公开(公告)号：US08153994B2

公开(公告)日：2012-04-10

申请号：US12592736

申请日：2009-12-02

Applicant: Marco Pedrali ,  Riccardo Ghislanzoni

Inventor： Marco Pedrali ,  Riccardo Ghislanzoni

IPC: G21K5/00

CPC classification number: G21K1/06 ,  C25D1/02 ,  C25D1/22 ,  C25D5/02 ,  C25D5/14 ,  G02B7/1815 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70175 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  Y10T29/4935

Abstract: A cooling system (10) for an extreme ultraviolet (EUV) grazing incidence collector (GIC) mirror assembly (240) having at least one shell (20) with a back surface (22) is disclosed. The cooling system has a plurality of spaced apart circularly configured cooling lines (30) arranged in parallel planes (PL) that are perpendicular to the shell central axis (AC) and that are in thermal contact with and that run around the back surface. Input and output secondary cooling-fluid manifolds (44, 46) are respectively fluidly connected to the plurality of cooling lines to flow a cooling fluid from the input secondary cooling-fluid manifold to the output cooling secondary fluid manifold over two semicircular paths for each cooling line. Separating the cooling fluid input and output locations reduces thermal gradients that can cause local surface deformations in the shell that can lead to degraded focusing performance.

Abstract translation: 公开了一种用于具有至少一个具有后表面（22）的外壳（20）的极紫外（EUV）掠入射收集器（GIC）反射镜组件（240）的冷却系统（10）。 冷却系统具有多个间隔开的圆形配置的冷却管线（30），它们布置在垂直于壳体中心轴线（AC）并且与背面表面热交换并且在其周围流动的平行平面（PL）中。 输入和输出二次冷却流体歧管（44,46）分别流体地连接到多个冷却管线，以将冷却流体从输入的二次冷却流体歧管流到输出冷却次要流体歧管两个半圆的路径，以进行每个冷却 线。 分离冷却液输入和输出位置可减少热梯度，从而导致壳体局部表面变形，从而导致聚焦性能降低。

公开(公告)号：US20120050708A1

公开(公告)日：2012-03-01

申请号：US12807166

申请日：2010-08-30

Applicant: Richard A. Levesque ,  Natale M. Ceglio ,  Glovanni Nocerino ,  Fabio Zocchi

Inventor： Richard A. Levesque ,  Natale M. Ceglio ,  Glovanni Nocerino ,  Fabio Zocchi

IPC: G03B27/70 ,  H05G2/00

CPC classification number: G02B19/0095 ,  B82Y10/00 ,  G02B19/0028 ,  G02B19/0047 ,  G03F7/70033 ,  G03F7/70166 ,  G21K1/06 ,  G21K1/062 ,  G21K1/067 ,  H05G2/005 ,  H05G2/008

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates a rotating Sn rod in the target portion to generate the EUV radiation. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Abstract translation: 用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。 使用具有光源部分和目标部分的LPP靶系统形成LPP，其中来自光源部分的脉冲激光束照射目标部分中的旋转Sn棒以产生EUV辐射。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。 还公开了利用SOCOMO的EUV光刻系统。

公开(公告)号：US20120050707A1

公开(公告)日：2012-03-01

申请号：US12807170

申请日：2010-08-30

Applicant: Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: G03B27/52 ,  H05G2/00

CPC classification number: G02B5/085 ,  G02B5/0891 ,  G02B19/0028 ,  G02B19/0095 ,  G03F7/70033 ,  G03F7/70166 ,  G21K1/06 ,  H05G2/005 ,  H05G2/008

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates a Sn wire provided by the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Abstract translation: 用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。 使用具有光源部和目标部的LPP靶系统形成LPP，其中来自光源部的脉冲激光束照射由目标部提供的Sn线。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。 还公开了利用SOCOMO的EUV光刻系统。

公开(公告)号：US20120050706A1

公开(公告)日：2012-03-01

申请号：US12807167

申请日：2010-08-30

Applicant: Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: G03B27/52 ,  H05G2/00

CPC classification number: G21K1/067 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70033 ,  G03F7/70166 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/006 ,  H05G2/008

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon ice provided by the target portion to an irradiation location. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Abstract translation: 用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。 使用具有光源部分和目标部分的LPP靶系统形成LPP，其中来自光源部分的脉冲激光束将由目标部分提供的氙冰照射到照射位置。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。 还公开了利用SOCOMO的EUV光刻系统。

公开(公告)号：US20120050704A1

公开(公告)日：2012-03-01

申请号：US12807165

申请日：2010-08-30

Applicant: Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: G03B27/42 ,  H05G2/00

CPC classification number: G21K1/067 ,  G03F7/70033 ,  G03F7/70166 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

公开(公告)号：US20120038812A1

公开(公告)日：2012-02-16

申请号：US12806350

申请日：2010-08-11

Applicant: Iain A. Neil

Inventor： Iain A. Neil

IPC: H04N5/225 ,  G02B17/06

CPC classification number: G02B17/0636 ,  G02B17/0642 ,  H04N5/2259 ,  H04N9/097

Abstract: A three-mirror anastigmatic with at least one non-rotationally symmetric mirror is disclosed. The at least one non-rotationally symmetric mirror may be an electroformed mirror shell having a non-rotationally symmetric reflective surface formed by a correspondingly shaped mandrel.

Abstract translation: 公开了具有至少一个非旋转对称镜的三镜反射镜。 至少一个非旋转对称镜可以是具有由对应形状的心轴形成的非旋转对称反射表面的电铸镜壳。

公开(公告)号：US20110242515A1

公开(公告)日：2011-10-06

申请号：US13065008

申请日：2011-03-11

Applicant: Natale M. Ceglio ,  Gopal Vasudevan

Inventor： Natale M. Ceglio ,  Gopal Vasudevan

IPC: G03F7/20 ,  G02B5/08 ,  G03B27/54

CPC classification number: G03F7/70008 ,  G02B5/0891 ,  G02B5/10 ,  G02B5/208 ,  G02B27/0927 ,  G02B27/0983 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175

Abstract: A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator. The collector mirror directs EUV radiation from an EUV radiation source towards the aperture member. The RCED redirects a portion of the EUV radiation that would not otherwise pass through the aperture of the aperture member or that would not have an optimum angular distribution, to pass through the aperture and to have an improved angular distribution better suited to input specifications of an illuminator. This provides the illuminator with greater amount of useable EUV radiation than would otherwise be available from the collector mirror alone, thereby enhancing the performing of an EUV lithography system that uses such a collector system with a RCED.

Abstract translation: 用于极紫外（EUV）辐射的收集器系统包括与照明器的孔径构件相邻布置的收集器反射镜和辐射收集增强装置（RCED）。 收集器镜将EUV辐射源的EUV辐射引导到孔径构件。 RCED将EUV辐射的一部分重新定向，否则它们将不会通过孔径构件的孔径，或者不具有最佳的角度分布，以穿过该孔，并具有更好地适合于输入规格的角分布 照明器 这为照明器提供了比单独从收集器镜可能获得的更大量的可用的EUV辐射，从而增强了使用具有RCED的这种收集器系统的EUV光刻系统的执行。

公开(公告)号：US20110168925A1

公开(公告)日：2011-07-14

申请号：US12803075

申请日：2010-06-18

Applicant: Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: H05G2/00 ,  G02B5/10 ,  G03B27/54

CPC classification number: G03F7/70941 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/10 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G21K2201/061 ,  H05G2/005

Abstract: A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.

Abstract translation: 一种用于极紫外（EUV）光刻系统的源极收集器模块，该模块包括产生EUV辐射的激光产生等离子体（LPP）和相对于其放置的放射入射收集器（GIC）反射镜，并且具有输入端和 输出端。 LPP使用LPP目标系统形成，其中脉冲激光束在轴上行进通过GIC并入射到固体，可移动的LPP靶上。 GIC反射镜相对于LPP布置，以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 提出了一个示例GIC镜面设计，其中包括一个多项式曲面图校正，以补偿GIC外壳厚度效应，从而提高远场成像性能。

公开(公告)号：US20110128513A1

公开(公告)日：2011-06-02

申请号：US12592736

申请日：2009-12-02

Applicant: Marco Pedrali ,  Ricardo Ghislanzoni

Inventor： Marco Pedrali ,  Ricardo Ghislanzoni

IPC: G03B27/52 ,  F28D15/00 ,  F28F9/02 ,  B21D53/02

CPC classification number: G21K1/06 ,  C25D1/02 ,  C25D1/22 ,  C25D5/02 ,  C25D5/14 ,  G02B7/1815 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70175 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  Y10T29/4935

Abstract: A cooling system (10) for an extreme ultraviolet (EUV) grazing incidence collector (GIC) mirror assembly (240) having at least one shell (20) with a back surface (22) is disclosed. The cooling system has a plurality of spaced apart circularly configured cooling lines (30) arranged in parallel planes (PL) that are perpendicular to the shell central axis (AC) and that are in thermal contact with and that run around the back surface.Input and output secondary cooling-fluid manifolds (44, 46) are respectively fluidly connected to the plurality of cooling lines to flow a cooling fluid from the input secondary cooling-fluid manifold to the output cooling secondary fluid manifold over two semicircular paths for each cooling line. Separating the cooling fluid input and output locations reduces thermal gradients that can cause local surface deformations in the shell that can lead to degraded focusing performance.

Abstract translation: 公开了一种用于具有至少一个具有后表面（22）的外壳（20）的极紫外（EUV）掠入射收集器（GIC）反射镜组件（240）的冷却系统（10）。 冷却系统具有多个间隔开的圆形配置的冷却管线（30），它们布置在垂直于壳体中心轴线（AC）并且与背面表面热交换并且在其周围流动的平行平面（PL）中。 输入和输出二次冷却流体歧管（44,46）分别流体地连接到多个冷却管线，以将冷却流体从输入的二次冷却流体歧管流到输出冷却次要流体歧管两个半圆的路径，以进行每个冷却 线。 分离冷却液输入和输出位置可减少热梯度，从而导致壳体局部表面变形，从而导致聚焦性能降低。

公开(公告)号：US20240222744A1

公开(公告)日：2024-07-04

申请号：US18560785

申请日：2022-05-16

Applicant: Media Lario s.r.l. ,  Politecnico di Milano

Inventor： Giuseppe Valsecchi ,  Robert David Banham ,  Caterina Rigamonti ,  Luca Magagnin

IPC: H01M12/08 ,  H01M4/42 ,  H01M4/86 ,  H01M8/18 ,  H01M16/00

CPC classification number: H01M12/08 ,  H01M4/42 ,  H01M4/8652 ,  H01M8/18 ,  H01M16/006

Abstract: The Zinc air cell is circular and includes a chamber for the electrolyte flowing, a cathode, an anode, a container structure of the electrolyte chamber and a cathode current collector. A contact element electrically connects the cathode to the anode current collector of the adjacent cell to close the circuit. This Zinc-Air rechargeable flow battery cell includes at least one carbon porous air electrode (positive electrode) for the synthesis of oxygen reduction reaction (ORR)/oxygen evolution reaction (OER). Furthermore, it includes an alkaline gel polymeric membrane (GPM) with hydroxide ion conductivity or a composite polymer electrolyte (CPE), and at least one metal negative electrode including zinc or zinc alloy or an inert conductive electrode where zinc deposition occurs during battery discharging. An aqueous electrolyte solution is adapted to flow through a housing and containing a zinc-based nanoelectrofuel. The carbon porous air electrode is an oxygen reduction reaction (ORR) catalyst. There is casing in which said components are positioned, and an inlet and an outlet are located within and traverse said casing and are constructed to permit the exchange of the aqueous electrolyte in the cell and in the reservoir.