公开(公告)号：US20220093725A1

公开(公告)日：2022-03-24

申请号：US17025209

申请日：2020-09-18

Applicant: Intel Corporation

Inventor： Adel A. Elsherbini ,  Mohammad Enamul Kabir ,  Zhiguo Qian ,  Gerald S. Pasdast ,  Kimin Jun ,  Shawna M. Liff ,  Johanna M. Swan ,  Aleksandar Aleksov ,  Feras Eid

IPC: H01L49/02 ,  H01L23/49 ,  H01L23/492

Abstract: Disclosed herein are capacitors and resistors at direct bonding interfaces in microelectronic assemblies, as well as related structures and techniques. For example, in some embodiments, a microelectronic assembly may include a first microelectronic component and a second microelectronic component, wherein a direct bonding interface of the second microelectronic component is direct bonded to a direct bonding interface of the first microelectronic component, the microelectronic assembly includes a sensor, the sensor includes a first sensor plate and a second sensor plate, the first sensor plate is at the direct bonding interface of the first microelectronic component, and the second sensor plate is at the direct bonding interface of the second microelectronic component.

公开(公告)号：US20220093492A1

公开(公告)日：2022-03-24

申请号：US17025771

申请日：2020-09-18

Applicant: Intel Corporation

Inventor： Adel A. Elsherbini ,  Krishna Bharath ,  Han Wui Then ,  Kimin Jun ,  Aleksandar Aleksov ,  Mohammad Enamul Kabir ,  Shawna M. Liff ,  Johanna M. Swan ,  Feras Eid

IPC: H01L23/49 ,  H05K1/11 ,  H01L23/538 ,  H01L23/532

Abstract: Disclosed herein are microelectronic assemblies including direct bonding, as well as related structures and techniques. For example, in some embodiments, a microelectronic assembly may include a first microelectronic component and a second microelectronic component coupled to the first microelectronic component by a direct bonding region, wherein the direct bonding region includes a first subregion and a second subregion, and the first subregion has a greater metal density than the second subregion. In some embodiments, a microelectronic assembly may include a first microelectronic component and a second microelectronic component coupled to the first microelectronic component by a direct bonding region, wherein the direct bonding region includes a first metal contact and a second metal contact, the first metal contact has a larger area than the second metal contact, and the first metal contact is electrically coupled to a power/ground plane of the first microelectronic component.

公开(公告)号：US12266682B2

公开(公告)日：2025-04-01

申请号：US17025209

申请日：2020-09-18

Applicant: Intel Corporation

Inventor： Adel A. Elsherbini ,  Mohammad Enamul Kabir ,  Zhiguo Qian ,  Gerald S. Pasdast ,  Kimin Jun ,  Shawna M. Liff ,  Johanna M. Swan ,  Aleksandar Aleksov ,  Feras Eid

IPC: H01L23/49 ,  H01L23/492 ,  H01L49/02

Abstract: Disclosed herein are capacitors and resistors at direct bonding interfaces in microelectronic assemblies, as well as related structures and techniques. For example, in some embodiments, a microelectronic assembly may include a first microelectronic component and a second microelectronic component, wherein a direct bonding interface of the second microelectronic component is direct bonded to a direct bonding interface of the first microelectronic component, the microelectronic assembly includes a sensor, the sensor includes a first sensor plate and a second sensor plate, the first sensor plate is at the direct bonding interface of the first microelectronic component, and the second sensor plate is at the direct bonding interface of the second microelectronic component.

公开(公告)号：US20250079392A1

公开(公告)日：2025-03-06

申请号：US18458621

申请日：2023-08-30

Applicant: Intel Corporation

Inventor： Omkar G. Karhade ,  Nitin A. Deshpande ,  Mohammad Enamul Kabir ,  Debendra Mallik

IPC: H01L23/00 ,  H01L25/065

Abstract: Hybrid bonding interconnect (HBI) architectures for scalability. Embodiments implement a bonding layer on a semiconductor die that includes a thick oxide layer overlaid with a thin layer of a hermetic material including silicon and at least one of carbon and nitrogen. The conductive bonds of the semiconductor die are placed in the thick oxide layer and exposed at the surface of the hermetic material. Some embodiments implement a non-bonding moisture seal ring (MSR) structure.

公开(公告)号：US12165962B2

公开(公告)日：2024-12-10

申请号：US17121093

申请日：2020-12-14

Applicant: Intel Corporation

Inventor： Aleksandar Aleksov ,  Mohammad Enamul Kabir ,  Adel A. Elsherbini ,  Shawna M. Liff ,  Johanna M. Swan ,  Feras Eid

IPC: H01L23/00 ,  H01L23/498 ,  H01L23/538 ,  H01L23/31 ,  H01L23/48

Abstract: Disclosed herein are microelectronic assemblies including microelectronic components coupled by direct bonding, and related structures and techniques. In some embodiments, a microelectronic assembly may include a first microelectronic component including a first guard ring extending through at least a portion of a thickness of and along a perimeter; a second microelectronic component including a second guard ring extending through at least a portion of a thickness of and along a perimeter, where the first and second microelectronic components are coupled by direct bonding; and a seal ring formed by coupling the first guard ring to the second guard ring. In some embodiments, a microelectronic assembly may include a microelectronic component coupled to an interposer that includes a first liner material at a first surface; a second liner material at an opposing second surface; and a perimeter wall through the interposer and connected to the first and second liner materials.

公开(公告)号：US20240355768A1

公开(公告)日：2024-10-24

申请号：US18761443

申请日：2024-07-02

Applicant: Intel Corporation

Inventor： Adel A. Elsherbini ,  Krishna Bharath ,  Kevin P. O'Brien ,  Kimin Jun ,  Han Wui Then ,  Mohammad Enamul Kabir ,  Gerald S. Pasdast ,  Feras Eid ,  Aleksandar Aleksov ,  Johanna M. Swan ,  Shawna M. Liff

IPC: H01L23/00 ,  H01L25/065

CPC classification number: H01L24/08 ,  H01L24/05 ,  H01L24/29 ,  H01L24/32 ,  H01L25/0657 ,  H01L28/10 ,  H01L2224/05147 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/0801 ,  H01L2224/08145 ,  H01L2224/0903 ,  H01L2224/09055 ,  H01L2224/09505 ,  H01L2224/29186 ,  H01L2224/32145

Abstract: Disclosed herein are microelectronic assemblies including microelectronic components that are coupled together by direct bonding, as well as related structures and techniques. For example, in some embodiments, a microelectronic assembly may include a first microelectronic component and a second microelectronic component coupled to the first microelectronic component by a direct bonding region, wherein the direct bonding region includes at least part of an inductor.

公开(公告)号：US20240063147A1

公开(公告)日：2024-02-22

申请号：US17891704

申请日：2022-08-19

Applicant: Intel Corporation

Inventor： Adel Elsherbini ,  Mohammad Enamul Kabir ,  Johanna Swan ,  Omkar Karhade ,  Kimin Jun ,  Feras Eid ,  Shawna Liff ,  Xavier Brun ,  Bhaskar Jyoti Krishnatreya ,  Tushar Talukdar ,  Haris Khan Niazi

IPC: H01L23/00 ,  H01L25/065 ,  H01L21/56 ,  H01L23/31 ,  H01L23/29

CPC classification number: H01L23/564 ,  H01L24/08 ,  H01L24/24 ,  H01L25/0652 ,  H01L24/19 ,  H01L21/56 ,  H01L23/3107 ,  H01L23/291 ,  H01L2224/08145 ,  H01L24/16 ,  H01L2224/16227 ,  H01L2224/16238 ,  H01L2924/37001 ,  H01L2224/24145 ,  H01L24/73 ,  H01L2224/73259 ,  H01L2224/24225 ,  H01L2224/73209 ,  H01L2224/2499

Abstract: Techniques and mechanisms to mitigate corrosion to via structures of a composite chiplet. In an embodiment, a composite chiplet comprises multiple integrated circuit (IC) components which are each in a different respective one of multiple levels. One or more conductive vias extend through an insulator layer in a first level of the multiple levels. An annular structure of the composite chiplet extends vertically through the insulator layer, and surrounds the one or more conductive vias in the insulator layer. The annular structure mitigates an exposure of the one or more conductive vias to moisture which is in a region of the insulator layer that is not surrounded by the annular structure. In another embodiment, the annular structure further surrounds an IC component which extends in the insulator layer.

公开(公告)号：US20240063076A1

公开(公告)日：2024-02-22

申请号：US17891727

申请日：2022-08-19

Applicant: Intel Corporation

Inventor： Mohammad Enamul Kabir ,  Bhaskar Jyoti Krishnatreya ,  Kimin Jun ,  Adel Elsherbini ,  Tushar Talukdar ,  Feras Eid ,  Debendra Mallik ,  Krishna Vasanth Valavala ,  Xavier Brun

IPC: H01L23/367 ,  H01L23/00 ,  H01L23/373 ,  H01L23/48 ,  H01L25/065

CPC classification number: H01L23/367 ,  H01L24/08 ,  H01L23/3736 ,  H01L23/373 ,  H01L23/3732 ,  H01L23/481 ,  H01L24/32 ,  H01L24/29 ,  H01L25/0657 ,  H01L2224/08145 ,  H01L2224/32225 ,  H01L2224/29147 ,  H01L2224/29124 ,  H01L2224/29139 ,  H01L2224/29144 ,  H01L2224/29193 ,  H01L2224/29186

Abstract: Microelectronic devices, assemblies, and systems include a multichip composite device having one or more integrated circuit dies bonded to a base die, a conformal thermal heat spreading layer on the top and sidewalls of the integrated circuit dies, and an inorganic dielectric material on a portion of the conformal thermal heat spreading layer, laterally adjacent the integrated circuit dies, and over the base die. The conformal thermal heat spreading layer includes a high thermal conductivity material to provide a thermal pathway for the integrated circuit dies during operation.

公开(公告)号：US20230197637A1

公开(公告)日：2023-06-22

申请号：US17554471

申请日：2021-12-17

Applicant: Intel Corporation

Inventor： Debendra Mallik ,  Mohammad Enamul Kabir ,  Nitin Deshpande ,  Omkar Karhade ,  Arnab Sarkar ,  Sairam Agraharam ,  Christopher Pelto ,  Gwang-Soo Kim ,  Ravindranath Mahajan

IPC: H01L23/00 ,  H01L25/065

CPC classification number: H01L23/564 ,  H01L25/0655 ,  H01L21/447

Abstract: Stacked die assemblies having a moisture sealant layer according to embodiments are described herein. A microelectronic package structure having a first die with a second and an adjacent third die on the first die. Each of the second and third die comprise hybrid bonding interfaces with the first die. A first layer is on a region of the first die adjacent sidewalls of the second and the third dies, and adjacent an edge portion of the first die. The first layer comprises a diffusion barrier material A second layer is over the first layer, the second layer, wherein a top surface of the second layer is substantially coplanar with the top surfaces of the second and third dies. The first layer provides a hermetic moisture sealant layer for stacked die package structures.

公开(公告)号：US20220189861A1

公开(公告)日：2022-06-16

申请号：US17121093

申请日：2020-12-14

Applicant: Intel Corporation

Inventor： Aleksandar Aleksov ,  Mohammad Enamul Kabir ,  Adel A. Elsherbini ,  Shawna M. Liff ,  Johanna M. Swan ,  Feras Eid

IPC: H01L23/498 ,  H01L23/00 ,  H01L23/538

Abstract: Disclosed herein are microelectronic assemblies including microelectronic components coupled by direct bonding, and related structures and techniques. In some embodiments, a microelectronic assembly may include a first microelectronic component including a first guard ring extending through at least a portion of a thickness of and along a perimeter; a second microelectronic component including a second guard ring extending through at least a portion of a thickness of and along a perimeter, where the first and second microelectronic components are coupled by direct bonding; and a seal ring formed by coupling the first guard ring to the second guard ring. In some embodiments, a microelectronic assembly may include a microelectronic component coupled to an interposer that includes a first liner material at a first surface; a second liner material at an opposing second surface; and a perimeter wall through the interposer and connected to the first and second liner materials.