公开(公告)号：US20230161264A1

公开(公告)日：2023-05-25

申请号：US18089940

申请日：2022-12-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Duan-Fu Stephen HSU ,  Christoph Rene Konrad Cebulla Hennerkes ,  Rafael C. Howell ,  Zhan Shi ,  Xiaoyang Jason Li ,  Frank Staals

IPC: G03F7/20

CPC classification number: G03F7/70266 ,  G03F7/705 ,  G03F7/7055

Abstract: A method for determining a wavefront parameter of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model for a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movement, and a lens fingerprint of a tuning apparatus (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., a wavefront parameter such as tilt, offset, etc.) based on the lens fingerprint of the tuning apparatus, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning apparatus performance.

公开(公告)号：US11656555B2

公开(公告)日：2023-05-23

申请号：US17605601

申请日：2020-04-14

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Janardan Nath ,  Kalyan Kumar Mankala ,  Todd R. Downey ,  Joseph Harry Lyons ,  Ozer Unluhisarcikli ,  Alexander Harris Ledbetter ,  Nicholas Stephen Apone ,  Tian Gang

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70083 ,  G03F7/70133

Abstract: An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.

公开(公告)号：US20230154725A1

公开(公告)日：2023-05-18

申请号：US18155698

申请日：2023-01-17

Applicant: ASML Netherlands B.V.

Inventor： Jurgen VAN SOEST

IPC: H01J37/305 ,  H01J37/22 ,  H01J37/317

CPC classification number: H01J37/3056 ,  H01J37/226 ,  H01J37/3175 ,  H01J2237/31774 ,  H01J2237/20285

Abstract: An emitter is configured to emit charged particles. The emitter comprises a body, a metal layer and a charged particle source layer. The body has a point. The metal layer is of a first metal on at least the point. The charged particle source layer is on the metal layer. The point comprises a second metal other than the first metal.

公开(公告)号：US11650576B2

公开(公告)日：2023-05-16

申请号：US16479199

申请日：2018-01-15

Applicant: ASML Netherlands B.V.

Inventor： Wei Fang ,  Cho Huak Teh ,  Robeter Jian ,  Yi-Ying Wang ,  Shih-Tsung Chen ,  Jian-Min Liao ,  Chuan Li ,  Zhaohui Guo ,  Pang-Hsuan Huang ,  Shao-Wei Lai ,  Shih-Tsung Hsu

IPC: G06T7/00 ,  G06K9/62 ,  G06N5/02 ,  G05B19/418 ,  G06F18/24

CPC classification number: G05B19/41875 ,  G06F18/24 ,  G06N5/02 ,  G06T7/0004 ,  G06T2207/30148

Abstract: A server for knowledge recommendation for defect review. The server includes a processor electronically coupled to an electronic storage device storing a plurality of knowledge files related to wafer defects. The processor is configured to execute a set of instruction to cause the server to: receive a request for knowledge recommendation for inspecting an inspection image from a defect classification server; search for a knowledge file in the electronic storage device that matches the inspection image; and transmit the search result to the defect classification server.

公开(公告)号：US20230144419A1

公开(公告)日：2023-05-11

申请号：US18085338

申请日：2022-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： John Colin TRAVERS ,  Federico BELLI ,  Malte Christian BRAHMS ,  Andreas Johannes Antonius BROUNS ,  Ronald Franciscus Herman HUGERS

IPC: H01S3/067 ,  G02F1/35 ,  G02B6/02 ,  G03F7/20

CPC classification number: H01S3/06741 ,  G02F1/3528 ,  G02B6/02328 ,  G03F7/70625

Abstract: A broadband radiation source device, including a fiber assembly having a plurality of optical fibers, each optical fiber being filled with a gas medium, wherein the broadband radiation source device is operable such that subsets of the optical fibers are independently selectable for receiving a beam of input radiation so as to generate a broadband output from only a subset of the plurality of optical fibers at any one time.

公开(公告)号：US11644428B2

公开(公告)日：2023-05-09

申请号：US16719107

申请日：2019-12-18

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey Den Boef

IPC: G01B11/00 ,  G01N21/956 ,  G03F7/20

CPC classification number: G01N21/95607 ,  G03F7/7015 ,  G03F7/70633

Abstract: Systems, methods, and apparatus are provided for determining overlay of a pattern on a substrate with a mask pattern defined in a resist layer on top of the pattern on the substrate. A first grating is provided under a second grating, each having substantially identical pitch to the other, together forming a composite grating. A first illumination beam is provided under an angle of incidence along a first horizontal direction. The intensity of a diffracted beam from the composite grating is measured. A second illumination beam is provided under the angle of incidence along a second horizontal direction. The second horizontal direction is opposite to the first horizontal direction. The intensity of the diffracted beam from the composite grating is measured. The difference between the diffracted beam from the first illumination beam and the diffracted beam from the second illumination beam, linearly scaled, results in the overlay error.

公开(公告)号：US20230139746A1

公开(公告)日：2023-05-04

申请号：US18075589

申请日：2022-12-06

Applicant: ASML Netherlands B.V.

Inventor： Yezheng Tao ,  Daniel John William Brown ,  Alexander Anthony Schafgans ,  Palash Parijat Das

IPC: H05G2/00 ,  H01S3/23 ,  H01S3/00

Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.

公开(公告)号：US20230138469A1

公开(公告)日：2023-05-04

申请号：US17801980

申请日：2021-02-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Carlo LANCIA ,  Anjan Prasad Gantapara ,  Dirk-Jan KERNKAMP ,  Seyed Iman MOSSAVAT ,  Alexander YPMA

IPC: G05B13/04

Abstract: A method of tuning a prediction model relating to at least one particular configuration of a manufacturing device. The method includes obtaining a function including at least a first function of first prediction model parameters associated with the at least one particular configuration, and a second function of the first prediction model parameters and second prediction model parameters associated with configurations of the manufacturing device and/or related devices other than the at least one particular configuration. Values of the first prediction model parameters are obtained based on an optimization of the function, and a prediction model is tuned according to these values of the first prediction model parameters to obtain a tuned prediction mode.

公开(公告)号：US20230134837A1

公开(公告)日：2023-05-04

申请号：US18090873

申请日：2022-12-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Onvlee ,  Antonius Franciscus Johannes De Groot ,  Wim Symens ,  David Ferdinand Vles

IPC: G03F7/20

Abstract: A substrate support for supporting a substrate. The substrate support includes a main body, a clamping device and a dither device. The main body includes a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate is being loaded onto the support surface.

公开(公告)号：US20230121922A1

公开(公告)日：2023-04-20

申请号：US17792335

申请日：2020-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/687

Abstract: A suction clamp for clamping an object. The suction clamp includes a base structure including a base and a connection area, and a first pad for receiving the object. The suction clamp further includes a resilient member connecting the first pad to the connection area of the base structure such that the first pad is moveable relative to the base between a receiving position for receiving the object and a clamping position for clamping the object, wherein the resilient member is adapted to bias the first pad to the receiving position. The suction clamp further includes a suction opening arranged in the base and adapted to be connected to a suction device for providing a suction force for clamping the object on the first pad.