公开(公告)号：US6080991A

公开(公告)日：2000-06-27

申请号：US135495

申请日：1998-08-17

Applicant: Ching-Long Tsai

Inventor： Ching-Long Tsai

IPC: G01Q30/20 ,  G01N1/28 ,  H01J37/26

CPC classification number: G01N1/286 ,  H01J2237/26 ,  H01J2237/282 ,  H01J2237/3114

Abstract: A focused ion beam (FIB) is used to mill a test slice to form an observable wall for a transmission electron microscope (TEM). A slanting angle .theta. of the observable wall surface is automatically formed. The method for milling the test slice includes the following steps: The first step is to measure the slanting angle .theta.. The next step is to tilt the test slice with the slanting angle .theta. in both a counterclockwise direction and a clockwise direction and to perform FIB milling so that the TEM observable wall has a uniform thickness. Furthermore, during the FIB milling, an aperture in the TEM observable wall serves as a milling stop signal.

Abstract translation: 聚焦离子束（FIB）用于研磨测试切片以形成透射电子显微镜（TEM）的可观察壁。 自动形成可观察壁表面的倾斜角度θ。 铣削测试切片的方法包括以下步骤：第一步是测量倾斜角度θ。 下一步是在逆时针方向和顺时针方向上以倾斜角度θ倾斜测试切片，并执行FIB铣削，以使TEM可观察的壁具有均匀的厚度。 此外，在FIB铣削期间，TEM可观测壁中的孔用作铣削停止信号。

公开(公告)号：US08581190B2

公开(公告)日：2013-11-12

申请号：US13058540

申请日：2009-08-05

Applicant: Tomonori Nakano ,  Takeshi Kawasaki ,  Kotoko Hirose ,  Hiroyuki Ito

Inventor： Tomonori Nakano ,  Takeshi Kawasaki ,  Kotoko Hirose ,  Hiroyuki Ito

IPC: G01N23/225

CPC classification number: H01J37/153 ,  H01J37/21 ,  H01J37/26 ,  H01J2237/282

Abstract: Disclosed is a scanning charged particle microscope provided with an aberration measuring means that measures high-order geometrical aberration at high precision and high speed. An image obtained by a single-hole aperture and an image obtained by a multiple-hole aperture arranged in a region larger than that for the single-hole aperture are deconvoluted, an aberration quantity is determined based on the profiles of beams tilted in a plurality of directions and the obtained quantity is fed back to an aberration corrector.

Abstract translation: 公开了一种带有像差测量装置的扫描带电粒子显微镜，其以高精度和高速测量高阶几何像差。 通过单孔孔径获得的图像和通过布置在大于单孔孔径的区域中的多孔孔径获得的图像被去卷积，基于多个倾斜的光束的轮廓来确定像差量 的方向和所获得的量被反馈到像差校正器。

公开(公告)号：US08158310B2

公开(公告)日：2012-04-17

申请号：US12279964

申请日：2007-12-27

Applicant: Hiroyuki Miyata ,  Takeshi Miyazaki ,  Kazuhiko Kobayashi ,  Kunito Hayashi

Inventor： Hiroyuki Miyata ,  Takeshi Miyazaki ,  Kazuhiko Kobayashi ,  Kunito Hayashi

IPC: G03C5/00

CPC classification number: H01J37/153 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/282 ,  Y10T428/24479

Abstract: A method of evaluating astigmatism of an irradiation system irradiating an electron beam is disclosed. In this method, a figure pattern consisting of plural (for example, four) concentric circles is formed on a reference sample “WP” and an image (scanned image) is formed based on an electron signal obtained by scanning the electron beam onto the reference sample “WP”. In the scanned image, the image has a blur in a region with its longitudinal direction parallel to the generating direction of the astigmatism and the size of the blur depends on magnitude of the astigmatism. Therefore, the direction and the magnitude of the astigmatism of the irradiation system of an irradiation apparatus can be detected based on the obtained scanned image.

Abstract translation: 公开了一种评估照射电子束的照射系统的像散的方法。 在该方法中，在参考样品“WP”上形成由多个（例如四个）同心圆组成的图形图形，并且基于通过将电子束扫描到参考上而获得的电子信号形成图像（扫描图像） 样品“WP”。 在扫描图像中，图像在其纵向方向平行于像散的产生方向的区域中具有模糊，并且模糊的大小取决于像散的大小。 因此，可以基于获得的扫描图像来检测照射装置的照射系统的散光的方向和大小。

公开(公告)号：US20110168911A1

公开(公告)日：2011-07-14

申请号：US12241727

申请日：2008-09-30

Applicant: Shinsuke NISHIMURA

Inventor： Shinsuke NISHIMURA

IPC: H01J3/14

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/282

Abstract: A method for measuring a demagnification of a charged particle beam exposure apparatus includes measuring a first stage position of a mask stage in accordance with a mask stage coordinate system, irradiating a first charged particle beam to a first irradiation position on a specimen through the opening portion of the mask, measuring the first irradiation position in accordance with a specimen stage coordinate system, moving the mask stage to a second stage position, measuring the second stage position of the mask stage, irradiating a second charged particle beam to a second irradiation position on the specimen through the opening portion of the mask measuring the second irradiation position in accordance with the specimen stage coordinate system, and calculating a demagnification of the charged particle beam exposure apparatus from the first and second stage positions and the first and second irradiation positions.

Abstract translation: 用于测量带电粒子束曝光装置的缩小的方法包括根据掩模台坐标系测量掩模台的第一级位置，通过开口部分将第一带电粒子束照射到样品上的第一照射位置 ，根据试样台坐标系测量第一照射位置，将掩模台移动到第二台位置，测量掩模台的第二台位置，将第二带电粒子束照射到第二照射位置上 所述试样通过所述掩模的开口部，根据所述试样台坐标系测量所述第二照射位置，并计算所述带电粒子束曝光装置从所述第一和第二台位置以及所述第一和第二照射位置的缩小。

公开(公告)号：US07649172B2

公开(公告)日：2010-01-19

申请号：US11798770

申请日：2007-05-16

Applicant: Masaru Ozawa ,  Hiromi Inada ,  Daisuke Terauchi ,  Hiroyuki Tanaka

Inventor： Masaru Ozawa ,  Hiromi Inada ,  Daisuke Terauchi ,  Hiroyuki Tanaka

IPC: H01J37/26 ,  G01N13/12

CPC classification number: H01J37/28 ,  G06T5/006 ,  G06T2207/10056 ,  G06T2207/20008 ,  G06T2207/20056 ,  H01J37/22 ,  H01J37/265 ,  H01J2237/223 ,  H01J2237/282

Abstract: Charged particle beam equipment enables the simultaneous measurement and correction of magnification errors in both X and Y directions in one measurement without requiring the elimination of displacement, if any, in rotation direction between the direction of a periodic structure pattern of a sample having a known periodic structure and the X or Y direction on an electron image of the sample. The charged particle beam equipment of the invention enables the simultaneous measurement of magnification errors in the X and Y directions by FFT transformation and coordinate transformation of an electron image, even when there is a displacement in rotation direction between the direction of the periodic structural pattern and the X or Y direction on the electron image of the sample.

Abstract translation: 带电粒子束设备能够在一次测量中同时测量和校正X和Y方向上的倍率误差，而不需要消除具有已知周期性的样品的周期性结构图案的方向之间的旋转方向上的位移（如果有的话） 结构和样品的电子图像上的X或Y方向。 本发明的带电粒子束设备能够通过FFT转换和电子图像的坐标变换来同时测量X和Y方向的倍率误差，即使在周期性结构图案的方向和 样品的电子图像上的X或Y方向。

公开(公告)号：US07521695B2

公开(公告)日：2009-04-21

申请号：US11783732

申请日：2007-04-11

Applicant: Yoshinori Nakada ,  Shunsuke Koshihara ,  Ryulchirou Tamochi ,  Yayol Hosoya ,  Hidetoshi Morokuma

Inventor： Yoshinori Nakada ,  Shunsuke Koshihara ,  Ryulchirou Tamochi ,  Yayol Hosoya ,  Hidetoshi Morokuma

IPC: H01J37/26

CPC classification number: H01J37/28 ,  H01J37/265 ,  H01J2237/221 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/282 ,  H01J2237/2826

Abstract: In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of automatically determining a searching magnification for automatic object detection from the obtained information after correction of coordinates, and a function of calculating the frequency of occurrence of objects or defects and a time required for measurement from the searching magnification and conditions of measurement.

Abstract translation: 为了提供一种全自动扫描电子显微镜，其从精细调整到全面自动执行调查工作，本发明的扫描电子显微镜具有在校正坐标之后计算校正精度的功能，并且用 向量39，根据坐标校正后的获取信息自动确定自动对象检测的搜索倍率的功能，以及根据搜索倍率和条件来计算物体或缺陷的发生频率以及测量所需的时间的功能 测量。

公开(公告)号：US07518121B2

公开(公告)日：2009-04-14

申请号：US11512806

申请日：2006-08-30

Applicant: Diederik Jan Maas ,  Sjoerd Antonius Maria Mentink ,  Jeroen Jan Lambertus Horikx ,  Bert Henning Freitag

Inventor： Diederik Jan Maas ,  Sjoerd Antonius Maria Mentink ,  Jeroen Jan Lambertus Horikx ,  Bert Henning Freitag

IPC: G21K1/08

CPC classification number: H01J37/28 ,  H01J37/153 ,  H01J2237/282

Abstract: The invention relates to a method for determining lens errors in a Scanning Electron Microscope, more specifically to a sample that enables such lens errors to be determined. The invention describes, for example, the use of cubic MgO crystals which are relatively easy to produce as so-called ‘self-assembling’ crystals on a silicon wafer. Such crystals have almost ideal angles and edges. Even in the presence of lens errors this may give a clear impression of the situation if no lens errors are present. This enables a good reconstruction to be made of the cross-section of the beam in different under- and over-focus planes. The lens errors can then be determined on the basis of this reconstruction, whereupon they can be corrected by means of a corrector.

Abstract translation: 本发明涉及一种用于确定扫描电子显微镜中的透镜误差的方法，更具体地涉及能够确定这种透镜误差的样本。 本发明描述了例如使用在硅晶片上相对容易产生的所谓“自组装”晶体的立方MgO晶体。 这种晶体具有几乎理想的角度和边缘。 即使存在镜头错误，如果没有镜头错误，这可能给出一个清晰的情况。 这使得能够在不同的底部和过度聚焦平面上对梁的横截面进行良好的重建。 然后可以基于该重建来确定透镜误差，由此可以通过校正器校正透镜误差。

公开(公告)号：US20080283750A1

公开(公告)日：2008-11-20

申请号：US12119916

申请日：2008-05-13

Applicant: Eiko NAKAZAWA ,  Hiroyuki Kobayashi

Inventor： Eiko NAKAZAWA ,  Hiroyuki Kobayashi

IPC: G01N23/04

CPC classification number: H01J37/265 ,  H01J2237/245 ,  H01J2237/282

Abstract: There is provided a transmission electron microscope capable of a capturing continuous field-of-view image without having an influence of aberration. In order to obtain an electron beam image of the whole of a predetermined range of a sample, the transmission electron microscope specifies a region with little aberration in a field of view of an image pickup device, moves a sample stage in units of the specified regions, captures the whole of the predetermined range as a plurality of continuous field-of-view images.

Abstract translation: 提供了能够捕获连续视野图像而不会产生像差影响的透射电子显微镜。 为了获得样品的整个预定范围的电子束图像，透射电子显微镜在图像拾取装置的视野中指定几乎没有像差的区域，以指定区域为单位移动样品台 捕获整个预定范围作为多个连续的视野图像。

公开(公告)号：US20070114407A1

公开(公告)日：2007-05-24

申请号：US11584950

申请日：2006-10-23

Applicant: Frederick Schamber ,  Cornelis van Beek

Inventor： Frederick Schamber ,  Cornelis van Beek

IPC: G21K7/00

CPC classification number: G01N15/1012 ,  G01N2015/1018 ,  G01N2015/1087 ,  G01N2015/1493 ,  H01J37/28 ,  H01J2237/282

Abstract: A system is presented for evaluating the performance of a particle detecting and measuring instrument wherein the instrument receives a specimen and detects the number of particles on the specimen and measures the descriptive parameters of the particles. The system includes a known specimen received by the instrument and wherein the known specimen has known particles on the specimen, with known parameters of each known particle on the specimen. The instrument detects the known particles and measures the parameters thereof. A matching of individual measured particles is made against individual known particles by means of selected known parameters thereof. A comparison is made of the parameters of each measured particle against the parameters of each known particle to which the measured particle was matched and an indication is provided of the instrument's performance as a function of the matching and the comparison.

Abstract translation: 提出了一种用于评估颗粒检测和测量仪器的性能的系统，其中仪器接收样品并检测样品上的颗粒数量并测量颗粒的描述参数。 该系统包括由仪器接收的已知样品，其中已知样品在样品上具有已知的颗粒，并且具有样品上每个已知颗粒的已知参数。 仪器检测已知颗粒并测量其参数。 通过其选择的已知参数对各个已知的颗粒进行单个测量的颗粒的匹配。 比较每个测量粒子的参数与测量粒子匹配的每个已知粒子的参数，并且根据匹配和比较的函数提供仪器性能的指示。

公开(公告)号：US20070045558A1

公开(公告)日：2007-03-01

申请号：US11512806

申请日：2006-08-30

Applicant: Diederik Maas ,  Sjoerd Antonius Mentink ,  Jeroen Jan Horikx ,  Bert Freitag

Inventor： Diederik Maas ,  Sjoerd Antonius Mentink ,  Jeroen Jan Horikx ,  Bert Freitag

IPC: H01J3/14

CPC classification number: H01J37/28 ,  H01J37/153 ,  H01J2237/282

Abstract: The invention relates to a method for determining lens errors in a Scanning Electron Microscope, more specifically to a sample that enables such lens errors to be determined. The invention describes, for example, the use of cubic MgO crystals which are relatively easy to produce as so-called ‘self-assembling’ crystals on a silicon wafer. Such crystals have almost ideal angles and edges. Even in the presence of lens errors this may give a clear impression of the situation if no lens errors are present. This enables a good reconstruction to be made of the cross-section of the beam in different under- and over-focus planes. The lens errors can then be determined on the basis of this reconstruction, whereupon they can be corrected by means of a corrector.

Abstract translation: 本发明涉及一种用于确定扫描电子显微镜中的透镜误差的方法，更具体地涉及能够确定这种透镜误差的样本。 本发明描述了例如使用在硅晶片上相对容易产生的所谓“自组装”晶体的立方MgO晶体。 这种晶体具有几乎理想的角度和边缘。 即使存在镜头错误，如果没有镜头错误，这可能给出一个清晰的情况。 这使得能够在不同的底部和过度聚焦平面上对梁的横截面进行良好的重建。 然后可以基于该重建来确定透镜误差，由此可以通过校正器校正透镜误差。