公开(公告)号：US20240355579A1

公开(公告)日：2024-10-24

申请号：US18138709

申请日：2023-04-24

Applicant: KLA Corporation

Inventor： Yeishin Tung ,  Peter Lin ,  Mi Zhang ,  Chengping Zhang ,  Sameet Shriyan

IPC: H01J37/22 ,  G01B11/14 ,  H01J37/20

CPC classification number: H01J37/226 ,  G01B11/14 ,  H01J37/20

Abstract: A beam of light is directed at a workpiece on a stage. The workpiece is disposed an absolute distance from an electron beam column. The beam of light that is reflected off the workpiece is received at a sensor. Using the beam of light, a nominal distance between the electron beam column and the workpiece on the stage is determined.

公开(公告)号：US20230326714A1

公开(公告)日：2023-10-12

申请号：US18027051

申请日：2021-08-04

Applicant: V TECHNOLOGY CO., LTD.

Inventor： Michinobu MIZUMURA

IPC: H01J37/28 ,  H01J37/317 ,  H01J37/32 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/28 ,  H01J37/3178 ,  H01J37/32449 ,  H01J37/244 ,  H01J37/226 ,  H01J2237/2817 ,  H01J2237/2806

Abstract: A metal pattern inspection method which applies a pulsed voltage to a metallic pattern, sets a cycle of the pulsed voltage to be shorter than a scanning cycle in which a focused ion beam is swept, indicating only a region of a secondary charged particle image corresponding to a portion of the metallic pattern which is isolated by a wire breakage and to which the pulsed voltage is applied in the form of a first pattern created as a function of surface electrical potentials changing in level with time, detecting, as a disconnection, a boundary between the first pattern and a second pattern created as a function of surface electrical potentials not changing in level with time, and determining whether there is a breaking of or a short circuit in the metallic pattern based on the presence or absence of the disconnection.

公开(公告)号：US11688581B2

公开(公告)日：2023-06-27

申请号：US17223146

申请日：2021-04-06

Applicant: Gatan, Inc.

Inventor： John Andrew Hunt ,  Michael Bertilson

IPC: H01J37/244 ,  G01J3/02 ,  G01J3/44 ,  G01N21/66 ,  H01J37/22 ,  H01J37/285

CPC classification number: H01J37/244 ,  G01J3/021 ,  G01J3/0216 ,  G01J3/0218 ,  G01J3/4406 ,  G01N21/66 ,  H01J37/226 ,  H01J37/285 ,  H01J2237/2445 ,  H01J2237/262 ,  H01J2237/2855

Abstract: Apparatuses for collection of upstream and downstream transmission electron microscopy (TEM) cathodoluminescence (CL) emitted from a sample exposed to an electron beam are described. A first fiber optic cable carries first CL light emitted from a first TEM sample surface, into a spectrograph. A second fiber optic cable carries second CL light emitted from a second TEM sample surface into the spectrograph. The first and second fiber optic cables are positioned such that the spectrograph produces a first light spectrum for the first fiber optic cable and a separate light spectrum for the second fiber optic cable. The described embodiments allow collection of TEM CL data in a manner that allows analyzing upstream and downstream TEM CL signals separately and simultaneously with an imaging spectrograph.

公开(公告)号：US20190195621A1

公开(公告)日：2019-06-27

申请号：US16222270

申请日：2018-12-17

Applicant: NuFlare Technology, Inc.

Inventor： Riki OGAWA ,  Hiroyuki NAGAHAMA

IPC: G01B11/25 ,  H01J37/28 ,  H01J37/20 ,  H01J37/21 ,  H01J37/22

CPC classification number: G01B11/25 ,  H01J37/20 ,  H01J37/21 ,  H01J37/222 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/20235 ,  H01J2237/216 ,  H01J2237/2448

Abstract: A displacement measuring apparatus includes an illumination system to obliquely irradiate the target object surface with beams, a sensor to receive a reflected light from the target object surface, an optical system to diverge the reflected light in a Fourier plane with respect to the target object surface, a camera to image a diverged beam in the Fourier plane, a gravity center shift amount calculation circuitry to calculate a gravity center shift amount of the reflected light in the light receiving surface of the sensor, based on a light quantity distribution of the beam imaged by the camera, and a measurement circuitry to measure a heightwise displacement of the target object surface by an optical lever method, using information on a corrected gravity center position obtained by correcting the gravity center position of the reflected light received by the sensor by using the gravity center shift amount.

公开(公告)号：US20190180974A1

公开(公告)日：2019-06-13

申请号：US16210567

申请日：2018-12-05

Applicant: FEI Company

Inventor： Hervé-William Rémigy

IPC: H01J37/18 ,  G01N1/42 ,  F25B19/00 ,  H01J37/20 ,  H01J37/244 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/18 ,  F25B19/005 ,  G01N1/42 ,  H01J37/20 ,  H01J37/226 ,  H01J37/244 ,  H01J37/261 ,  H01J2237/2001 ,  H01J2237/202

Abstract: A method of preparing a cryogenic sample (e.g. for study in a charged-particle microscope), whereby the sample is subjected to rapid cooling using a cryogen, comprising the following steps: Providing two conduits for transporting cryogenic fluid, each of which conduits opens out into a mouthpiece, which mouthpieces are arranged to face each other across an intervening gap; Placing the sample in said gap; Pumping cryogenic fluid through said conduits so as to concurrently flush from said mouthpieces, thereby suddenly immersing the sample in cryogenic fluid from two opposite sides, wherein the flush of cryogenic fluid applied from a first of said mouthpieces is different—e.g. has a different duration—to that applied from the second of said mouthpieces.

公开(公告)号：US20190108969A1

公开(公告)日：2019-04-11

申请号：US16088880

申请日：2016-03-28

Applicant: Hitachi High-Technologies Corporation

Inventor： Tomohiko OGATA ,  Masaki HASEGAWA ,  Hisaya MURAKOSHI ,  Katsunori ONUKI ,  Noriyuki KANEOKA

IPC: H01J37/147 ,  H01J37/22 ,  H01J37/29

CPC classification number: H01J37/147 ,  H01J37/04 ,  H01J37/05 ,  H01J37/224 ,  H01J37/226 ,  H01J37/29

Abstract: The objective of the present invention is to propose a charged particle beam device with which an imaging optical system and an irradiation optical system can be adjusted with high precision. In order to achieve this objective, provided is a charged particle beam device comprising: a first charged particle column which serves as an irradiation optical signal; a deflector that deflects charged particles which have passed through the inside of the first charged particle column toward an object; and a second charged particle column which serves as an imaging optical system. The charged particle beam device is provided with: a light source that emits light toward the object; and a control device that obtains, on the basis of detection charged particles generated according to irradiation of light emitted from the light source, a plurality of deflection signals which maintain a certain deflection state, and that selects or calculates, from the plurality of deflection signals or from relationship information produced from the plurality of deflection signals, a deflection signal that satisfies a predetermined condition.

公开(公告)号：US20180158645A1

公开(公告)日：2018-06-07

申请号：US15576686

申请日：2016-08-11

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： Bok Lae CHO ,  Sang Jung AHN ,  Inho SUL

IPC: H01J37/16 ,  H01J37/244 ,  H01J37/22 ,  H01J37/18 ,  G02B21/02 ,  G02B21/06 ,  G02B21/36 ,  G02B21/00

CPC classification number: H01J37/16 ,  G02B21/0004 ,  G02B21/02 ,  G02B21/06 ,  G02B21/36 ,  G02B21/361 ,  H01J37/18 ,  H01J37/20 ,  H01J37/226 ,  H01J37/244 ,  H01J37/26 ,  H01J37/285 ,  H01J2237/166 ,  H01J2237/182 ,  H01J2237/2448 ,  H01J2237/2808 ,  H01J2237/2855

Abstract: A vacuum sample chamber for a particle and optical device includes on one surface thereof, an aperture through which a particle beam to be focused along an optical axis of particles such as electrons, ions and neutral particles is incident; and on the opposite surface thereof, a detachable sample holder through which light penetrates, thereby enabling a sample to be observed and analyzed by means of the particle beam and light. A sample chamber is capable of reducing observation time by maintaining a vacuum therein even when a sample is put into or taken out from a sample chamber of an electron microscope or focused ion beam observation equipment, and capable of obtaining an optical image on the outside thereof without inserting a light source or an optical barrel into the sample chamber. A light-electron fusion microscope comprising the sample chamber.

公开(公告)号：US09865427B2

公开(公告)日：2018-01-09

申请号：US14704453

申请日：2015-05-05

Applicant: FEI COMPANY

Inventor： Martinus Petrus Maria Bierhoff ,  Bart Buijsse ,  Cornelis Sander Kooijman ,  Hugo Van Leeuwen ,  Hendrik Gezinus Tappel ,  Colin August Sanford ,  Sander Richard Marie Stoks ,  Steven Berger ,  Ben Jacobus Marie Bormans ,  Koen Arnoldus Wilhelmus Driessen ,  Johannes Antonius Hendricus W. G. Persoon

IPC: H01J37/26 ,  H01J37/18 ,  H01J37/21 ,  H01J37/302 ,  H01J37/16 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/26 ,  H01J37/16 ,  H01J37/18 ,  H01J37/185 ,  H01J37/20 ,  H01J37/21 ,  H01J37/226 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1405 ,  H01J2237/162 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2006

Abstract: A user interface for operation of a scanning electron microscope device that combines lower magnification reference images and higher magnification images on the same screen to make it easier for a user who is not used to the high magnification of electron microscopes to readily determine where on the sample an image is being obtained and to understand the relationship between that image and the rest of the sample. Additionally, other screens, such as, for example, an archive screen and a settings screen allow the user to compare saved images and adjust the settings of the system, respectively.

公开(公告)号：US09824854B2

公开(公告)日：2017-11-21

申请号：US15109481

申请日：2014-12-24

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yusuke Ominami ,  Junichi Katane ,  Shinsuke Kawanishi ,  Sukehiro Ito

IPC: G01N23/00 ,  H01J37/28 ,  H01J37/244 ,  H01J37/18 ,  H01J37/22

CPC classification number: H01J37/28 ,  H01J37/18 ,  H01J37/226 ,  H01J37/244 ,  H01J2237/24455 ,  H01J2237/2448 ,  H01J2237/2608

Abstract: Provided is a charged particle beam device capable of observing the interior and the surface of a sample in a simple manner. This charged particle beam device operates in a transmitted charged particle image mode and a secondary charged particle image mode. In the transmitted charged particle image mode, a transmitted charged particle image is produced on the basis of a detection signal (512) associated with light emitted from a light-emitting member (500) that emits light upon being irradiated with transmitted charged particles transmitted through the interior of a sample (6). In the secondary charged particle image mode, a secondary charged particle image is produced on the basis of a detection signal (518) caused by reflected charged particles or secondary charged particles (517) from the sample (6).

公开(公告)号：US20170309442A1

公开(公告)日：2017-10-26

申请号：US15486880

申请日：2017-04-13

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Yosef Basson

IPC: H01J37/20 ,  H01J37/18 ,  H01J37/248 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/09 ,  H01J37/16 ,  H01J37/18 ,  H01J37/226 ,  H01J37/248 ,  H01J37/28 ,  H01J2237/0206 ,  H01J2237/0262 ,  H01J2237/038 ,  H01J2237/049 ,  H01J2237/20292 ,  H01J2237/2813

Abstract: A high voltage inspection system that includes a vacuum chamber; electron optics that is configured to direct an electron beam towards an upper surface of a substrate; a substrate support module that comprises a chuck and a housing; wherein the chuck is configured to support a substrate; wherein the housing is configured to surround the substrate without masking the electron beam, when the substrate is positioned on the chuck during a first operational mode of the high voltage inspection system; and wherein the substrate, the chuck and the housing are configured to (a) receive a high voltage bias signal of a high voltage level that exceeds ten thousand volts, and (b) to maintain at substantially the high voltage level during the first operational mode of the high voltage inspection system.