公开(公告)号：US20160314940A1

公开(公告)日：2016-10-27

申请号：US15199046

申请日：2016-06-30

Applicant: Applied Materials, Inc.

Inventor： James D. CARDUCCI ,  Hamid TAVASSOLI ,  Ajit BALAKRISHNA ,  Zhigang CHEN ,  Andrew NGUYEN ,  Douglas A. BUCHBERGER, JR. ,  Kartik RAMASWAMY ,  Shahid RAUF ,  Kenneth S. COLLINS

IPC: H01J37/32

Abstract: Embodiments of the present invention provide a plasma chamber design that allows extremely symmetrical electrical, thermal, and gas flow conductance through the chamber. By providing such symmetry, plasma formed within the chamber naturally has improved uniformity across the surface of a substrate disposed in a processing region of the chamber. Further, other chamber additions, such as providing the ability to manipulate the gap between upper and lower electrodes as well as between a gas inlet and a substrate being processed, allows better control of plasma processing and uniformity as compared to conventional systems.

公开(公告)号：US20160163511A1

公开(公告)日：2016-06-09

申请号：US14829662

申请日：2015-08-19

Applicant: Applied Materials, Inc.

Inventor： Andrew NGUYEN ,  Tza-Jing GUNG ,  Haitao WANG ,  Maxim Mikhailovich NOGINOV ,  Reza SADJADI ,  Chunlei ZHANG ,  Xue YANG

IPC: H01J37/32 ,  H01L21/3065 ,  C23C14/22 ,  H01L21/02 ,  C23C16/50 ,  C23C16/455

CPC classification number: H01L21/3065 ,  C23C14/22 ,  C23C16/45565 ,  C23C16/46 ,  C23C16/50 ,  C23C16/505 ,  H01J37/32082 ,  H01J37/32669 ,  H01L21/02274

Abstract: Implementations described herein provide a magnetic ring which enables both lateral and azimuthal tuning of the plasma in a processing chamber. In one embodiment, the magnetic ring has a body. The body has a top surface and a bottom surface, and a plurality of magnets are disposed on the bottom surface of the body.

Abstract translation: 本文所述的实施方案提供一种能够在处理室中进行等离子体的横向和方位调谐的磁环。 在一个实施例中，磁环具有主体。 主体具有顶表面和底表面，并且多个磁体设置在主体的底表面上。