Automatic observation apparatus for detecting mineral samples
    31.
    发明授权
    Automatic observation apparatus for detecting mineral samples 有权
    自动观察装置,用于检测矿物样品

    公开(公告)号:US09506857B2

    公开(公告)日:2016-11-29

    申请号:US14909732

    申请日:2015-06-16

    CPC classification number: G01N21/4133 G01N21/87 G01N33/38 G01N2201/025

    Abstract: An automatic observation apparatus for detecting mineral samples comprises a base (1), a supporting arm (2), a sample fixing device (3), a stepper motor (4), a high-definition camera (5) and a control system (6). A refractometer is fixed on the base (1). A vertical through hole is formed at the top end of the supporting arm (2), and a lifting rod (211) penetrates through the vertical through hole and is matched with the vertical through hole in shape. A cavity is formed at the top end of the supporting arm (2), a gear (216) is mounted in the cavity, and the gear (216) is meshed with a rack (215) of the lifting rod (211). The sample fixing device (3) is a right-hexagonal-prism shell with the top end sealed, a spring (312) is arranged in a vertical hole of the sample fixing device, a sample locating head fixing device (314) is arranged at the lower end of the spring (312), a blind hole is formed in the lower end of the sample locating head fixing device (314), and a sample locating head (316) is matched with the blind hole in the lower end of the sample locating head fixing device (314). The apparatus can conveniently and efficiently fix samples, stray light interference is avoided, mineral samples can be rotated to be observed from different angles, and mineral sample detection accuracy is improved.

    Abstract translation: 用于检测矿物样品的自动观察装置包括基座(1),支撑臂(2),样品固定装置(3),步进马达(4),高清晰度照相机(5)和控制系统 6)。 折射计固定在基座(1)上。 在支撑臂(2)的顶端形成有垂直通孔,提升杆(211)穿过垂直通孔并与垂直通孔形状匹配。 在支撑臂(2)的顶端形成有空腔,齿轮(216)安装在空腔中,齿轮(216)与提升杆(211)的齿条(215)啮合。 样品定影装置(3)是顶端密封的右六边形棱镜壳体,在样品固定装置的垂直孔中设置弹簧(312),样品定位头固定装置(314)布置在 弹簧(312)的下端,在样品定位头固定装置(314)的下端形成有盲孔,并且样品定位头(316)与下端的盲孔匹配 样品定位头固定装置(314)。 该设备可以方便有效地固定样品,避免杂散光干扰,矿物样品可以从不同角度旋转观察,矿物样品检测精度提高。

    SPECTROSCOPY APPARATUS AND METHODS
    32.
    发明申请
    SPECTROSCOPY APPARATUS AND METHODS 审中-公开
    光谱仪器和方法

    公开(公告)号:US20160238533A1

    公开(公告)日:2016-08-18

    申请号:US15025464

    申请日:2014-09-30

    Applicant: RENISHAW PLC

    Abstract: This invention concerns spectroscopy apparatus comprising a light source arranged to generate a light profile on a sample, a photodetector having at least one photodetector element for detecting characteristic light generated from interaction of the sample with light from the light source, a support for supporting the sample, the support movable relative to the light profile, and a processing unit. The processing unit is arranged to associate a spectral value recorded by the photodetector element at a particular time with a point on the sample predicted to have generated the characteristic light recorded by the photodetector element at the particular time based on relative motion anticipated to have occurred between the support and the light profile.

    Abstract translation: 本发明涉及光谱装置,其包括被配置为在样品上产生光分布的光源,具有至少一个光电探测元件的光电检测器,该光电检测元件用于检测由样品与来自光源的光的相互作用产生的特征光;支撑样品 ,相对于光轮廓可移动的支撑件,以及处理单元。 处理单元被布置为将由特定时间的光电检测器元件记录的光谱值与预测的样品上的点相关联,以在特定时间基于由光电检测器元件记录的特征光,基于预期发生在 支持和光线。

    Methods for gas leak detection and localization in populated areas using two or more tracer measurements
    33.
    发明申请
    Methods for gas leak detection and localization in populated areas using two or more tracer measurements 审中-公开
    使用两次或多次示踪剂测量的人口稠密地区气体泄漏检测和定位方法

    公开(公告)号:US20160216172A1

    公开(公告)日:2016-07-28

    申请号:US15088885

    申请日:2016-04-01

    Applicant: Picarro, Inc.

    Abstract: Improved gas leak detection from moving platforms is provided. Automatic horizontal spatial scale analysis can be performed in order to distinguish a leak from background levels of the measured gas. Source identification can be provided by using two or more tracer measurements of isotopic ratios and/or chemical tracers to distinguish gas leaks from other sources of the measured gas. Multi-point measurements combined with spatial analysis of the multi-point measurement results can provide leak source distance estimates. Qualitative source identification is provided. These methods can be practiced individually or in any combination.

    Abstract translation: 提供了从移动平台改进的气体泄漏检测。 可以进行自动水平空间尺度分析,以区分泄漏与被测气体的背景水平。 可以通过使用两个或更多个同位素比率和/或化学示踪剂的示踪剂测量来提供源识别,以区分气体泄漏与测量气体的其他来源。 多点测量结合多点测量结果的空间分析可以提供泄漏源距离估计。 提供定性来源识别。 这些方法可以单独或以任何组合实施。

    Wafer edge detection and inspection
    34.
    发明授权
    Wafer edge detection and inspection 有权
    晶圆边缘检测和检查

    公开(公告)号:US09377416B2

    公开(公告)日:2016-06-28

    申请号:US14709427

    申请日:2015-05-11

    Abstract: Methods and systems for determining wafer inspection coordinates for fixed location(s) on a wafer are provided. One system includes an illumination subsystem configured to direct light to a spot on an edge of a wafer. The spot extends beyond the edge of the wafer. The system also includes a stage that rotates the wafer thereby causing the spot to be scanned over the edge of the wafer. The system also includes a detector configured to detect light from the spot while the spot is being scanned over the edge and to generate output responsive thereto. The system further includes a computer processor configured to determine wafer inspection coordinates of two or more locations on the edge of the wafer based on the output and to determine wafer inspection coordinates of fixed location(s) on the wafer based on the wafer inspection coordinates of the two or more locations on the edge.

    Abstract translation: 提供了用于确定晶片上固定位置的晶片检查坐标的方法和系统。 一个系统包括被配置为将光引导到晶片边缘上的点的照明子系统。 斑点延伸超过晶片的边缘。 该系统还包括使晶片旋转的台,从而使光斑在晶片的边缘上扫描。 该系统还包括检测器,其被配置为在斑点被扫描在边缘上时检测来自斑点的光并且响应于此产生输出。 该系统还包括计算机处理器,其被配置为基于输出来确定晶片边缘上的两个或更多个位置的晶片检查坐标,并且基于晶片的晶片检查坐标来确定晶片上固定位置的晶片检查坐标 边缘上的两个或多个位置。

    Laser scanning microscope system and method of setting laser-light intensity value
    35.
    发明授权
    Laser scanning microscope system and method of setting laser-light intensity value 有权
    激光扫描显微镜系统和设置激光光强度值的方法

    公开(公告)号:US09304085B2

    公开(公告)日:2016-04-05

    申请号:US14516798

    申请日:2014-10-17

    Abstract: A method of setting a laser-light intensity value includes: emitting laser light, the laser light being excitation light, a fluorescent-dyed biological sample being irradiated with the excitation light and emitting light; detecting fluorescence emitted by the biological sample, and outputting a signal corresponding to a brightness value; prestoring relation information, the relation information including the plurality of laser-light intensity values, and information on at least one possible correlation between a phototoxicity degree and the brightness value in relation to each of the laser-light intensity values, the phototoxicity to the biological sample resulting from the laser light; generating a fluorescence image having the brightness value based on the output signal; calculating a brightness value representative of a ROI area based on the generated fluorescence image; and referring to the relation information, and determining a laser-light intensity value satisfying tolerance of the phototoxicity based on the calculated representative brightness value.

    Abstract translation: 设置激光强度值的方法包括:发射激光,激光作为激发光,荧光染色的生物样品被激发光照射并发射光; 检测由生物样品发出的荧光,并输出与亮度值对应的信号; 预定关系信息,包括多个激光光强度值的关系信息,以及关于每个激光强度值的光毒性度和亮度值之间的至少一个可能的相关性的信息,对生物学的光毒性 由激光产生的样品; 产生具有基于输出信号的亮度值的荧光图像; 基于所生成的荧光图像计算代表ROI区域的亮度值; 并且参考关系信息,并且基于计算的代表亮度值来确定满足光毒性的容许度的激光光强度值。

    Wafer Edge Detection and Inspection
    36.
    发明申请
    Wafer Edge Detection and Inspection 有权
    晶圆边缘检测和检查

    公开(公告)号:US20150330914A1

    公开(公告)日:2015-11-19

    申请号:US14709427

    申请日:2015-05-11

    Abstract: Methods and systems for determining wafer inspection coordinates for fixed location(s) on a wafer are provided. One system includes an illumination subsystem configured to direct light to a spot on an edge of a wafer. The spot extends beyond the edge of the wafer. The system also includes a stage that rotates the wafer thereby causing the spot to be scanned over the edge of the wafer. The system also includes a detector configured to detect light from the spot while the spot is being scanned over the edge and to generate output responsive thereto. The system further includes a computer processor configured to determine wafer inspection coordinates of two or more locations on the edge of the wafer based on the output and to determine wafer inspection coordinates of fixed location(s) on the wafer based on the wafer inspection coordinates of the two or more locations on the edge.

    Abstract translation: 提供了用于确定晶片上固定位置的晶片检查坐标的方法和系统。 一个系统包括被配置为将光引导到晶片边缘上的点的照明子系统。 斑点延伸超过晶片的边缘。 该系统还包括使晶片旋转的台,从而使光斑在晶片的边缘上扫描。 该系统还包括检测器,其被配置为在斑点被扫描在边缘上时检测来自斑点的光并且响应于此产生输出。 该系统还包括计算机处理器,其被配置为基于输出来确定晶片边缘上的两个或更多个位置的晶片检查坐标,并且基于晶片的晶片检查坐标来确定晶片上固定位置的晶片检查坐标 边缘上的两个或多个位置。

    INSPECTION DEVICE AND INSPECTION SYSTEM FOR DISPLAY SUBSTRATE
    37.
    发明申请
    INSPECTION DEVICE AND INSPECTION SYSTEM FOR DISPLAY SUBSTRATE 有权
    用于显示基板的检查装置和检查系统

    公开(公告)号:US20150330891A1

    公开(公告)日:2015-11-19

    申请号:US14499567

    申请日:2014-09-29

    Abstract: The present disclosure relates to a technical field of display substrate inspection. The present disclosure discloses an inspection device and an inspection system for display substrate. The inspection device includes a support member, a turning table and a first drive device. The turning table includes: a carrier pivotally mounted on a pivot shaft, the carrier having an observation aperture through its thickness direction; and positioning clamps which are mounted on the carrier and are used to retain the display substrate in the range of the observation aperture. The first drive device is in transmission connection with the pivot shaft of the carrier in order to drive the turning table to rotate around the pivot shaft. When inspecting the appearance of the display substrate by the above mentioned inspection device, omnidirectional inspection of the display substrate can be achieved by turning the turning table. Moreover, the contact between the inspector and the display substrate can be avoided, the risk of damaging the display substrate during appearance inspection can be decreased, and therefore defects of the display substrate caused by appearance inspection can be reduced.

    Abstract translation: 本公开涉及显示基板检查的技术领域。 本公开公开了一种用于显示基板的检查装置和检查系统。 检查装置包括支撑构件,转台和第一驱动装置。 转台包括:枢转地安装在枢轴上的托架,托架具有穿过其厚度方向的观察孔; 以及安装在载体上并用于将显示基板保持在观察孔的范围内的定位夹。 第一驱动装置与载体的枢轴传动连接,以驱动转台围绕枢转轴转动。 当通过上述检查装置检查显示基板的外观时,可以通过转动转台来实现对显示基板的全方位检查。 此外,可以避免检查者和显示基板之间的接触,可以减少在外观检查期间损坏显示基板的风险,因此可以减少由外观检查引起的显示基板的缺陷。

    METHOD FOR THE EVALUATION OF THE COLLOIDAL STABILITY OF LIQUID BIOPOLYMER SOLUTIONS
    39.
    发明申请
    METHOD FOR THE EVALUATION OF THE COLLOIDAL STABILITY OF LIQUID BIOPOLYMER SOLUTIONS 有权
    评价液体生物反应器溶液的胶体稳定性的方法

    公开(公告)号:US20150015886A1

    公开(公告)日:2015-01-15

    申请号:US14381697

    申请日:2013-02-27

    Abstract: The invention concerns the field of biomolecule formulation screening and stability testing. It concerns a method for the evaluation of the colloidal stability of liquid biopolymer solutions. The present invention describes a method for determining the stability of a liquid pharmaceutical composition comprising: a) providing a liquid pharmaceutical composition in a container, b) shaking said container on a shaker, whereby the shaker performs an oloid movement, c) determining the stability of said liquid pharmaceutical composition.

    Abstract translation: 本发明涉及生物分子制剂筛选和稳定性测试领域。 它涉及评估液体生物聚合物溶液的胶体稳定性的方法。 本发明描述了一种用于确定液体药物组合物的稳定性的方法,其包括:a)在容器中提供液体药物组合物,b)在振荡器上摇动所述容器,由此所述振动器进行o运动,c)确定稳定性 的所述液体药物组合物。

    Methods for gas leak detection and localization in populated areas using horizontal analysis
    40.
    发明申请
    Methods for gas leak detection and localization in populated areas using horizontal analysis 有权
    采用横向分析方法对人口稠密地区进行气体泄漏检测和定位

    公开(公告)号:US20140032160A1

    公开(公告)日:2014-01-30

    申请号:US13656080

    申请日:2012-10-19

    Applicant: Picarro, Inc.

    CPC classification number: G01M3/20 G01N21/3504 G01N33/0004 G01N2201/025

    Abstract: Improved gas leak detection from moving platforms is provided. Automatic horizontal spatial scale analysis can be performed in order to distinguish a leak from background levels of the measured gas. Source identification can be provided by using isotopic ratios and/or chemical tracers to distinguish gas leaks from other sources of the measured gas. Multi-point measurements combined with spatial analysis of the multi-point measurement results can provide leak source distance estimates. These methods can be practiced individually or in any combination.

    Abstract translation: 提供了从移动平台改进的气体泄漏检测。 可以进行自动水平空间尺度分析,以区分泄漏与被测气体的背景水平。 可以通过使用同位素比率和/或化学示踪剂来提供源识别,以区分气体泄漏与测量气体的其他来源。 多点测量结合多点测量结果的空间分析可以提供泄漏源距离估计。 这些方法可以单独或以任何组合实施。

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