公开(公告)号：US11048175B2

公开(公告)日：2021-06-29

申请号：US16642927

申请日：2018-07-31

Applicant: ASML Holding N.V.

Inventor： Victor Antonio Perez-Falcon ,  Michael Andrew Chieda

IPC: G03F7/20

Abstract: Methods and systems are described for cleaning a support such as a clamp of a chuck that holds a patterning device or a wafer in a lithographic apparatus. The method includes loading a electrostatic cleaning substrate into a lithographic apparatus. The electrostatic cleaning substrate includes at least one electrode. The method further includes bringing the electrostatic cleaning substrate near to the clamping surface to be cleaned and connecting the electrode to a voltage source. Particles present on the support are then transferred to the electrostatic cleaning substrate.

公开(公告)号：US20210157248A1

公开(公告)日：2021-05-27

申请号：US16613551

申请日：2018-04-13

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Sebastianus Adrianus GOORDEN ,  Johannes Antonius Gerardus AKKERMANS ,  Simon Reinald HUISMAN ,  Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY

IPC: G03F9/00 ,  G01B11/00

Abstract: Disclosed is a metrology sensor apparatus comprising: an illumination system operable to illuminate a metrology mark in on a substrate with illumination radiation; an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark; and a wavelength dependent spatial filter for spatially filtering the scattered radiation, the wavelength dependent spatial filter having a spatial profile dependent on the wavelength of the scattered radiation. The wavelength dependent spatial filter may comprise a dichroic filter operable to substantially transmit scattered radiation within a first wavelength range and substantially block scattered radiation within a second wavelength range and at least one second filter operable to substantially block scattered radiation at least within the first wavelength range and the second wavelength range.

公开(公告)号：US20210072654A1

公开(公告)日：2021-03-11

申请号：US17054313

申请日：2019-05-02

Applicant: ASML Holding N.V.

Inventor： David TAUB ,  Joseph Ashwin FRANKLIN ,  Jeffrey John KOWALSKI

IPC: G03F9/00 ,  G02B6/36

Abstract: A lithography system comprises an illumination system configured to produce abeam of radiation, a support configured to support a patterning device configured to impart a pattern on the beam, a projection system configured to project the patterned beam onto a substrate, and an alignment system comprising an illuminator. The illuminator comprises an optical fiber, an optical fiber protector (714), an optical fiber support (700) comprising a first support arm assembly configured to support the optical fiber protector, an optical system, and an optical system support comprising a second support arm assembly configured to support the optical system.

公开(公告)号：US10908518B2

公开(公告)日：2021-02-02

申请号：US15984040

申请日：2018-05-18

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Santiago E. Delpuerto ,  Antonius Franciscus Johannes De Groot ,  Kenneth C. Henderson ,  Raymond Wilhelmus Louis Lafarre ,  Matthew Lipson ,  Louis John Markoya ,  Tammo Uitterdijk ,  Ronald Van Der Wilk ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/687

Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

公开(公告)号：US10895813B2

公开(公告)日：2021-01-19

申请号：US16760137

申请日：2018-10-26

Applicant: ASML Holding N.V.

Inventor： Irit Tzemah ,  Eric Brian Catey ,  John David Connelly

IPC: G03F7/20 ,  G03F9/00

Abstract: A lithographic cluster includes a track unit and a lithographic apparatus. The lithographic apparatus includes an alignment sensor and at least one controller. The track unit is configured to process a first lot and a second lot. The lithographic apparatus is operatively coupled to the track unit. The alignment sensor is configured to measure an alignment of at least one alignment mark type of a calibration wafer. At least one controller is configured to determine a correction set for calibrating the lithographic apparatus based on the measured alignment of the at least one alignment mark type and apply first and second weight corrections to the correction set for processing the first and second lots, respectively, such that overlay drifts or jumps during processing the first and second lots are mitigated.

公开(公告)号：US10809193B2

公开(公告)日：2020-10-20

申请号：US16362922

申请日：2019-03-25

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Marinus Johannes Maria Van Dam ,  Richard Carl Zimmerman

IPC: G01N21/47 ,  G03F7/20 ,  G01N21/21

Abstract: An inspection apparatus or lithographic apparatus includes an optical system and a detector. The optical system includes a non-linear prismatic optic. The optical system is configured to receive zeroth and first diffraction order beams reflected from a diffraction target and separate first and second polarizations of each diffraction order beam. The detector is configured to simultaneously detect first and second polarizations of each of the zeroth and first diffraction order beams. Based on the detected first and second polarizations of one or more diffraction orders, an operational parameter of a lithographic apparatus can be adjusted to improve accuracy or precision in the lithographic apparatus. The optical system can include a plurality of non-linear prismatic optics. For example, the optical system can include a plurality of Wollaston prisms.

公开(公告)号：US20200326556A1

公开(公告)日：2020-10-15

申请号：US16913698

申请日：2020-06-26

Applicant: ASML Holding N.V.

Inventor： Douglas C. CAPPELLI ,  Stanislav SMIRNOV ,  Richard Carl ZIMMERMAN ,  Joshua ADAMS ,  Alexander Kenneth RAUB ,  Yevgeniy Konstantinovich SHMAREV

IPC: G02B27/28 ,  G01N21/47 ,  G03F7/20 ,  G01N21/956

Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.

公开(公告)号：US20200271438A1

公开(公告)日：2020-08-27

申请号：US16650962

申请日：2018-09-14

Applicant: ASML Holding N.V.

Inventor： Parag Vinayak KELKAR ,  Justin Lloyd KREUZER

IPC: G01B11/06 ,  G02B27/28 ,  G02B5/30

Abstract: An inspection apparatus, including: an optical system configured to provide a beam of radiation to a surface to be measured and to receive redirected radiation from the surface; and a detection system configured to measure the redirected radiation, wherein the optical system includes an optical element to process the radiation, the optical element including a Mac Neille-type multilayer polarizing coating configured to produce a reduced chromatic offset of the radiation.

公开(公告)号：US10724961B2

公开(公告)日：2020-07-28

申请号：US15683473

申请日：2017-08-22

Applicant: ASML HOLDING N.V.

Inventor： Yevgeniy Konstantinovich Shmarev ,  Stanislav Smirnov

IPC: G01N21/88 ,  G01N21/21 ,  G01N21/95 ,  G03F7/207 ,  G03F7/20

Abstract: An inspection apparatus includes an inspection optical system configured to a direct an inspection beam onto a surface of a substrate, the inspection optical system having an objective, a focus measurement optical system configured to receive a focus measurement beam, redirected by the substrate, from the objective, the focus measurement optical system having a movable reflective element configured to receive the focus measurement beam, and a control system configured to cause movement of the reflective element with a direction component along a beam path of the focus measurement beam and configured to determine whether the substrate surface is in the focus of the objective based on the focus measurement beam.

公开(公告)号：US10705439B2

公开(公告)日：2020-07-07

申请号：US15904946

申请日：2018-02-26

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf Kemper ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Marco Polizzi ,  Edwin Augustinus Matheus Van Gompel ,  Johannes Petrus Maria Smeulers ,  Stefan Philip Christiaan Belfroid ,  Herman Vogel

IPC: G03F7/20

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.