Abstract:
An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having at least one first deflection electrode 51a, 51b, 51c and plural second deflection electrodes 52a, 52b, 52c, wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation.The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.
Abstract:
The invention comprises a patient positioning and/or repositioning system, such as a laying, semi-vertical, or seated patient positioning, alignment, and/or control method and apparatus used in conjunction with multi-axis charged particle radiation therapy. Patient positioning constraints optionally include one or more of: a seat support, a back support, a head support, an arm support, a knee support, and a foot support. One or more of the positioning constraints are preferably movable and/or under computer control for rapid positioning, repositioning, and/or immobilization of the patient. The system optionally uses an X-ray beam that lies in substantially the same path as a proton beam path of a particle beam cancer therapy system. The generated image is usable for: fine tuning body alignment relative to the proton beam path, to control the charged particle beam path to accurately and precisely target the tumor, and/or in system verification and validation.
Abstract:
An ion transfer arrangement for transporting ions between higher and lower pressure regions of the mass spectrometer comprises an ion transfer conduit 60. The conduit 60 has an inlet opening towards a relatively high pressure chamber 40 and an outlet 70 opening towards a relatively low pressure chamber. The conduit 60 also has at least one side wall surrounding an ion transfer channel 115. The side wall includes a plurality of apertures 140 formed in the longitudinal direction of the side wall so as to permit a flow of gas from within the ion transfer channel 115 to a lower pressure region outside of the side wall of the conduit 60.
Abstract:
An multi-ion beam implantation apparatus and method are disclosed. An exemplary apparatus includes an ion beam source that emits at least two ion beams; an ion beam analyzer; and a multi-ion beam angle incidence control system. The ion beam analyzer and the multi-ion beam angle incidence control system are configured to direct the emitted at least two ion beams to a wafer.
Abstract:
An electro-optical (EO) radiation collector for collecting and/or transmitting EO radiation (which may include EO radiation in the visible wavelengths) for transmission to an EO sensor. The EO radiation collector may be used with an arc flash detection device or other protective system, such as an intelligent electronic device (IED). The arc flash detection device may detect an arc flash event based upon EO radiation collected by and/or transmitted from the EO radiation collector. The EO radiation collector may receive an EO conductor cable, an end of which may be configured to receive EO radiation. A portion of the EO radiation received by the EO radiation collector may be transmitted into the EO conductor cable and transmitted to the arc flash detection device. The EO radiation collector may be adapted to receive a second EO conductor cable, which may be used to provide redundant EO transmission and/or self-test capabilities.
Abstract:
An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having at least one first deflection electrode 51a, 51b, 51c and plural second deflection electrodes 52a, 52b, 52c, wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation.The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.
Abstract:
The invention comprises a patient positioning method and apparatus used in conjunction with multi-axis charged particle or proton beam radiation therapy of cancerous tumors. The patient positioning system is used to translate the patient and/or rotate the patient into a zone where the proton beam can scan the tumor using a targeting system. The patient positioning system is optionally used in conjunction with systems used to constrain movement of the patient, such as semi-vertical, sitting, or laying positioning systems.
Abstract:
A novel method of gating electron emission from field-emitter cathodes for radio frequency (RF) electrode guns and a novel cathode that provides a focused electron beam without the need for magnetic fields or a curved cathode surface are provided. The phase and strength of a predefined harmonic field, such as the 3rd harmonic field, are adjusted relative to a fundamental field to cause a field emission cathode to emit electrons at predefined times for the generation of high-brightness electron beams. The emission time is gated responsive to the combined harmonic and fundamental fields and the response of the FE cathode to the combined fields. A planar focusing cathode includes a selected dielectric material, such as a ceramic material, to provide an electron beam emission surface. Metal surfaces are provided both radially around and behind the dielectric material to shape the electric fields that accelerate and guide the beam from the cathode surface.
Abstract:
A method for slowing and controlling a beam of charged particles includes the steps of superimposing at least one magnetic field on a mass and passing the beam through the mass and at least one magnetic field such that the beam and the mass slows but does not stop the particles. An apparatus for slowing and controlling a beam of charged particles includes a bending magnetic field superimposed on a focusing magnetic field within a mass.
Abstract:
Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool includes a first column of openings along a first direction and having a pitch. The BAA also includes a second column of openings along the first direction and staggered from the first column of openings. The second column of openings has the pitch. A scan direction of the BAA is along a second direction, orthogonal to the first direction.