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    Method for improving optical response and liquid crystal display device using same
    37.
    发明授权
    Method for improving optical response and liquid crystal display device using same 有权
    改善光学响应的​​方法及使用其的液晶显示装置

    公开(公告)号：US09575363B2

    公开(公告)日：2017-02-21

    申请号：US14910744

    申请日：2014-08-04

    Applicant: TOKYO UNIVERSITY OF SCIENCE FOUNDATION ,  DIC CORPORATION

    Inventor： Shunsuke Kobayashi ,  Kiyofumi Takeuchi ,  Masakazu Kaneoya

    IPC: G02F1/13363 ,  G02F1/1335 ,  G02F1/1337 ,  G02F1/1343

    CPC classification number: G02F1/13363 ,  G02F1/133528 ,  G02F1/133711 ,  G02F1/134309 ,  G02F2001/133531 ,  G02F2001/133562 ,  G02F2001/133567 ,  G02F2001/133742 ,  G02F2413/01 ,  G02F2413/02 ,  G02F2413/05 ,  G02F2413/08

    Abstract: In a liquid crystal display device 1 including a liquid crystal cell 2 having a liquid crystal layer, a first polarization plate 3 and a second polarization plate 4, and an optical compensation plate 5, when a differential coefficient of the amount of transmitted light I1 with respect to a time t when the driving voltage is turned off from on in a case in which the optical compensation plate 5 is not disposed is represented by ∂I1/∂t, and a differential coefficient of the amount of transmitted light I2 with respect to the time t when the driving voltage is turned off from on in a case in which the optical compensation plate 5 is disposed is represented by ∂I2/∂t, a phase difference in the liquid crystal layer and a phase difference in the optical compensation plate 5 are optically designed to satisfy a relationship of |∂I2/∂t|>|∂I1/∂t|.

    Abstract translation: 在包括具有液晶层的液晶单元2，第一偏振板3和第二偏振板4以及光学补偿板5的液晶显示装置1中，当透射光量I 1与 在没有配置光学补偿板5的情况下驱动电压关闭时的时间t表示为∂I1/∂t，透射光量I2的微分系数相对于 在配置光学补偿板5的情况下，驱动电压为ON时的时间t由∂I2/∂t表示，液晶层的相位差和光学补偿板的相位差 5被光学设计以满足|∂I2/∂t|> |∂I1/∂t|的关系。

    BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD
    38.
    发明申请
    BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD 审中-公开
    基站发生器，含有基站发生器的基板反应组合物和基站生成方法

    公开(公告)号：US20160122292A1

    公开(公告)日：2016-05-05

    申请号：US14901525

    申请日：2014-06-25

    Applicant: WAKO PURE CHEMICAL INDUSTRIES, LTD. ,  TOKYO UNIVERSITY OF SCIENCE FOUNDATION

    Inventor： Nobuhiko SAKAI ,  Kosuke YANABA ,  Koji ARIMITSU

    IPC: C07C279/26 ,  G03F7/004 ,  C07C65/28 ,  C07D209/48 ,  C07C59/84 ,  C07D311/86

    CPC classification number: C07C279/26 ,  B01J19/123 ,  B01J19/127 ,  B01J19/128 ,  C07C59/84 ,  C07C65/28 ,  C07C2601/14 ,  C07C2603/24 ,  C07D209/48 ,  C07D311/86 ,  G03F7/0045

    Abstract: It is a subject of the present invention to provide a base generator which has high solubility to general-purpose organic solvents, can dissolve directly into a base-reactive compound, such as an epoxy-based compound, further is provided with both performance of high heat resistance and low nucleophilicity, and generates a strong base, a base-reactive composition comprising the base generator and a base-reactive compound, as well as a method for generating a base, etc.The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc. (wherein R1 to R5 each independently represent a hydrogen atom; an alkyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R6 represents a hydrogen atom; an alkyl group which may have a substituent; an alkenyl group; an alkynyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R7 represents a hydrogen atom; an alkyl group which may have an amino group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, and Z− represents an anion derived from a carboxylic acid having a specific structure.)

    Abstract translation: 本发明的主题是提供一种对通用有机溶剂具有高溶解度的碱发生剂，可以直接溶解在诸如环氧基化合物的碱反应性化合物中，还具有高的性能 耐碱性和低亲核性，并且产生强碱，包含碱产生剂和碱反应性化合物的碱反应性组合物，以及产生碱的方法等。本发明涉及由 通式（A），包含该化合物的碱发生剂，包含碱发生剂和碱反应性化合物的碱反应性组合物，以及产生碱的方法等（其中R 1至R 5各自独立地表示 氢原子;烷基;可具有取代基的芳基;或可具有取代基的芳烷基，R6表示氢原子;可具有取代基的烷基;可具有取代基的烷基 甲基 炔基; 可以具有取代基的芳基; 或可具有取代基的芳基烷基，R7表示氢原子; 可以具有氨基的烷基; 可以具有取代基的芳基; 或可以具有取代基的芳烷基，Z-表示衍生自具有特定结构的羧酸的阴离子。）

    FABRICATION METHOD OF RESIN COMPACT, RESIN COMPACT, AND MOLD
    39.
    发明申请
    FABRICATION METHOD OF RESIN COMPACT, RESIN COMPACT, AND MOLD 审中-公开
    树脂紧凑，树脂紧凑和模具的制造方法

    公开(公告)号：US20150079341A1

    公开(公告)日：2015-03-19

    申请号：US14028007

    申请日：2013-09-16

    Applicant: Tokyo University of Science Foundation ,  KURARAY Co., Ltd.

    Inventor： Go TAZAKI ,  Toshiyuki Zento ,  Jun Taniguchi

    IPC: B29C59/02 ,  B29C33/58

    CPC classification number: B29C33/58 ,  B29C33/68 ,  B29C37/0067 ,  B29C43/222 ,  B29C59/046 ,  B29C2035/0827 ,  B29C2043/025 ,  B29C2059/023 ,  G03F7/0002 ,  Y10T428/24355

    Abstract: Disclosed is fabrication of a resin compact using a mold.The mold includes a resin mold body satisfies any one of conditions which are: a width of a protrusion is 5 nm or greater and less than 50 nm, an aspect ratio of the protrusion is 2 or greater, and Martens hardness is 200 or greater; the width of the protrusion is 50 nm or greater and less than 100 nm, the aspect ratio of the protrusion is 3 or greater, and Martens hardness is 200 or greater; and the width of the protrusion is 100 nm or greater and less than 1 μm, the aspect ratio of the protrusion is 4 or greater, and Martens hardness is 150 or greater. The inversion pattern has a space between the adjacent protrusions less than twice a height of the protrusion.The mold further includes an adhesion layer and a release layer.

    Abstract translation: 公开了使用模具制造树脂压块。 该模具包括：树脂模体，其满足以下条件之一：突起的宽度为5nm以上且小于50nm，突起的纵横比为2以上，马氏硬度为200以上; 突起的宽度为50nm以上且小于100nm，突起的纵横比为3以上，马氏硬度为200以上; 并且突起的宽度为100nm以上且小于1μm，突起的纵横比为4以上，马氏硬度为150以上。 反转图案在相邻突起之间具有小于突起高度的两倍的空间。 模具还包括粘合层和剥离层。

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