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公开(公告)号：US11809086B2
公开(公告)日：2023-11-07
申请号：US17502715
申请日：2021-10-15
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/00
CPC classification number: G03F7/70341 , G03F7/70808
Abstract: A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure comprising an aperture formed therein for the passage therethrough of a radiation beam through the immersion fluid, the aperture defining an immersion space to be filled with the immersion fluid, and an inner part and an outer part; wherein the inner part and the outer part are arranged so as to form therebetween a variable space and a connecting space that connects the variable space to the immersion space, wherein the outer part is movable relative to the inner part in a first plane so as to change in shape the variable space but not the connecting space, and wherein the fluid handling structure is configured to contain the immersion fluid in the variable space.
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公开(公告)号：US11774857B2
公开(公告)日：2023-10-03
申请号：US17838946
申请日：2022-06-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Henricus Egidius Catharina Eummelen , Frank Debougnoux , Koen Cuypers , Han Henricus Aldegonda Lempens , Theodorus Wilhelmus Polet , Jorge Alberto Vieyra Salas , John Maria Bombeeck , Johannes Cornelis Paulus Melman , Giovanni Luca Gattobigio
CPC classification number: G03F7/70341 , G03F7/70725
Abstract: An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.
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公开(公告)号：US11720032B2
公开(公告)日：2023-08-08
申请号：US17273758
申请日：2019-08-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Raphael Nico Johan Stegen , Erik Henricus Egidius Catharina Eummelen , Christianus Wilhelmus Johannes Berendsen , Theodorus Wilhelmus Polet , Giovanni Luca Gattobigio
CPC classification number: G03F7/7065 , G01N21/88 , G03F7/70341 , G03F7/70716 , G01N2201/0636 , G01N2201/103
Abstract: A process tool for processing production substrates, the process tool including: a movable stage configured to perform long-stroke movements in an X-Y plane; an imaging device mounted to a fixed part of the tool and having an optical axis substantially parallel to the X-Y plane; and a mirror mounted on the movable stage and oriented at a predetermined angle of inclination to the X-Y plane so that by moving the movable stage to a predetermined position a part of a component to be inspected can be imaged by the imaging device.
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Patent Agency Ranking
公开(公告)号：US20220137519A1
公开(公告)日：2022-05-05
申请号：US17580696
申请日：2022-01-21
Applicant: ASML Netherlands B.V.
Inventor： Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Johannes Cornelis Paulus Melman , Han Henricus Aldegonda Lempens , Miao Yu , Cornelius Maria Rops , Ruud Olieslagers , Artunç Ulucan , Theodorus Wilhelmus Polet , Patrick Johannes Wilhelmus Spruytenburg
IPC: G03F7/20 , H01L21/027
Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.
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公开(公告)号：US10416571B2
公开(公告)日：2019-09-17
申请号：US16063583
申请日：2016-12-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Johannes Cornelis Paulus Melman , Han Henricus Aldegonda Lempens , Miao Yu , Cornelius Maria Rops , Ruud Olieslagers , Artunç Ulucan , Theodorus Wilhelmus Polet , Patrick Johannes Wilhelmus Spruytenburg
IPC: G03F7/20 , H01L21/027
Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.
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26.发明授权公开(公告)号：US10317804B2
公开(公告)日：2019-06-11
申请号：US15781813
申请日：2016-11-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Daan Daniel Johannes Antonius Van Sommeren , Coen Hubertus Matheus Baltis , Harold Sebastiaan Buddenberg , Giovanni Luca Gattobigio , Johannes Cornelis Paulus Melman , Günes Nakiboglu , Theodorus Wilhelmus Polet , Walter Theodorus Matheus Stals , Yuri Johannes Gabriël Van De Vijver , Josephus Peter Van Lieshout , Jorge Alberto Vieyra Salas , Aleksandar Nikolov Zdravkov
IPC: G03F7/20
Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.
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公开(公告)号：US10222707B2
公开(公告)日：2019-03-05
申请号：US15054010
申请日：2016-02-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Wilhelmus Polet , Henrikus Herman Marie Cox , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Jimmy Matheus Wilhelmus Van De Winkel , Gregory Martin Mason Corcoran , Frank Johannes Jacobus Van Boxtel
IPC: G03F7/20
Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.
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公开(公告)号：US09915877B2
公开(公告)日：2018-03-13
申请号：US15629399
申请日：2017-06-21
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Wilhelmus Franciscus Johannes Simons , Martijn Houben , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Han Henricus Aldegonda Lempens , Rogier Hendrikus Magdalena Cortie , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Siegfried Alexander Tromp , Theodorus Wilhelmus Polet , Jim Vincent Overkamp , Van Vuong Vy
CPC classification number: G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
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