Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method

    公开(公告)号:US11815806B2

    公开(公告)日:2023-11-14

    申请号:US17990049

    申请日:2022-11-18

    CPC classification number: G03F1/32 G03F1/24 G03F7/2004

    Abstract: Provided is a reflective mask blank with which it is possible to further reduce the shadowing effect of a reflective mask, and also possible to form a fine and highly accurate phase-shift pattern. A reflective mask blank having, in the following order on a substrate, a multilayer reflective film and a phase-shift film that shifts the phase of EUV light, said reflective mask blank characterized in that the phase-shift film has a thin film comprising a metal-containing material that contains: ruthenium (Ru); and at least one element from among chromium (Cr), nickel (Ni), (Co), aluminum (Al), silicon (Si), titanium (Ti), vanadium (V), germanium (Ge), niobium (Nb), molybdenum (Mo), tin (Sn), tellurium (Te), hafnium (Hf), tungsten (W), and rhenium (Re).

    SUBSTRATE FOR MAGNETIC DISK, MAGNETIC DISK, AND HARD DISK DRIVE APPARATUS

    公开(公告)号:US20230298623A1

    公开(公告)日:2023-09-21

    申请号:US18321166

    申请日:2023-05-22

    Inventor: Kinobu OSAKABE

    Abstract: A substrate for a magnetic disk includes a substrate main body having two main surfaces and an outer circumferential edge surface, and a film that is an alloy film containing Ni and P and provided on a surface of the substrate main body. A disk shape of the substrate main body has an outer diameter of 90 mm or more. A thickness T of the substrate that includes film thicknesses of sections of the film provided on the main surfaces is 0.520 mm or less. A total thickness D mm, which is a sum of the film thicknesses of the sections of the film on the main surfaces and the thickness T mm satisfy D≥0.0082/T−0.0015. A surface roughness maximum height Rz of the film provided on the outer circumferential edge surface is smaller than that of the substrate main body at the outer circumferential edge surface.

    LOCKING FUNCTION FOR A MOBILE DEVICE
    47.
    发明公开

    公开(公告)号:US20230222201A1

    公开(公告)日:2023-07-13

    申请号:US17910498

    申请日:2021-03-02

    Inventor: Michael WALZ

    CPC classification number: G06F21/44 H04L9/0825 A61B1/00059 H04L9/0877

    Abstract: A mobile device comprises a functional arrangement for performing a function of the mobile device, a coupling device for connecting the mobile device to a stationary device, an authentication device for authenticating the stationary device and an activation device. The authentication device authenticates the stationary device based on information on the stationary device. The activation device activates the functional arrangement when the mobile device is connected to the stationary device by the coupling device, and when the stationary device has been authenticated by the authentication device.

Patent Agency Ranking