01J37/28 ,  H01J2237/2814

Abstract: A width-measurement method of reducing or eliminating an error in measurement of a width of an object on a sample resulting from the dimension of the beam diameter, wherein a width-measured value of the object to be width-measured which has been obtained on the basis of a secondary signal obtained from secondary particles emitted from the sample having thereon the object to be width-measured is corrected with a value with respect to a dimension value of a beam diameter.

Abstract translation: 一种宽度测量方法，用于减少或消除由光束直径尺寸导致的样品宽度测量误差，其中宽度测量对象的宽度测量值已经在 从其上具有待宽度测量对象的样品发射的二次粒子获得的二次信号的基础用相对于束直径的尺寸值的值进行校正。

公开(公告)号：US06777677B2

公开(公告)日：2004-08-17

申请号：US10463576

申请日：2003-06-18

Applicant: Mari Nozoe ,  Hidetoshi Nishiyama ,  Shigeaki Hijikata ,  Kenji Watanabe ,  Koji Abe

Inventor： Mari Nozoe ,  Hidetoshi Nishiyama ,  Shigeaki Hijikata ,  Kenji Watanabe ,  Koji Abe

IPC: H01J3728

CPC classification number: G06T7/0004 ,  G01N23/20 ,  G06T2207/30148 ,  H01J2237/2487 ,  H01J2237/2817

Abstract: A pattern inspection system for inspecting a substrate surface on which a predetermined pattern is formed with radiation of an electron beam and an optical beam. the pattern inspection system includes a radiation and which radiates an electron beam to the substrate, a detection unit which detects a secondarily generated signal attributable to the radiation of the electron beam, a retrieval unit which retrieves an image from the signal detected by the detection unit, and an image processing unit which classifies the retrieved image depending on a type of the image.

Abstract translation: 一种图案检查系统，用于检查其上形成有电子束和光束的辐射的预定图案的基板表面。 图案检查系统包括辐射并且向基板辐射电子束，检测单元，其检测归因于电子束的辐射的次要生成的信号;检索单元，其从由检测单元检测到的信号中检索图像 以及图像处理单元，其根据图像的类型对检索到的图像进行分类。

公开(公告)号：US06646261B2

公开(公告)日：2003-11-11

申请号：US10024777

申请日：2001-12-20

Applicant: Jan Martijn Krans

Inventor： Jan Martijn Krans

IPC: H01J3728

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J2237/2448 ,  H01J2237/2817

Abstract: The invention relates to wafer inspection by means of a scanning electron microscope (SEM) column in which the secondary electron detector 22, 24 is positioned centrally above the objective lens of the column. Secondary electrons that leave the central part of the specimen in a direction substantially perpendicular to its surface are inevitably collected in the central part of the detector surface where the bore 36 for the primary beam 6 is situated. Consequently, such electrons do not contribute to the detector signal. In order to avoid such a detrimental loss of signal contribution, it is proposed to provide a central electrode 35 in the central bore 36 such that secondary electrons that approach the bore are driven aside towards the electron-sensitive detector region 48.

公开(公告)号：US06570163B1

公开(公告)日：2003-05-27

申请号：US09508345

申请日：2000-04-17

Applicant: Mohamed Mochtar El Gomati ,  Ludek Frank ,  Ilona Mullerova

Inventor： Mohamed Mochtar El Gomati ,  Ludek Frank ,  Ilona Mullerova

IPC: H01J3728

CPC classification number: H01J37/244 ,  H01J2237/047 ,  H01J2237/2448

Abstract: A cathode lens is formed between a gun electrode (8) and a specimen (9). An electron probe (11), produced as part of an electron column and suitably focused by lenses (1, 2 and 3) and scanned by suitable deflector/stigmator electrodes (2), is decelerated within the cathode lens field and its final landing energy is finely adjustable by the specimen negative bias. Emitted secondary electrons are re-accelerated within the same field and due to uniformity of this field, they increase their axial velocity only so that they are collimated into a narrow signal beam. The collimated signal beam passes mostly through an aperture (18) of electrode (8), where it enters the gun and a final lens consisting of a central earthed electrode (6) surrounded by two earthed electrodes (7) and (8). The signal beam approaches a special mirror electrode (4), the field of which decelerates and deflects the electrons further off the axis and returns them back towards the specimen (9). They are again re-accelerated in the final lens field, and impact a channel-plate electron multiplier (5) and after amplification, the signal electron beam impacts a collector (7), which can be divided into suitable parts for multichannel detection. The detector may have small dimensions and high resolution, and may be used in microscopes and other devices.

Abstract translation: 阴极透镜形成在枪电极（8）和试样（9）之间。 作为电子柱的一部分产生并被透镜（1,2和3）适当聚焦并由合适的偏转器/扫描电极（2）扫描的电子探针（11）在阴极透镜场内减速，并且其最终的着陆能量 可以通过样品负偏压精细调节。 发射的二次电子在相同的场内被重新加速，并且由于该场的均匀性，它们仅增加它们的轴向速度，使得它们被准直成窄信号束。 准直信号光束主要通过电极（8）的孔（18），其中它进入枪和由两个接地电极（7）和（8）围绕的中心接地电极（6）组成的最终透镜。 信号光束接近特殊的反射镜电极（4），其中的电场使电子进一步减速并使电子偏离轴线并将其返回到样品（9）。 它们在最终的透镜场中再次被重新加速，并且影响通道板电子倍增器（5），并且在放大之后，信号电子束撞击收集器（7），其可被分成用于多通道检测的适当部分。 检测器可以具有小尺寸和高分辨率，并且可以用于显微镜和其它装置中。

公开(公告)号：US06504164B2

公开(公告)日：2003-01-07

申请号：US09740662

申请日：2000-12-19

Applicant: Akira Yonezawa ,  Seiji Morita ,  Mitsuyoshi Satou

Inventor： Akira Yonezawa ,  Seiji Morita ,  Mitsuyoshi Satou

IPC: H01J3728

CPC classification number: H01J37/28 ,  H01J37/141

Abstract: The invention is to observe semiconductor wafers with higher resolution at a low acceleration voltage—in particular, achieving such high-resolution observability when a wafer is inclined or tilted at large angles. A composite lens is used which consists essentially of a single-pole or monopole magnetic field type lens and an electrostatic field invasive lens whereas an electrode of the electrostatic field invasive lens which opposes the wafer is made of a magnetic material while letting a high voltage of the negative polarity be applied to this electrode and the wafer. Even when the wafer is tilted, any astigmatism and axis failure will hardly occur.

Abstract translation: 本发明是在低加速电压下观察具有更高分辨率的半导体晶片，特别是当晶片以大角度倾斜或倾斜时获得这种高分辨率可观察性。 使用复合透镜，其基本上由单极或单极磁场型透镜和静电场侵入透镜组成，而与晶片相对的静电场侵入透镜的电极由磁性材料制成，同时使高 对该电极和晶片施加负极性。 即使当晶片倾斜时，几乎不会发生任何散光和轴故障。

公开(公告)号：US06369385B1

公开(公告)日：2002-04-09

申请号：US09305975

申请日：1999-05-05

Applicant: Lawrence P. Muray ,  Ho-Seob Kim ,  T. H. Philip Chang

Inventor： Lawrence P. Muray ,  Ho-Seob Kim ,  T. H. Philip Chang

IPC: H01J3728

CPC classification number: G01Q30/02 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/1205 ,  H01J2237/2818 ,  Y10S977/707 ,  Y10S977/849 ,  Y10S977/86 ,  Y10S977/869 ,  Y10S977/874 ,  Y10S977/881 ,  Y10S977/887

Abstract: An apparatus for surface inspection and processing of a wafer includes a microcolumn and an associated scanning probe microscope. The microcolumn enables high speed scanning of the wafer at a relatively high resolution, while the scanning probe microscope provides atomic resolution of highly localized areas of the wafer. The microcolumn and scanning probe microscope can be partially fabricated out of the same substrate. Additionally, the microcolumn and scanning probe microscope can be a portion of an array of microcolumns and/or scanning probe microscopes. The apparatus may be used for imaging, lithography and spectroscopy.

Abstract translation: 用于表面检查和处理晶片的装置包括微柱和相关联的扫描探针显微镜。 微柱可以以相对高的分辨率高速扫描晶片，而扫描探针显微镜提供晶片的高度局部化区域的原子分辨率。 微柱和扫描探针显微镜可以由相同的基底部分制成。 另外，微柱和扫描探针显微镜可以是微柱阵列和/或扫描探针显微镜的一部分。 该装置可用于成像，光刻和光谱学。

公开(公告)号：US06774364B2

公开(公告)日：2004-08-10

申请号：US10410131

申请日：2003-04-10

Applicant: Shigenori Takagi

Inventor： Shigenori Takagi

IPC: H01J3728

CPC classification number: H01J37/28 ,  H01J2237/22

Abstract: In an operation of an electron microscope, at least a spot size of an electron beam on a specimen, an acceleration voltage, a detector type, a specimen position, and an observation magnification are set as a predetermined image observation condition and an observation image is picked up under the predetermined image observation condition. Different image observation conditions are automatically set based on the observation image. A plurality of observation images are picked up based on the setup image observation conditions. The plurality of picked-up observation images are simultaneously displayed on a second display section. A desired observation image is selected from among the observation images displayed on the second display section. The selected observation image is displayed on a first display section on an enlarged scale.

Abstract translation: 在电子显微镜的操作中，将样本上的电子束的至少点尺寸，加速电压，检测器类型，样本位置和观察倍率设置为预定图像观察条件，并且观察图像为 在预定图像观察条件下拾起。 基于观察图像自动设定不同的图像观察条件。 基于设置图像观察条件来拾取多个观察图像。 多个拾取观察图像同时显示在第二显示部分上。 从显示在第二显示部分上的观察图像中选择期望的观察图像。 所选择的观察图像以放大比例显示在第一显示部分上。

公开(公告)号：US06664541B2

公开(公告)日：2003-12-16

申请号：US09990170

申请日：2001-11-21

Applicant: Mehran Nasser-Ghodsi ,  Jeffrey Reichert

Inventor： Mehran Nasser-Ghodsi ,  Jeffrey Reichert

IPC: H01J3728

CPC classification number: H01J37/268 ,  G01N23/2252 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: The present invention includes a system for localization of defects in test samples. A sample is scanned using a particle beam. Some particles interact with conductive elements and may cause the emission of x-rays. Other particles can pass through the sample entirely and generate a current that can be measured. A higher current generated indicates less conductive material at the scan target that may mean a void, dishing, or erosion is present. Localization of a defect can be confirmed using an x-ray emission detector.

Abstract translation: 本发明包括用于定位测试样品中的缺陷的系统。 使用粒子束扫描样品。 一些颗粒与导电元素相互作用，并可能导致x射线的发射。 其他颗粒可以完全通过样品，并产生可以测量的电流。 产生的较高的电流表示在扫描目标处的导电材料较少，这可能意味着存在空隙，凹陷或侵蚀。 可以使用x射线发射检测器确认缺陷的定位。