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21.发明授权公开(公告)号：US10555412B2
公开(公告)日：2020-02-04
申请号：US15976728
申请日：2018-05-10
Applicant: Applied Materials, Inc.
Inventor： Leonid Dorf , Olivier Luere , Rajinder Dhindsa , James Rogers , Sunil Srinivasan , Anurag Kumar Mishra
Abstract: Embodiments of this disclosure describe an electrode biasing scheme that enables maintaining a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate that consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.
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