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公开(公告)号：US09853410B2
公开(公告)日：2017-12-26
申请号：US15240162
申请日：2016-08-18
Applicant: Gigaphoton Inc.
Inventor： Takeshi Asayama , Hiroaki Tsushima , Kouji Kakizaki , Osamu Wakabayashi
IPC: H01S3/038 , H01S3/036 , H01S3/225 , H01S3/00 , G03F7/20 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/134 , H01S3/13
CPC classification number: H01S3/038 , G03F7/70025 , H01S3/0014 , H01S3/036 , H01S3/08009 , H01S3/09705 , H01S3/0971 , H01S3/1305 , H01S3/134 , H01S3/225
Abstract: A gas laser apparatus includes a chamber containing a laser gas, a pair of electrodes disposed within the chamber, a fan disposed within the chamber, a motor connected to a rotating shaft of the fan, and a rotating speed control unit configured to control a rotating speed of the fan based on a wear-out parameter of the pair of electrodes.
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公开(公告)号：US09837780B2
公开(公告)日：2017-12-05
申请号：US15150800
申请日：2016-05-10
Applicant: Gigaphoton Inc.
Inventor： Takeshi Asayama , Osamu Wakabayashi , Kouji Kakizaki
Abstract: The excimer laser apparatus may include a laser chamber configured to contain gas, a pair of electrodes provided in the laser chamber, a power source unit configured to supply a pulse voltage between the pair of electrodes, a gas supply unit configured to supply gas into the laser chamber, a gas exhaust unit configured to partially exhaust gas from within the laser chamber, and a gas control unit configured to control the gas supply unit and the gas exhaust unit, where a replacement ratio of gas to be replaced from within the laser chamber increases as deterioration of the pair of electrodes progresses, the deterioration being represented by a deterioration parameter of the pair of electrodes.
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公开(公告)号：US09497842B2
公开(公告)日：2016-11-15
申请号：US14992506
申请日：2016-01-11
Applicant: GIGAPHOTON INC
Inventor： Tsukasa Hori , Kouji Kakizaki , Tatsuya Yanagida , Osamu Wakabayashi , Hakaru Mizoguchi
CPC classification number: H05G2/008 , H01S3/005 , H01S3/0071 , H01S3/09 , H01S3/102 , H01S3/104 , H01S3/1106 , H01S3/1611 , H01S3/1643 , H01S3/1673 , H01S3/2232 , H01S3/2308 , H01S3/2366 , H01S3/2391 , H05G2/003 , H05G2/005
Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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Patent Agency Ranking
公开(公告)号：US09167678B2
公开(公告)日：2015-10-20
申请号：US14201671
申请日：2014-03-07
Applicant: GIGAPHOTON INC.
Inventor： Tsukasa Hori , Kouji Kakizaki , Tatsuya Yanagida , Osamu Wakabayashi
CPC classification number: H05G2/008 , H01S3/02 , H01S3/094026 , H01S3/10061 , H01S3/1106 , H01S3/131 , H01S3/1636 , H01S3/1643 , H01S3/2232 , H01S3/2316 , H01S3/2383 , H05G2/003 , H05G2/005
Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
Abstract translation: 一种系统，包括：室，激光束装置，被配置为产生要被引入到所述腔室中的激光束;激光控制器，用于激光束装置至少控制激光束的光束强度和输出定时;以及目标 供给单元，被配置为将目标材料供应到所述室中，所述目标材料被所述激光束照射以产生极紫外光。
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35.发明授权Wavelength converter, wavelength converting device, solid state laser device, and laser system 有权波长转换器，波长转换装置，固态激光装置和激光系统公开(公告)号：US08934510B2
公开(公告)日：2015-01-13
申请号：US13710658
申请日：2012-12-11
Applicant: Gigaphoton Inc.
Inventor： Kouji Kakizaki , Takashi Onose , Hideo Hoshino
CPC classification number: G02F1/353 , G02F1/3544 , G02F1/37 , G02F2001/3503 , H01S3/0092 , H01S3/10007 , H01S3/1625 , H01S3/2251 , H01S3/2333 , H01S3/2375
Abstract: A wavelength converter may include a non-linear optical crystal, and an optical member bonded to a region of a contact surface of the non-linear optical crystal, located a predetermined distance or more on an inner side from an outer periphery of the contact surface. The wavelength converter may receive laser light and stably output light having a wavelength different from that of the laser light.
Abstract translation: 波长转换器可以包括非线性光学晶体，以及结合到非线性光学晶体的接触表面的区域中的光学部件，其位于距接触表面的外周的内侧一定距离以上 。 波长转换器可以接收激光并稳定地输出具有与激光波长不同的波长的光。
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公开(公告)号：US08841641B2
公开(公告)日：2014-09-23
申请号：US13903811
申请日：2013-05-28
Applicant: Gigaphoton Inc.
Inventor： Kouji Kakizaki , Shinji Nagai , Tatsuya Yanagida
CPC classification number: G21K5/00 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
Abstract: An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.
Abstract translation: 从等离子体射出目标材料被照射激光并变成等离子体和极紫外光的极紫外光源装置可以包括：产生极紫外光的室; 电磁场产生单元，用于产生腔室内的电场和磁场中的至少一个; 以及用于对粘附到腔室内的光学元件的碎屑进行充填和分离的清洁单元。
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公开(公告)号：US08811438B2
公开(公告)日：2014-08-19
申请号：US13936734
申请日：2013-07-08
Applicant: Gigaphoton Inc.
Inventor： Yukio Watanabe , Hideyuki Hayashi , Kouji Kakizaki , Michio Shinozaki , Hideo Hoshino
CPC classification number: H01S3/0407 , F25B2400/06 , F25D17/02 , H01S3/03 , H01S3/041 , H01S3/22
Abstract: A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.
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公开(公告)号：US08787413B2
公开(公告)日：2014-07-22
申请号：US13936819
申请日：2013-07-08
Applicant: Gigaphoton Inc.
Inventor： Yukio Watanabe , Hideyuki Hayashi , Kouji Kakizaki , Michio Shinozaki , Hideo Hoshino
IPC: H01S3/04
CPC classification number: H01S3/0407 , F25B2400/06 , F25D17/02 , H01S3/03 , H01S3/041 , H01S3/22
Abstract: A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.
Abstract translation: 一种用于气体激光器的温度控制器，其控制多个温度控制装置的温度，包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分 与第一温度控制部分相比，第一温度控制部分与低温或高温的温度控制相比，包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂 温度控制部分，产生冷却剂的第二温度控制部分或用于调节每个第二温度控制部分的温度的加热剂，将第一温度控制部分和第一温度控制部分并联连接的第一管道系统， 以及连接第二回火的第二管道系统 所述控制部分和每个第二温度控制部分并联。
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