公开(公告)号：US09915621B2

公开(公告)日：2018-03-13

申请号：US15031690

申请日：2014-12-18

Applicant: Applied Materials, Inc.

Inventor： Majeed A. Foad ,  Christopher Dennis Bencher ,  Christopher G. Talbot ,  John Christopher Moran

IPC: G01N21/95 ,  G01N21/956

CPC classification number: G01N21/95 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/061

Abstract: An extreme ultraviolet (EUV) substrate inspection system and method of manufacturing thereof, includes: an EUV source directing EUV illumination through an aperture; a light detector detecting mask illumination with reduced off axis rays reflected off from a substrate; and a computing device processing image data detected by the light detector.

公开(公告)号：US10421125B2

公开(公告)日：2019-09-24

申请号：US15655298

申请日：2017-07-20

Applicant: Applied Materials, Inc.

Inventor： Hou T. Ng ,  Ron Naftali ,  Christopher G. Talbot

IPC: B22F3/105 ,  B29C64/135 ,  B29C64/171 ,  B33Y50/02 ,  G02B26/08 ,  H04N5/74 ,  B29C64/153 ,  B29C64/245 ,  B33Y10/00 ,  B33Y30/00

Abstract: An additive manufacturing apparatus includes a platform, a dispenser to dispense layers of feed material on the platform, and a fusing system including an energy source to generate an energy beam having an adjustable intensity profile, an actuator to cause the energy beam to traverse across an outermost layer of feed material, and a controller coupled to the actuator and the energy source. The controller is configured to cause the energy source to adjust the intensity profile of the energy beam on the outermost layer of feed material based on a traversal velocity and/or a traversal direction of the light beam across the outermost layer of feed material.

公开(公告)号：US10307822B2

公开(公告)日：2019-06-04

申请号：US15655229

申请日：2017-07-20

Applicant: Applied Materials, Inc.

Inventor： Hou T. Ng ,  Ron Naftali ,  Christopher G. Talbot

IPC: H04N5/74 ,  B22F3/105 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  G02B26/08 ,  B29C64/135 ,  B29C64/153 ,  B29C64/171 ,  B29C64/245

Abstract: An additive manufacturing apparatus includes a platform, a dispenser to dispense layers of feed material on the platform, and a fusing system to direct an energy beam to fuse at least a portion of the outermost layer of feed material. The fusing system includes an energy source to emit the energy beam, a deformable mirror to receive the energy beam and reflect the energy beam, wherein a shape of the deformable mirror defines at least in part an intensity profile of the energy beam on the outermost layer of feed material, an actuator coupled to the deformable mirror, and a controller coupled to the actuator and configured to cause the actuator to deform the shape of the deformable mirror to adjust the intensity profile of the energy beam on the outermost layer of feed material in accordance to a desired profile.

公开(公告)号：US20160282280A1

公开(公告)日：2016-09-29

申请号：US15031690

申请日：2014-12-18

Applicant: Applied Materials, Inc.

Inventor： Majeed A. Foad ,  Christopher Dennis Bencher ,  Christopher G. Talbot ,  John Christopher Moran

IPC: G01N21/95

CPC classification number: G01N21/95 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/061

Abstract: An extreme ultraviolet (EUV) substrate inspection system and method of manufacturing thereof, includes: an EUV source directing EUV illumination through an aperture; a light detector detecting mask illumination with reduced off axis rays reflected off from a substrate; and a computing device processing image data detected by the light detector.

Abstract translation: 极紫外（EUV）基板检查系统及其制造方法包括：EUV源，通过孔指示EUV照明; 光检测器，检测从基板反射的具有减少的离轴光线的掩模照明; 以及处理由光检测器检测的图像数据的计算装置。