公开(公告)号：US09865429B2

公开(公告)日：2018-01-09

申请号：US14541314

申请日：2014-11-14

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Chih-Hong Hwang ,  Chun-Lin Chang ,  Nai-Han Cheng ,  Chi-Ming Yang ,  Chin-Hsiang Lin

IPC: H01J3/02 ,  H01J37/317 ,  H01J3/26 ,  H01J37/02 ,  H01J37/06

CPC classification number: H01J37/3171 ,  H01J3/02 ,  H01J3/022 ,  H01J3/26 ,  H01J37/026 ,  H01J37/06 ,  H01J2237/0041 ,  H01J2237/31705

Abstract: The present disclosure provides for various advantageous methods and apparatus of controlling electron emission. One of the broader forms of the present disclosure involves an electron emission element, comprising an electron emitter including an electron emission region disposed between a gate electrode and a cathode electrode. An anode is disposed above the electron emission region, and a voltage set is disposed above the anode. A first voltage applied between the gate electrode and the cathode electrode controls a quantity of electrons generated from the electron emission region. A second voltage applied to the anode extracts generated electrons. A third voltage applied to the voltage set controls a direction of electrons extracted through the anode.

公开(公告)号：US09779905B2

公开(公告)日：2017-10-03

申请号：US14123896

申请日：2012-05-25

Applicant: Muradin Abubekirovich Kumakhov

Inventor： Muradin Abubekirovich Kumakhov

IPC: H01J3/26 ,  G21K1/087 ,  H05H7/04 ,  G21K1/02 ,  H05H7/06 ,  H01J3/34

CPC classification number: H01J3/26 ,  G21K1/02 ,  G21K1/087 ,  H01J3/34 ,  H05H7/04 ,  H05H7/06 ,  H05H2007/046

Abstract: A method and a device for changing direction of movement of a beam of accelerated charged particles are based on the use of a curved channel which is made from a material that is able to be electrically charged, and formation of the same kind of charge on an inside surface of the channel wall as that of the particles. Maintenance of a condition that relates an energy and a charge of the particles to geometrical parameters of the channel is required, in particular, a radius R of curvature of a longitudinal axis thereof, and to electrical strength of the wall material. The beam can possibly be rotated through large angles without loss of intensity, significantly simplifying a design, and also reducing the mass and dimensions of all devices, particularly by obviating a need for magnets and supply voltage and control voltage sources for such devices.

公开(公告)号：US20150340191A1

公开(公告)日：2015-11-26

申请号：US14709068

申请日：2015-05-11

Applicant: Jan Berk ,  Thomas Weidinger

Inventor： Jan Berk ,  Thomas Weidinger

IPC: H01J35/14

CPC classification number: H01J29/98 ,  H01J3/26 ,  H01J29/70 ,  H01J35/14 ,  H05G1/66

Abstract: A positioning apparatus is provided for an electron beam of an electron tube, the apparatus including a first DC voltage circuit having a high potential difference and a second DC voltage circuit having a smaller potential difference, having in each case a first potential level and a second potential level, and a deflection module, which has two inputs and at least one deflection coil, wherein the at least one deflection coil is connected between the two inputs of the deflection module.

Abstract translation: 为电子管的电子束设置定位装置，该装置包括具有高电位差的第一直流电压电路和具有较小电位差的第二直流电压电路，每一种电压均具有第一电位电平和第二电位电平 电位电平和偏转模块，其具有两个输入和至少一个偏转线圈，其中至少一个偏转线圈连接在偏转模块的两个输入端之间。

公开(公告)号：US08981321B2

公开(公告)日：2015-03-17

申请号：US14084938

申请日：2013-11-20

Applicant: Canon Kabushiki Kaisha

Inventor： Hirohito Ito

IPC: H01J37/00 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/3177 ,  H01J2237/304 ,  H01J2237/31766

Abstract: A charged-particle beam exposure apparatus which includes a deflector that deflects a charged-particle beam, and a stage mechanism that drives a substrate, and draws a pattern on the substrate while scanning the charged-particle beam in a main-scanning direction by the deflector and scanning the substrate in a sub-scanning direction by the stage mechanism. The apparatus includes a blanker unit configured to control irradiation and unirradiation of the substrate with the charged-particle beam, and a controller configured to control the deflector to deflect the charged-particle beam in the sub-scanning direction by an amount of driving of the substrate in the sub-scanning direction by the stage mechanism during a period of time from stop of drawing on the substrate until restart thereof when the drawing on the substrate is stopped and then restarted while the substrate is driven in the sub-scanning direction by the stage mechanism.

Abstract translation: 一种带电粒子束曝光装置，其包括使带电粒子束偏转的偏转器，以及驱动基板的级机构，并且在主扫描方向上沿着主扫描方向扫描带电粒子束时在基板上绘制图案 偏转器，并通过平台机构沿副扫描方向扫描基板。 该设备包括：配置成控制带有带电粒子束的衬底的照射和未照射的消隐器单元;以及控制器，其被配置为控制偏转器，以使带电粒子束在副扫描方向上偏转一定量的驱动 基板在副扫描方向上由底板机构在基板停止时的时间内直到重新起动，当基板上的拉拔停止时再次启动，同时基板沿副扫描方向被驱动 舞台机制。

公开(公告)号：US20140145090A9

公开(公告)日：2014-05-29

申请号：US13498131

申请日：2012-03-23

Applicant: Yves Jongen

Inventor： Yves Jongen

IPC: H01J3/14

CPC classification number: H01J3/26 ,  A61N5/01 ,  A61N5/10 ,  A61N5/1077 ,  A61N5/1081 ,  A61N2005/1087 ,  G21K1/093

Abstract: The present invention relates to a particle therapy apparatus used for radiation therapy. More particularly, this invention relates to a compact isocentric gantry for delivering particle beams perpendicularly to a rotation axis of the gantry. The gantry comprises three dipole magnets. The angle of the last dipole magnet is smaller than 90° and a most preferred bending angle for this last dipole magnet is 60°.

公开(公告)号：US20140098919A1

公开(公告)日：2014-04-10

申请号：US14123896

申请日：2012-05-25

Applicant: Muradin Abubekirovich KUMAKHOV

Inventor： Muradin Abubekirovich Kumakhov

IPC: H01J3/26 ,  G21K1/02

CPC classification number: H01J3/26 ,  G21K1/02 ,  G21K1/087 ,  H01J3/34 ,  H05H7/04 ,  H05H7/06 ,  H05H2007/046

Abstract: The inventions relate to a group that includes means for directing charged particles, enabling the acceleration and interaction thereof, and producing radiation caused by their movement, namely a method for changing the direction of an accelerated charged particle beam, a device for implementing said method, a source of undulator electromagnetic radiation, a linear and a circular charged particle accelerator, and a collider and means for producing a magnetic field created by a stream of accelerated charged particles. The method and the device for implementing same are based on the use of a curved channel (1) for transporting particles, which is made from a material that is able to be electrically charged, and the formation of the same kind of charge on the inside surface of the channel wall as that of the particles. The characterizing feature of these inventions is that they require the maintenance of a condition that relates the energy and the charge of the particles to the geometrical parameters of the channel, in particular the radius R of curvature of the longitudinal axis (14) thereof, and to the electrical strength of the wall material. The other devices in this group include a device for changing the direction of a beam, which defines the trajectory of the particles inside these devices to produce the required shape according to the function of the corresponding device and focuses the beam. The technical result is the possibility of rotating the beam through large angles without loss of intensity, significantly simplifying the design, and also reducing the mass and dimensions of all the devices, particularly by obviating the need for magnets and supply voltage and control voltage sources for such devices.

公开(公告)号：US20140021366A1

公开(公告)日：2014-01-23

申请号：US13789434

申请日：2013-03-07

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hideto Dohi ,  Akira Ikegami ,  Hideyuki Kazumi

IPC: H01J3/26 ,  H01J3/14

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/1508

Abstract: The present invention provides a charged particle beam apparatus which is provided with a tilting deflector which is disposed between a charged particle source and an objective lens and tilts a charged particle beam, wherein a first optical element includes an electromagnetic quadrupole which generates dispersion to suppress the dispersion which is generated by deflection by the tilting deflector, and a second optical element is composed of a deflector for deflecting the charged particle beam which enters the first optical element or an electromagnetic quadrupole which causes the charged particle beam to generate a dispersion different from the dispersion generated by the first optical element.

Abstract translation: 本发明提供一种具有倾斜偏转器的带电粒子束装置，该倾斜偏转器设置在带电粒子源和物镜之间并使带电粒子束倾斜，其中第一光学元件包括电磁四极杆，其产生分散体以抑制 由倾斜偏转器偏转产生的色散，第二光学元件由用于偏转进入第一光学元件的电荷粒子束或电磁四极杆的偏转器组成，导致带电粒子束产生不同于 由第一光学元件产生的色散。

公开(公告)号：US08389949B2

公开(公告)日：2013-03-05

申请号：US12864612

申请日：2009-06-09

Applicant: Hisashi Harada ,  Takaaki Iwata

Inventor： Hisashi Harada ,  Takaaki Iwata

IPC: H01J1/50

CPC classification number: H01J3/22 ,  A61N5/1042 ,  A61N5/1043 ,  A61N5/1077 ,  A61N5/1078 ,  A61N2005/1087 ,  H01J3/26

Abstract: The objective is to obtain a particle beam therapy system, the irradiation flexibility of which is high and that can reduce the amount of irradiation onto a normal tissue. There are provided a scanning electromagnet that performs scanning and outputting in such a way that a supplied charged particle beam is formed in a three-dimensional irradiation shape based on a treatment plan; and deflection electromagnets that switch the orbits for the charged particle beam in such a way that the charged particle beam with which scanning and outputting are performed by the scanning electromagnet reaches an isocenter through a single beam orbit selected from a plurality of beam orbits established between the isocenter and the scanning electromagnet. The distance between the scanning electromagnet and the isocenter is made long.

Abstract translation: 目的是获得粒子束治疗系统，其照射灵活性高，并且可以减少照射到正常组织上的量。 提供一种扫描电磁体，其以这样一种方式执行扫描和输出，使得基于处理计划以三维照射形状形成所提供的带电粒子束; 以及偏转电磁体，其以使得由扫描电磁体执行扫描和输出的带电粒子束通过选自多个波束轨道中的单个波束轨道到达等角点的方式切换带电粒子束的轨道， 等距中心和扫描电磁铁。 扫描电磁铁与等角点之间的距离很长。

公开(公告)号：US08314409B2

公开(公告)日：2012-11-20

申请号：US12870816

申请日：2010-08-28

Applicant: Tom Miller ,  Gene Mirro ,  Cornelis Sander Kooijman ,  Hendrik Jan de Vos

Inventor： Tom Miller ,  Gene Mirro ,  Cornelis Sander Kooijman ,  Hendrik Jan de Vos

IPC: H01J3/14

CPC classification number: H01J3/26 ,  H01J37/1472 ,  H01J37/1477 ,  H01J37/3026 ,  H01J2237/1504 ,  H01J2237/1518 ,  H01J2237/1526 ,  H01J2237/30416 ,  H01J2237/3045 ,  H01J2237/30461

Abstract: An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.

Abstract translation: 引导带电粒子束的改进方法，其补偿带电粒子通过改变一个或多个偏转器信号而穿过系统所需的时间。 根据本发明的一个实施例，在数模（D / A）转换之前，将数字滤波器应用于扫描图案，以便减少或消除可能由TOF误差引起的过拍影响。 在其他实施例中，也可以使用模拟滤波器或具有较低带宽的信号放大器的使用来补偿TOF误差。 通过改变扫描图案，可以显着减少或消除超拍效果。

公开(公告)号：US09443691B2

公开(公告)日：2016-09-13

申请号：US14144187

申请日：2013-12-30

Applicant: General Electric Company

Inventor： Vance Scott Robinson ,  Carey Shawn Rogers ,  Sergio Lemaitre ,  Mark Alan Frontera ,  Sergiy Zalyubovskiy ,  Xi Zhang

IPC: H01J35/06 ,  H01J29/48 ,  H01J29/04 ,  H01L23/367 ,  H01L23/373 ,  H01J3/26 ,  H01J29/00 ,  H01L33/44 ,  H01L33/64 ,  H01L23/31 ,  H01J1/14 ,  H01J1/15

CPC classification number: H01J29/484 ,  H01J1/14 ,  H01J1/15 ,  H01J3/26 ,  H01J29/006 ,  H01J29/04 ,  H01J29/485 ,  H01J35/06 ,  H01L23/3178 ,  H01L23/367 ,  H01L23/373 ,  H01L23/3736 ,  H01L23/3738 ,  H01L33/44 ,  H01L33/641 ,  H01L33/642 ,  H01L2924/0002 ,  Y10T428/24612 ,  Y10T428/24802 ,  Y10T428/24826 ,  Y10T428/24942 ,  Y10T428/2495 ,  H01L2924/00

Abstract: Embodiments of the disclosure relate to electron emitters for use in conjunction with X-ray emitting devices. In certain embodiments the emitter includes features that prevent, limit, or control deflection of the electron emitter at operating temperatures. In this manner, the electron emitter may be kept substantially flat or at a desired curvature during operation.

Abstract translation: 本公开的实施例涉及与X射线发射装置结合使用的电子发射器。 在某些实施例中，发射器包括防止，限制或控制电子发射器在工作温度下的偏转的特征。 以这种方式，电子发射器可以在操作期间保持基本上平坦或处于期望的曲率。