公开(公告)号：US08003940B2

公开(公告)日：2011-08-23

申请号：US12349751

申请日：2009-01-07

Applicant: Mayuka Oosaki ,  Chie Shishido ,  Hiroki Kawada ,  Tatsuya Maeda

Inventor： Mayuka Oosaki ,  Chie Shishido ,  Hiroki Kawada ,  Tatsuya Maeda

IPC: H01J37/28 ,  H01J37/256 ,  G01N23/00

CPC classification number: H01J37/28 ,  H01J2237/282

Abstract: A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron images which are captured by imaging a reference pattern formed on a wafer, a tool state monitoring unit for monitoring tool states of each of the plural scanning electron microscopes, and an output unit for displaying on a screen a relationship between the tool-to-tool disparity between the plural scanning electron microscopes and tool states of each of the plural scanning electron microscopes monitored by the tool state monitoring unit. The tool state monitoring unit monitors the tool states of each of the plural scanning electron microscopes while imaging the reference pattern formed on the wafer by using each of the plural scanning electron microscopes.

Abstract translation: 用于控制多个扫描电子显微镜之间的工具对工具差异的系统包括：测量单元，用于基于通过成像获得的二次电子图像提取的信息来测量多个扫描电子显微镜之间的工具对工具差异 在晶片上形成的参考图案，用于监视多个扫描电子显微镜中的每一个的工具状态的工具状态监视单元和用于在屏幕上显示多个扫描电子显微镜之间的工具与工具之间的差异之间的关系的输出单元 以及由工具状态监视单元监视的多个扫描电子显微镜中的每一个的工具状态。 工具状态监视单元通过使用多个扫描电子显微镜中的每一个对成像在晶片上的参考图案进行成像，监视多个扫描电子显微镜中的每一个的工具状态。

公开(公告)号：US07439525B2

公开(公告)日：2008-10-21

申请号：US11501824

申请日：2006-08-10

Applicant: Shinsuke Nishimura

Inventor： Shinsuke Nishimura

IPC: G21K5/10

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/282

Abstract: A method for measuring a demagnification of a charged particle beam exposure apparatus includes measuring a first stage position of a mask stage in accordance with a mask stage coordinate system, irradiating a first charged particle beam to a first irradiation position on a specimen through the opening portion of the mask, measuring the first irradiation position in accordance with a specimen stage coordinate system, moving the mask stage to a second stage position, measuring the second stage position of the mask stage, irradiating a second charged particle beam to a second irradiation position on the specimen through the opening portion of the mask measuring the second irradiation position in accordance with the specimen stage coordinate system, and calculating a demagnification of the charged particle beam exposure apparatus from the first and second stage positions and the first and second irradiation positions.

Abstract translation: 用于测量带电粒子束曝光装置的缩小的方法包括根据掩模台坐标系测量掩模台的第一级位置，通过开口部分将第一带电粒子束照射到样品上的第一照射位置 ，根据试样台坐标系测量第一照射位置，将掩模台移动到第二台位置，测量掩模台的第二台位置，将第二带电粒子束照射到第二照射位置上 所述试样通过所述掩模的开口部，根据所述试样台坐标系测量所述第二照射位置，并计算所述带电粒子束曝光装置从所述第一和第二台位置以及所述第一和第二照射位置的缩小。

公开(公告)号：US20070114405A1

公开(公告)日：2007-05-24

申请号：US11583886

申请日：2006-10-20

Applicant: Mayuka Oosaki ,  Chie Shishido ,  Hiroki Kawada ,  Tatsuya Maeda

Inventor： Mayuka Oosaki ,  Chie Shishido ,  Hiroki Kawada ,  Tatsuya Maeda

IPC: G21K7/00

CPC classification number: H01J37/28 ,  H01J2237/282

Abstract: A system for controlling a tool-to-tool matching between a plurality of scanning electron microscopes for pattern dimension measurement includes a measuring unit for, at regular intervals, measuring a tool-to-tool disparity between scanning electron microscopes based on secondary electron image data, and measuring indicators indicating states of the microscopes, a tool-to-tool-disparity causing factor analyzing unit for analyzing a relationship between the tool-to-tool disparity and the values of the indicators measured by the measuring unit to estimate a factor that has caused said tool-to-tool disparity, and an output unit for displaying and outputting the tool-to-tool disparity causing factor estimated by the tool-to-tool-disparity causing factor analyzing unit.

Abstract translation: 用于控制用于图案尺寸测量的多个扫描电子显微镜之间的工具对工具匹配的系统包括用于以规则的间隔测量基于二次电子图像数据的扫描电子显微镜之间的工具对工具差异的测量单元 以及指示显示器状态的测量指示器，工具对工具差异因素分析单元，用于分析工具与工具之间的差异与由测量单元测量的指标的值之间的关系，以估计因素 已经引起了工具对工具的差异，以及输出单元，用于显示和输出由工具对工具差异造成因子分析单元估计的工具对工具差异引起的因素。

公开(公告)号：US20060284110A1

公开(公告)日：2006-12-21

申请号：US11501824

申请日：2006-08-10

Applicant: Shinsuke Nishimura

Inventor： Shinsuke Nishimura

IPC: G01N23/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/282

Abstract: A method for measuring a demagnification of a charged particle beam exposure apparatus includes measuring a first stage position of a mask stage in accordance with a mask stage coordinate system, irradiating a first charged particle beam to a first irradiation position on a specimen through the opening portion of the mask, measuring the first irradiation position in accordance with a specimen stage coordinate system, moving the mask stage to a second stage position, measuring the second stage position of the mask stage, irradiating a second charged particle beam to a second irradiation position on the specimen through the opening portion of the mask measuring the second irradiation position in accordance with the specimen stage coordinate system, and calculating a demagnification of the charged particle beam exposure apparatus from the first and second stage positions and the first and second irradiation positions.

公开(公告)号：US20060102840A1

公开(公告)日：2006-05-18

申请号：US11314312

申请日：2005-12-22

Applicant: Yoshinori Nakada ,  Shunsuke Koshihara ,  Ryuichirou Tamochi ,  Yayoi Hosoya ,  Hidetoshi Morokuma

Inventor： Yoshinori Nakada ,  Shunsuke Koshihara ,  Ryuichirou Tamochi ,  Yayoi Hosoya ,  Hidetoshi Morokuma

IPC: G21K7/00

CPC classification number: H01J37/28 ,  H01J37/265 ,  H01J2237/221 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/282 ,  H01J2237/2826

Abstract: In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of automatically determining a searching magnification for automatic object detection from the obtained information after correction of coordinates, and a function of calculating the frequency of occurrence of objects or defects and a time required for measurement from the searching magnification and conditions of measurement.

Abstract translation: 为了提供一种全自动扫描电子显微镜，其从精细调整到全面自动执行调查工作，本发明的扫描电子显微镜具有在校正坐标之后计算校正精度的功能，并且用 向量39，根据坐标校正后的获取信息自动确定自动对象检测的搜索倍率的功能，以及根据搜索倍率和条件来计算物体或缺陷的发生频率以及测量所需的时间的功能 测量。

公开(公告)号：US20030071230A1

公开(公告)日：2003-04-17

申请号：US10270068

申请日：2002-10-15

Applicant: Pioneer Corporation

Inventor： Yasumitsu Wada

IPC: H01J037/147

CPC classification number: H01J37/26 ,  H01J2237/153 ,  H01J2237/282

Abstract: An electron beam apparatus for irradiating a target with an electron beam includes a reference sample including at least one reference pattern which has a plurality of lattice structures arranged along the circumference of a circle in a evaluation surface of the reference sample; and an adjustment section for adjusting the electron beam by irradiating the evaluation surface with the electron beam on the basis of electrons generated from the reference sample.

公开(公告)号：US6078046A

公开(公告)日：2000-06-20

申请号：US81778

申请日：1998-05-20

Applicant: Hirotaro Mori ,  Kiyokazu Yoshida

Inventor： Hirotaro Mori ,  Kiyokazu Yoshida

IPC: H01J37/22 ,  H01J37/04 ,  H01J37/244 ,  G01K1/08

CPC classification number: H01J37/244 ,  H01J2237/24405 ,  H01J2237/26 ,  H01J2237/282

Abstract: In an apparatus for measuring an intensity of an electron beam, the electron beam is made incident a fluorescent screen and a part of the incident electron beam is converted into an optical image, and the optical image formed on the fluorescent screen is picked-up by a television camera by a reflection mirror having a central hole and being inclined with respect to a direction into which the optical image is made incident upon the reflection mirror. A part of the electron beam transmitted through the fluorescent screen and passing through the central hole of the reflection mirror is made incident upon a Faraday case, which generates an electric current representing an intensity of the electron beam impinging upon the fluorescent screen. In the transmission type electron microscope, after measuring an intensity of the electron beam impinging upon the fluorescent screen, after removing the fluorescent screen, reflection mirror and Faraday cage from an optical axis, a shutter is opened to expose a photographic film to the electron beam for a time period which provides an optimum exposure on the basis of the measured intensity of the electron beam.

Abstract translation: 在用于测量电子束强度的装置中，使电子束入射荧光屏，并且将一部分入射电子束转换为光学图像，并且在荧光屏上形成的光学图像由 通过具有中心孔并且相对于使光学图像入射到反射镜上的方向倾斜的反射镜的电视摄像机。 通过荧光屏透射并穿过反射镜的中心孔的电子束的一部分入射到法拉第壳体上，该法拉第壳体产生表示电子束照射在荧光屏上的强度的电流。 在透射型电子显微镜中，在测量入射到荧光屏上的电子束的强度之后，在从荧光屏上除去荧光屏，反射镜和法拉第笼之后，打开快门以将照相胶片暴露于电子束 在一段基于测量的电子束强度提供最佳曝光的时间段内。

公开(公告)号：US5583427A

公开(公告)日：1996-12-10

申请号：US545070

申请日：1995-10-19

Applicant: Alan T. Teruya ,  John W. Elmer

Inventor： Alan T. Teruya ,  John W. Elmer

IPC: G01R19/00 ,  H01J37/26 ,  G01N27/00

CPC classification number: G01R19/0061 ,  H01J37/265 ,  H01J2237/24405 ,  H01J2237/282

Abstract: A tomographic technique for determining the power distribution of an electron beam using electron beam profile data acquired from a modified Faraday cup to create an image of the current density in high and low power beams. A refractory metal disk with a number of radially extending slits is placed above a Faraday cup. The beam is swept in a circular pattern so that its path crosses each slit in a perpendicular manner, thus acquiring all the data needed for a reconstruction in one circular sweep. Also, a single computer is used to generate the signals actuating the sweep, to acquire that data, and to do the reconstruction, thus reducing the time and equipment necessary to complete the process.

Abstract translation: 一种断层摄影技术，用于使用从修改的法拉第杯获得的电子束轮廓数据确定电子束的功率分布，以在高功率和低功率光束中产生电流密度的图像。 具有多个径向延伸狭缝的难熔金属盘被放置在法拉第杯的上方。 光束被扫描成圆形图案，使得其路径以垂直方式穿过每个狭缝，从而获得在一个循环扫描中重建所需的所有数据。 此外，单个计算机用于产生致动扫描的信号，以获取该数据，并进行重建，从而减少完成该过程所需的时间和设备。

公开(公告)号：US20230253178A1

公开(公告)日：2023-08-10

申请号：US18187966

申请日：2023-03-22

Applicant: NuFlare Technology, Inc. ,  NuFlare Technology America, Inc.

Inventor： Victor KATSAP

IPC: H01J37/22 ,  H01J37/12 ,  G01N23/2251 ,  H01J37/073 ,  H01J37/26

CPC classification number: H01J37/222 ,  H01J37/12 ,  H01J37/224 ,  G01N23/2251 ,  H01J37/073 ,  H01J37/263 ,  H01J2237/282 ,  G01N2223/401 ,  G01N2223/418 ,  G01N2223/20 ,  H01J2237/2443 ,  H01J2237/06316

Abstract: The present disclosure is related to a Schottky thermal field (TFE) source for emitting an electron beam. Electron optics can adjust a shape of the electron beam before the electron beam impacts a scintillator screen. Thereafter, the scintillator screen generates an emission image in the form of light. An emission image can be adjusted and captured by a camera sensor in a camera at a desired magnification to create a final image of the Schottky TFE source's tip. The final image can be displayed and analyzed to for defects.

公开(公告)号：US20230162944A1

公开(公告)日：2023-05-25

申请号：US17916785

申请日：2021-03-31

Applicant: ASML Netherlands B.V.

Inventor： Xiang WANG ,  Steffen MEYER ,  Mark O'MAHONY

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/28 ,  H01J2237/2817 ,  H01J2237/2809 ,  H01J2237/0044 ,  H01J2237/282

Abstract: An improved method and apparatus for enhancing an inspection image in a charged-particle beam inspection system. An improved method for enhancing an inspection image comprises acquiring a plurality of test images of a sample that are obtained at different landing energies, determining distortion levels for the plurality of test images, determining a landing energy level that enables the sample to be in a neutral charge condition during inspection based on the distortion levels, and acquiring an inspection image based on the determined landing energy level.