公开(公告)号：US07439492B1

公开(公告)日：2008-10-21

申请号：US11344044

申请日：2006-02-01

Applicant: Gene E. Ice

Inventor： Gene E. Ice

IPC: G21C11/06

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067 ,  G21K2201/068

Abstract: This invention extends the Kirkpatrick-Baez (KB) mirror focusing geometry to allow nondispersive focusing of neutrons with a convergence on a sample much larger than is possible with existing KB optical schemes by establishing an array of at least three mirrors and focusing neutrons by appropriate multiple deflections via the array. The method may be utilized with supermirrors, multilayer mirrors, or total external reflection mirrors. Because high-energy x-rays behave like neutrons in their absorption and reflectivity rates, this method may be used with x-rays as well as neutrons.

Abstract translation: 本发明扩展了Kirkpatrick-Baez（KB）反射镜聚焦几何，以允许中子在非常分散的聚集上比采用现有的KB光学方案大得多的样品，通过建立至少三个反射镜的阵列并通过适当的多重聚焦中子 通过阵列的偏转。 该方法可以与超镜，多层反射镜或全部外部反射镜一起使用。 由于高能x射线在吸收和反射率方面表现得像中子，所以该方法可以与x射线以及中子一起使用。

公开(公告)号：US20060226350A1

公开(公告)日：2006-10-12

申请号：US10516449

申请日：2003-06-03

Applicant: Shinya Morita ,  Hitoshi Ohmori ,  Yutaka Yamagata ,  Hirohiko Shimizu ,  Takayuki Oku

Inventor： Shinya Morita ,  Hitoshi Ohmori ,  Yutaka Yamagata ,  Hirohiko Shimizu ,  Takayuki Oku

IPC: H05H3/02

CPC classification number: G21K1/06 ,  G21K2201/068

Abstract: An apparatus for controlling a neutron beam includes a plurality of columnar prisms 1 that are made of a material having a refractive index of less than 1 for a neutron beam, and are arranged so as to be multi-layered. The columnar prisms 1 each have an approximately right-triangle-shaped section, and are three-dimensionally multi-layered such that respective surfaces 1a, 1b, 1c of the columnar prisms are in parallel to one another. Stick-shaped members 5 are made of the above material, the stick-shaped members 5 are set in a plurality of grooves formed on a jig 6 that have the same shape, and upper surfaces of the grooves are flattened at the same time.

Abstract translation: 用于控制中子束的装置包括多个柱状棱镜1，其由中子束的折射率小于1的材料制成，并且被布置为多层。 柱状棱镜1各自具有近似三角形的截面，并且是三维多层的，使得柱状棱镜的各个表面1a，1b，1c彼此平行。 棒状构件5由上述材料制成，棒状构件5被设置在形成于具有相同形状的夹具6上的多个槽中，并且槽的上表面同时被平坦化。

公开(公告)号：US06765197B2

公开(公告)日：2004-07-20

申请号：US09965501

申请日：2001-09-27

Applicant: Melvin A. Piestrup ,  Richard H. Pantell ,  Hector R. Beguiristain

Inventor： Melvin A. Piestrup ,  Richard H. Pantell ,  Hector R. Beguiristain

IPC: G02B500

CPC classification number: G21K1/06 ,  G21K2201/068

Abstract: A compound refractive lens for neutrons is provided having a plurality of individual unit Fresnel lenses comprising a total of N in number. The unit lenses are aligned substantially along an axis, the i-th lens having a displacement ti orthogonal to the axis, with the axis located such that ∑ i = 1 N ⁢   ⁢ t i = 0. Each of the unit lenses comprises a lens material having a refractive index decrement &dgr;

Abstract translation: 提供了一种用于中子的复合折射透镜，其具有多个单独的单个菲涅耳透镜，其包括总数为N的数量。 单位透镜基本上沿轴线对准，第i个透镜具有与轴正交的位移ti，其中轴定位成使得每个单位透镜包括在波长λ处具有折射率递减δ<1的透镜材料 <200埃 在优选模式中，上述透镜被配置为使得位移ti分布并且具有围绕轴的位移ti的标准偏差sigmat，并且其中每个单位透镜具有sn-sn-1的最小菲涅耳区宽度 其中sn和sn-1是n和n-1区域的区域半径，标准偏差是sigmat <= [Sn-sn-1] / 4。

公开(公告)号：US06696205B2

公开(公告)日：2004-02-24

申请号：US09745576

申请日：2000-12-21

Applicant: Cameron J. Brooks ,  Kenneth C. Racette

Inventor： Cameron J. Brooks ,  Kenneth C. Racette

IPC: G03F900

CPC classification number: G03F1/22 ,  G03F1/20 ,  G21K1/06 ,  G21K2201/068 ,  H01J2237/31791

Abstract: A thin transition-metal based scattering layer of a mask blank for use in EPL systems is formed by providing the thin transition-metal scattering layer directly over membrane layers on a lot of substrates, thereby forming a continuous contact between the single transition metal-based scattering layer and the membrane layer. Preferably, the single transition metal-based scattering layer is a single tantalum-silicon composite scattering layer having a stoichiometry of TaxSi. The deposition parameters for depositing the thin transition-metal based scattering layer are adjusted to provide the scattering layer uniformly over all substrates within the lot. A first substrate from the lot of substrates is then selected, an initial stress measurement of the scattering layer is determined and then the substrate is annealed at a first temperature. The stress of the scattering layer over the first annealed substrate is determined, and subsequently the anneal temperature is adjusted based on a comparison between the pre-anneal, initial stress measurement and the post-annealed stress measurement. A second substrate from the lot of substrates is then selected, annealed at the adjusted temperature, stress measurement of the scattering layer of the second substrate is determined, and the anneal temperature may once again be adjusted. The above process is repeated until a targeted stress level of the thin transition-metal based scattering layer of the mask blank has been obtained. The thin scattering layer is adapted to have final film stress controllable to within ±10% of the targeted stress.

Abstract translation: 用于EPL系统的掩模毛坯的薄过渡金属基散射层通过在许多基底上的膜层上直接提供薄的过渡金属散射层而形成，从而在单过渡金属基 散射层和膜层。 优选地，单过渡金属基散射层是具有TaxSi的化学计量的单个钽 - 硅复合散射层。 调整用于沉积薄过渡金属的散射层的沉积参数，以在散射层内的所有衬底上均匀地提供散射层。 然后选择来自大量基板的第一基板，确定散射层的初始应力测量，然后在第一温度下退火基板。 确定第一退火衬底上的散射层的应力，然后基于预退火，初始应力测量和后退火应力测量之间的比较来调整退火温度。 然后选择来自大量基板的第二基板，在调节温度下退火，确定第二基板的散射层的应力测量，并且可以再次调整退火温度。 重复上述过程，直到获得掩模板的薄过渡金属基散射层的目标应力水平。 薄散射层适于使最终膜应力可控制在目标应力的±10％以内。

公开(公告)号：US5850425A

公开(公告)日：1998-12-15

申请号：US845211

申请日：1997-04-21

Applicant: Stephen W. Wilkins

Inventor： Stephen W. Wilkins

IPC: G01N23/04 ,  G01N23/05 ,  G01N23/205 ,  G01N23/207 ,  G01T1/29 ,  G01T1/36 ,  G03B42/02 ,  G21K1/06

CPC classification number: A61B6/484 ,  G01N23/04 ,  G01N23/05 ,  G01N23/205 ,  G01N23/207 ,  G01T1/2914 ,  G01T1/36 ,  G03B42/02 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/062 ,  G21K2201/068 ,  G21K2207/005

Abstract: An x-ray or neutron optic configuration includes a plurality of single crystal portions formed with respective spaced x-ray or neutron reflection faces formed at predetermined asymmetry angles to a Bragg diffraction plane in the respective crystal portion. The crystal portions are interconnected to maintain a first and second of these faces spaced apart for receipt of a sample between them and to allow small adjustments of the relative angle of the faces about the normal to the plane of diffraction while maintaining the normals to the Bragg planes for the first and second faces substantially in the plane of diffraction. A first face is arranged to be a monochromator and collimator with respect to x-rays or neutrons of appropriate wavelength incident reflected through the sample for receipt by the second face, which thereby serves as analyzer face.

Abstract translation: X射线或中子光学配置包括多个单晶部分，其形成有各自间隔开的x射线或中子反射面，其以相应的晶体部分中的布拉格衍射平面以预定的不对称角度形成。 晶体部分相互连接以保持这些面中的第一和第二面间隔开以便在它们之间接收样品，并且允许小面调整相对于衍射平面的法线的相对角度，同时保持与布拉格的法线 第一和第二面的平面基本上在衍射平面中。 第一面被布置为相对于通过样品反射的x射线或适当波长的中子的单色仪和准直器，由第二面接收，从而用作分析器面。

公开(公告)号：US5744813A

公开(公告)日：1998-04-28

申请号：US602844

申请日：1996-02-26

Applicant: Muradin Abubekirovich Kumakhov

Inventor： Muradin Abubekirovich Kumakhov

IPC: G01N23/04 ,  G21K1/06 ,  G02B5/124

CPC classification number: B82Y10/00 ,  G01N23/04 ,  G21K1/06 ,  G21K1/062 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/068

Abstract: The present invention provides for bending the beams, their focusing, transforming a divergent radiation into a quasi-parallel one, and vice versa, its filtering and monochromatization. Also attained are reduced radiation transfer losses, extended range of energies used, and higher radiation concentration. A possibility is provided for the use of larger radiation sources without decreasing the proportion of the captured particles, as well as for controlling the radiation spectrum. With this purpose in view, provision is made in the proposed method, apart from multiple reflection of particles upon interaction with different-density alternating media, for diffuse and potential scattering or interference of particles that diffract on multilayer structures applied to reflecting surfaces. In a device carrying the proposed method into effect, the aforementioned surfaces are coated with layers differing in electromagnetic properties. The optical system of the device appears principally as a set of miniature lenses or bemilenses 28, built up of a plurality of capillaries or polycapillaries, the walls of whose channels 24 are provided with an appropriate coating 22. No use of any support structures for forming the profiles of the optical system is required.

Abstract translation: PCT No. PCT / RU94 / 00146 Sec。 371日期1996年2月26日 102（e）日期1996年2月26日PCT提交1994年7月8日PCT公布。 第WO96 / 02058号公报 日期1996年1月25日本发明提供了弯曲梁，它们的聚焦，将发散辐射变换成准并联辐射，反之亦然，其过滤和单色化。 还获得了减少辐射传输损失，使用的能量的扩大范围和更高的辐射浓度。 提供了使用更大辐射源的可能性，而不会降低捕获的颗粒的比例，以及用于控制辐射光谱。 鉴于此目的，在所提出的方法中，除了在与不同密度的交替介质相互作用之间的多个反射颗粒之外，提供了用于扩散和潜在的散射或衍射到施加到反射表面的多层结构上的颗粒的干涉。 在实施所提出的方法的装置中，上述表面涂覆有不同电磁特性的层。 该装置的光学系统主要表现为由多个毛细管或多毛细管构成的一组微型透镜或壳体28，其通道24的壁设置有合适的涂层22.不使用任何支撑结构用于形成 需要光学系统的轮廓。

公开(公告)号：US5646976A

公开(公告)日：1997-07-08

申请号：US487936

申请日：1995-06-07

Applicant: George Gutman

Inventor： George Gutman

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067 ,  G21K2201/068

Abstract: This invention relates to novel methods of producing flat and curved optical elements with laterally and depth graded multilayer thin films, in particular multilayers of extremely high precision, for use with soft and hard x-rays and neutrons and the optical elements achieved by these methods. In order to improve the performance of an optical element, errors in d spacing and curvature are isolated and subsequently compensated.

Abstract translation: 本发明涉及生产具有横向和深度梯度多层薄膜的平面和弯曲光学元件的新方法，特别是具有极高精度的多层，用于软和硬x射线和中子以及通过这些方法实现的光学元件。 为了提高光学元件的性能，分离出d间隔和曲率的误差并随后进行补偿。

公开(公告)号：US5604353A

公开(公告)日：1997-02-18

申请号：US489503

申请日：1995-06-12

Applicant: David M. Gibson ,  Robert G. Downing

Inventor： David M. Gibson ,  Robert G. Downing

IPC: G21K1/00 ,  G21K1/02 ,  G21K1/04 ,  G21K1/06 ,  G21K5/02 ,  G01N23/00

CPC classification number: G21K1/06 ,  G21K2201/064 ,  G21K2201/068

Abstract: An apparatus and method for providing focused x-ray, gamma-ray, charged particle and neutral particle, including neutron, radiation beams with a controllable amount of divergence are disclosed. The apparatus features a novel use of a radiation blocking structure, which, when combined with multiple-channel total reflection optics, increases the versatility of the optics by providing user-controlled output-beam divergence.

Abstract translation: 公开了一种用于提供聚焦的x射线，γ射线，带电粒子和中性粒子的装置和方法，包括具有可控量散度的中子，辐射束。 该装置具有辐射阻挡结构的新用途，当与多通道全反射光学器件组合时，通过提供用户控制的输出光束发散度来增加光学器件的通用性。

公开(公告)号：US4788703A

公开(公告)日：1988-11-29

申请号：US919117

申请日：1986-10-15

Applicant: Mutsuaki Murakami ,  Susumu Yoshimura

Inventor： Mutsuaki Murakami ,  Susumu Yoshimura

IPC: G21K7/00 ,  G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/067 ,  G21K2201/068

Abstract: Diffraction elements for penetrating radiation, such as X-rays and neutrons, are prepared by coating a film of poly-(phenyleneoxadiazole) onto a substrate and graphitizing the poly-(phenyleneoxadiazole) to form a flexible graphite monocrystal on the substrate.

Abstract translation: 用于穿透辐射的衍射元件，例如X射线和中子，通过将聚（苯并恶二唑）膜涂覆到基底上并石墨化聚（苯撑二恶唑）以在基底上形成柔性石墨单晶来制备。

公开(公告)号：US4651012A

公开(公告)日：1987-03-17

申请号：US714336

申请日：1985-03-21

Applicant: Benton C. Clark ,  Todd E. Crumbaker

Inventor： Benton C. Clark ,  Todd E. Crumbaker

IPC: G21K1/06 ,  G21K1/02

CPC classification number: G21K1/06 ,  G21K2201/068

Abstract: A projection system derived from certain solid geometrical properties using two aperture plates bearing arrays of holes with well defined spacing projects radiation from diverse sources such as electromagnetic radiation, visible and invisible light radiation, discrete particles, X-rays, gamma rays, charged and uncharged particles, as a multi-dot radiation image pattern onto a distant target, overcoming the enormous intensity losses inherent in prior art for pin hole projection of test patterns. The source angular emission function may be of nearly any type, from omni-directional (perfectly diffuse) to uni-directional. Such dot patterns are suitable for evaluating imaging systems as well as the critical operating parameters of mapping spectrometer sensors. The lensless projection system is capable of superimposing radiation source rays from every hole in the first aperture plate onto each image dot at the focal plane with dramatic increase in intensity of the projected image.

Abstract translation: 使用具有良好限定的间隔的两个带有孔阵列的孔板的投影系统从不同的来源（例如电磁辐射，可见光和不可见光辐射，离散粒子，X射线，γ射线，带电和不带电 颗粒，作为远距离目标上的多点辐射图像图案，克服了现有技术中固有的用于测试图案的针孔投影的巨大的强度损失。 源角度发射功能可以是从全向（完全漫射）到单向的几乎任何类型。 这种点阵图适用于评估成像系统以及映射光谱仪传感器的关键操作参数。 无镜头投影系统能够将投影图像的强度显着增加，将来自第一孔板中的每个孔的辐射源射线叠加在焦平面上的每个图像点上。