公开(公告)号：US20090231707A1

公开(公告)日：2009-09-17

申请号：US12403233

申请日：2009-03-12

Applicant: Dirk Heinrich EHM ,  Stephan MUELLENDER ,  Thomas STEIN ,  Johannes Hubertus Josephina MOORS ,  Bastiaan Theodoor WOLSCHRIJN ,  Dieter KRAUS ,  Richard VERSLUIS ,  Marcus Gerhardus Hendrikus MEIJERINK

Inventor： Dirk Heinrich EHM ,  Stephan MUELLENDER ,  Thomas STEIN ,  Johannes Hubertus Josephina MOORS ,  Bastiaan Theodoor WOLSCHRIJN ,  Dieter KRAUS ,  Richard VERSLUIS ,  Marcus Gerhardus Hendrikus MEIJERINK

IPC: B60R1/06

CPC classification number: G03B27/16 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70883 ,  G03F7/70916 ,  G21K2201/061

Abstract: An optical arrangement, in particular a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) that encloses an interior space (15); at least one, in particular reflective, optical element (4 to 10, 12, 14.1 to 14.6) that is arranged in the housing (2); at least one vacuum generating unit (3) for generating a vacuum in the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1 to 18.10) that is arranged in the interior space (15) of the housing (2) and that encloses at least the optical surface (17, 17.1, 17.2) of the optical element (4 to 10, 12, 14.1 to 14.5), wherein a contamination reduction unit is associated with the vacuum housing (18.1 to 18.10), which contamination reduction unit reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).

Abstract translation: 光学装置，特别是用于EUV光刻的投影曝光装置（1）包括：封闭内部空间（15）的壳体（2）; 布置在壳体（2）中的至少一个特别是反射的光学元件（4至10,12,14.1至14.6）; 至少一个用于在所述壳体（2）的内部空间（15）中产生真空的真空发生单元（3）; 以及布置在所述壳体（2）的内部空间（15）中并且至少包围所述光学元件（4）的光学表面（17,17.1,17.2）的至少一个真空壳体（18,18.1至18.10） 至10,12,14.1至14.5），其中污染减少单元与真空壳体（18.1至18.10）相关联，该污染减少单元至少降低污染物质，特别是水和/或烃的分压 相对于内部空间（15）中的污染物质的分压紧邻光学表面（17,17.1,17.2）。

公开(公告)号：US07572556B2

公开(公告)日：2009-08-11

申请号：US10572149

申请日：2003-09-17

Applicant: Hans-Jürgen Mann ,  Martin Lowisch ,  Wolfgang Singer

Inventor： Hans-Jürgen Mann ,  Martin Lowisch ,  Wolfgang Singer

IPC: G03F1/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70091 ,  G03F7/70191 ,  G21K2201/061

Abstract: A mask having a multilayer coating of a specified period thickness distribution such as those used in lithography devices for producing semiconductor components. One problem of projection optics concerns pupil apodization which leads to imaging defects. As here proposed, the period thickness in the mask plane is selected so that it is greater than the period thickness for maximum reflectivity. As a result, not only does the apodization over the pupil become more symmetric but the intensity variation also becomes smaller overall.

Abstract translation: 具有特定周期厚度分布的多层涂层的掩模，例如用于制造半导体部件的光刻装置中的那些。 投影光学的一个问题涉及导致成像缺陷的瞳孔变迹。 如这里所提出的，选择掩模平面中的周期厚度使其大于最大反射率的周期厚度。 结果，不仅瞳孔上的变迹变得更加对称，而且整体的强度变化也变小。

公开(公告)号：US20090161829A1

公开(公告)日：2009-06-25

申请号：US12063334

申请日：2006-07-26

Applicant: Zewu Chen ,  Ning Gao ,  Walter Gibson

Inventor： Zewu Chen ,  Ning Gao ,  Walter Gibson

IPC: G21K1/06

CPC classification number: G01N23/223 ,  B82Y10/00 ,  G01N2223/076 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: An x-ray system or method for exciting a sample under x-ray analysis, using a curved monochromating optic for directing a monochromatic x-ray beam from an x-ray source towards a first focal area. A second optic is positioned within, and receives, the monochromatic x-ray beam, and directs a focused x-ray beam towards a second focal area on the sample. A detector is positioned near the sample to collect radiation from the sample as a result of the focused x-ray beam. The curved monochromating optic produces a beam spot size at the first focal area larger than a beam spot size produced by the second optic at the second focal area, therefore, a beam spot size on the sample is thereby reduced using the second optic. Doubly-curved monochromating optics, and polycapillary optics, are disclosed as possible implementations of the optics.

Abstract translation: 一种用于在x射线分析下激发样本的X射线系统或方法，使用弯曲单色光学器件将来自x射线源的单色x射线束引导到第一焦点区域。 第二光学器件位于单色X射线束内并且接收单色X射线束，并将聚焦的X射线束引导到样品上的第二焦点区域。 检测器位于样品附近以由于聚焦的X射线束而从样品收集辐射。 弯曲单色光学器件在第一焦点区域处产生大于由第二焦点区域处的第二光学器件产生的光束尺寸的光束尺寸，因此，使用第二光学元件，样品上的光束尺寸因此减小。 公开了双折射单色光学器件和多毛细管光学器件作为光学器件的可能实现。

公开(公告)号：US20090159808A1

公开(公告)日：2009-06-25

申请号：US12004871

申请日：2007-12-20

Applicant: Norbert R. Bowering ,  Igor V. Fomenkov ,  Oleh V. Khodykin ,  Alexander N. Bykanov

Inventor： Norbert R. Bowering ,  Igor V. Fomenkov ,  Oleh V. Khodykin ,  Alexander N. Bykanov

IPC: G01J1/42 ,  C23C16/22

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G01J1/429 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70975 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.

Abstract translation: 公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。 该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和 镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。 还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料 技术，并沉积覆盖中间材料的多层镜面涂层。

公开(公告)号：US07541605B2

公开(公告)日：2009-06-02

申请号：US11406343

申请日：2006-04-19

Applicant: Kenji Takahashi

Inventor： Kenji Takahashi

IPC: G03C5/16

CPC classification number: G21K4/00 ,  B82Y10/00 ,  C09K11/642 ,  C09K11/643 ,  C09K11/7706 ,  C09K11/7773 ,  C09K11/7774 ,  C09K11/778 ,  G21K2004/02 ,  G21K2004/06 ,  G21K2201/061

Abstract: A laminate comprises a stimulable phosphor layer, which is capable of storing radiation image information, and which is capable of emitting light of an intensity proportional to the radiation image information when being exposed to secondary stimulating rays, a response speed converting fluorescent substance layer, which is capable of converting the light emitted by the stimulable phosphor layer into light having a life time longer than a light emission life time of the light emitted by the stimulable phosphor layer, and a photo-conductor layer, which is capable of exhibiting electrical conductivity when being exposed to the light obtained from the conversion performed by the response speed converting fluorescent substance layer. The laminate and an electroluminescent layer, which is capable of emitting the secondary stimulating rays with voltage application, are overlaid one upon the other and combined with each other into an integral body.

Abstract translation: 叠层体包括能够存储放射线图像信息的能激发的荧光体层，并且能够在暴露于次级刺激光线时发射与放射线图像信息成比例的强度的光，响应速度转换荧光物质层，其中 能够将由可刺激荧光体层发射的光转换成寿命长于由可刺激荧光体层发射的光的发光寿命的寿命的光;以及光导体层，其能够在 暴露于由响应速度转换荧光物质层进行的转换所获得的光。 能够在施加电压的情况下发射次级刺激光线的层压体和电致发光层彼此重叠并且彼此组合成一体。

公开(公告)号：US07449704B2

公开(公告)日：2008-11-11

申请号：US11647024

申请日：2006-12-27

Applicant: Igor V. Fomenkov ,  Alexander I. Ershov

Inventor： Igor V. Fomenkov ,  Alexander I. Ershov

IPC: H01J35/20

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An EUV light source apparatus and method for producing EUV light, which includes a plasma generation chamber for generating EUV plasma; an EUV light collector having a reflective portion irradiated by EUV light produced in the EUV plasma; a target sample having reflective portion comprised of the same materials as the EUV light collector reflective portion; a first EUV detector for detecting EUV light produced in the EUV plasma; and a second EUV detector for detecting EUV light reflected from the target sample.

Abstract translation: EUV光源装置及其制造方法，其包括：产生EUV等离子体的等离子体产生室; 具有在EUV等离子体中产生的EUV光照射的反射部的EUV集光体; 具有由与EUV集光反射部相同的材料构成的反射部的目标样品; 用于检测在EUV等离子体中产生的EUV光的第一EUV检测器; 以及用于检测从目标样品反射的EUV光的第二EUV检测器。

公开(公告)号：US07440546B2

公开(公告)日：2008-10-21

申请号：US11634681

申请日：2006-12-06

Applicant: Chian Q. Liu ,  Raymond P. Conley ,  Albert T. Macrander ,  Hyon Chol Kang ,  G. Brian Stephenson ,  Jorg Maser

Inventor： Chian Q. Liu ,  Raymond P. Conley ,  Albert T. Macrander ,  Hyon Chol Kang ,  G. Brian Stephenson ,  Jorg Maser

IPC: G21K1/06

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/067

Abstract: A zone plate multilayer structure includes a substrate carrying a plurality of alternating layers respectively formed of tungsten silicide (WSi2) and silicon (Si). The alternating layers are sequentially deposited precisely controlling a thickness of each layer from a minimum thickness of a first deposited layer adjacent the substrate to a maximum thickness of a last deposited layer. The first minimum thickness layer has a selected thickness of less than or equal to 5 nm with the thickness of the alternating layers monotonically increasing to provide a zone plate multilayer structure having a thickness of greater than 12 μm (microns). The x-rays are diffracted in Laue transmission geometry by the specific arrangement of silicon and tungsten silicide.

Abstract translation: 区域板多层结构包括承载分别由硅化钨（WSi 2 N 2）和硅（Si）形成的多个交替层的基板。 交替层顺序沉积，从邻近衬底的第一沉积层的最小厚度到最后沉积层的最大厚度精确地控制每一层的厚度。 第一最小厚度层具有小于或等于5nm的选定厚度，交替层的厚度单调增加，以提供厚度大于12μm（微米）的区域板多层结构。 X射线通过硅和硅化钨的具体布置在Laue透射几何中衍射。

公开(公告)号：US07388220B2

公开(公告)日：2008-06-17

申请号：US11646938

申请日：2006-12-27

Applicant: Igor V. Fomenkov ,  Alexander I. Ershov

Inventor： Igor V. Fomenkov ,  Alexander I. Ershov

IPC: H01J35/20

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site.

Abstract translation: 公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源，其包括适于递送移动等离子体引发靶的目标传送系统和具有EUV光收集光学器件的EUV光收集光学器件， 定义所需等离子体起始位点的焦点。

公开(公告)号：US20080013685A1

公开(公告)日：2008-01-17

申请号：US11774138

申请日：2007-07-06

Applicant: Yoshio Iwasaki ,  Yutaka Yokozawa

Inventor： Yoshio Iwasaki ,  Yutaka Yokozawa

IPC: G01N23/201

CPC classification number: G01N23/201 ,  B82Y10/00 ,  G21K2201/061

Abstract: An ultra-small angle X-ray scattering measuring apparatus includes a detector for detecting X-rays emitted from a sample, an X-ray collimating mirror arranged between the X-ray real focus and the sample, a monochromator arranged between the X-ray collimating mirror and the sample and an analyzer arranged between the sample and the detector. The X-ray collimating mirror includes a pair of X-ray mirrors that are arranged orthogonally relative to each other. The X-ray mirrors are multilayer film mirrors and their X-ray reflection surfaces are paraboloidal. The interplanar spacing of lattice planes of each of the multilayer films is continuously changed along the paraboloid so as to meet the Bragg's condition. The monochromator and the analyzer are formed by using a channel-cut crystal. The analyzer is driven to rotate for scanning around a 2θ-axial line and diffracted rays reduced to a spectrum by the analyzer are detected by the detector.

Abstract translation: 一种超小型X射线散射测定装置，具备检测从样品发出的X射线的检测器，配置在X射线实际焦点与样本之间的X射线准直镜，配置在X射线 准直镜和样品以及布置在样品和检测器之间的分析仪。 X射线准直镜包括相对于彼此正交布置的一对X射线镜。 X射线镜是多层膜反射镜，它们的X射线反射面是抛物面的。 每个多层膜的晶格面的平面间距沿着抛物面连续变化，以满足布拉格条件。 单色仪和分析器通过使用通道切割晶体形成。 分析仪被驱动旋转以围绕2θ轴线进行扫描，并由检测器检测由分析仪降低到光谱的衍射光线。

公开(公告)号：US20070280421A1

公开(公告)日：2007-12-06

申请号：US11834423

申请日：2007-08-06

Applicant: Yong CHO ,  Daesoo Han

Inventor： Yong CHO ,  Daesoo Han

IPC: G21K3/00

CPC classification number: B82Y10/00 ,  G21K1/10 ,  G21K2201/061

Abstract: A narrow band x-ray filter can include: a substrate; and a sheaf of one or more reflection units stacked upon each other on the substrate. Each reflection unit can include: a first set of at least two discrete spacers on a respective underlying structures, a reflector disposed on the first set of spacers so as to form a void between the respective underlying structure and the reflector; and a first set of at least two discrete shims disposed on the first set of at least two spacers, each shim being at least substantially the same thickness as the reflector. A first device to produce a narrow band x-ray beam may include such a filter or an x-ray telescope. A second device to make an x-ray image of a subject may include the first device.

Abstract translation: 窄带x射线滤波器可以包括：基底; 以及在基板上彼此堆叠的一个或多个反射单元的一对组合。 每个反射单元可以包括：在相应的下面结构上的第一组至少两个分立的间隔物，设置在第一组间隔物上的反射体，以便在相应的下面的结构和反射体之间形成空隙; 以及设置在所述第一组至少两个间隔件上的至少两个离散垫片的第一组，每个垫片至少具有与所述反射器基本相同的厚度。 用于产生窄带x射线束的第一装置可以包括这种滤光器或x射线望远镜。 用于制作被摄体的X射线图像的第二装置可以包括第一装置。