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公开(公告)号：US20240342745A1
公开(公告)日：2024-10-17
申请号：US18756153
申请日：2024-06-27
Inventor： Chien-Hung WANG , Chun-Chih LIN , Chi-Hung LIAO , Yung-Yao LEE , Wei Chang CHENG
IPC: B05C11/10 , F16K7/12 , F16K23/00 , F16K31/122 , F16K37/00 , H01L21/67 , B05C5/02 , B05C11/08 , G03F7/16 , G03F7/30
CPC classification number: B05C11/1002 , F16K7/126 , F16K23/00 , F16K31/1221 , F16K37/0041 , H01L21/67017 , H01L21/6715 , B05C5/02 , B05C11/08 , G03F7/162 , G03F7/3021
Abstract: A method of preventing drippage in a liquid dispensing system includes generating at least a first proxy signal representing at least a first indirect measure of a position of a first automatic control valve (ACV), wherein the first ACV has positions ranging from fully closed to fully open. The method further includes recognizing, based on at least the first proxy signal, whether a failure state exists in which the first ACV has failed to close. The method further includes causing a second ACV to close when the failure state exists, wherein the second ACV is fluidically connected to the first ACV, and the second ACV has positions ranging from fully closed to fully open.
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公开(公告)号：US20240261814A1
公开(公告)日：2024-08-08
申请号：US18638692
申请日：2024-04-18
Applicant: SCREEN Holdings Co., Ltd.
Inventor： Hiroshi ABE , Takashi OTA , Takaaki ISHIZU , Kenji KOBAYASHI , Ryo MURAMOTO , Sei NEGORO , Manabu OKUTANI , Wataru SAKAI
CPC classification number: B05C11/08 , B05B1/24 , G03F7/40 , H01L21/0262 , H01L21/02628 , H01L21/02057 , H01L21/67017 , H01L21/67034 , H01L21/67051 , H01L21/67098 , H01L21/67103 , H01L21/67115 , H01L21/6715 , H01L21/68764 , H01L21/68785 , H05B3/0047
Abstract: A substrate processing method includes a liquid film forming step of forming a liquid film, a liquid film heat retaining step of keeping the liquid film warm, a gas phase layer forming step of forming a gas phase layer which holds the processing liquid on a center portion of the liquid film, an opening forming step of forming an opening in the center portion of the liquid film by excluding the processing liquid held by the gas phase layer, a substrate rotating step of rotating the substrate around a rotation axis, and an opening expanding step of expanding the opening, while a state in which the gas phase layer is formed on an inner circumferential edge of the liquid film is maintained, by moving the irradiation region toward a circumferential edge portion of the substrate while the liquid film heat retaining step and the substrate rotating step are performed.
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公开(公告)号：US12048944B2
公开(公告)日：2024-07-30
申请号：US17062977
申请日：2020-10-05
Inventor： Chien-Hung Wang , Chun-Chih Lin , Chi-Hung Liao , Yung-Yao Lee , Wei Chang Cheng
IPC: B05C11/10 , F16K7/12 , F16K23/00 , F16K31/122 , F16K37/00 , H01L21/67 , B05C5/02 , B05C11/08 , G03F7/16 , G03F7/30
CPC classification number: B05C11/1002 , F16K7/126 , F16K23/00 , F16K31/1221 , F16K37/0041 , H01L21/67017 , H01L21/6715 , B05C5/02 , B05C11/08 , G03F7/162 , G03F7/3021
Abstract: A method of preventing drippage in a fluid dispensing system. The fluid dispensing system includes a first automatic control valve (ACV), an input of the first ACV connected to fluid-source of fluid, the first ACV having positions ranging from fully closed to fully open, and a second ACV, an input of the second ACV being connected to an output of the first ACV, and an output of the second ACV being connected to a nozzle, the second ACV having positions ranging from fully closed to fully open. The method includes generating a first proxy signal representing at least a first indirect measure of a position of the first ACV. The method includes recognizing, based on at least the first proxy signal that a failure state exists in which the first ACV has failed to close. The method includes causing the second ACV to close when the failure state exists.
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公开(公告)号：US12042813B2
公开(公告)日：2024-07-23
申请号：US17133647
申请日：2020-12-24
Applicant: SCREEN Holdings Co., Ltd.
Inventor： Hiroshi Abe , Takashi Ota , Takaaki Ishizu , Kenji Kobayashi , Ryo Muramoto , Sei Negoro , Manabu Okutani , Wataru Sakai
CPC classification number: B05C11/08 , B05B1/24 , G03F7/40 , H01L21/0262 , H01L21/02628 , H01L21/02057 , H01L21/67017 , H01L21/67034 , H01L21/67051 , H01L21/67098 , H01L21/67103 , H01L21/67115 , H01L21/6715 , H01L21/68764 , H01L21/68785 , H05B3/0047
Abstract: A substrate processing method includes a liquid film forming step of forming a liquid film, a liquid film heat retaining step of keeping the liquid film warm, a gas phase layer forming step of forming a gas phase layer which holds the processing liquid on a center portion of the liquid film, an opening forming step of forming an opening in the center portion of the liquid film by excluding the processing liquid held by the gas phase layer, a substrate rotating step of rotating the substrate around a rotation axis, and an opening expanding step of expanding the opening, while a state in which the gas phase layer is formed on an inner circumferential edge of the liquid film is maintained, by moving the irradiation region toward a circumferential edge portion of the substrate while the liquid film heat retaining step and the substrate rotating step are performed.
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公开(公告)号：US20240226950A1
公开(公告)日：2024-07-11
申请号：US18236256
申请日：2023-08-21
Applicant: North Carolina State University
Inventor： Aram AMASSIAN , Nathaniel R. WOODWARD , Boyu GUO
Abstract: Spin coating systems and methods. In one aspect, a spin coater assembly is provided. The spin coater assembly includes a spinner configured for receiving a substrate thereon, a plurality of material dispensers, an arm assembly configured to selectively position one of the plurality of material dispensers over the substrate, and a controller in communication with each of the spinner, the plurality of material dispensers, and the arm assembly.
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Patent Agency Ranking
公开(公告)号：US11986853B2
公开(公告)日：2024-05-21
申请号：US17090983
申请日：2020-11-06
Applicant: SCREEN Holdings Co., Ltd.
Inventor： Yuji Tanaka , Masaya Asai , Masahiko Harumoto , Koji Kaneyama
IPC: B05D1/00 , B05C11/08 , B05C11/10 , B05D1/36 , B05D3/00 , C23F1/00 , C23F1/08 , H01L21/67 , H01L21/677 , H01L21/687
CPC classification number: B05D1/005 , B05C11/08 , B05C11/10 , B05C11/1039 , B05D1/36 , B05D3/007 , C23F1/00 , C23F1/08 , H01L21/67051 , H01L21/6708 , H01L21/67167 , H01L21/67173 , H01L21/67178 , H01L21/67742 , H01L21/68707
Abstract: A coating liquid containing metal as a metal-containing coating liquid is supplied to a surface to be processed of a substrate by a coating processing unit, whereby a metal-containing coating film is formed on the surface to be processed. The substrate on which the metal-containing coating film has been formed is transported to a metal removal unit by a transport mechanism. A removal liquid for dissolving the metal is supplied to a peripheral portion of the substrate by the metal removal unit such that the metal-containing coating film remains in a region except for the peripheral portion of the surface to be processed of the substrate.
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公开(公告)号：US20190019666A1
公开(公告)日：2019-01-17
申请号：US16134320
申请日：2018-09-18
Applicant: SCREEN Holdings Co., Ltd.
Inventor： Masanori IMAMURA , Kazuo MORIOKA
IPC: H01L21/027 , H01L21/67 , B05C11/10 , B05C11/08 , B05B15/40 , B05C11/02 , B05B12/08 , A61J3/00 , B05B13/02
CPC classification number: H01L21/027 , A61J3/005 , B05B12/088 , B05B13/02 , B05B15/40 , B05C11/023 , B05C11/08 , B05C11/10 , B05C11/1002 , H01L21/6715
Abstract: A coating apparatus includes an open/close valve having a motor that allows control of opening operation and closing operation in accordance with electric signals applied from a controller. The coating apparatus further includes a suck back valve having a motor that allows control of a volume variation in a flow path for suck back that is in communication with an upstream side and a downstream side of a pipe in accordance with electric signals from the controller. The controller allows control of start of the closing operation of the open/close valve and start of suction operation of the suck back valve through application of the electric signals to the respective motors. This achieves simple adjustment of liquid cut-off.
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公开(公告)号：US09786522B2
公开(公告)日：2017-10-10
申请号：US14659701
申请日：2015-03-17
Applicant: SCREEN Holdings Co., Ltd.
Inventor： Kenji Kobayashi , Manabu Okutani
CPC classification number: H01L21/67028 , B05B1/24 , B05B15/60 , B05C11/08 , B05D1/02 , H01L21/67051 , H01L21/67109 , H01L21/67201 , H01L21/68728 , H01L21/68742 , H01L21/6875
Abstract: A substrate treatment method is performed by a substrate treatment apparatus including a substrate holding unit which holds a substrate, and a hot plate which heats the substrate from below. The method includes: a treatment liquid supplying step of locating the hot plate at a retracted position at which the hot plate is retracted below the substrate holding unit and, in this state, supplying a treatment liquid to an upper surface of the substrate held by the substrate holding unit; a protection liquid film forming step of forming a liquid film of a protection liquid to cover an upper surface of the hot plate in the treatment liquid supplying step; and a substrate heating step of heating the substrate by the hot plate with the hot plate being located adjacent to a lower surface of the substrate or in contact with the lower surface of the substrate.
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公开(公告)号：US20170090291A1
公开(公告)日：2017-03-30
申请号：US15374081
申请日：2016-12-09
Applicant: Tokyo Electron Limited
Inventor： Kousuke YOSHIHARA , Hideharu KYOUDA , Koshi MUTA , Taro YAMAMOTO , Yasushi TAKIGUCHI , Masahiro FUKUDA
CPC classification number: G03F7/3021 , B05C5/02 , B05C5/027 , B05C11/08 , B05D1/005 , B05D1/26 , G03F7/30 , H01L21/6715
Abstract: A developing apparatus including a horizontal substrate holder, a rotating mechanism to rotate the substrate holder, a developer nozzle to supply a developer onto a part of the substrate to form a liquid puddle, a moving mechanism to move the developer nozzle in a radial direction of the rotating substrate, a contact part that moves with the developer nozzle and has a surface opposed to the substrate, which is smaller than the surface of the substrate, and a control unit to output a control signal such that a supply position of the developer on the substrate is moved in the radial direction of the substrate so that the liquid puddle is spread out on a whole surface of the substrate while the contact part is in contact with the liquid puddle.
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公开(公告)号：US09568829B2
公开(公告)日：2017-02-14
申请号：US14449419
申请日：2014-08-01
Applicant: TOKYO ELECTRON LIMITED
Inventor： Kousuke Yoshihara , Hideharu Kyouda , Koshi Muta , Taro Yamamoto , Yasushi Takiguchi , Masahiro Fukuda
CPC classification number: G03F7/3021 , B05C5/02 , B05C5/027 , B05C11/08 , B05D1/005 , B05D1/26 , G03F7/30 , H01L21/6715
Abstract: A developing method includes: horizontally holding an exposed substrate by a substrate holder; forming a liquid puddle on a part of the substrate, by supplying a developer from a developer nozzle; rotating the substrate; spreading the liquid puddle on a whole surface of the substrate, by moving the developer nozzle such that a supply position of the developer on the rotating substrate is moved in a radial direction of the substrate; bringing, simultaneously with the spreading of the liquid puddle on the whole surface of the substrate, a contact part into contact with the liquid puddle, the contact part being configured to be moved together with the developer nozzle and having a surface opposed to the substrate which is smaller than the surface of the substrate. According to this method, an amount of liquid falling down to the outside of the substrate can be inhibited. In addition, since the rotating speed of the substrate can be decreased, spattering of the developer can be inhibited. Further, a throughput can be improved by stirring the developer.
Abstract translation: 显影方法包括：通过基板保持器水平保持曝光的基板; 通过从显影剂喷嘴提供显影剂，在基底的一部分上形成液体熔池; 旋转基板; 通过使显影剂喷嘴移动使得旋转基板上的显影剂的供给位置沿基板的径向方向移动，将液体熔池分散在基板的整个表面上; 使液体熔池在基板的整个表面上的扩展同时与接触部分与液体熔池接触，接触部分被构造成与显影剂喷嘴一起移动并且具有与基板相对的表面， 小于衬底的表面。 根据该方法，能够抑制向基板外侧落下的液体的量。 此外，由于可以降低基板的旋转速度，可以抑制显影剂的飞溅。 此外，可以通过搅拌显影剂来提高生产量。
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