公开(公告)号：US20130135602A1

公开(公告)日：2013-05-30

申请号：US13816462

申请日：2011-07-22

Applicant: Michinobu Mizumura

Inventor： Michinobu Mizumura

IPC: G03F7/20

CPC classification number: G03F7/2002 ,  G03F7/201 ,  G03F7/70258 ,  G03F7/70275 ,  G03F7/70358

Abstract: A scanning exposure apparatus using microlens arrays, includes a plurality of microlens arrays is arrayed in a direction perpendicular to a scanning direction above a substrate to be exposed, and the microlens arrays are supported on a support substrate. The microlens arrays can be supported on a support substrate so as to be capable of being inclined from a direction parallel to the exposure substrate, relative to the direction in which the microlens arrays are arranged. The inclination angles of these microlens arrays are configured so as to gradually increase or decrease along the arrangement direction.

Abstract translation: 使用微透镜阵列的扫描曝光装置包括多个微透镜阵列沿垂直于待曝光的衬底上的扫描方向的方向排列，并且微透镜阵列被支撑在支撑衬底上。 微透镜阵列可以被支撑在支撑基板上，以便能够相对于布置微透镜阵列的方向从平行于曝光基板的方向倾斜。 这些微透镜阵列的倾斜角度被配置成沿着排列方向逐渐增大或减小。

公开(公告)号：US08298752B2

公开(公告)日：2012-10-30

申请号：US12530992

申请日：2008-03-19

Applicant: Hideki Etori

Inventor： Hideki Etori

IPC: G02B5/02

CPC classification number: G02B5/0278 ,  B29C33/3842 ,  B29C33/424 ,  G02B3/0012 ,  G02B5/021 ,  G02B5/0226 ,  G02B5/0242 ,  G02B5/0268 ,  G02F1/1303 ,  G02F1/133707 ,  G03F7/0005 ,  G03F7/2008 ,  G03F7/201 ,  G03F7/70075 ,  G03F7/7035 ,  G03F7/70533

Abstract: A method for producing surface convexes or concaves disposes a mask member having light transmitting sections and non-light transmitting sections over and spaced from one side of a photosensitive film including a photosensitive resin composition, and a light diffusing member is disposed on the opposite side of the photosensitive film across the mask member. Light is irradiated from a light source disposed on the opposite side of the mask member across the light diffusing member to subject the photosensitive film to light exposure through the light diffusing member and the light transmitting sections of the mask member. Exposed portions or unexposed portions of the photosensitive film are removed by development to produce convexes or concaves on the photosensitive film in shapes determined by shapes of the exposed portions or unexposed portions. In exposure, conditions such as haze of the light diffusing member are controlled to control the shapes of the exposed portions or unexposed portions.

Abstract translation: 制造表面凸部或凹部的方法将具有透光部和非透光部的掩模构件配置在包含感光性树脂组合物的感光性膜的一侧之上并与之隔开的光扩散部件配置在 遮光构件上的感光膜。 光从设置在掩模构件的相反侧的光源穿过光漫射构件照射，以使感光膜通过光漫射构件和掩模构件的透光部分进行曝光。 通过显影去除感光膜的曝光部分或未曝光部分，以在曝光部分或未曝光部分的形状确定的形状在感光膜上产生凸起或凹陷。 在曝光中，控制诸如光漫射构件的雾度的条件以控制曝光部分或未曝光部分的形状。

公开(公告)号：US20120214104A1

公开(公告)日：2012-08-23

申请号：US13501897

申请日：2010-10-14

Applicant: Takaaki Suzuki ,  Hidetoshi Kotera ,  Isaku Kanno ,  Daisuke Hiramaru

Inventor： Takaaki Suzuki ,  Hidetoshi Kotera ,  Isaku Kanno ,  Daisuke Hiramaru

IPC: G03F7/20

CPC classification number: G03F7/0037 ,  B81C1/00126 ,  B81C99/002 ,  G03F1/14 ,  G03F1/38 ,  G03F1/50 ,  G03F7/2002 ,  G03F7/201

Abstract: The disclosed method for producing a microstructure can form a complicated three-dimensionally formed microstructure with few steps.A first mask pattern (22) containing a light transmitting section and a light blocking section is disposed along an unexposed photosensitive resin (42), and a second mask pattern (32) containing a light transmitting section and a light blocking section is disposed on the reverse side of the first mask pattern (22) from the photosensitive resin (42). Additionally, by means of integrally rotating the photosensitive resin (42) and the first mask pattern (22) around a central axis (Z) that passes through the photosensitive resin (42) and the first mask pattern (22), and at the same time radiating exposure light from the reverse side of the second mask pattern (32) from the photosensitive resin (42) and the first mask pattern (22) in a direction that is inclined obliquely with respect to the direction of the central axis (Z), the light beam of the exposure light that is transmitted through the light transmitting section of the second mask pattern (32) and the light transmitting section of the first mask pattern (22) exposes the photosensitive resin (42).

Abstract translation: 所公开的微结构制造方法可以以几步形成复杂的三维形成的微结构。 沿着未曝光的感光性树脂（42）设置包含透光部和遮光部的第一掩模图案（22），将含有透光部和遮光部的第二掩模图案（32）配置在 第一掩模图案（22）与感光性树脂（42）的反面。 此外，通过使感光性树脂（42）和第一掩模图案（22）围绕通过感光性树脂（42）和第一掩模图案（22）的中心轴（Z）一体地旋转，并且在同一 在相对于中心轴线（Z）的方向倾斜倾斜的方向上，从第二掩模图案的背面照射来自感光性树脂（42）和第一掩模图案（22）的曝光光， 通过第二掩模图案（32）的透光部分透射的曝光光的光束和第一掩模图案（22）的透光部分暴露感光性树脂（42）。

公开(公告)号：US20100112465A1

公开(公告)日：2010-05-06

申请号：US12607612

申请日：2009-10-28

Applicant: Heiko Feldmann

Inventor： Heiko Feldmann

IPC: G03F7/20 ,  G03B27/42 ,  G03F1/00

CPC classification number: G03F7/70258 ,  G02B5/0236 ,  G02B5/0284 ,  G02B5/32 ,  G03F7/0037 ,  G03F7/201 ,  G03F7/70341 ,  G03F7/70416

Abstract: The disclosure relates to an optical arrangement for three-dimensionally patterning a radiation-sensitive material layer, such as a projection exposure apparatus for microlithography. The optical arrangement includes a mask for forming a three-dimensional radiation pattern, a substrate with the radiation-sensitive material layer, and a projection optical unit for imaging the three-dimensional radiation pattern from the mask into the radiation-sensitive material layer. The optical arrangement is designed to compensate for spherical aberrations along the thickness direction of the radiation-sensitive material layer in order to generate a stigmatic image of the three-dimensional radiation pattern.

Abstract translation: 本公开涉及用于三维图案化辐射敏感材料层的光学装置，例如用于微光刻的投影曝光装置。 光学装置包括用于形成三维辐射图案的掩模，具有辐射敏感材料层的基板和用于将三维辐射图案从掩模成像到辐射敏感材料层中的投影光学单元。 光学布置被设计为补偿沿着辐射敏感材料层的厚度方向的球面像差，以便产生三维辐射图案的连续图像。

公开(公告)号：US20100046079A1

公开(公告)日：2010-02-25

申请号：US10584409

申请日：2005-02-04

Applicant: Jun-Bo Yoon ,  Sung-il Chang ,  Dae-Hyun Kim ,  Hyung Suk Lee ,  Joon-Yong Choi ,  Weon-Wi Jang ,  Kyungho Lee

Inventor： Jun-Bo Yoon ,  Sung-il Chang ,  Dae-Hyun Kim ,  Hyung Suk Lee ,  Joon-Yong Choi ,  Weon-Wi Jang ,  Kyungho Lee

IPC: G02B27/12 ,  G03F7/20 ,  B32B3/00 ,  B29D11/00 ,  H01H57/00 ,  H05K1/00

CPC classification number: H01L21/0272 ,  B81B2203/0118 ,  B81B2203/019 ,  B81B2203/04 ,  B81C1/0015 ,  B81C1/00166 ,  G02B3/0012 ,  G02B3/0056 ,  G03F7/0005 ,  G03F7/201 ,  G03F7/2014 ,  H01L21/0274 ,  H01L21/76885 ,  H01L23/5222 ,  H01L2924/0002 ,  Y10T428/24479 ,  H01L2924/00

Abstract: The present invention relates to polymer patterns of various shapes formed using modifications of means and methods used in the prior lithography process, and the metal film patterns, metal patterns and plastic molds using the polymer patterns, as well as methods of forming these patterns and molds. The method of forming the polymer patterns comprises the steps of: (a) depositing a photosensitive polymer on the substrate to form a polymer film; (b) placing a photomask on the polymer film; and (c) irradiating the polymer film with a light moving in random direction through the photomask, so as to form at least one pattern which is concave from the surface of the polymer film in a direction perpendicular to the substrate and extends in a direction parallel to the substrate. The inventive polymer patterns have at least one pattern which is concave from the surface of the polymer film in a direction perpendicular to the substrate and extends in a direction parallel to the substrate. The vertical cross-section of the concave patterns has at least one curved surface.

Abstract translation: 本发明涉及使用在现有光刻工艺中使用的方法和方法的改进形成的各种形状的聚合物图案，以及使用聚合物图案的金属膜图案，金属图案和塑料模具以及形成这些图案和模具的方法 。 形成聚合物图案的方法包括以下步骤：（a）将光敏聚合物沉积在基底上以形成聚合物膜; （b）将光掩模放在聚合物膜上; 和（c）以沿随机方向移动的光照射聚合物膜通过光掩模，从而形成至少一个图案，该图案在垂直于基底的方向上从聚合物膜的表面凹入并在平行方向上延伸 到基底。 本发明的聚合物图案具有至少一种图案，其在垂直于基底的方向上从聚合物膜的表面凹入，并且在平行于基底的方向上延伸。 凹形图案的垂直横截面具有至少一个曲面。

公开(公告)号：US07656504B1

公开(公告)日：2010-02-02

申请号：US08376676

申请日：1995-01-20

Applicant: Naomasa Shiraishi

Inventor： Naomasa Shiraishi

IPC: G03B27/54 ,  G03B27/42 ,  G03B27/72

CPC classification number: G03B27/42 ,  G03B27/72 ,  G03F7/201 ,  G03F7/70066 ,  G03F7/70108 ,  G03F7/70141 ,  G03F7/70158 ,  G03F7/70208 ,  G03F7/70316 ,  G03F7/70333 ,  G03F7/70358 ,  G03F7/7055 ,  G03F9/7088

Abstract: An exposure system is provided for illuminating a fine pattern that may have features extending along orthogonal first and second linear directions. An illumination source may be provided having decreased intensity portions at a center and defined along the first and second directions.

Abstract translation: 提供曝光系统，用于照亮可能具有沿正交的第一和第二直线方向延伸的特征的精细图案。 可以提供在中心具有降低的强度部分并沿第一和第二方向限定的照明源。

公开(公告)号：US20090290891A1

公开(公告)日：2009-11-26

申请号：US12467055

申请日：2009-05-15

Applicant: Wolfgang Sievers

Inventor： Wolfgang Sievers

IPC: G03G15/043 ,  G03G15/04

CPC classification number: G03F7/2051 ,  G03F7/2008 ,  G03F7/201 ,  G03F7/2012 ,  G03F7/2057 ,  G03F7/24

Abstract: An apparatus, a method, and a plate made by the method, e.g., using the apparatus. The apparatus includes a light tunnel of light reflective walls with polygonal cross-section like a kaleidoscope, and a light source, located at one end to produce light radiation to the inside of the light tunnel towards the other end. Light entering the light tunnel towards an inner reflective surface of a wall is reflected off the inner reflective surface so that it can emerge from the other end to cure a plate having photo-curable material thereon.

Abstract translation: 通过该方法制造的装置，方法和板，例如使用该装置。 该装置包括具有像万花筒的多边形横截面的光反射壁的光通道和位于一端的光源，以产生朝向另一端的光通道内部的光辐射。 进入光通道朝向内壁反射表面的光从内部反射表面反射出来，从而可以从另一端出来固化其上具有光固化材料的板。

公开(公告)号：US20090102018A1

公开(公告)日：2009-04-23

申请号：US12276152

申请日：2008-11-21

Applicant: Donald L. Yates ,  Garry A. Mercaldi

Inventor： Donald L. Yates ,  Garry A. Mercaldi

IPC: H01L29/92

CPC classification number: H01L28/92 ,  G03F7/0035 ,  G03F7/201 ,  H01L21/0273 ,  H01L21/0274 ,  H01L21/0275 ,  H01L21/32139 ,  H01L27/10852 ,  H01L28/84 ,  H01L28/91

Abstract: Container structures for use in integrated circuits and methods of their manufacture without the use of mechanical planarization such as chemical-mechanical planarization (CMP), thus eliminating CMP-induced defects and variations. The methods utilize localized masking of holes for protection of the inside of the holes during non-mechanical removal of exposed surface layers. The localized masking is accomplished through differential exposure of a resist layer to electromagnetic or thermal energy. The container structures are adapted for use in memory cells and apparatus incorporating such memory cells, as well as other integrated circuits.

Abstract translation: 用于集成电路的容器结构及其制造方法，而不使用机械平面化（例如化学机械平面化（CMP）），从而消除了CMP引起的缺陷和变化。 该方法利用在非机械去除暴露的表面层期间的孔的局部掩蔽来保护孔的内部。 通过将抗蚀剂层与电磁或热能的差分曝光来实现局部掩蔽。 容器结构适用于并入这种存储单元的存储器单元和装置以及其它集成电路。

公开(公告)号：US07382959B1

公开(公告)日：2008-06-03

申请号：US11580335

申请日：2006-10-13

Applicant: Alan J. Jacobsen

Inventor： Alan J. Jacobsen

IPC: G02B6/10 ,  G03C5/00 ,  G03C5/04

CPC classification number: G02B6/10 ,  B82Y20/00 ,  G02B1/005 ,  G02B6/1221 ,  G02B6/1225 ,  G02B6/138 ,  G03F7/0005 ,  G03F7/0037 ,  G03F7/201 ,  G03F7/2012

Abstract: A method and system of creating one or more waveguides and/or patterning these waveguides to form a 3D microstructure that uses mask and collimated light. In one embodiment, the system includes at least one collimated light source selected to produce a collimated light beam; a reservoir having a photo-monomer adapted to polymerize by the collimated light beam; and a mask having at least one aperture and positioned between the at least one collimated light source and the reservoir. Here, the at least one aperture is adapted to guide a portion of the collimated light beam into the photo-monomer to form the at least one polymer waveguide through a portion of a volume of the photo-monomer.

Abstract translation: 创建一个或多个波导和/或图案化这些波导以形成使用掩模和准直光的3D微结构的方法和系统。 在一个实施例中，系统包括被选择用于产生准直光束的至少一个准直光源; 具有适于通过准直光束聚合的光单体的储存器; 以及具有至少一个孔并且定位在所述至少一个准直光源和所述储存器之间的掩模。 这里，至少一个孔适于将准直光束的一部分引导到光单体中以通过一部分光单体的一部分形成至少一个聚合物波导。

公开(公告)号：US20060110694A1

公开(公告)日：2006-05-25

申请号：US11301605

申请日：2005-12-13

Applicant: Chin-Hsiang Lin

Inventor： Chin-Hsiang Lin

IPC: G01B9/02 ,  G03F7/20

CPC classification number: G03F7/203 ,  G03F7/001 ,  G03F7/201

Abstract: A method for forming an arbitrary pattern of sub-micron contact holes in a substrate using a combination of interferometric photolithography and optical photolithography with a non-critical mask. The substrate is covered with a photosensitive material and is exposed by a standing wave interference pattern produced by the superposition of two coherent laser beams. Then the substrate is rotated through 90° and exposed by the same pattern. The double exposure produces a regular array of sub-micron unexposed regions which are all potentially holes if developed. The photosensitive material is then covered by a non-critical photomask and a standard light source is used to exposed those areas of the photosensitive material containing unwanted holes. Upon final development, the desired pattern is obtained.

Abstract translation: 使用干涉光刻和具有非临界掩模的光学光刻的组合在衬底中形成亚微米接触孔的任意图案的方法。 衬底被感光材料覆盖，并且通过由两个相干激光束的叠加产生的驻波干涉图案曝光。 然后将基板旋转90°并以相同的图案曝光。 双重曝光产生了亚微米未曝光区域的规则阵列，如果显影，这些区域都是潜在的孔。 感光材料然后被非关键光掩模覆盖，并且使用标准光源来曝光含有不想要的孔的感光材料的那些区域。 在最终显影时，获得所需的图案。