公开(公告)号：US20070258085A1

公开(公告)日：2007-11-08

申请号：US11417297

申请日：2006-05-02

Applicant: Michael Robbins ,  Paul Forderhase ,  Joel Bailey ,  Kevin Nguyen

Inventor： Michael Robbins ,  Paul Forderhase ,  Joel Bailey ,  Kevin Nguyen

IPC: G01N21/00

CPC classification number: G01N21/9503 ,  G01N21/4738

Abstract: A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. The optic is held at an angle from a surface normal to avoid reflective artifacts from the specular surface of the substrate. The optic can be rotated radially relative to a center point of the substrate edge to allow for focused inspection of all surfaces of the substrate edge. The plurality of lights can modulate color and intensity of light to enhance inspection of the substrate for defects.

Abstract translation: 衬底照明和检查系统提供用于照明和检查衬底，特别是衬底边缘。 该系统使用具有设置在其外部或内部的多个光的光漫射器，用于提供衬底的均匀漫射照明。 光扩散器的光学和成像系统外部用于检查包括镜面的基板的多个表面。 光学元件保持与表面法线成一定角度，以避免来自基板的镜面的反射伪影。 光学元件可以相对于基板边缘的中心点径向旋转，以允许对基板边缘的所有表面进行聚焦检查。 多个光可以调制光的颜色和强度，以增强基板对缺陷的检查。

公开(公告)号：US20070113353A1

公开(公告)日：2007-05-24

申请号：US11608134

申请日：2006-12-07

Applicant: Nicholas Pivonka ,  David Scheuing ,  Michael Robbins ,  Malcolm Deleo

Inventor： Nicholas Pivonka ,  David Scheuing ,  Michael Robbins ,  Malcolm Deleo

IPC: C11D3/00

CPC classification number: C11D11/0058 ,  C11D3/3773 ,  C11D3/3776 ,  C11D3/378 ,  C11D3/3784 ,  C11D11/0035

Abstract: Treated articles with improved water sheeting and soap scum repellency result from forming hydroscopic films on the surfaces of hydrophobic polymeric substrates treated with compositions, kits and methods that employ water-soluble or water-dispersible copolymers having: (i) a first monomer that is capable of forming a cationic charge on protonation; (ii) a second monomer that is acidic and that is capable of forming an anionic charge in the compositions; (iii) optionally, a third monomer having an uncharged hydrophilic group; and (iv) optionally, a fourth monomer that is hydrophobic. Treated articles exhibit a Water Sheeting Index of greater than 6. Treated articles may further exhibit improved soap scum repellency behavior compared to untreated articles.

Abstract translation: 具有改进的水薄片和皂泡斥散性的处理制品是由使用水溶性或水分散性共聚物的组合物，试剂盒和方法处理的疏水性聚合物基材表面上形成吸水膜导致的，所述水溶性或水分散性共聚物具有：（i）能够 在质子化时形成阳离子电荷; （ii）酸性并且能够在组合物中形成阴离子电荷的第二单体; （iii）任选的具有不带电荷的亲水基团的第三单体; 和（iv）任选的是疏水性的第四单体。 经处理的制品表现出大于6的水面指数。与未处理的制品相比，处理的制品可能进一步显示出改进的皂泡排斥性能。

公开(公告)号：US20060007168A1

公开(公告)日：2006-01-12

申请号：US10861100

申请日：2004-06-04

Applicant: Michael Robbins ,  Chester Wyche ,  Victor Avendano ,  Raymond Bond

Inventor： Michael Robbins ,  Chester Wyche ,  Victor Avendano ,  Raymond Bond

IPC: G09G5/00

CPC classification number: G06F1/1601 ,  G06F3/0238 ,  G06F3/04886

Abstract: A control interface is disclosed that includes a display screen, a touch screen disposed on the display screen, a processor and a memory electrically connected to the display and the touch screen, and a bezel disposed over the touch screen. The bezel preferably includes a frame and a button disposed on the frame. The frame is preferably disposed over the touch screen such that at least part of the frame is disposed outside the perimeter of the touch screen. The button includes a touch pad, touch screen contact point and a lateral extension connecting the touch pad and contact point. Preferably, the button is positioned at least partially outside the perimeter of the touch screen such that pressing the button causes the contact point to contact the touch screen.

Abstract translation: 公开了一种控制接口，其包括显示屏，设置在显示屏上的触摸屏，电连接到显示器和触摸屏的处理器和存储器以及设置在触摸屏上的边框。 所述表圈优选地包括设置在所述框架上的框架和按钮。 优选地，框架设置在触摸屏上方，使得框架的至少一部分设置在触摸屏的周边之外。 按钮包括触摸板，触摸屏接触点和连接触摸板和接触点的横向延伸。 优选地，按钮至少部分地定位在触摸屏的周边外部，使得按下按钮使得接触点与触摸屏接触。

公开(公告)号：US08714352B2

公开(公告)日：2014-05-06

申请号：US12964898

申请日：2010-12-10

Applicant: David Farascioni ,  Dino Kasvikis ,  Russell Estrella ,  Michael Robbins ,  Jonathan Sapienza

Inventor： David Farascioni ,  Dino Kasvikis ,  Russell Estrella ,  Michael Robbins ,  Jonathan Sapienza

IPC: B65D85/24

CPC classification number: A61B17/068 ,  A61B17/072 ,  A61B50/30 ,  A61B2017/0688 ,  A61B2017/07221 ,  A61B2017/07235 ,  A61B2017/07271 ,  A61B2050/005 ,  A61B2050/0059

Abstract: A cartridge shipping aid is provided to retain staples within staple pockets of a staple cartridge during shipment. The cartridge shipping aid includes a base and a longitudinal rib extending perpendicularly from an underside of the base and indiscernible into a knife slot formed in a staple cartridge. One or more perpendicular keys are formed along a lower edge of the longitudinally extending rib for engagement with an underside surface of the staple cartridge. The cartridge shipping aid may additionally include sidewalls projecting perpendicularly from outer edges of the base. Projections are formed on one end of the base for engagement with associate detents formed on the staple cartridge. Grasping structure is formed adjacent one end of the base and longitudinal rib.

Abstract translation: 提供盒式运送辅助装置以在装运期间将订书钉保持在订书钉盒的订书针袋中。 盒式运送辅助装置包括基部和从基部的下侧垂直延伸并且不可识别到形成在钉仓中的刀槽的纵向肋。 沿着纵向延伸的肋的下边缘形成一个或多个垂直键，用于与钉仓的下侧表面接合。 墨盒运输辅助装置还可以包括从底座的外边缘垂直地突出的侧壁。 在基座的一端形成突起，用于与形成在钉仓上的相关联的棘爪啮合。 在基部的一端和纵向肋上形成抓握结构。

公开(公告)号：US07988028B2

公开(公告)日：2011-08-02

申请号：US12553174

申请日：2009-09-03

Applicant: David Farascioni ,  Dino Kasvikis ,  Paul A. Scirica ,  Danyel Racenet ,  Michael Robbins

Inventor： David Farascioni ,  Dino Kasvikis ,  Paul A. Scirica ,  Danyel Racenet ,  Michael Robbins

IPC: A61B17/068

CPC classification number: A61B17/068 ,  A61B17/072 ,  A61B17/07207 ,  A61B17/115 ,  A61B18/1442 ,  A61B2017/0023 ,  A61B2017/07214 ,  A61B2017/07221 ,  A61B2017/07235 ,  A61B2017/07242 ,  A61B2017/07278 ,  A61B2017/07285 ,  A61B2017/2945 ,  A61B2018/1432

Abstract: A surgical instrument is disclosed. The surgical instrument includes a handle assembly, a drive assembly, an endoscopic portion, a pair of jaw members, a dynamic clamping member, and a tissue stop. The drive assembly is disposed in mechanical cooperation with a movable handle of the handle assembly. The endoscopic portion defines a first longitudinal axis. The jaw members are each longitudinally curved with respect to the longitudinal axis. The dynamic clamping member is disposed in mechanical cooperation with a distal portion of the drive assembly and includes an upper beam, a lower beam, and a vertical beam having a cutting edge on a distal portion thereof. At least a portion of the dynamic clamping member is longitudinally curved with respect to the longitudinal axis. The tissue stop is disposed adjacent a distal portion of the first jaw member and configured to impede tissue from distally escaping the jaw members.

Abstract translation: 公开了一种外科器械。 手术器械包括手柄组件，驱动组件，内窥镜部分，一对钳口构件，动态夹紧构件和组织止挡件。 驱动组件与手柄组件的可移动手柄机械配合设置。 内窥镜部分限定第一纵向轴线。 钳口构件各自相对于纵向轴线纵向弯曲。 动态夹紧构件与驱动组件的远端部分机械配合设置，并且包括上梁，下梁和在其远端部分上具有切割边缘的垂直梁。 动态夹紧构件的至少一部分相对于纵向轴线纵向弯曲。 所述组织止挡件邻近所述第一钳口构件的远端部分设置，并且构造成阻止组织远离所述钳口构件。

公开(公告)号：US20080011421A1

公开(公告)日：2008-01-17

申请号：US11825669

申请日：2007-07-06

Applicant: Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

Inventor： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

IPC: C23F1/00

CPC classification number: G01C25/00 ,  H01L21/67069 ,  H01L21/681

Abstract: An edge area of the substrate processing device is disclosed. The edge area being processed is isolated from the remainder of the substrate by directing a flow of an inert gas through a plenum near the area to be processed thus forming a barrier while directing a flow of reactive species at an angle relative to the top surface of the substrate towards the substrate edge area thus processing the substrate edge area. A flow of oxygen containing gas into the processing chamber together with a negative exhaust pressure may contribute to the biasing of reactive species and other gases away from the non-processing areas of the substrate. A seal arrangement is provided for the processing chamber.

Abstract translation: 公开了一种基板处理装置的边缘区域。 正在处理的边缘区域与基板的其余部分分离，通过使惰性气体流通过待处理区域附近的增压室，从而形成屏障，同时将反应物流的流动相对于顶部表面成一定角度 基板朝向基板边缘区域，从而处理基板边缘区域。 含氧气体流入处理室和负排气压力可能有助于使反应物质和其他气体偏离基板的非处理区域。 为处理室提供密封装置。

公开(公告)号：US20070062647A1

公开(公告)日：2007-03-22

申请号：US11230263

申请日：2005-09-19

Applicant: Joel Bailey ,  Jonathan Doan ,  Paul Forderhase ,  Johnny Ortiz ,  Michael Robbins

Inventor： Joel Bailey ,  Jonathan Doan ,  Paul Forderhase ,  Johnny Ortiz ,  Michael Robbins

IPC: H01L21/306 ,  C23F1/00

CPC classification number: H01L21/67063 ,  G03F7/168 ,  H01L21/02087 ,  H01L21/6708

Abstract: An isolative substrate edge area processing method and apparatus is described. The apparatus has an isolator for isolating and processing by dry chemical technique a portion of a substrate including a substrate edge region. The isolator has nozzles for directing a flow of reactive species towards the edge area of the substrate and a purge plenum for biasing flow of reactive species towards an exhaust plenum while the substrate rotates on a chuck. Tuned flow control prevents migration of reactive species and reaction byproducts out of the processing area. A method for processing a substrate with the isolator involves directing a flow of reactive species at an angle towards an edge area of the substrate while forming a boundary around the processing area with flow control provided by the purge plenum, and exhaust plenum.

Abstract translation: 描述了隔离衬底边缘区域处理方法和装置。 该装置具有用于通过干化学技术隔离和处理包括衬底边缘区域的衬底的一部分的隔离器。 隔离器具有用于将反应物质流引导到基底的边缘区域的喷嘴和用于在衬底在卡盘上旋转的同时将反应物质的流动偏向排气室的吹扫气室。 调节流量控制可防止反应物质和反应副产物迁离加工区域。 用隔离器处理衬底的方法包括以一定角度朝向衬底的边缘区域引导反应物种的流动，同时通过由净化气室和排气室提供的流动控制在处理区域周围形成边界。

公开(公告)号：US20060007169A1

公开(公告)日：2006-01-12

申请号：US10861225

申请日：2004-06-04

Applicant: Michael Robbins ,  Chester Wyche ,  Victor Avendano ,  Raymond Bond

Inventor： Michael Robbins ,  Chester Wyche ,  Victor Avendano ,  Raymond Bond

IPC: G09G5/00

CPC classification number: G06F3/0224 ,  G06F3/0416 ,  G06F3/04886

Abstract: A control interface is disclosed that includes a display screen, a touch screen disposed on the display screen, a processor and memory electrically connected to the display and the touch screen, and a bezel, which is of a particular type, disposed over the touch screen. The processor may be configured according to any one or more different types of bezels.

Abstract translation: 公开了一种控制接口，其包括显示屏，设置在显示屏上的触摸屏，电连接到显示器和触摸屏的处理器和存储器，以及设置在触摸屏上的特定类型的边框 。 处理器可以根据任何一种或多种不同类型的边框来配置。

公开(公告)号：US20050205518A1

公开(公告)日：2005-09-22

申请号：US11131611

申请日：2005-05-18

Applicant: Michael Robbins

Inventor： Michael Robbins

IPC: H01L21/3065 ,  H01L21/00 ,  H01L21/31 ,  H01L21/311 ,  H01L21/316 ,  B44C1/22

CPC classification number: H01L21/67069 ,  H01J37/32366 ,  H01L21/31116 ,  H01L21/31612 ,  H01L21/6708

Abstract: A method for shaping and/or encapsulating near-edge regions of a substrate wafer is described. A housing provides channels for flowing a reactive gas towards the wafer edge. The reactive gas is directed towards the wafer edge for removing or depositing a thin film on the wafer edge. Gasses are exhausted downstream from the flow of the reactive gas. A second channel in the housing directs a flow of diluent/quenching gas onto the wafer for exhausting of the diluent/quenching gas and the reactive gas away from the wafer. The method may also provide a sequence of process steps, for example, selectively etching of a material on the wafer, etching of second material on the wafer and depositing an encapsulating material layer on the wafer.

Abstract translation: 描述了用于成形和/或封装衬底晶片的近边缘区域的方法。 壳体提供用于使反应性气体流向晶片边缘的通道。 反应气体被引向晶片边缘，用于在晶片边缘上去除或沉积薄膜。 气体从反应气体的流动下游排出。 壳体中的第二通道将稀释剂/淬火气体流引导到晶片上，以将稀释剂/淬火气体和反应气体排出离开晶片。 该方法还可以提供一系列工艺步骤，例如，选择性地蚀刻晶片上的材料，蚀刻晶片上的第二材料并在晶片上沉积封装材料层。

公开(公告)号：US5160576A

公开(公告)日：1992-11-03

申请号：US664826

申请日：1991-03-05

Applicant: Michael Robbins

Inventor： Michael Robbins

IPC: G01B11/06 ,  G01J3/12 ,  G01J3/443 ,  G01N21/67 ,  G02B5/28

CPC classification number: G02B5/289 ,  G01B11/0683 ,  G01N21/67 ,  G01J2003/1213 ,  G01J3/443

Abstract: A method of optically detecting a change in intensity of an emission peak in a plasma process, such as a plasma etching process, by reflecting an emission spectrum of radiation from the plasma reaction off of a pair of rugate filters. The reflected emission spectrum has increased in-band reflections and decreased out-of-band reflections which provides reduced noise and an easier-to-detect emission peak. The method can be used for end-point detection in a plasma etching process such as etching of SiO.sub.2.

Abstract translation: 通过将来自等离子体反应的辐射的发射光谱反射离开一对贪婪滤光器，光电检测等离子体工艺中的发射峰值的变化的方法，例如等离子体蚀刻工艺。 反射的发射光谱具有增加的带内反射和减少的带外反射，其提供降低的噪声和更易于检测的发射峰。 该方法可用于诸如蚀刻SiO 2的等离子体蚀刻工艺中的端点检测。