GATE PATTERNING FOR QUANTUM DOT DEVICES
    28.
    发明申请

    公开(公告)号:US20190148530A1

    公开(公告)日:2019-05-16

    申请号:US16097725

    申请日:2016-06-10

    Abstract: Disclosed herein are quantum dot devices with patterned gates, as well as related computing devices and methods. For example, a quantum dot device may include gates disposed on a quantum well stack. In some embodiments, the gates may include a first gate with a first length; two second gates with second lengths arranged such that the first gate is disposed between the second gates; and two third gates with third lengths arranged such that the second gates are disposed between the third gates; and the first, second, and third lengths may all be different. In some embodiments, the gates may include a first set of gates alternatingly arranged with a second set of gates, spacers may be disposed between gates of the first set and gates of the second set, and gates in the first or second set may include a gate dielectric having a U-shaped cross-section.

    SUPERCONDUCTOR-SILICON INTERFACE CONTROL
    29.
    发明申请

    公开(公告)号:US20190131511A1

    公开(公告)日:2019-05-02

    申请号:US16096235

    申请日:2016-06-30

    Abstract: Described herein are methods that allow reducing or eliminating formation of silicon nitride layers at superconductor-silicon interfaces, as well as quantum circuit devices fabricated using such methods. The methods include applying various surface modification techniques to silicon in order to form a controlled interfacial layer at the interface of silicon and superconductor, which interfacial layer prevents or at least minimizes formation of silicon nitride at said interface. Reducing or eliminating silicon nitride layers at superconductor-silicon interfaces in quantum circuits may help minimizing the negative effects of spurious TLS's, thereby improving on the decoherence problem of qubits.

Patent Agency Ranking