公开(公告)号：US20190146352A1

公开(公告)日：2019-05-16

申请号：US16249518

申请日：2019-01-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan Saeed ,  Petrus Martinus Gerardus Johannes Arts ,  Harold Sebastiaan Buddenberg ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Floor Lodewijk Keukens ,  Ferdy Migchelbrink ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Arnoldus Johannes Martinus Jozeph Ras ,  Gheorghe Tanasa ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Daan Daniel Johannes Antonius Van Sommeren ,  Marijn Wouters ,  Miao Yu

IPC: G03F7/20 ,  H01L21/66 ,  G01N21/95

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

公开(公告)号：US09213246B2

公开(公告)日：2015-12-15

申请号：US14179276

申请日：2014-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf Kemper ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

IPC: G03F7/20 ,  F01N1/02

CPC classification number: G03F7/70341 ,  F01N1/023 ,  G03F7/709

Abstract: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

Abstract translation: 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。

公开(公告)号：US11016401B2

公开(公告)日：2021-05-25

申请号：US16610103

申请日：2018-05-01

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Matthew Lipson ,  Christopher John Mason ,  Damoon Sohrabibabaheidary ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Bert Dirk Scholten

IPC: G03F7/20

Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.

公开(公告)号：US10222707B2

公开(公告)日：2019-03-05

申请号：US15054010

申请日：2016-02-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Wilhelmus Polet ,  Henrikus Herman Marie Cox ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran ,  Frank Johannes Jacobus Van Boxtel

IPC: G03F7/20

Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.

公开(公告)号：US10175585B2

公开(公告)日：2019-01-08

申请号：US14473643

申请日：2014-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Robert Douglas Watso ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Peter Paul Steijaert ,  Antonius Martinus Cornelis Petrus De Jong ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Joao Paulo Da Paz Sena ,  Maurice Martinus Johannes Van Der Lee ,  Henricus Martinus Dorotheus Van Lier ,  Gheorghe Tanasa

IPC: G06F7/20 ,  G03F7/20

Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.

公开(公告)号：US11269259B2

公开(公告)日：2022-03-08

申请号：US16952371

申请日：2020-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas Poiesz ,  Bert Dirk Scholten ,  Dirk Willem Harberts ,  Lucas Henricus Johannes Stevens ,  Laura Maria Fernandez Diaz ,  Johannes Adrianus Cornelis Maria Pijnenburg ,  Abraham Alexander Soethoudt ,  Wilhelmus Jacobus Johannes Welters ,  Jimmy Matheus Wilhelmus Van De Winkel

IPC: G03F7/20

Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

公开(公告)号：US10216100B2

公开(公告)日：2019-02-26

申请号：US15738701

申请日：2016-06-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan Saeed ,  Petrus Martinus Gerardus Johannes Arts ,  Harold Sebastiaan Buddenberg ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Floor Lodewijk Keukens ,  Ferdy Migchelbrink ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Arnoldus Johannes Martinus Jozeph Ras ,  Gheorghe Tanasa ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Daan Daniel Johannes Antonius Van Sommeren ,  Marijn Wouters ,  Miao Yu

IPC: G01N21/00 ,  G03F7/20 ,  H01L21/66 ,  G01N21/95 ,  H01L27/146 ,  H01L27/148

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.

公开(公告)号：US20150055102A1

公开(公告)日：2015-02-26

申请号：US14473643

申请日：2014-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Robert Douglas WATSO ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Peter Paul Steijaert ,  Antonius Martinus Cornelis Petrus De Jong ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Joao Paulo Da Paz Sena ,  Maurice Martinus Johannes Van Der Lee ,  Henricus Martinus Dorotheus Van Lier ,  Gheorghe Tanasa

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.

公开(公告)号：US20210072649A1

公开(公告)日：2021-03-11

申请号：US16952371

申请日：2020-11-19

Applicant: ASML Netherlands B.V.

Inventor： Thomas Poiesz ,  Bert Dirk Scholten ,  Dirk Willem Harberts ,  Lucas Henricus Johannes Stevens ,  Laura Maria Fernandez Diaz ,  Johannes Adrianus Cornelis M Pijnenburg ,  Abraham Alexander Soethoudt ,  Wilhelmus Jacobus Johannes Welters ,  Jimmy Matheus Wilhelmus Van De Winkel

IPC: G03F7/20

Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

公开(公告)号：US10725390B2

公开(公告)日：2020-07-28

申请号：US16249518

申请日：2019-01-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan Saeed ,  Petrus Martinus Gerardus Johannes Arts ,  Harold Sebastiaan Buddenberg ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Floor Lodewijk Keukens ,  Ferdy Migchelbrink ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Arnoldus Johannes Martinus Jozeph Ras ,  Gheorghe Tanasa ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Daan Daniel Johannes Antonius Van Sommeren ,  Marijn Wouters ,  Miao Yu

IPC: G03F7/20 ,  H01L21/66 ,  G01N21/95 ,  H01L27/146 ,  H01L27/148

Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.