公开(公告)号：US09612522B2

公开(公告)日：2017-04-04

申请号：US14620114

申请日：2015-02-11

Applicant: Applied Materials, Inc.

Inventor： Vinayak Vishwanath Hassan ,  Majeed A. Foad ,  Cara Beasley ,  Ralf Hofmann

IPC: G03F1/54 ,  G03F1/24 ,  G03F1/22 ,  C23C14/04 ,  C23C16/04 ,  C23C28/00

CPC classification number: G03F1/24 ,  C23C14/042 ,  C23C16/042 ,  C23C28/00 ,  C23C28/322 ,  C23C28/34 ,  C23C28/42 ,  C23C28/44 ,  G03F1/22 ,  G03F1/54 ,  G03F7/70033

Abstract: An extreme ultraviolet (EUV) mask blank production system includes: a substrate handling vacuum chamber for creating a vacuum; a substrate handling platform, in the vacuum, for transporting an ultra-low expansion substrate loaded in the substrate handling vacuum chamber; and multiple sub-chambers, accessed by the substrate handling platform, for forming an EUV mask blank includes: a multi-layer stack, formed above the ultra-low expansion substrate, for reflecting an extreme ultraviolet (EUV) light, and an absorber layer, formed above the multi-layer stack, for absorbing the EUV light at a wavelength of 13.5 nm includes the absorber layer has a thickness of less than 80 nm and less than 2% reflectivity.

公开(公告)号：US20160282280A1

公开(公告)日：2016-09-29

申请号：US15031690

申请日：2014-12-18

Applicant: Applied Materials, Inc.

Inventor： Majeed A. Foad ,  Christopher Dennis Bencher ,  Christopher G. Talbot ,  John Christopher Moran

IPC: G01N21/95

CPC classification number: G01N21/95 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/061

Abstract: An extreme ultraviolet (EUV) substrate inspection system and method of manufacturing thereof, includes: an EUV source directing EUV illumination through an aperture; a light detector detecting mask illumination with reduced off axis rays reflected off from a substrate; and a computing device processing image data detected by the light detector.

Abstract translation: 极紫外（EUV）基板检查系统及其制造方法包括：EUV源，通过孔指示EUV照明; 光检测器，检测从基板反射的具有减少的离轴光线的掩模照明; 以及处理由光检测器检测的图像数据的计算装置。

公开(公告)号：US20160208415A1

公开(公告)日：2016-07-21

申请号：US14908505

申请日：2014-08-19

Applicant: APPLIED MATERIALS, INC.

Inventor： Christopher Dennis Bencher ,  Peng Xie ,  Stephen Moffatt ,  Bruce E. Adams ,  Majeed A. Foad

IPC: C30B30/04 ,  C30B19/08 ,  C30B29/02

CPC classification number: C30B30/04 ,  C23C14/04 ,  C23C14/16 ,  C23C14/5806 ,  C30B19/08 ,  C30B29/02

Abstract: A magnetic field guided crystal orientation system, and a method of operation of a magnetic field guided crystal orientation system thereof, including: a work platform; a heating element above the work platform for selectively heating a base layer having grains on a wafer substrate where the wafer substrate is a part of a wafer on the work platform; and a magnetic assembly fixed relative to the heating element for aligning the grains of the base layer using a magnetic field of 10 Tesla or greater for formation of an interconnect having a crystal orientation of grains in the interconnect matching the crystal orientation of the grains of the base layer.

Abstract translation: 磁场引导晶体取向系统及其磁场引导晶体取向系统的操作方法，包括：工作平台; 工作平台上方的加热元件，用于选择性地加热晶片衬底上具有晶粒的基底层，其中晶片衬底是工作平台上的晶片的一部分; 以及相对于所述加热元件固定的磁性组件，用于使用10特斯拉或更大的磁场对准所述基底层的晶粒，以形成所述互连中的晶粒取向与所述晶体的晶体取向相匹配 基层。

公开(公告)号：US20160011502A1

公开(公告)日：2016-01-14

申请号：US14696325

申请日：2015-04-24

Applicant: Applied Materials, Inc.

Inventor： Ralf Hofmann ,  Vinayak Vishwanath Hassan ,  Cara Beasley ,  Majeed A. Foad

IPC: G03F1/24 ,  H01J37/34 ,  H01J37/32 ,  C23C16/44

CPC classification number: G03F7/702 ,  C23C14/0605 ,  C23C14/0635 ,  C23C14/14 ,  C23C16/44 ,  G02B1/14 ,  G02B5/085 ,  G02B5/0891 ,  G03F1/24 ,  G03F1/48 ,  G03F1/52 ,  G03F7/70033 ,  G03F7/70316 ,  G03F7/70916 ,  G03F7/70958 ,  G21K1/062 ,  H01J37/32798 ,  H01J37/3429

Abstract: An apparatus and method of manufacture of an extreme ultraviolet reflective element includes: a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer formed from niobium or niobium carbide for forming a Bragg reflector; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.

Abstract translation: 一种制造极紫外反射元件的设备和方法包括：基片; 所述多层叠层包括多个反射层对，所述多个反射层对具有由硅形成的第一反射层和由用于形成布拉格反射器的铌或碳化铌形成的第二反射层; 以及多层堆叠上和上方的覆盖层，用于通过减少氧化和机械侵蚀来保护多层堆叠。

公开(公告)号：US20160011345A1

公开(公告)日：2016-01-14

申请号：US14696331

申请日：2015-04-24

Applicant: Applied Materials, Inc.

Inventor： Ralf Hofmann ,  Cara Beasley ,  Vinayak Vishwanath Hassan ,  Majeed A. Foad

IPC: G02B5/08 ,  C23C16/455 ,  C23C16/24 ,  G03F7/20

CPC classification number: G02B5/0891 ,  C23C14/06 ,  C23C14/14 ,  C23C16/24 ,  C23C16/45525 ,  G02B5/0833 ,  G02B5/0875 ,  G03F7/7015 ,  G03F7/70316 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067 ,  H05G2/008

Abstract: An extreme ultraviolet reflective element and method of manufacture includes a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer having a preventative layer separating a lower amorphous layer and an upper amorphous layer; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.

Abstract translation: 极紫外线反射元件及其制造方法包括：基板; 所述多层叠层包括多个反射层对，所述多个反射层对具有由硅形成的第一反射层和具有分隔下部非晶层和上部非晶层的预防层的第二反射层; 以及多层堆叠上和上方的覆盖层，用于通过减少氧化和机械侵蚀来保护多层堆叠。

公开(公告)号：US20150235847A1

公开(公告)日：2015-08-20

申请号：US14425578

申请日：2013-10-24

Applicant: Applied Materials, Inc.

Inventor： Cara Beasley ,  Ralf Hofmann ,  Majeed A. Foad

IPC: H01L21/02

CPC classification number: H01L21/02376 ,  B05D3/061 ,  B05D3/065 ,  B05D3/141 ,  B05D5/12 ,  C01B32/182 ,  C01B32/184 ,  C01B32/186 ,  C01B32/20 ,  H01L21/02318 ,  H01L21/0234 ,  H01L21/02345 ,  H01L21/0237 ,  H01L21/02527 ,  H01L21/02628 ,  H01L21/02664 ,  H01L21/288

Abstract: Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template molecules such as polynuclear aromatics, and may be deposited on the substrate by spinning on, by spraying, by flowing, by dipping, or by condensing. The energy may be applied as radiant energy, thermal energy, or plasma energy.

Abstract translation: 本文所述的实施方案提供了在基底上形成石墨碳如石墨烯的方法和装置。 该方法包括提供包含线性共轭烃的前体，在基底上沉积来自前体的烃层，以及通过向基底施加能量从烃层形成石墨烯。 前体可以包括模板分子，例如多核芳族化合物，并且可以通过旋转，喷雾，通过浸渍，或通过冷凝沉积在基材上。 能量可以作为辐射能，热能或等离子体能量施加。