公开(公告)号：US08323745B2

公开(公告)日：2012-12-04

申请号：US12748146

申请日：2010-03-26

Applicant: Tokonori Yamadaya ,  Kiyoshi Ishikawa ,  Atsushi Sawano

Inventor： Tokonori Yamadaya ,  Kiyoshi Ishikawa ,  Atsushi Sawano

IPC: B05D3/02

CPC classification number: C03C17/25 ,  C09D183/04 ,  C08K5/205

Abstract: An application liquid capable of forming a dense silica-based coating film even when embedded into a fine groove, and a method for formation of a silica-based coating film using the application liquid are provided. An application liquid is used including (A) a siloxane polymer, and (B) a base generator represented by the following general formula (I): wherein, R1 and R2 are a hydrocarbon group having 1 to 5 carbon atoms and which may be the same or different; or one of R1 and R2 is a hydrogen atom and the other is a hydrocarbon group having 1 to 5 carbon atoms; when R1 and R2 are both a hydrocarbon group, these may bind to one another to form a ring structure; R3 is a linking group; and R4 is a condensed ring.

Abstract translation: 提供即使嵌入微细沟槽也能够形成致密二氧化硅系涂膜的涂布液，以及使用该涂布液形成二氧化硅系涂膜的方法。 使用包含（A）硅氧烷聚合物和（B）由以下通式（I）表示的碱发生剂的应用液：其中，R 1和R 2是具有1至5个碳原子的烃基，并且可以是 相同或不同; R 1和R 2中的一个为氢原子，另一个为碳原子数为1〜5的烃基; 当R1和R2都是烃基时，它们可以彼此结合形成环结构; R3是连接基团; R4是稠环。

公开(公告)号：US07969343B2

公开(公告)日：2011-06-28

申请号：US12685438

申请日：2010-01-11

Applicant: Kiyoshi Ishikawa

Inventor： Kiyoshi Ishikawa

IPC: H03M1/12

CPC classification number: H03M1/0604 ,  H03M1/468 ,  H03M1/804

Abstract: An analog-to-digital converter circuit includes: a capacitor array including a plurality of first capacitors, each having a first terminal connecting to a common node and having a capacitance represented by the nth power of 2 (2n) on the basis of the smallest of the capacitances of the first capacitors=1; a second capacitor for contributing to attenuation of the voltage on the common node; a switch array, each switch of the switch array supplying and disconnecting one of a first reference voltage, a second reference voltage, and the voltage of an input signal to and from a second terminal of an associated one of the first capacitors; a second switch supplying and disconnecting a third reference voltage to and from the common node; a comparator comparing a voltage on the common node with the third reference voltage; and a control circuit controlling the first switches and the second switch.

Abstract translation: 一种模拟 - 数字转换器电路包括：电容器阵列，包括多个第一电容器，每个第一电容器具有连接到公共节点的第一端子，并且具有基于最小的第二电容器 的第一电容器的电容= 1; 用于有助于衰减公共节点上的电压的第二电容器; 开关阵列的每个开关，将第一参考电压，第二参考电压和与第一电容器中相关联的一个的第二端子的输入信号的电压中的一个提供和断开; 向所述公共节点提供和断开第三参考电压的第二开关; 比较公共节点上的电压与第三参考电压的比较器; 以及控制所述第一开关和所述第二开关的控制电路。

公开(公告)号：US20100301853A1

公开(公告)日：2010-12-02

申请号：US12439846

申请日：2007-09-05

Applicant: William Happer ,  Kiyoshi Ishikawa ,  Brian Patton ,  Yuan-Yu Jau

Inventor： William Happer ,  Kiyoshi Ishikawa ,  Brian Patton ,  Yuan-Yu Jau

IPC: G01R33/44

CPC classification number: G01R33/282 ,  G01N24/081 ,  G01R33/4641 ,  G01R33/5601

Abstract: The present invention relates to a method and system for polarizing a solid compound of interest via spin transfer from an optically-pumped alkali vapor. In one embodiment, the method provides a cell which contains a solid compound as well as pure alkali metal and some amount of buffer gas. The cell is heated to vaporize some of the pure alkali. Resonant laser light is passed through the cell to polarize the atomic vapor, a process known as “optical pumping.” Optical pumping can transfer order from photons to atoms, causing a buildup of vapor atoms in one angular momentum state. This vapor polarization is then transferred through the surface of the solid compound in order to polarize the nuclei in the bulk of the compound. This can produce nuclear polarizations in the sample many times larger than the limit set by thermal equilibrium. The method can be used in nuclear magnetic resonance (NMR) or magnetic resonance imaging (MRI).

Abstract translation: 本发明涉及一种通过旋光转移从光泵浦的碱蒸气偏振感兴趣的固体化合物的方法和系统。 在一个实施方案中，该方法提供了含有固体化合物以及纯碱金属和一定量缓冲气体的电池。 将电解槽加热以蒸发一些纯碱。 谐振激光通过电池以使原子蒸气偏振，一种称为“光泵浦”的过程。光泵浦可以将光子从原子转移到原子，从而在一个角动量状态下形成蒸气原子。 然后将该蒸气极化转移通过固体化合物的表面，以使化合物的主体中的核极化。 这可以在样品中产生比通过热平衡设定的极限多许多倍的核极化。 该方法可用于核磁共振（NMR）或磁共振成像（MRI）。

公开(公告)号：US20100035177A1

公开(公告)日：2010-02-11

申请号：US12443118

申请日：2007-09-13

Applicant: Kiyoshi Ishikawa ,  Jun Koshiyama ,  Kazumasa Wakiya

Inventor： Kiyoshi Ishikawa ,  Jun Koshiyama ,  Kazumasa Wakiya

IPC: G03F7/20 ,  G03F7/004

CPC classification number: H01L21/0273 ,  G03F7/0035 ,  G03F7/40 ,  H01L21/0337 ,  H01L21/0338 ,  Y10S430/128

Abstract: A novel method for forming a pattern capable of decreasing the number of steps in a double patterning process, and a material for forming a coating film suitably used in the method for forming a pattern are provided. First resist film (2) is formed by applying a first chemically amplified resist composition on support (1), and thus formed film is selectively exposed, and developed to form multiple first resist patterns (3). Next, on the surface of the first resist patterns (3) are formed multiple coating patterns (5) by forming coating films (4) constituted with a water soluble resin film, respectively. Furthermore, a second chemically amplified resist composition is applied on the support (1) having the coating pattern (5) formed thereon to form second resist film (6), which is selectively exposed and developed to form multiple second resist patterns (7). Accordingly, a pattern including the coating patterns (5) and the second resist patterns (7) is formed on the support (1).

Abstract translation: 提供一种用于形成能够减少双重图案化工艺中的台阶数的图案的新颖方法和用于形成图案的方法中适当使用的涂膜形成材料。 通过在支撑体（1）上涂覆第一化学放大抗蚀剂组合物形成第一抗蚀剂膜（2），从而形成膜被选择性地曝光并显影以形成多个第一抗蚀剂图案（3）。 接下来，通过分别形成由水溶性树脂膜构成的涂膜（4），在第一抗蚀剂图案（3）的表面上形成多个涂布图案（5）。 此外，在其上形成有涂层图案（5）的支撑体（1）上施加第二化学放大抗蚀剂组合物以形成第二抗蚀剂膜（6），其被选择性地暴露和显影以形成多个第二抗蚀剂图案（7）。 因此，在支撑体（1）上形成包括涂布图案（5）和第二抗蚀图案（7）的图案。

公开(公告)号：US20090155546A1

公开(公告)日：2009-06-18

申请号：US12064342

申请日：2006-08-28

Applicant: Naoki Yamashita ,  Kiyoshi Ishikawa ,  Yoshinori Sakamoto ,  Takuma Hojo

Inventor： Naoki Yamashita ,  Kiyoshi Ishikawa ,  Yoshinori Sakamoto ,  Takuma Hojo

IPC: B32B5/00 ,  G03F7/20 ,  G03F7/004

CPC classification number: G03F7/0043 ,  B81C99/009 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0045 ,  G03F7/0757 ,  G03F7/203 ,  Y10T428/24802

Abstract: Disclosed are a film-forming composition which can form a pattern having an enhanced contrast by the action of uneven surface morphology produced after image development, and a method for forming a pattern and a three-dimensional mold using the composition. A composition comprising at least one of a hydrolysate and a condensation product of an alkoxy metal compound represented by the chemical formula (A), the composition additionally comprising a compound which can respond to at least one of light and heat to control the solubility of a finished film in a developing solution. R1n-M(OR2)4-n  (A) wherein M represents a silicon, a germanium, a titanium, a tantalum, an indium or a tin; R1 represents a hydrogen atom or a monovalent organic group; R2 represents a monovalent organic group; and n represents an integer of 1 to 3.

Abstract translation: 公开了一种成膜组合物，其可以通过图像显影后产生的不均匀表面形态的作用形成具有增强的对比度的图案，以及使用该组合物形成图案的方法和三维模具。 一种组合物，其包含由化学式（A）表示的烷氧基金属化合物的水解产物和缩合产物中的至少一种，所述组合物另外包含可以响应于光和热中的至少一种以控制溶解度的化合物 成品薄膜在开发中的解决方案。 <？in-line-formula description =“In-line Formulas”end =“lead”？> R1n-M（OR2）4-n（A）<？in-line-formula description =“In-line Formulas”end =“尾”→其中M表示硅，锗，钛，钽，铟或锡; R1表示氢原子或一价有机基团; R2表示一价有机基团; n表示1〜3的整数。

公开(公告)号：US20090029284A1

公开(公告)日：2009-01-29

申请号：US11993444

申请日：2006-06-16

Applicant: Shogo Matsumaru ,  Toshiyuki Ogata ,  Kiyoshi Ishikawa ,  Hideo Hada ,  Shigenori Fujikawa ,  Toyoki Kunitake

Inventor： Shogo Matsumaru ,  Toshiyuki Ogata ,  Kiyoshi Ishikawa ,  Hideo Hada ,  Shigenori Fujikawa ,  Toyoki Kunitake

IPC: G03F7/075 ,  G03F7/20

CPC classification number: H01L21/0273 ,  G03F7/405

Abstract: There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask.The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.

Abstract translation: 提供一种涂覆材料，其使用在基板上形成的图案作为掩模，在蚀刻工艺中提高图案的耐蚀刻性。 该材料是使用在基板上形成的图案作为掩模的蚀刻工艺的图案涂覆材料，其包括在水解时可产生羟基的金属化合物（W）。

公开(公告)号：US5908738A

公开(公告)日：1999-06-01

申请号：US18910

申请日：1998-02-05

Applicant: Mitsuru Sato ,  Katsumi Oomori ,  Kiyoshi Ishikawa ,  Etsuko Iguchi ,  Toshimasa Nakayama

Inventor： Mitsuru Sato ,  Katsumi Oomori ,  Kiyoshi Ishikawa ,  Etsuko Iguchi ,  Toshimasa Nakayama

IPC: G03F7/004 ,  G03F7/09 ,  G03F7/11 ,  G03F7/26 ,  H01L21/027 ,  G03C1/825

CPC classification number: G03F7/091 ,  Y10S430/117 ,  Y10S430/124

Abstract: Proposed is a novel undercoating composition used in the photolithographic patterning of a photoresist layer by intervening between the substrate surface and the photoresist layer to decrease the adverse influences of the reflecting light from the substrate surface. The undercoating composition of the invention comprises (a) a melamine compound substituted by methylol groups and/or alkoxymethyl groups and (b) a polyhydroxy benzophenone compound, diphenyl sulfone compound or diphenyl sulfoxide compound, optionally, with admixture of (c) an alkali-insoluble resin of a (meth)acrylic acid ester.

Abstract translation: 提出了通过介于基板表面和光致抗蚀剂层之间用于光致抗蚀剂层的光刻图案中的新颖的底涂层组合物，以减少来自基板表面的反射光的不利影响。 本发明的底漆组合物包含（a）被羟甲基和/或烷氧基甲基取代的三聚氰胺化合物和（b）多羟基二苯甲酮化合物，二苯基砜化合物或二苯基亚砜化合物，任选地与（c） （甲基）丙烯酸酯的不溶性树脂。

公开(公告)号：US4826147A

公开(公告)日：1989-05-02

申请号：US647306

申请日：1984-09-04

Applicant: Satoshi Shino ,  Akira Sasahara ,  Kiyoshi Ishikawa ,  Shigeru Shibasaki ,  Shinji Takashina

Inventor： Satoshi Shino ,  Akira Sasahara ,  Kiyoshi Ishikawa ,  Shigeru Shibasaki ,  Shinji Takashina

IPC: B65H1/04 ,  G03G15/00 ,  B65H1/00

CPC classification number: B65H1/266 ,  B65H1/04 ,  G03G15/6502

Abstract: A dual purpose cassette is disclosed that allows the feeding of sheets in either a short edge or long edge direction. The cassette has openings on the short edge and long edge of its base and side portions so that depending on which direction the cassette is inserted into the machine sheets can be fed in the longitudinal or lateral directions.

Abstract translation: 公开了一种双用途盒，其允许片材在短边缘或长边缘方向上进给。 盒子在其基部和侧部的短边缘和长边缘上具有开口，使得根据盒子插入到机器片材中的哪个方向可以沿纵向或横向进给。

公开(公告)号：US08378863B2

公开(公告)日：2013-02-19

申请号：US13040062

申请日：2011-03-03

Applicant: Kiyoshi Ishikawa

Inventor： Kiyoshi Ishikawa

IPC: H03M1/06

CPC classification number: H03M1/00 ,  H03M1/0607 ,  H03M1/468 ,  H03M1/68 ,  H03M1/804

Abstract: An analog-to-digital (AD) converter device, includes: a capacitive digital-to-analog converter (DAC) including a reference capacitor group having capacitors which are weighted with a ratio, one terminal of each of the capacitors being coupled to a common signal line, the other terminal of each of the capacitors being coupled to one of reference power supplies via one of switches; a comparator to compare a voltage of the common signal line with a reference voltage; a successive approximation routine circuit to control the switches based on a comparison result of the comparator; an offset correction circuit to correct an offset of the comparator; and a DAC correction circuit to correct an error in a voltage change of the common signal line, the offset correction circuit and the DAC correction circuit performing a correction so that a residual offset of the comparator and a residual error of the capacitive DAC cancel.

Abstract translation: 一种模拟数字（AD）转换器装置，包括：电容性数模转换器（DAC），包括具有以比例加权的电容器的参考电容器组，每个电容器的一个端子耦合到 公共信号线，每个电容器的另一个端子经由开关中的一个耦合到参考电源之一; 将公共信号线的电压与参考电压进行比较的比较器; 基于比较器的比较结果控制开关的逐次逼近程序电路; 偏移校正电路，用于校正比较器的偏移; 以及DAC校正电路，用于校正公共信号线，偏移校正电路和DAC校正电路的电压变化中的误差，执行校正，使得比较器的残余偏移和电容性DAC的残留误差被抵消。

公开(公告)号：US07727701B2

公开(公告)日：2010-06-01

申请号：US10586694

申请日：2005-01-14

Applicant: Takuma Hojo ,  Kiyoshi Ishikawa ,  Tomoyuki Ando

Inventor： Takuma Hojo ,  Kiyoshi Ishikawa ,  Tomoyuki Ando

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/38

CPC classification number: G03F7/0397 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/122 ,  Y10S430/126

Abstract: A positive resist composition that exhibits a large exposure margin, and excellent levels of resolution and dry etching resistance, as well as a method of forming a resist pattern that uses the positive resist composition. This resist composition includes a resin component (A), which contains acid dissociable, dissolution inhibiting groups and displays increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the resin component (A) contains a structural unit (a1) represented by a general formula (I) shown below, a structural unit (a2) in which a hydroxyl group within the above general formula (I) has been protected by substituting the hydrogen atom thereof with an acid dissociable, dissolution inhibiting group (II) represented by a general formula (II) shown below, and a structural unit (a3) in which a hydroxyl group within the above general formula (I) has been protected by substituting the hydrogen atom thereof with an acyclic acid dissociable, dissolution inhibiting group (III).

Abstract translation: 显示出大的曝光裕度，优异的分辨率和耐干蚀刻性的阳性抗蚀剂组合物，以及形成使用正性抗蚀剂组合物的抗蚀剂图案的方法。 该抗蚀剂组合物包括含有酸解离的溶解抑制基团并在酸的作用下显示增加的碱溶性的树脂组分（A）和在曝光时产生酸的酸产生剂组分（B），其中树脂组分 ）包含由下述通式（I）表示的结构单元（a1），其中通过用酸取代上述通式（I）中的羟基已被保护的结构单元（a2） 由下述通式（II）表示的可离解的溶解抑制基团（II）和其中通式（I）中的羟基用其取代氢原子进行保护的结构单元（a3） 无环酸解离，溶解抑制组（III）。