公开(公告)号：US20130082701A1

公开(公告)日：2013-04-04

申请号：US13604856

申请日：2012-09-06

Applicant: Natsuhiko Mizutani ,  Tetsuo Kobayashi ,  Kiyoshi Ishikawa

Inventor： Natsuhiko Mizutani ,  Tetsuo Kobayashi ,  Kiyoshi Ishikawa

IPC: G01R33/46

CPC classification number: G01R33/323 ,  G01R33/24

Abstract: The present invention has an object to provide a nuclear magnetic resonance imaging apparatus or the like that avoids a region with zero sensitivity of an optical magnetometer and allows imaging by strong magnetic resonance when a common magnetic field is used as a bias field of an optical magnetometer and as a magnetostatic field to be applied to a sample. When a direction of a magnetostatic field application unit applying a magnetostatic field to a sample is a z direction, alkali metal cells of a plurality of scalar magnetometers are arranged so as not to overlap a region to be imaged in a z direction, and so as not to intersect the region to be imaged in an in-plane direction perpendicular to the z direction.

Abstract translation: 本发明的目的是提供一种避免光学磁力计具有零灵敏度的区域的核磁共振成像设备等，并且当使用公共磁场作为光学磁力计的偏置场时允许通过强磁共振成像 并且作为应用于样品的静磁场。 当向样品施加静磁场的静磁场施加单元的方向是az方向时，多个标量磁力计的碱金属单元被布置成不与在az方向上成像的区域重叠，从而不 在与z方向垂直的面内方向上与要成像的区域相交。

公开(公告)号：US08054074B2

公开(公告)日：2011-11-08

申请号：US12409789

申请日：2009-03-24

Applicant: Sunao Ichihara ,  Natsuhiko Mizutani ,  Hideyuki Sugioka ,  Tetsuo Kobayashi ,  Kiyoshi Ishikawa ,  Shuji Taue

Inventor： Sunao Ichihara ,  Natsuhiko Mizutani ,  Hideyuki Sugioka ,  Tetsuo Kobayashi ,  Kiyoshi Ishikawa ,  Shuji Taue

IPC: G01V3/00

CPC classification number: G01R33/0385 ,  B82Y25/00

Abstract: An atomic magnetometer includes a cell containing an atomic group, a pump light source, a probe light source, a mirror, and a detector. The cell is disposed between the pump light source and the mirror and between the probe light source and the detector. A pump beam emitted from the pump light source is circularly polarized light. The pump beam passes through the cell and is reflected by the mirror and then passes through the cell again. The probe beam emitted from the probe light source is linearly polarized light. An optical path of the probe beam is parallel to the plane of incidence of the pump beam and is also parallel to the surface of the mirror. The optical path of the probe beam crosses the optical path of the pump beam in the cell. The probe beam which has passed through the cell enters the detector.

Abstract translation: 原子磁强计包括含有原子团的单元，泵浦光源，探测光源，反射镜和检测器。 电池设置在泵浦光源和反射镜之间以及探测光源和检测器之间。 从泵浦光源发射的泵浦光是圆偏振光。 泵浦光束通过电池并被反射镜反射，然后再次通过电池。 从探测光源射出的探测光束是线偏振光。 探针光束的光路平行于泵浦光束的入射平面，并且平行于反射镜的表面。 探针光束的光路与电池中的泵浦光束的光路交叉。 已经通过电池的探测光束进入检测器。

公开(公告)号：US08009520B2

公开(公告)日：2011-08-30

申请号：US12116431

申请日：2008-05-07

Applicant: Yuan-Yu Jau ,  Kiyoshi Ishikawa ,  William Happer

Inventor： Yuan-Yu Jau ,  Kiyoshi Ishikawa ,  William Happer

IPC: G04B47/00 ,  G04F5/00 ,  G01V3/00 ,  H03L7/26

CPC classification number: G04F5/14

Abstract: A polarization gain medium such as an emitting laser diode provides the optical pumping. An atomic vapor cell is positioned in the laser cavity providing spontaneous push-pull optical pumping inside the laser cavity. This causes the laser beam to be modulated at hyperfine-resonance frequency. A clock signal is obtained from electrical modulation across the laser diode.

Abstract translation: 诸如发射激光二极管的偏振增益介质提供光泵浦。 原子蒸汽池位于激光腔中，提供激光腔内的自发推挽光泵浦。 这导致激光束以超精细共振频率被调制。 通过激光二极管的电调制获得时钟信号。

公开(公告)号：US20090263631A1

公开(公告)日：2009-10-22

申请号：US12064075

申请日：2006-08-28

Applicant: Yoshinori Sakamoto ,  Naoki Yamashita ,  Kiyoshi Ishikawa

Inventor： Yoshinori Sakamoto ,  Naoki Yamashita ,  Kiyoshi Ishikawa

IPC: B32B3/10 ,  C08G77/14 ,  C08L83/06 ,  C08J3/28 ,  B32B38/06

CPC classification number: G03F7/0757 ,  B82Y10/00 ,  B82Y40/00 ,  C08G77/20 ,  C09D183/04 ,  G03F7/0002 ,  H01L21/0273 ,  Y10T156/1041 ,  Y10T428/24802

Abstract: This invention provides a film forming composition for nanoimprinting, which has excellent resistance to etching with oxygen gas, can prevent the separation of a transfer pattern, can eliminate a problem of a holing time on a substrate, and is also excellent in transferability, and photosensitive resist, a nanostructure, a method for pattern formation using the same, and a program for realizing the method for pattern formation. The film forming composition for nanoimprinting comprises a polymeric silicon compound having the function of causing a photocuring reaction. Preferably, the polymeric silicon compound has a functional group cleavable as a result of response to electromagnetic waves and causes a curing reaction upon exposure to electromagnetic waves. More preferred are siloxane polymer compounds, silicon carbide polymer compounds, polysilane polymer compounds, and silazane polymer compounds, or any mixture thereof.

Abstract translation: 本发明提供一种纳米压印成膜用组合物，其具有优异的耐氧化蚀刻性，能够防止转印图案的分离，能够消除基板上的开孔时间的问题，并且转印性也优异，且感光性 抗蚀剂，纳米结构，使用其形成图案的方法，以及用于实现图案形成方法的程序。 用于纳米压印的成膜组合物包括具有引起光固化反应的功能的聚合物硅化合物。 优选地，聚合硅化合物具有由于对电磁波的响应而可切割的官能团，并且在暴露于电磁波时引起固化反应。 更优选硅氧烷聚合物化合物，碳化硅聚合物化合物，聚硅烷聚合物化合物和硅氮烷聚合物化合物，或其任何混合物。

公开(公告)号：US20090243610A1

公开(公告)日：2009-10-01

申请号：US12409789

申请日：2009-03-24

Applicant: Sunao Ichihara ,  Natsuhiko Mizutani ,  Hideyuki Sugioka ,  Tetsuo Kobayashi ,  Kiyoshi Ishikawa ,  Shuji Taue

Inventor： Sunao Ichihara ,  Natsuhiko Mizutani ,  Hideyuki Sugioka ,  Tetsuo Kobayashi ,  Kiyoshi Ishikawa ,  Shuji Taue

IPC: G01V3/00

CPC classification number: G01R33/0385 ,  B82Y25/00

Abstract: An atomic magnetometer includes a cell containing an atomic group, a pump light source, a probe light source, a mirror, and a detector. The cell is disposed between the pump light source and the mirror and between the probe light source and the detector. A pump beam emitted from the pump light source is circularly polarized light. The pump beam passes through the cell and is reflected by the mirror and then passes through the cell again. The probe beam emitted from the probe light source is linearly polarized light. An optical path of the probe beam is parallel to a plane of incidence of the pump beam and is also parallel to a surface of the mirror. The optical path of the probe beam crosses an optical path of the pump beam in the cell. The probe beam which has passed through the cell enters the detector.

Abstract translation: 原子磁强计包括含有原子团的单元，泵浦光源，探测光源，反射镜和检测器。 电池设置在泵浦光源和反射镜之间以及探测光源和检测器之间。 从泵浦光源发射的泵浦光是圆偏振光。 泵浦光束通过电池并被反射镜反射，然后再次通过电池。 从探测光源射出的探测光束是线偏振光。 探针光束的光路平行于泵浦光束的入射平面，并且平行于反射镜的表面。 探针光束的光路与电池中的泵浦光束的光路交叉。 已经通过电池的探测光束进入检测器。

公开(公告)号：US20080241747A1

公开(公告)日：2008-10-02

申请号：US10586694

申请日：2005-01-14

Applicant: Takuma Hojo ,  Kiyoshi Ishikawa ,  Tomoyuki Ando

Inventor： Takuma Hojo ,  Kiyoshi Ishikawa ,  Tomoyuki Ando

IPC: G03F7/004 ,  G03F7/26

CPC classification number: G03F7/0397 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/122 ,  Y10S430/126

Abstract: A positive resist composition that exhibits a large exposure margin, and excellent levels of resolution and dry etching resistance, as well as a method of forming a resist pattern that uses the positive resist composition. This resist composition includes a resin component (A), which contains acid dissociable, dissolution inhibiting groups and displays increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the resin component (A) contains a structural unit (a1) represented by a general formula (I) shown below, a structural unit (a2) in which a hydroxyl group within the above general formula (I) has been protected by substituting the hydrogen atom thereof with an acid dissociable, dissolution inhibiting group (II) represented by a general formula (II) shown below, and a structural unit (a3) in which a hydroxyl group within the above general formula (I) has been protected by substituting the hydrogen atom thereof with an acyclic acid dissociable, dissolution inhibiting group (III).

Abstract translation: 显示出大的曝光裕度，优异的分辨率和耐干蚀刻性的阳性抗蚀剂组合物，以及形成使用正性抗蚀剂组合物的抗蚀剂图案的方法。 该抗蚀剂组合物包括含有酸解离的溶解抑制基团并在酸的作用下显示增加的碱溶性的树脂组分（A）和在曝光时产生酸的酸产生剂组分（B），其中树脂组分 ）包含由下述通式（I）表示的结构单元（a1），其中通过用酸取代上述通式（I）中的羟基已被保护的结构单元（a2） 由下述通式（II）表示的可离解的溶解抑制基团（II）和其中通式（I）中的羟基用其氢原子进行保护而被保护的结构单元（a3） 无环酸解离，溶解抑制组（III）。

公开(公告)号：US07183491B2

公开(公告)日：2007-02-27

申请号：US10740459

申请日：2003-12-22

Applicant: Kiyoshi Ishikawa

Inventor： Kiyoshi Ishikawa

IPC: H05K7/06

CPC classification number: H05K1/025 ,  H05K1/0237 ,  H05K1/0253 ,  H05K1/0298 ,  H05K1/117 ,  H05K2201/09236 ,  H05K2201/093 ,  H05K2201/094 ,  H05K2201/0969 ,  H05K2201/09845

Abstract: To provide a printed wiring board where the impedance between pads through which differential signals pass has been set to a predetermined standard value. The printed wiring board includes a first conductor layer extending over an area excluding a hole formed for each pad group and filled with a dielectric, and a second conductor layer extending over an area containing areas facing the hole. The hole encompasses a plurality of areas facing predetermined respective pads which are adjacent to each other and which form the pad group from among the plurality of pads.

Abstract translation: 为了提供印刷电路板，其中差分信号通过的焊盘之间的阻抗已经被设置为预定的标准值。 印刷布线板包括在除了为每个焊盘组形成并填充有电介质的孔之外的区域上延伸的第一导体层，以及在包含面向孔的区域的区域上延伸的第二导体层。 该孔包围面对预定相应焊盘的多个区域，这些区域彼此相邻并且从多个焊盘中形成焊盘组。

公开(公告)号：US20060247346A1

公开(公告)日：2006-11-02

申请号：US10553083

申请日：2004-04-15

Applicant: Takuma Hojo ,  Kiyoshi Ishikawa

Inventor： Takuma Hojo ,  Kiyoshi Ishikawa

IPC: C08K5/41

CPC classification number: G03F7/0397

Abstract: The invention provides a positive resist composition which has high etching resistance and attains high resolution, and a method of forming patterns by using the positive resist composition. The positive resist composition contains a resin component (A), which has acid dissociable, dissolution inhibiting groups, and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) which generates acid on exposure, wherein the resin component (A) is a polymer comprising structural units (al) represented by the general formula (I) shown below, and a portion of the hydroxyl groups of the units (al) are protected by replacing the hydrogen atoms of the hydroxyl groups with acid dissociable, dissolution inhibiting groups represented by the general formula (II) shown below: (wherein, R is a hydrogen atom or methyl group, R1 is an alkyl group having 1 to 5 carbon atoms, R2 is an alkyl group having 1 to 5 carbon atoms or a hydrogen atom, and X is an aliphatic polycyclic group having 10 to 16 carbon atoms or an aromatic polycyclic hydrocarbon group having 10 to 16 carbon atoms.)

Abstract translation: 本发明提供了具有高耐蚀刻性和高分辨率的正型抗蚀剂组合物，以及通过使用正性抗蚀剂组合物形成图案的方法。 正型抗蚀剂组合物含有具有酸解离性，溶解抑制基团，在酸作用下表现出增加的碱溶解性的树脂成分（A）和暴露时产生酸的酸产生剂成分（B），其中树脂成分 （A）是包含由下述通式（I）表示的结构单元（a1）的聚合物，并且单元（a1）的一部分羟基通过用酸解离而置换羟基的氢原子来保护 ，由下述通式（II）表示的溶解抑制基团：（其中，R是氢原子或甲基，R 1是具有1至5个碳原子的烷基，R 0 > 2是具有1至5个碳原子的烷基或氢原子，X是具有10至16个碳原子的脂族多环基团或具有10至16个碳原子的芳族多环烃基。

公开(公告)号：US6042988A

公开(公告)日：2000-03-28

申请号：US161778

申请日：1998-09-29

Applicant: Mitsuro Sato ,  Katsumi Oomori ,  Etsuko Iguchi ,  Kiyoshi Ishikawa ,  Fumitake Kaneko ,  Yoshiki Sugeta

Inventor： Mitsuro Sato ,  Katsumi Oomori ,  Etsuko Iguchi ,  Kiyoshi Ishikawa ,  Fumitake Kaneko ,  Yoshiki Sugeta

IPC: G03F7/004 ,  G03F7/038 ,  G03C1/492

CPC classification number: G03F7/038 ,  G03F7/0045 ,  Y10S430/12 ,  Y10S430/122

Abstract: The present invention provides a chemical-amplification-type negative resist composition containing an alkali-soluble resin, a compound capable of generating an acid by irradiation and a crosslinking agent, and the resist composition of the present invention is characterized in that it further contains an organic carboxylic acid compound as an acidic compound and an organic amine compound as an alkaline compound. According to the content of such acidic and alkaline compounds, the negative resist composition achieves a negative resist pattern exhibiting improved definition and an excellent profile with a reduced dependency on the type of substrate as well as a minimized change in the sensitivety and film thickness with the passage of time and a satisfactory PEG margin, and therefore, the negative resist composition of the present invention can be used in the field of manufacturing electronic parts such as semiconductor devices and liquid-crystal display devices, where finer and more precise processing is increasingly required.

Abstract translation: 本发明提供一种含有碱溶性树脂，能够通过照射产生酸的化合物和交联剂的化学扩增型负性抗蚀剂组合物，其特征在于，其还含有 作为酸性化合物的有机羧酸化合物和作为碱性化合物的有机胺化合物。 根据这种酸性和碱性化合物的含量，负性抗蚀剂组合物实现了抗蚀剂图案显示出改善的清晰度和优异的轮廓，对基材的类型的依赖性降低，并且使敏感度和膜厚度的最小化变化与 时间的流逝和令人满意的PEG余量，因此，本发明的负性抗蚀剂组合物可以用于半导体器件和液晶显示器件等电子部件的制造领域，其中越来越需要更精细和更精确的加工 。

公开(公告)号：US5902713A

公开(公告)日：1999-05-11

申请号：US762920

申请日：1996-12-10

Applicant: Hideo Hada ,  Hiroyuki Yamazaki ,  Yoshiki Sugeta ,  Hiroshi Komano ,  Kiyoshi Ishikawa

Inventor： Hideo Hada ,  Hiroyuki Yamazaki ,  Yoshiki Sugeta ,  Hiroshi Komano ,  Kiyoshi Ishikawa

IPC: C09K3/00 ,  G03F7/004 ,  G03F7/033 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  G03C5/00

CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/12 ,  Y10S430/122

Abstract: Disclosed are novel high-sensitivity positive- and negative-working chemical-sensitization photoresist compositions capable of giving a highly heat-resistant patterned resist layer of high resolution having excellently orthogonal cross sectional profile without being influenced by standing waves. The composition contains, as an acid generating agent by irradiation with actinic rays, a specific cyano-substituted oximesulfonate compound such as .alpha.-(methylsulfonyloxyimino)-4-methoxybenzyl cyanide. The advantages obtained by the use of this specific acid-generating agent is remarkable when the film-forming resinous ingredient has such a molecular weight distribution that the ratio of the weight-average molecular weight to the number-average molecular weight does not exceed 3.5.