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公开(公告)号:US12105449B2
公开(公告)日:2024-10-01
申请号:US18219164
申请日:2023-07-07
Applicant: CANON KABUSHIKI KAISHA
Inventor: Shingo Hirota , Yoshiro Tsukada , Masami Hano , Toshiyuki Yamada , Kyohei Kikuchi , Daisuke Katayama , Taro Hanazato
IPC: G03G15/00 , B05D3/06 , G03G9/09 , G03G15/043 , G03G15/20
CPC classification number: G03G15/2007 , B05D3/061 , G03G9/0904 , G03G15/043 , G03G15/5008 , B05D2501/00 , G03G2215/209
Abstract: An image forming system includes an image forming unit, a varnish applying unit, a conveying unit, an irradiation unit, and a controller. The controller controls conveyance of a recording material so that a conveying speed of the recording material in a case that varnish is applied to the recording material with a toner image is formed is slower than a conveying speed of the recording material in a case that varnish is applied to the recording material with no toner image. The controller controls irradiation of the varnish with light so that intensity of the light with which the varnish is irradiated in a case that the varnish is applied to the recording material with the toner image is lower than intensity of the light with which the varnish is irradiated in a case that the varnish is applied to the recording material with no toner image.
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公开(公告)号:US11718764B2
公开(公告)日:2023-08-08
申请号:US16086232
申请日:2017-01-18
Applicant: PPG Industries Ohio, Inc.
Inventor: Roxalana L. Martin , Dennis L. Faler , Jennifer Tamaki Jordan , Mark P. Bowman , Shanti Swarup , Xiangling Xu , Hongying Zhou , Mark A. Tucker
IPC: B05D1/02 , B05D3/02 , B05D3/06 , B05D7/00 , C08K3/013 , C08K5/00 , C08L33/10 , C08L75/02 , C09D175/06
CPC classification number: C09D175/06 , B05D1/02 , B05D3/02 , B05D3/061 , B05D7/56 , C08K3/013 , C08K5/0025 , C08L33/10 , C08L75/02 , C08K2201/008 , C08L2201/14 , C08L2203/16 , C08L2205/03 , C08L2207/53 , C08L2312/00
Abstract: A coating composition includes an aqueous carrier medium, at least a first polymer, and polymeric core-shell particles dispersed in the aqueous carrier medium. The first polymer includes: (i) a barrier segment having aromatic groups and urethane linkages, urea linkages, or a combination thereof; and (ii) an elastomeric segment having a glass transition temperature of less than 0° C. The barrier segment can make up at least 30% of the first polymer, based on the total solids weight of the first polymer.
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公开(公告)号:US20180158677A1
公开(公告)日:2018-06-07
申请号:US15869021
申请日:2018-01-11
Applicant: Applied Materials, Inc.
Inventor: Cara BEASLEY , Ralf HOFMANN , Majeed A. FOAD
IPC: H01L21/02 , H01L21/288 , C01B32/182 , C01B32/184 , B05D5/12
CPC classification number: H01L21/02527 , B05D3/061 , B05D3/065 , B05D3/141 , B05D5/12 , C01B32/182 , C01B32/184 , C01B32/186 , C01B32/20 , H01L21/02318 , H01L21/0234 , H01L21/02345 , H01L21/0237 , H01L21/02376 , H01L21/02628 , H01L21/02664 , H01L21/288
Abstract: Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template molecules such as polynuclear aromatics, and may be deposited on the substrate by spinning on, by spraying, by flowing, by dipping, or by condensing. The energy may be applied as radiant energy, thermal energy, or plasma energy.
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公开(公告)号:US20170354991A1
公开(公告)日:2017-12-14
申请号:US15539662
申请日:2015-08-19
Applicant: POSCO
Inventor: Jin-Tae KIM , Jong-Sang KIM , Bong-Woo HA , Yang-Ho CHOI , Jung-Hwan LEE , Ha-Na CHOI , Jong-Kook KIM
CPC classification number: B05D3/061 , B05D3/02 , B05D3/067 , B05D3/142 , B05D7/14 , B05D7/53 , B05D2202/10 , B41M5/0047 , B41M5/0058 , B41M7/0081
Abstract: A method of manufacturing a transparent pattern printed steel plate includes forming a printed paint film layer by jetting transparent ink onto at least one surface of a steel plate, and curing the printed paint film layer with ultraviolet light to form a cured printed paint film layer. Further, a method of manufacturing a transparent pattern printed steel plate includes preparing a steel plate having a color painted film layer formed on at least one surface thereof, forming a printed paint film layer by jetting transparent ink onto the color painted film layer, and curing the printed paint film layer to form a cured printed paint film layer.
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公开(公告)号:US20170297251A1
公开(公告)日:2017-10-19
申请号:US15285165
申请日:2016-10-04
Applicant: CC3D LLC
Inventor: Kenneth Lyle Tyler
CPC classification number: B29C47/128 , B05B3/001 , B05B3/1007 , B05B5/032 , B05B5/04 , B05B7/1481 , B05B13/0636 , B05D3/061 , B29B15/122 , B29C35/0261 , B29C35/0805 , B29C47/0023 , B29C47/0038 , B29C47/0042 , B29C47/0066 , B29C47/022 , B29C47/065 , B29C47/0867 , B29C47/1045 , B29C47/20 , B29C47/22 , B29C47/24 , B29C64/106 , B29C64/209 , B29C64/264 , B29C70/388 , B29C70/50 , B29C70/52 , B29C70/521 , B29C70/523 , B29C70/526 , B29C2035/0827 , B29D23/00 , B29K2105/08 , B29L2023/00 , B29L2023/22 , B33Y30/00
Abstract: A head is disclosed for use with a manufacturing system. The head may have a housing configured to discharge a tubular structure reinforced with at least one continuous fiber and having a three-dimensional trajectory, and a cure enhancer operatively connected to the housing and configured to cure a liquid matrix in the tubular structure during discharge. The head may also have a nozzle configured to discharge a fill material into the tubular structure, and a wand extending from the housing to the nozzle.
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公开(公告)号:US20170256418A1
公开(公告)日:2017-09-07
申请号:US15061860
申请日:2016-03-04
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: SHU-HAO CHANG , KUO-CHANG KAU , KEVIN HUANG , JENG-HORNG CHEN
IPC: H01L21/311 , H01L21/687 , G03F7/20 , H01L21/027
CPC classification number: G03F7/70341 , B05D1/60 , B05D3/06 , B05D3/061 , B05D3/068 , G03F7/0042 , G03F7/038 , G03F7/11 , G03F7/167 , G03F7/2004 , G03F7/201 , G03F7/2037 , G03F7/2039 , G03F7/38 , G03F7/40 , G03F7/70325 , H01L21/02118 , H01L21/02277 , H01L21/0271 , H01L21/0274 , H01L21/0277 , H01L21/31111 , H01L21/31133 , H01L21/31144 , H01L21/687 , H01L21/68764
Abstract: Disclosed is a method for lithography patterning. The method includes providing a substrate, forming a deposition enhancement layer (DEL) over the substrate, and flowing an organic gas near a surface of the DEL. During the flowing of the organic gas, the method further includes irradiating the DEL and the organic gas with a patterned radiation. Elements of the organic gas polymerize upon the patterned radiation, thereby forming a resist pattern over the DEL. The method further includes etching the DEL with the resist pattern as an etch mask, thereby forming a patterned DEL.
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公开(公告)号:US09751105B2
公开(公告)日:2017-09-05
申请号:US14131082
申请日:2012-07-10
Applicant: Olivier Dellea , Philippe Coronel , Pascal Fugier
Inventor: Olivier Dellea , Philippe Coronel , Pascal Fugier
IPC: B05C19/04 , B05D1/12 , B05C19/00 , B05D1/20 , B05C11/10 , B05C19/06 , B05D3/06 , B05D3/00 , B05D3/12
CPC classification number: B05C19/04 , B05C11/1002 , B05C11/1036 , B05C19/00 , B05C19/008 , B05C19/06 , B05D1/12 , B05D1/20 , B05D3/061 , B05D3/12 , B05D3/203
Abstract: A facility for depositing a film of ordered particles onto a moving substrate, the facility configured to allow deposition, onto the substrate, of a film of ordered particles escaping from a particle outlet of a transfer zone having a first width. The facility further includes an accessory device in a form of a deposit head, provided to seal the particle outlet and configured to allow the deposition, onto the substrate, of a film of ordered particles escaping from an end of a particle transfer channel of the deposit head, the end having a second width strictly lower than the first width.
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公开(公告)号:US20170133115A1
公开(公告)日:2017-05-11
申请号:US15413317
申请日:2017-01-23
Applicant: SPDI, Inc.
Inventor: John Wilson , Robert Schenk
CPC classification number: G21K5/04 , B05B15/00 , B05C5/001 , B05C9/12 , B05D3/061 , B05D3/067 , B05D5/005 , G21F5/10
Abstract: A radiation system includes a radiation device coupled to a control unit; a radiation blocker having an adaptor opening for receiving the radiation device when the radiation device is positioned on the radiation blocker; and a carrier comprising a first compartment for housing the radiation blocker and, a second compartment for housing the control unit. The adaptor opening can dimensionally fit the radiation device to block radiations from the radiation device when the radiation device is positioned in the radiation blocker. The radiation device can produce radiation having peak radiation wavelength in a range of from about 250 nm to about 450 nm and can have a peak irradiation power in a range of from about 0.5 W/cm2 to about 10 W/cm2.
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公开(公告)号:US20150235847A1
公开(公告)日:2015-08-20
申请号:US14425578
申请日:2013-10-24
Applicant: Applied Materials, Inc.
Inventor: Cara Beasley , Ralf Hofmann , Majeed A. Foad
IPC: H01L21/02
CPC classification number: H01L21/02376 , B05D3/061 , B05D3/065 , B05D3/141 , B05D5/12 , C01B32/182 , C01B32/184 , C01B32/186 , C01B32/20 , H01L21/02318 , H01L21/0234 , H01L21/02345 , H01L21/0237 , H01L21/02527 , H01L21/02628 , H01L21/02664 , H01L21/288
Abstract: Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template molecules such as polynuclear aromatics, and may be deposited on the substrate by spinning on, by spraying, by flowing, by dipping, or by condensing. The energy may be applied as radiant energy, thermal energy, or plasma energy.
Abstract translation: 本文所述的实施方案提供了在基底上形成石墨碳如石墨烯的方法和装置。 该方法包括提供包含线性共轭烃的前体,在基底上沉积来自前体的烃层,以及通过向基底施加能量从烃层形成石墨烯。 前体可以包括模板分子,例如多核芳族化合物,并且可以通过旋转,喷雾,通过浸渍,或通过冷凝沉积在基材上。 能量可以作为辐射能,热能或等离子体能量施加。
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公开(公告)号:US20140045126A1
公开(公告)日:2014-02-13
申请号:US14054673
申请日:2013-10-15
Applicant: EMPIRE TECHNOLOGY DEVELOPMENT LLC
Inventor: Kazufumi OGAWA
IPC: C07F7/08
CPC classification number: C07F7/0801 , B01J2219/00612 , B01J2219/00626 , B01J2219/00637 , B05D1/185 , B05D3/061 , B05D7/52 , B05D7/56 , B05D2203/35 , B82Y30/00 , B82Y40/00 , C08K3/08 , C08K5/5435 , C08K9/06 , C09D4/00 , C09D7/62 , C09D183/06 , G03F7/165 , G03F7/265 , Y10T428/24802 , C08G77/14
Abstract: A patterned fine particle film structure includes a fine particle layer including fine particles arranged and bound to a surface of a substrate coated with a patterned film including a first film compound having a first functional group. The fine particles are coated with films including a first coupling agent having a first coupling reactive group that undergoes a coupling reaction with the first functional group to form a bond. The fine particle layer is bound by a bond formed through a coupling reaction. In an embodiment, fine particles coated with films of a film compound that reacts with the first coupling reactive group and the fine particles are alternately bound to the substrate.
Abstract translation: 构图的微细颗粒膜结构包括细颗粒层,其包括布置并结合到涂覆有包括具有第一官能团的第一膜化合物的图案化膜的基板的表面的细颗粒。 该微粒涂覆有包括具有与第一官能团进行偶联反应的第一偶联反应性基团的第一偶联剂以形成键的膜。 细颗粒层由通过偶联反应形成的键结合。 在一个实施方案中,涂覆有与第一偶联反应性基团和细颗粒反应的膜化合物的膜的细颗粒交替结合到基材上。
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