公开(公告)号：US5261963A

公开(公告)日：1993-11-16

申请号：US803340

申请日：1991-12-04

Applicant: William C. Basta ,  David C. Punola ,  Daniel L. Near ,  Jeffery S. Smith

Inventor： William C. Basta ,  David C. Punola ,  Daniel L. Near ,  Jeffery S. Smith

IPC: B01J3/00 ,  B01J19/32 ,  C23C16/44 ,  C23C16/00

CPC classification number: B01J19/32 ,  B01J3/006 ,  C23C16/4412 ,  B01J2219/3221 ,  B01J2219/32213 ,  B01J2219/32231 ,  B01J2219/32237 ,  B01J2219/32408 ,  Y10S165/913

Abstract: Chemical vapor deposition apparatus comprises a reactor having a chamber with a coating region for coating a substrate and an exhaust region communicating with the coating region. The coating region includes an inlet for introduction of a gaseous reactant stream to pass over the substrate to react therewith to form a coating thereon and a spent gas stream. The exhaust region includes an outlet for exhausting the spent gas stream from the coating region. The substrate is supported in the coating region and heated to an elevated reaction temperature by suitable support means and heating means. A condensing assembly is disposed in the exhaust region for condensing excess, unreacted gaseous reactant from the spent gas stream before entry into the outlet. The condensing assembly includes a high surface area, apertured structure disposed in the exhaust region where the temperature of the spent gas stream is sufficiently reduced to condense excess, unreacted gaseous reactant therefrom. An enclosure is disposed around the condensing structure and configured to direct the spent gas stream from the coating region to flow through the condensing structure where the excess, unreacted gaseous reactant can condense before entering the outlet.

Abstract translation: 化学气相沉积设备包括一个反应器，该反应器具有一个具有用于涂覆基底的涂层区域和与该涂层区域连通的排气区域的腔室。 涂覆区域包括用于引入气态反应物流以通过基底以与其反应以在其上形成涂层和废气流的入口。 排气区域包括用于从涂覆区域排出废气流的出口。 衬底被支撑在涂覆区域中，并通过合适的支撑装置和加热装置加热到升高的反应温度。 冷凝组件设置在排气区域中，用于在进入出口之前将来自废气流的过量未反应的气体反应物冷凝。 冷凝组件包括设置在排气区域中的高表面积，有孔结构，其中废气流的温度被充分还原以从其中冷凝过量的未反应的气态反应物。 外壳围绕冷凝结构设置并且构造成引导来自涂覆区域的废气流流过冷凝结构，其中过量的未反应的气态反应物可在进入出口之前冷凝。

公开(公告)号：US5259735A

公开(公告)日：1993-11-09

申请号：US873175

申请日：1992-04-24

Applicant: Kazue Takahashi ,  Shinjiro Ueda ,  Manabu Edamura ,  Naoyuki Tamura ,  Kazuaki Ichihashi

Inventor： Kazue Takahashi ,  Shinjiro Ueda ,  Manabu Edamura ,  Naoyuki Tamura ,  Kazuaki Ichihashi

IPC: B01D19/00 ,  B01D8/00 ,  B01J3/00 ,  B01J3/02 ,  B01L7/00 ,  B01L99/00 ,  C23C14/54 ,  C23C14/56 ,  F04B23/14 ,  F04B37/08

CPC classification number: C23C14/564 ,  B01D8/00 ,  B01J3/006 ,  Y10S417/901

Abstract: An evacuation system in an ultra-high vacuum sputtering apparatus capable of shortening the pumping time of the system. A main pump, composed of a turbo-molecular pump and a baffle is positioned upstream of a main pump and cooled to a temperature in which argon gas is not absorbed and only water is absorbed. The pump and a vacuum chamber are separated by a valve. A pipeline circulates a heating medium to rapidly heat and cool the vacuum chamber for enabling a gas discharge from the vacuum chamber whereby the pumping time can be reduced and the overall production of the system can be increased.

公开(公告)号：US5161955A

公开(公告)日：1992-11-10

申请号：US747667

申请日：1991-08-20

Applicant: Philip Danielson ,  Giovanni Carrea

Inventor： Philip Danielson ,  Giovanni Carrea

IPC: B01J3/00 ,  F04B37/02 ,  F04B37/04 ,  H01J7/18

CPC classification number: F04B37/02 ,  B01J3/006 ,  F04B37/04 ,  H01J7/18

Abstract: A bulk getter-pump, consisting primarily of large beds of heated getter-material for use in pumping down in a high-vacuum environment. The pump is designed for applications now are served by turbo, cryo, diffusion, and ion pumps. The pump consists of a meshed cage filled with bulk getter-material pellets, which cage is housed in a housing coupled to a conduit of a vacuum chamber, so that the bulk getter-material is exposed to the interior of the vacuum chamber. In use, a roughing pump is first used to bring the chamber down to a pressure of about 10.sup.3 torr, and then the bulk getter-pump of the invention is operatively coupled to the chamber for sorbing gases, in order to reach a high vacuum.

Abstract translation: 大量吸气泵，主要由大型加热吸气剂床组成，用于在高真空环境中泵送。 该泵设计用于现在由涡轮，低温，扩散和离子泵供应的应用。 泵由一个填充有大量吸气材料颗粒的网状笼组成，其中笼子被容纳在耦合到真空室的管道的壳体中，使得本体吸气材料暴露于真空室的内部。 在使用中，首先使用粗抽泵将室降低到约103托的压力，然后本发明的本体吸气泵可操作地耦合到室以吸附气体，以便达到高真空。

公开(公告)号：US5128081A

公开(公告)日：1992-07-07

申请号：US446585

申请日：1989-12-05

Applicant: Richard W. Siegel ,  Horst Hahn ,  Jeffrey A. Eastman

Inventor： Richard W. Siegel ,  Horst Hahn ,  Jeffrey A. Eastman

IPC: B01J3/00 ,  B22F3/00 ,  B22F9/12 ,  C01B13/32 ,  C01B33/02 ,  C01F5/04 ,  C01F7/42 ,  C01G9/02 ,  C01G23/047

CPC classification number: B82Y30/00 ,  B01J3/006 ,  B22F3/006 ,  B22F9/12 ,  C01B13/322 ,  C01B33/02 ,  C01F5/04 ,  C01F7/424 ,  C01G23/047 ,  C01G9/02 ,  C01P2002/72 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/21

Abstract: Method of making selected phases of nanocrystalline ceramic materials. Various methods of controlling the production of nanocrystalline alpha alumina and titanium oxygen phases are described. Control of the gas atmosphere and use of particular oxidation treatments give rise to the ability to control the particular phases provided in the aluminum/oxygen and titanium/oxygen system.

Abstract translation: 制备纳米晶陶瓷材料的选定方法。 描述了控制纳米晶α氧化铝和钛氧相的生产的各种方法。 气体气氛的控制和特定氧化处理的使用产生了控制铝/氧和钛/氧系统中提供的特定相的能力。

公开(公告)号：US5062771A

公开(公告)日：1991-11-05

申请号：US325910

申请日：1989-03-20

Applicant: Akihiko Satou ,  Tadao Kusaka ,  Shigeo Tomiyama ,  Kouzi Aoki ,  Ichiro Gyobu ,  Kimio Muramatsu ,  Hiroaki Sakamoto ,  Shinjiroo Ueda ,  Masahiro Mase ,  Takashi Nagaoka

Inventor： Akihiko Satou ,  Tadao Kusaka ,  Shigeo Tomiyama ,  Kouzi Aoki ,  Ichiro Gyobu ,  Kimio Muramatsu ,  Hiroaki Sakamoto ,  Shinjiroo Ueda ,  Masahiro Mase ,  Takashi Nagaoka

IPC: B01J3/00 ,  C23C16/44 ,  F04D19/04

CPC classification number: B01J3/006 ,  C23C16/4412 ,  F04D17/168 ,  F04D19/046 ,  F04D23/008 ,  Y10S148/022 ,  Y10S148/03 ,  Y10S148/169 ,  Y10S438/909

Abstract: This invention concerns a production method and a processing apparatus for semiconductor devices, as well as an evacuating apparatus used for the processing apparatus. According to this invention, since the evacuation system of pressure-reduction processing apparatus for conducting various wafer processings during production steps of semiconductor devices is constituted only with oil-free vacuum pump, deleterious oil contaminations or carbonation products of oils produced from oils upon heating are not present in the pressure-reducing processing chamber as compared with conventional pressure-reducing processing apparatus using a vacuum oil pump as an evacuation pump and the production method of semiconductor devices using such apparatus. Accordingly, highly clean evacuated condition can be attained and, in addition, semiconductor devices at high reliability and with no degradation in the electric characteristics can be obtained by using the pressure-reducing processing apparatus having such a highly clean processing chamber.

公开(公告)号：US5022829A

公开(公告)日：1991-06-11

申请号：US382659

申请日：1989-10-12

Applicant: Gerrit De Haan

Inventor： Gerrit De Haan

IPC: H01L29/73 ,  B01J3/00 ,  B29C67/24 ,  C08G63/60 ,  C08J5/04 ,  C08L67/00 ,  F04B37/14 ,  H01L21/02 ,  H01L21/285 ,  H01L21/331 ,  H01L21/60 ,  H01L21/76 ,  H01L21/762 ,  H01L21/768 ,  H01L21/822 ,  H01L21/8222 ,  H01L23/522 ,  H01L27/04 ,  H01L27/06

CPC classification number: H01L21/28525 ,  B01J3/006 ,  F04B37/14 ,  H01L21/76229 ,  H01L21/76235 ,  H01L21/76897 ,  H01L28/20 ,  Y10S417/01

Abstract: The present invention provides an apparatus having a high vacuum environment and a plurality of components located within the high vacuum environment so as to be exposed to high vacuum. At least one of the plurality of components is formed from a plastic material comprising liquid crystal polymer to prevent outgassing of the plastics material in the high vacuum environment.

Abstract translation: PCT No.PCT / GB88 / 01105 Sec。 371日期：1989年10月12日 102（e）日期1989年10月12日PCT提交1988年12月14日PCT公布。 出版物WO89 / 05689 日期：1989年6月29日。本发明提供一种具有高真空环境和位于高真空环境内的多个部件以暴露于高真空的装置。 多个部件中的至少一个部件由包含液晶聚合物的塑料材料形成，以防止高真空环境中的塑料材料脱气。

公开(公告)号：US4969556A

公开(公告)日：1990-11-13

申请号：US360033

申请日：1989-06-01

Applicant: Hajime Ishimaru ,  Kazuo Miyamoto ,  Kyozi Ono ,  Yutaka Mikasa ,  Hiroshi Takemura

Inventor： Hajime Ishimaru ,  Kazuo Miyamoto ,  Kyozi Ono ,  Yutaka Mikasa ,  Hiroshi Takemura

IPC: B01J3/00 ,  B01J3/02 ,  H01L21/673

CPC classification number: H01L21/67356 ,  B01J3/006 ,  B01J3/02 ,  H01L21/67386 ,  H01L21/67393

Abstract: Disclosed is a vacuum container for transporting one or more articles in the vacuum atomsphere. To this end, the vacuum container comprises a container body which can be maintained in the air-tight state and which is formed with a hole through which one or more articles are inserted into or removed out of said container body, a gate valve for opening or closing the opening of the container body, vacuum maintaining pump means communicated with the container body in order to maintain the interior thereof at an extremely high degree of vacuum and retaining means disposed within the container body for releasably retaining at least one article. With the vacuum container with the above-described construction, one or more articles which cannot be exposed to the surrounding atmosphere because of various reasons can be transported in the vacuum state in a stable manner.

Abstract translation: 公开了一种真空容器，用于在真空原子层中输送一个或多个物品。 为此，真空容器包括可保持在气密状态并且形成有一个或多个物品插入或移出所述容器主体的孔的容器主体，用于打开的闸阀 或关闭容器主体的开口，真空保持泵装置与容器主体连通，以便将其内部保持在非常高的真空度，并且保持装置设置在容器主体内以可释放地保持至少一个物品。 利用具有上述结构的真空容器，由于各种原因不能暴露于周围大气的一个或多个物品可以以稳定的方式在真空状态下运输。

公开(公告)号：US4874453A

公开(公告)日：1989-10-17

申请号：US817115

申请日：1986-01-08

Applicant: Kenji Fukuta ,  Takaoki Kaneko ,  Yoshinobu Takahashi

Inventor： Kenji Fukuta ,  Takaoki Kaneko ,  Yoshinobu Takahashi

IPC: B01J3/00 ,  B05D3/14 ,  B29C59/14 ,  H01J37/32

CPC classification number: H01J37/32357 ,  B01J3/006 ,  B05D3/144 ,  B29C59/14

Abstract: An apparatus for plasma treatment, capable of plasma-treating works of resin material by irradiating the surfaces of the works with a microwave discharge plasma within a vacuum reaction chamber. A plasma introducing port is formed in the wall of the reaction chamber. A plasma-irradiating pipe is connected to the plasma introducing port for injecting the plasma into the reaction chamber to irradiate the surfaces of the works. A discharge port is formed in the wall of the reaction chamber to reduce the internal pressure of the reaction chamber. A plasma diffuser includes a rotatable vane for diffusing the flow of plasma to distribute uniform density of plasma in the reaction chamber. A plurality of deflecting plates projecting from the inner wall of the reaction chamber toward the interior thereof may also be provided to diffuse the flow of plasma in the reaction chamber. In a method, a plurality of the works are rotated in relation to each other about a common axis, and also individual works are rotated independently from each other about their own axes.

公开(公告)号：US4826698A

公开(公告)日：1989-05-02

申请号：US095070

申请日：1987-09-11

Applicant: David Reznik

Inventor： David Reznik

IPC: B01J3/00 ,  B65B31/02 ,  B66C13/02 ,  E21B19/09 ,  A23B9/00

CPC classification number: B01J3/006 ,  B65B31/025 ,  B66C13/02 ,  E21B19/09

Abstract: A pressure treatment chamber comprising an enclosure whose interior is maintained at predetermined pressure and temperature conditions, the enclosure defining at least one access port, a rotary feeder disposed within the enclosure and being maintained at the pressure and temperature conditions of the interior thereof and communicating with the access port via a conduit extending through the enclosure and filled with a condensible gas substantially to the exclusion of atmospheric air, and pressurized fluid sealing apparatus coupled to the conduit for providing communication between the conduit and the rotary feeder while reducing the amount of gas transfer between the interior and exterior of the enclosure.

Abstract translation: 一种压力处理室，包括其内部保持在预定压力和温度条件下的外壳，外壳限定至少一个进入口，设置在外壳内的旋转进料器，并保持在其内部的压力和温度条件下并与 通过延伸穿过外壳并且充满基本上排除大气空气的可冷凝气体的管道的进入端口以及耦合到管道的加压流体密封装置，用于在导管和旋转进料器之间提供连通，同时减少气体转移量 在外壳的内部和外部之间。

公开(公告)号：US4786522A

公开(公告)日：1988-11-22

申请号：US58287

申请日：1987-06-04

Applicant: Kenji Fukuta ,  Takaoki Kaneko ,  Yoshinobu Takahashi

Inventor： Kenji Fukuta ,  Takaoki Kaneko ,  Yoshinobu Takahashi

IPC: B01J3/00 ,  B01J19/12 ,  B05C9/10 ,  B29C59/14 ,  B05D3/06

CPC classification number: B01J19/126 ,  B01J3/006 ,  B05C9/10 ,  B29C59/14 ,  B01J2219/0894 ,  B01J2219/1227 ,  B01J2219/1942

Abstract: A method for applying surface plasma-treating to works of resin material in a reaction chamber by irradiating the surfaces of the works with a microwave discharge plasma within the reaction chamber, comprising injection the plasma from a plurality of positions located adjacently to the inner wall of the reaction chamber, and injecting the plasma from each injecting position in a certain spreading angle along the direction of injection. An apparatus for plasma treatment, capable of plasma-treating works of resin material by irradiating the surfaces of the works with a microwave discharge plasma within a vacuum reaction chamber which is in the form of a circular cylinder of 1000 mm or more in diameter, the form of a square prism of 1000 mm or more in the length of a side or the analogous form, comprising a plurality of plasma introducing ports formed in the wall of the reaction chamber at optional positions thereon; and a glass pipe connected to each plasma introducing port for injecting the plasma into the reaction chamber in a certain spreading angle along the direction of injection.

Abstract translation: 一种通过在反应室内用微波放电等离子体照射工件的表面，在反应室中对树脂材料的工作进行表面等离子体处理的方法，包括：将等离子体从位于邻近内壁的多个位置 反应室，并且沿着注射方向以一定的扩展角度从每个注射位置注入等离子体。 一种用于等离子体处理的装置，其能够通过在直径为1000mm或更大的圆柱体形式的真空反应室内用微波放电等离子体照射工件的表面来等离子体处理树脂材料的工作， 在侧面或类似形式的长度上具有1000mm或更大的方形棱柱的形式，包括在其上的任选位置处形成在反应室的壁中的多个等离子体引入口; 以及连接到每个等离子体引入口的玻璃管，用于沿着注射方向以一定的扩展角将等离子体注入到反应室中。