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31.发明授权公开(公告)号：US09658541B2
公开(公告)日：2017-05-23
申请号：US14322625
申请日：2014-07-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Willem Jurrianus Venema , Bearrach Moest , Vasco Miguel Matias Serrao , Cedran Bomhof
CPC classification number: G03F7/70775 , B21B38/00 , G03F9/7011 , G03F9/7019 , G03F9/7026 , G03F9/7088 , G03F9/7092 , H01J2235/062
Abstract: A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems.
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公开(公告)号：US12287455B2
公开(公告)日：2025-04-29
申请号：US17625426
申请日：2020-06-26
Applicant: ASML Netherlands B.V.
Inventor： Yue Ma , Marcus Adrianus Van De Kerkhof , Qiushi Zhu , Klaus Martin Hummler , Peter Matthew Mayer , Kay Hoffmann , Andrew David LaForge , Igor Vladimirovich Fomenkov , Daniel John William Brown
Abstract: Provided is an optical element for a lithographic apparatus. The optical element includes a capping layer that includes oxygen vacancies therein. The oxygen vacancies prevent attack of the capping layer by preventing hydrogen and other species from penetrating the capping layer and underlying layers. The capping layer provides a low hydrogen recombination rate enabling hydrogen to clean the surface of the optical element. The capping layer may include an alloyed metal, a mixed metal oxide or a doped metal oxide and it may be a ruthenium capping layer that includes one or more dopants therein.
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公开(公告)号：US12271008B2
公开(公告)日：2025-04-08
申请号：US17282559
申请日：2019-09-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey Nikipelov , Marcus Adrianus Van De Kerkhof , Pieter-Jan Van Zwol , Laurentius Cornelius De Winter , Wouter Joep Engelen , Alexey Olegovich Polyakov
Abstract: A first diffusor configured to receive and transmit radiation has a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation has a first layer and a second layer. The first layer is formed from a first material, the first layer including a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also includes a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusors may be configured to receive and transmit EUV radiation.
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公开(公告)号：US12235592B2
公开(公告)日：2025-02-25
申请号：US18008283
申请日：2021-06-09
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Koos Van Berkel , Marcus Adrianus Van De Kerkhof , Roger Franciscus Mattheus Maria Hamelinck , Shahab Shervin , Marinus Augustinus Christiaan Verschuren , Johannes Bernardus Charles Engelen , Matthias Kruizinga , Tammo Uitterdijk , Oleksiy Sergiyovich Galaktionov , Kjeld Gertrudus Hendrikus Janssen , Johannes Adrianus Cornelis Maria Pijnenburg , Peter Van Delft
IPC: G03F7/00
Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.
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公开(公告)号：US12174552B2
公开(公告)日：2024-12-24
申请号：US17773004
申请日：2020-10-05
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Victor Antonio Perez-Falcon , Marcus Adrianus Van De Kerkhof , Daniel Leslie Hall , Christopher John Mason , Arthur Winfried Eduardus Minnaert , Johannes Hubertus Josephina Moors , Samir A. Nayfeh
IPC: G03F7/00 , H01L21/683 , H01L21/687
Abstract: Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.
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Patent Agency Ranking
公开(公告)号：US12117736B2
公开(公告)日：2024-10-15
申请号：US17621472
申请日：2020-06-05
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Satish Achanta , Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine , Stef Marten Johan Janssens , Andrey Nikipelov
IPC: G03F7/00 , G03F1/82 , H01L21/683 , H01L21/687
CPC classification number: G03F7/707 , G03F1/82 , H01L21/6831 , H01L21/68721
Abstract: A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has been selected to exhibit low wear; a clamping apparatus for actuating a clamping operation between the clamping surface and the substrate, wherein the clamping operation is defined at least in part by at least one interface characteristic between the clamping surface and the substrate; and a processing station, operable to apply an adjustment to a first property of the substrate to optimize at least one interface characteristic of a particular clamping operation in dependence on the clamping surface parameter and at least one substrate surface parameter which defines a second property of the substrate.
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公开(公告)号：US11996262B2
公开(公告)日：2024-05-28
申请号：US17179165
申请日：2021-02-18
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Jing Zhang , Martijn Petrus Christianus Van Heumen , Patriek Adrianus Alphonsus Maria Bruurs , Erheng Wang , Vineet Sharma , Makfir Sefa , Shao-Wei Fu , Simone Maria Scolari , Johannes Andreas Henricus Maria Jacobs
CPC classification number: H01J37/20 , F16L11/04 , F16L11/12 , B01D19/0068 , H01J2237/2001 , H01L21/67288
Abstract: Apparatuses, systems, and methods for transferring fluid to a stage in a charged particle beam system are disclosed. In some embodiments, a stage may be configured to secure a wafer, a chamber may be configured to house the stage; and a tube may be provided within the chamber to transfer fluid between the stage and outside of the chamber. The tube may include a first tubular layer of first material, wherein the first material is a flexible polymer; and a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube. In some embodiments, a system may include a degasser system outside of the chamber, where the degasser system may be configured to remove gases from the transfer fluid before the transfer fluid enters the tube.
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公开(公告)号：US20220342315A1
公开(公告)日：2022-10-27
申请号：US17621472
申请日：2020-06-05
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Satish Achanta , Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine , Stef Marten Johan Janssens , Andrey Nikipelov
IPC: G03F7/20 , H01L21/683 , G03F1/82 , H01L21/687
Abstract: A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has been selected to exhibit low wear; a clamping apparatus for actuating a clamping operation between the clamping surface and the substrate, wherein the clamping operation is defined at least in part by at least one interface characteristic between the clamping surface and the substrate; and a processing station, operable to apply an adjustment to a first property of the substrate to optimize at least one interface characteristic of a particular clamping operation in dependence on the clamping surface parameter and at least one substrate surface parameter which defines a second property of the substrate.
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公开(公告)号：US20220260756A1
公开(公告)日：2022-08-18
申请号：US17625426
申请日：2020-06-26
Applicant: ASML Netherlands B.V.
Inventor： Yue Ma , Marcus Adrianus Van De Kerkhof , Qiushi Zhu , Klaus Martin Hummler , Peter Matthew Mayer , Kay Hoffmann , Andrew David LaForge , Igor Vladimirovich Fomenkov , Daniel John William Brown
Abstract: Provided is an optical element for a lithographic apparatus. The optical element includes a capping layer that includes oxygen vacancies therein. The oxygen vacancies prevent attack of the capping layer by preventing hydrogen and other species from penetrating the capping layer and underlying layers. The capping layer provides a low hydrogen recombination rate enabling hydrogen to clean the surface of the optical element. The capping layer may include an alloyed metal, a mixed metal oxide or a doped metal oxide and it may be a ruthenium capping layer that includes one or more dopants therein.
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公开(公告)号：US11347142B2
公开(公告)日：2022-05-31
申请号：US17206649
申请日：2021-03-19
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： David Ferdinand Vles , Erik Achilles Abegg , Aage Bendiksen , Derk Servatius Gertruda Brouns , Pradeep K. Govil , Paul Janssen , Maxim Aleksandrovich Nasalevich , Arnoud Willem Notenboom , Mária Péter , Marcus Adrianus Van De Kerkhof , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Johannes Petrus Martinus Bernardus Vermeulen , Willem-Pieter Voorthuijzen , James Norman Wiley
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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