公开(公告)号：US20080156969A1

公开(公告)日：2008-07-03

申请号：US11958608

申请日：2007-12-18

Applicant: Peter Ehbets

Inventor： Peter Ehbets

IPC: G01J3/50

CPC classification number: G01J3/36 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/0256 ,  G01J3/51 ,  G01J3/513 ,  G01J2003/1234

Abstract: A spectral photoelectric measurement transformer comprises an array (10) of photoelectric transformer elements and dielectric interference bandpass filters (22a, 22b) disposed on a common filter support (21) connected upstream of them for sensitizing the transformer elements to different wavelength ranges of the measurement light. The bandpass filters are divided into a number of filter groups, each of which contains the same different bandpass filters within the filter group. An optical deflector element (30) spectrally shifts the effective bandpass curves of the bandpass filters of all the filter groups except one so that the effective bandpass curves of all the bandpass filters have different spectral positions. As a result, a multiplication of the filter channels effectively made available can be achieved using only a few different bandpass filters. Due to the small number of different bandpass filters, the measurement transformer is inexpensive to manufacture.

Abstract translation: 光谱光电测量变压器包括光电变压器元件的阵列（10）和布置在其上游连接的公共滤波器支撑件（21）上的介质干涉带通滤波器（22a，22b），用于使变压器元件敏感到不同的波长范围 测量灯。 带通滤波器被分成多个滤波器组，每个滤波器组在滤波器组内包含相同的不同带通滤波器。 光偏转器元件（30）对所有滤光器组的带通滤波器的有效带通曲线进行光谱移位，除了所有滤光器组之外，所有带通滤波器的有效带通曲线具有不同的光谱位置。 结果，可以使用仅使用几个不同的带通滤波器来实现有效提供的滤波器通道的乘法。 由于少量不同的带通滤波器，测量变压器制造成本低廉。

公开(公告)号：US20070081204A1

公开(公告)日：2007-04-12

申请号：US11593184

申请日：2006-11-03

Applicant: Peter Ehbets ,  Wolfgang Geissler ,  Adrian Kohlbrenner

Inventor： Peter Ehbets ,  Wolfgang Geissler ,  Adrian Kohlbrenner

IPC: H04N1/46

CPC classification number: B41F33/0036 ,  B41P2233/51

Abstract: In a method for determining color and/or density values for use in monitoring and regulating a printing process in a printing apparatus, specifically in a sheet-fed offset printing press, measuring areas of a printed sheet are measured photoelectrically during the printing process, directly in or on the running printing apparatus. From the measured values obtained in the process, the color and/or density values for the relevant measuring areas are formed. From the measurement, measured value deviations caused directly in the printing process with respect to a measurement outside the printing process can be corrected computationally.

Abstract translation: 在用于确定用于监视和调节打印装置中的打印处理的颜色和/或密度值的方法中，特别是在单张胶版印刷机中，打印片材的测量区域在印刷过程中被光电测量 在正在运行的打印设备中或之上。 根据该过程获得的测量值，形成相关测量区域的颜色和/或密度值。 从测量中，可以计算地校正在打印过程中直接导致的相对于打印处理之外的测量的测量值偏差。

公开(公告)号：US06545808B1

公开(公告)日：2003-04-08

申请号：US09403678

申请日：2000-02-10

Applicant: Peter Ehbets ,  Michel Poirier ,  Zhihong Xu ,  Nadia Capolla

Inventor： Peter Ehbets ,  Michel Poirier ,  Zhihong Xu ,  Nadia Capolla

IPC: G02B2744

CPC classification number: G02B6/02138 ,  G02B5/1857 ,  G02B5/1871 ,  G02B6/02085 ,  G02B27/58 ,  G03F1/34 ,  G03F7/001 ,  H01S5/1225

Abstract: A phase mask (15) for modulating a collimated light beam passing therethrough, the light beam being diffracted to photoinduce a refractive index profile in a photosensitive optical medium, the phase mask (15) comprises a substrate (17) having an outer surface provided with a plurality of parallel grating corrugations (19). The grating corrugations (19) have a non-uniform relief depth across the outer surface for photoinducing a non-uniform refractive index profile in the photosensitive optical medium. The non-uniform relief depth is defined by a variable thin film layer (21) of variable thickness overlaying the substrate (17). The grating corrugations (19) can either be etched into the variable thin film layer (21) itself or be etched into the substrate (17), with the variable this film layer (21) being deposited on it after etching. Methods to make such phase masks are also provided.

Abstract translation: 一种用于调制通过其中的准直光束的相位掩模（15），所述光束被衍射以光敏光敏介质中的折射率分布，所述相位掩模（15）包括具有外表面的基板（17） 多个平行光栅波纹（19）。 光栅波纹（19）在外表面上具有不均匀的浮雕深度，用于光敏光敏介质中的不均匀折射率分布。 不均匀的浮雕深度由覆盖基板（17）的可变厚度的可变薄膜层（21）限定。 光栅波纹（19）可以自身蚀刻到可变薄膜层（21）中，或者蚀刻到衬底（17）中，在蚀刻之后可以将该膜层（21）沉积在其上。 还提供了制造这种相位掩模的方法。