公开(公告)号：US07790045B1

公开(公告)日：2010-09-07

申请号：US11854872

申请日：2007-09-13

Applicant: Peng-Wei Chuang ,  Caroline A. Ross

Inventor： Peng-Wei Chuang ,  Caroline A. Ross

IPC: B44C1/22 ,  B05D3/00

CPC classification number: B81C1/00031 ,  B81C2201/0149 ,  Y10S977/888 ,  Y10S977/895 ,  Y10S977/90 ,  Y10T428/2457 ,  Y10T428/2462

Abstract: The present invention relates to the self-assembly of a spherical-morphology block copolymer into V-shaped grooves of a substrate. Although spherical morphology block copolymers typically form a body-centered cubic system (bcc) sphere array in bulk, the V-shaped grooves promote the formation of a face-centered cubic system (fcc) sphere array that is well ordered. In one embodiment, the (111) planes of the fcc sphere array are parallel to the angled side walls of the V-shaped groove. The (100) plane of the fcc sphere array is parallel to the top surface of the substrate, and may show a square symmetry among adjacent spheres. This square symmetry is unlike the hexagonal symmetry seen in monolayers of spherical domains and is a useful geometry for lithography applications, especially those used in semiconductor applications.

Abstract translation: 本发明涉及将球形形态嵌段共聚物自身组装成基材的V形槽。 虽然球形形态嵌段共聚物通常以体积形成体心立方体系（bcc）球阵列，但是V形槽促进形成良好排列的面心立方体（fcc）球阵列。 在一个实施例中，fcc球阵列的（111）面平行于V形槽的成角度的侧壁。 fcc球阵列的（100）平面平行于衬底的顶表面，并且可以在相邻球体之间显示正方形对称。 该方形对称性与在球形畴的单层中看到的六边形对称不同，并且是用于光刻应用的有用几何形状，特别是在半导体应用中使用的那些。

公开(公告)号：US07713753B2

公开(公告)日：2010-05-11

申请号：US12203958

申请日：2008-09-04

Applicant: Shuaigang Xiao ,  Xiaomin Yang

Inventor： Shuaigang Xiao ,  Xiaomin Yang

IPC: H01L21/00

CPC classification number: B81C1/00031 ,  B81C2201/0149 ,  B82B3/00 ,  B82Y30/00 ,  B82Y40/00

Abstract: A method of fabricating a device includes: providing a substrate having a patterned surface, depositing a first-level self-assembled material on at least a portion of the patterned surface, wherein the position and/or orientation of the first-level self-assembled material is directed by the patterned surface, to form a first nanostructure pattern, and depositing a second-level self-assembled material on at least a portion of the first nanostructure pattern to form an array of nanostructures of the second-level self-assembled material. An apparatus fabricated using the method is also provided.

Abstract translation: 制造器件的方法包括：提供具有图案化表面的衬底，在图案化表面的至少一部分上沉积第一级自组装材料，其中第一级自组装的位置和/或取向 材料由图案化的表面引导，以形成第一纳米结构图案，并且在第一纳米结构图案的至少一部分上沉积二级自组装材料以形成二级自组装材料的纳米结构阵列 。 还提供了使用该方法制造的装置。

公开(公告)号：US20100093160A1

公开(公告)日：2010-04-15

申请号：US12330898

申请日：2008-12-09

Applicant: Yonghan Roh ,  Kyoungseob Kim ,  Seokwon Jeong ,  Hyungjin Kim ,  Sungha Park

Inventor： Yonghan Roh ,  Kyoungseob Kim ,  Seokwon Jeong ,  Hyungjin Kim ,  Sungha Park

IPC: H01L21/266 ,  H01L21/311

CPC classification number: H01L21/32139 ,  B81C1/00396 ,  B81C2201/0149 ,  B81C2201/0198 ,  B82Y10/00 ,  H01L21/0332 ,  H01L29/0665 ,  H01L29/0673 ,  H01L29/78

Abstract: Provided are methods of forming nano-devices. One of the methods includes forming a nano-scale self-assembly material layer on a substrate formed of at least one layer, forming a mask layer on the self-assembly material layer, performing a surface treatment process on the substrate using the mask layer as a mask, and removing the self-assembly material layer.Accordingly, it is possible to fabricate nano-devices through a nano-scale substrate patterning process, ion implantation process and etching process, without using a light source.

Abstract translation: 提供了形成纳米器件的方法。 其中一种方法包括在由至少一层形成的衬底上形成纳米级自组装材料层，在自组装材料层上形成掩模层，使用掩模层在衬底上进行表面处理工艺 掩模，并且去除自组装材料层。 因此，可以通过纳米级基板图案化工艺，离子注入工艺和蚀刻工艺制造纳米器件，而不使用光源。

公开(公告)号：US20100087352A1

公开(公告)日：2010-04-08

申请号：US12575920

申请日：2009-10-08

Applicant: Thomas G. Mason

Inventor： Thomas G. Mason

IPC: G03F7/00 ,  C23C14/34 ,  C25D5/00 ,  C09D11/02 ,  C11D17/00 ,  B01J13/00

CPC classification number: C11D11/00 ,  B81C2201/0149 ,  C25D5/48 ,  C25D15/02 ,  G03F7/09 ,  G03F7/11 ,  G03F7/16 ,  G03F7/40

Abstract: A method for producing particles includes providing a relief template having a surface relief pattern adapted to impart structure to a plurality of particles while they are under production; depositing a radiation-sensitive material on the relief template; exposing portions of the radiation-sensitive material on the relief template using a beam of spatially patterned radiation; removing portions of the radiation-sensitive material after the exposing to reveal at least portions of surfaces of the plurality of particles; and separating at least a portion of the plurality of particles from the relief template. At least a portion of a structure of each of the plurality of particles is defined by a combination of the surface relief pattern and the spatially patterned radiation.

Abstract translation: 一种生产颗粒的方法包括提供一种具有表面浮雕图案的浮雕模板，其适于在生产时将结构赋予多个颗粒; 在辐射模板上沉积辐射敏感材料; 使用空间图案化的辐射束将曝光模板上的辐射敏感材料的部分曝光; 在曝光之后去除所述辐射敏感材料的部分以露出所述多个颗粒的表面的至少一部分; 以及从所述浮雕模板分离所述多个颗粒的至少一部分。 通过表面浮雕图案和空间图案化辐射的组合来限定多个颗粒中的每一个的结构的至少一部分。

公开(公告)号：US20100051904A1

公开(公告)日：2010-03-04

申请号：US12203958

申请日：2008-09-04

Applicant: Shuaigang Xiao ,  Xiaomin Yang

Inventor： Shuaigang Xiao ,  Xiaomin Yang

IPC: H01L29/06 ,  H01L21/00

CPC classification number: B81C1/00031 ,  B81C2201/0149 ,  B82B3/00 ,  B82Y30/00 ,  B82Y40/00

Abstract: A method of fabricating a device includes: providing a substrate having a patterned surface, depositing a first-level self-assembled material on at least a portion of the patterned surface, wherein the position and/or orientation of the first-level self-assembled material is directed by the patterned surface, to form a first nanostructure pattern, and depositing a second-level self-assembled material on at least a portion of the first nanostructure pattern to form an array of nanostructures of the second-level self-assembled material. An apparatus fabricated using the method is also provided.

Abstract translation: 制造器件的方法包括：提供具有图案化表面的衬底，在图案化表面的至少一部分上沉积第一级自组装材料，其中第一级自组装的位置和/或取向 材料由图案化的表面引导，以形成第一纳米结构图案，并且在第一纳米结构图案的至少一部分上沉积二级自组装材料以形成二级自组装材料的纳米结构阵列 。 还提供了使用该方法制造的装置。

公开(公告)号：US20090200646A1

公开(公告)日：2009-08-13

申请号：US12030562

申请日：2008-02-13

Applicant: Dan B. Millward ,  Karl Stuen

Inventor： Dan B. Millward ,  Karl Stuen

IPC: H01L21/469 ,  H01L21/311 ,  H01L23/58

CPC classification number: H01L21/0337 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  G03F7/0002 ,  H01L21/0338 ,  H01L21/31144 ,  H01L21/76816 ,  Y10S977/778 ,  Y10S977/784 ,  Y10S977/789 ,  Y10S977/79 ,  Y10T428/24058 ,  Y10T428/24124 ,  Y10T428/24174 ,  Y10T428/24182

Abstract: Methods for fabricating sublithographic, nanoscale microstructures in one-dimensional arrays utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.

Abstract translation: 提供了使用自组装嵌段共聚物在一维阵列中制备亚光刻，纳米级微结构的方法，以及由这些方法形成的膜和器件。

公开(公告)号：US20090181171A1

公开(公告)日：2009-07-16

申请号：US12060516

申请日：2008-04-01

Applicant: Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

Inventor： Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

IPC: B44C1/22 ,  C08F283/10 ,  B05D5/00

CPC classification number: C08L63/00 ,  B05D5/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C08F283/10 ,  C08L53/00 ,  C09D125/14 ,  G03F7/0002 ,  G03F7/038 ,  Y10S264/901 ,  Y10S428/91 ,  Y10T428/24942

Abstract: A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.

Abstract translation: 公开了一种定向微相分离的结构域的方法，包括施加包含取向控制组分的组合物和包含具有至少两个微相分离结构域的嵌段共聚物的嵌段共聚物组合组分，其中取向控制组分与 嵌段共聚物组合物组分; 以及从所述组合物在所述基材的表面上形成组成上垂直分离的膜。 取向控制成分和嵌段共聚物在成膜时分离，在基板表面形成组成垂直分离的膜，其中取向控制成分相邻于与基板表面相邻的组成偏析膜的表面富集， 并且嵌段共聚物组件在空气 - 表面界面处富集。

公开(公告)号：US20090087653A1

公开(公告)日：2009-04-02

申请号：US11545060

申请日：2006-10-05

Applicant: Paul Franklin Nealey ,  Mark Petar Stoykovich ,  Konstantinos C. Daoulas ,  Marcus Muller ,  Juan J. de Pablo ,  SangMin Park

Inventor： Paul Franklin Nealey ,  Mark Petar Stoykovich ,  Konstantinos C. Daoulas ,  Marcus Muller ,  Juan J. de Pablo ,  SangMin Park

IPC: B32B17/10 ,  B05D1/40

CPC classification number: B32B17/10 ,  B01D69/10 ,  B01D71/40 ,  B01D71/80 ,  B01D2323/225 ,  B05D5/00 ,  B32B3/00 ,  B32B3/30 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  G03F7/70408 ,  Y10T428/24322 ,  Y10T428/24331 ,  Y10T428/24612 ,  Y10T428/24802 ,  Y10T428/269

Abstract: Methods of fabricating complex three-dimensional structures on patterned substrates and related compositions are provided. The methods involve depositing on the substrate a block copolymer material that is “mismatched” to the substrate pattern, and then ordering the material to form a complex three-dimensional structure. According to various embodiments, the copolymer material mismatches the substrate pattern in that the symmetry and/or length scale of its bulk morphology differs from that of the pattern. When ordered, a balance between the physics that determines the bulk block copolymer morphology and the physics that determines the substrate surface interfacial interactions results in a thermodynamically stable complex three-dimensional film that varies in a direction perpendicular to the substrate and has a morphology that differs from its bulk morphology.

Abstract translation: 提供了在图案化基底和相关组合物上制备复杂三维结构的方法。 所述方法包括在衬底上沉积与衬底图案“失配”的嵌段共聚物材料，然后排序材料以形成复杂的三维结构。 根据各种实施方案，共聚物材料使衬底图案失配，因为其体形态的对称性和/或长度尺度与图案的对称性和/或长度尺度不同。 当订购时，确定体积嵌段共聚物形态的物理学和确定衬底表面界面相互作用的物理学之间的平衡导致热力学稳定的复合三维膜在垂直于衬底的方向上变化并且具有不同的形态 从其大量形态。

公开(公告)号：US20090020924A1

公开(公告)日：2009-01-22

申请号：US12070795

申请日：2008-02-21

Applicant: Zhiqun Lin

Inventor： Zhiqun Lin

IPC: B28B1/29

CPC classification number: B81C1/00031 ,  B81B2207/056 ,  B81C2201/0149 ,  B82Y30/00

Abstract: Methods, apparatus, and systems of fabricating ordered or hierarchically ordered small-scale structures (e.g. micro- or sub-micro size) without the need for lithographic techniques or external fields. The methods use irreversible solvent evaporation to deposit the solute on a surface. A spherical lens is brought down into contact with the droplet. By selection and control of one or more relevant parameters, various characteristics or features of the resulting structures can be controlled. Nano-scale structures or materials can be formed or included in the micro- or sub-micro-scale formed structures. The nano-scale structures or materials can self-assembly in hierarchical order by selection and control of certain process parameters.

Abstract translation: 不需要光刻技术或外部场的方法，装置和制造有序或分级有序的小尺度结构（例如微尺寸或亚微米尺寸）的系统。 该方法使用不可逆溶剂蒸发将溶质沉积在表面上。 使球面透镜与液滴接触。 通过选择和控制一个或多个相关参数，可以控制所得结构的各种特征或特征。 纳米级结构或材料可以形成或包含在微尺度或亚微米级的结构中。 纳米尺度结构或材料可以通过选择和控制某些工艺参数以分级顺序进行自组装。

公开(公告)号：US20080315270A1

公开(公告)日：2008-12-25

申请号：US11766663

申请日：2007-06-21

Applicant: Eugene P. Marsh ,  Dan B. Millward

Inventor： Eugene P. Marsh ,  Dan B. Millward

IPC: H01L31/062 ,  B32B7/00 ,  G03C5/00

CPC classification number: B32B25/00 ,  B81C1/00206 ,  B81C2201/0149 ,  B82Y30/00 ,  G02B1/111 ,  G03F7/0002 ,  G03F7/091 ,  H01L21/0276 ,  H01L27/1462 ,  H01L31/02162 ,  H01L31/02168 ,  Y02E10/50 ,  Y10T428/24174

Abstract: Multi-layer antireflection coatings, devices including multi-layer antireflection coatings and methods of forming the same are disclosed. A block copolymer is applied to a substrate and self-assembled into parallel lamellae above a substrate. The block copolymer may optionally be allowed to self-assemble into a multitude of domains oriented either substantially parallel or substantially perpendicular to an widerlying substrate

Abstract translation: 公开了多层抗反射涂层，包括多层抗反射涂层的装置及其形成方法。 将嵌段共聚物施加到基底上并自组装成衬底上方的平行薄片。 嵌段共聚物可以任选地被允许自组装成大致平行或基本上垂直于较宽基底的多个畴