公开(公告)号：US20010020443A1

公开(公告)日：2001-09-13

申请号：US09859601

申请日：2001-05-16

Inventor： Paul D. Shirley

IPC: B05C005/00 ,  B05C011/02

CPC classification number: H01L21/6715 ,  B05C11/08 ,  G03F7/162

Abstract: A method and apparatus for forming a generally uniform liquid layer on a surface of an upper surface microelectronic substrate. The apparatus can include a support that engages less than the entire lower surface of the microelectronic substrate and rotates the microelectronic substrate at a selected rate. A barrier can extend over the upper surface of the microelectronic substrate and can rotate at about the same rate as the substrate to separate a rotating air mass adjacent to the upper surface and within the barrier from a stationary air mass external to the barrier. The rotating air mass can reduce the likelihood for liquid/air interface disturbances that create non-uniformities in the liquid layer. Accordingly, the method and apparatus can increase the range of thicknesses to which the liquid layer can be formed and can reduce the topographical non-uniformities of the liquid layer.

Abstract translation: 一种用于在上表面微电子衬底的表面上形成大致均匀的液体层的方法和装置。 该装置可包括支撑件，该支撑件小于微电子衬底的整个下表面并以选定的速率旋转微电子衬底。 屏障可以在微电子衬底的上表面上延伸并且可以以与衬底大致相同的速率旋转，以将与上表面相邻的旋转空气质量与阻挡层内的屏障内的静止空气质量分隔开。 旋转空气质量可以减少在液体层中产生不均匀性的液体/空气界面干扰的可能性。 因此，该方法和装置可以增加可以形成液体层的厚度的范围，并且可以减小液体层的形貌不均匀性。

公开(公告)号：US20010005639A1

公开(公告)日：2001-06-28

申请号：US09777330

申请日：2001-02-06

Inventor： Shinya Yonaha

IPC: B05D003/12 ,  B05C011/02 ,  H01L021/31

CPC classification number: G03F7/162 ,  B05C11/08 ,  B05D1/005

Abstract: A resist film having a thickness of 5500null or less is coated on the wafer having a large diameter of 8 inches or more by the spin coat process. A resist is dripped while allowing the wafer to be rotated at a rotation speed of 500 rpm to 1200 rpm and the dripping of the resist is suspended at the time of spreading the resist on the whole surface of the wafer. The rotation speed is raised to the predetermined rotation speed which regulates the thickness of the resist film and is determined from the correlation of the predetermined rotation speed and the thickness of the resist film. The wafer is rotated for 1 second to 5 seconds at the predetermined rotation speed. Then, the wafer is rotated for 15 seconds or more at the rotation speed which is lower than the predetermined rotation speed.

Abstract translation: 通过旋涂法将具有5500或更小的厚度的抗蚀剂膜涂覆在具有8英寸或更大直径的晶片上。 滴下抗蚀剂，同时允许晶片以500rpm至1200rpm的转速旋转，并且在将抗蚀剂铺展在晶片的整个表面上时，抗蚀剂滴落。 旋转速度升高到调节抗蚀剂膜厚度的预定旋转速度，并根据预定旋转速度和抗蚀剂膜厚度的相关性来确定。 晶片以预定转速旋转1秒至5秒。 然后，以比预定旋转速度低的旋转速度旋转晶片15秒以上

公开(公告)号：US20040244682A1

公开(公告)日：2004-12-09

申请号：US10746116

申请日：2003-12-24

Inventor： Lewyn B. Boler JR.

IPC: B05C011/02

CPC classification number: A47L13/30 ,  C11D3/14 ,  C11D17/049 ,  Y10T428/31663

Abstract: A system for applying a protective coating to a surface includes a device for applying a protective coating to a surface. The device includes a foam pad impregnated with a composite having a matrix that includes at least one polymer resin chosen from the following group: hydrocarbon, polybutene, silicone, polyethylene; at least one silicone fluid; at least one surface coating chosen from the following groups: wax, silicone resin; and a multiplicity of inert particles dispersed within the matrix. The composite, when examined alone (before it is impregnated into the foam pad), has a wax penetration point measurement from about 60 mm to about 250 mm at 25 degrees Celsius under ASTM Test Method D217, and the foam pad impregnated with the composite is adapted so that the foam pad impregnated with the composite, when rubbed upon a surface, leaves a surface coating on the surface. The invention also may take the form of a system that includes a foam pad impregnated with the composite and a rejuvenator fluid containing a silicone and a wax.

Abstract translation: 将保护涂层施加到表面的系统包括用于向表面施加保护涂层的装置。 该装置包括浸渍有具有基质的复合材料的泡沫垫，该基质包括至少一种选自以下组的聚合物树脂：烃，聚丁烯，硅氧烷，聚乙烯; 至少一种硅氧烷流体; 选自以下组的至少一种表面涂层：蜡，有机硅树脂; 和分散在基体内的多个惰性颗粒。 当复合材料单独（在浸渍到泡沫垫中）之前，在ASTM测试方法D217下，在25摄氏度下具有约60mm至约250mm的蜡渗透点，并且浸渍有复合材料的泡沫垫是 使得浸渍有复合材料的泡沫垫在摩擦在表面上时在表面上留下表面涂层。 本发明还可以采取包括浸渍有复合材料的泡沫垫和含有硅酮和蜡的复原剂流体的系统的形式。

公开(公告)号：US20040237884A1

公开(公告)日：2004-12-02

申请号：US10887041

申请日：2004-07-08

Applicant: Metso Paper. Inc.

Inventor： Ilkka Rata ,  Reijo Hassinen

IPC: B05C011/02

CPC classification number: B05C11/041 ,  B05C11/044 ,  B05C11/045 ,  D21G3/005

Abstract: A treatment equipment, which is intended to be installed in connection with a moving surface. The treatment equipment includes a frame and a blade holder formed from composite material as a single piece and connected to the frame. In addition, a blade is fitted to the blade holder, the bevelled edge belonging to which is arranged to be brought into contact with the moving surface by moving the blade holder. In the blade holder, there is also a separate backing blade, which is fitted at one edge into the blade holder, the other edge extending closer than the blade holder to the said bevelled edge.

Abstract translation: 一种处理设备，其旨在与移动表面相关地安装。 处理设备包括框架和由复合材料形成为单件并连接到框架的刀片保持架。 此外，叶片安装在刀架上，其倾斜边缘被布置成通过移动刀架而与移动表面接触。 在刀片保持器中，还有一个单独的背衬刀片，其在一个边缘处装配到刀片保持器中，另一个边缘比刀片保持器更靠近所述倾斜边缘。

公开(公告)号：US20040211360A1

公开(公告)日：2004-10-28

申请号：US10831284

申请日：2004-04-26

Inventor： Akira Jonoshita

IPC: B05C011/02 ,  B05B015/02 ,  B05C005/00

CPC classification number: H01L21/6715

Abstract: A processing equipment includes a chamber, an airflow generator which generates a downward airflow in the chamber, a stage in the chamber, a nozzle which is arranged above the stage. The nozzle has a protector which is arranged around a supply port of the nozzle. The protector protects the supply port form the downward airflow.

Abstract translation: 一种处理设备包括：室，气流发生器，其在室中产生向下的气流;室中的台;布置在载物台上方的喷嘴。 喷嘴具有围绕喷嘴的供给口设置的保护件。 保护器保护供气口形成向下的气流。

公开(公告)号：US20040168629A1

公开(公告)日：2004-09-02

申请号：US10248900

申请日：2003-02-28

Applicant: FORD GLOBAL TECHNOLOGIES, INC.

Inventor： Peter Miskech ,  Joseph Paul Tekelly ,  David Gary Dahlstrom ,  Keith Alan Kuzmich

IPC: B05C011/02

CPC classification number: B05C1/0808 ,  B05C1/027 ,  B05C1/10

Abstract: A material applicator assembly 10 which includes a rotor member 12 having a plurality of dispenser apertures 20 and a deformable material application ring 23 around the outer periphery of the rotor member 12. The assembly 10 being rotatably coupled to a centrally mounted tubular member 40. Member 40 having at least one aperture through which an adhesive material 45 is forced into each of the plurality of apertures 20 as the rotor member 12 is rotated about member 40, thereby injecting the adhesive material 45 into the application ring 23 to deposit the adhesive material 45 upon components 60 having varying cross-sectional shapes.

Abstract translation: 一种材料施加器组件10，其包括具有多个分配器孔20的转子构件12和围绕转子构件12的外周的可变形材料施加环23.组件10可旋转地联接到中心安装的管状构件40上 40具有至少一个孔，随着转子构件12围绕构件40旋转，粘合剂材料45被迫通过多个孔20中的每一个中，从而将粘合剂材料45注入到施加环23中以沉积粘合剂材料45 在具有变化的横截面形状的部件60上。

公开(公告)号：US20040069215A1

公开(公告)日：2004-04-15

申请号：US10268426

申请日：2002-10-10

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Keng-Ching Lin

IPC: B05C011/02

CPC classification number: H01L21/67051 ,  H01L21/67034

Abstract: A multi-nozzle gas spray arm for a spin coating apparatus. In a typical embodiment, the invention comprises a primary spray arm and a secondary spray arm which is confluently connected to the primary spray arm. The primary spray arm ejects a narrow, relatively high-velocity nitrogen stream against a substrate while the secondary spray arm ejects a diffuse, relatively low-velocity nitrogen stream against the substrate as the gas spray arm is typically swept across the surface of the wafer. The diffuse nitrogen flow characteristic of the nitrogen ejected from the secondary spray arm is effective in eliminating water and chemical droplets which otherwise would tend to remain and form dry spots on the wafer surface.

Abstract translation: 用于旋涂装置的多喷嘴气喷臂。 在一个典型的实施例中，本发明包括一个主喷雾臂和一个二次喷射臂，该喷雾臂与主喷雾臂汇合连接。 主喷雾臂将窄的相对高速的氮气流喷射到衬底上，同时当气体喷射臂通常扫过晶片的表面时，辅助喷射臂将散射的相对低速的氮气流喷射到衬底上。 从二次喷射臂喷出的氮气的弥散氮气流特征对于消除水分和化学液滴是有效的，否则将会倾向于保留并在晶片表面上形成干斑。

公开(公告)号：US20040040499A1

公开(公告)日：2004-03-04

申请号：US10235184

申请日：2002-09-04

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Kuo-Chen Huang ,  Chang-Shing Chen ,  Hsin-Yi Ho

IPC: B05C011/02

CPC classification number: H01L21/67253 ,  H01L21/6715

Abstract: An exhaust monitoring cup which measures exhaust gas flowing through a top opening in a coater cup of a spin coating apparatus used in the deposition of photoresist coatings on semiconductor wafers. The exhaust monitoring cup includes a gas flow cup which is positioned in fluid communication with the top opening of the coater cup. The exhaust gas flows through a gas flow opening in the gas flow cup, and a flow rate measuring apparatus at the gas flow opening receives the exhaust gas and measures the flow rate thereof. The flow rate of the gas leaving the gas flow cup can be compared to the flow rate of the gas flowing from an exhaust conduit leading from the bottom of the coater cup, to facilitate detection of abnormal conditions in the coater cup or exhaust conduit.

Abstract translation: 排气监测杯，其测量流过用于在半导体晶片上沉积光致抗蚀剂涂层的旋涂装置的涂覆杯中的顶部开口的废气。 排气监测杯包括气流杯，其定位成与涂布杯的顶部开口流体连通。 废气流过气流杯中的气体流通孔，气流开口处的流量测量装置接收废气并测量其流量。 离开气流杯的气体的流速可以与从涂布杯底部导出的排气管道流出的气体的流量进行比较，以便于检测涂布机杯或排气管道中的异常情况。

公开(公告)号：US20030196594A1

公开(公告)日：2003-10-23

申请号：US10123477

申请日：2002-04-17

Inventor： Charles R. Reed

IPC: B05C011/02 ,  B05C013/02

CPC classification number: B05B13/0228 ,  B05B13/0235

Abstract: Apparatus for spraying paint on a can or can top includes a carrier for the article, the carrier being formed of with a pedestal, a shaft extending upwardly from the pedestal, and an adapter mounted on the shaft. The adapter engages the article and causes it spin as the carrier spins at the spray painting station. Further, a bottom plate of the apparatus is formed with a slot through which the carrier shaft extends, thereby shielding lower portions of the apparatus from inadvertent spraying. Additionally, the apparatus positions individual carriers at the spraying station by means of a rotatable disc in which a slot that extends from the periphery toward the center of the disc engages the shaft of a carrier and, as the disc rotates, moves the shaft and the can it carries to the desired

Abstract translation: 用于在罐或罐顶上喷涂涂料的装置包括用于制品的载体，载体由基座形成，从基座向上延伸的轴以及安装在轴上的适配器。 适配器接合物品并使其随着载体在喷漆站处旋转而旋转。 此外，该装置的底板形成有一个狭槽，托架轴通过该槽延伸，从而屏蔽设备的下部，从而无意中喷洒。 另外，该装置通过可旋转盘将喷射站处的各个载体定位在其中，从圆周向圆盘的中心延伸的槽与托架的轴接合，并且当盘旋转时，使轴和 它可以携带到所需的

公开(公告)号：US20030131790A1

公开(公告)日：2003-07-17

申请号：US10308382

申请日：2002-12-03

Inventor： Markku Lummila

IPC: B05C011/02

CPC classification number: B05C11/025 ,  B05C3/18

Abstract: A cradle for a spreading device, such as a rotatable rod, to which a spreading organ to be pressed against a movable surface has been attached. The cradle is fastened to a holder, and a gasket is provided between the cradle and the holder (9).

Abstract translation: 用于扩展装置的支架，例如可旋转的杆，已经附着有被压靠在可移动表面上的扩展器具。 托架固定在支架上，并且在支架和支架（9）之间设有垫圈。