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公开(公告)号：US20110007285A1
公开(公告)日：2011-01-13
申请号：US12698932
申请日：2010-02-02
Applicant: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeiko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
Inventor： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeiko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC: G03B27/58
CPC classification number: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
Abstract translation: 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。
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42.发明申请Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method 有权检验方法和装置，平版印刷设备，平版印刷加工单元和器件制造方法公开(公告)号：US20100157299A1
公开(公告)日：2010-06-24
申请号：US12718599
申请日：2010-03-05
Applicant: Alexander Straaijer , Ronald Franciscus Herman Hugers
Inventor： Alexander Straaijer , Ronald Franciscus Herman Hugers
IPC: G01J4/00
CPC classification number: G01B11/0641 , G01N2021/4711 , G01N2021/4792 , G03F7/70625 , G03F7/70633
Abstract: The simultaneous measurement of four separately polarized beams upon diffraction from a substrate is used to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via up to three polarizing elements. This polarizes the light sources by 0, 45, 90 and 135°. The plurality of polarizing beamsplitters replaces the use of a phase modulator, but enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate.
Abstract translation: 使用从衬底衍射的同时测量四个分离的偏振光束来确定衬底的性质。 圆形或椭圆偏振光源最多通过三个偏振元件。 这使光源偏振0°，45°，90°和135°。 多个偏振分束器取代了相位调制器的使用，但是能够测量所有四个光束的强度，从而测量组合光束的相位调制和幅度，以给出基板的特征。
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公开(公告)号：US07738074B2
公开(公告)日：2010-06-15
申请号：US10890400
申请日：2004-07-14
Applicant: Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer
Inventor： Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer
CPC classification number: G03F7/70875 , G03F7/70258 , G03F7/70341 , G03F7/70716 , G03F7/70891
Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
Abstract translation: 浸没式光刻设备包括温度控制器，该温度控制器被配置为朝向共同的目标温度调节投影系统，基板和液体的温度。 控制这些元件的温度并降低温度梯度可以提高成像的一致性和一般的光刻性能。 控制温度的措施可以包括例如通过反馈电路来控制浸没液体流速和液体温度。
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公开(公告)号：US07593092B2
公开(公告)日：2009-09-22
申请号：US11448990
申请日：2006-06-08
Applicant: Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
Inventor： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
Abstract translation: 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。
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公开(公告)号：US20090002652A1
公开(公告)日：2009-01-01
申请号：US12153276
申请日：2008-05-15
Applicant: Joeri Lof , Antonius Theodorus Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
Inventor： Joeri Lof , Antonius Theodorus Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Mulkens , Roelof Aeilko Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC: G03B27/52
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
Abstract translation: 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在所述结构和所述基板的表面之间形成气体密封，以在该空间内容纳液体。
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Patent Agency Ranking
公开(公告)号：US20080218726A1
公开(公告)日：2008-09-11
申请号：US12078997
申请日：2008-04-09
Applicant: Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
Inventor： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
IPC: G03B27/52
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
Abstract: Lithographic Apparatus and Device Manufacturing Method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
Abstract translation: 平版印刷设备和设备制造方法在光刻投影设备中，结构围绕投影系统和光刻投影设备的基板台之间的空间。 在结构和衬底的表面之间使用气体以在空间中容纳液体。
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公开(公告)号：US20080218717A1
公开(公告)日：2008-09-11
申请号：US12068546
申请日：2008-02-07
Applicant: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC: G03B27/42
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US07158211B2
公开(公告)日：2007-01-02
申请号：US10946340
申请日：2004-09-22
Applicant: Alexander Straaijer
Inventor： Alexander Straaijer
CPC classification number: G03F7/707 , G03F7/70341
Abstract: A table configured to support a substrate has one or more projections which support the substrate. In an embodiment, the table also has a raised perimeter defining a space which is configured to be filled with a liquid. A pump is configured to remove liquid from the space via outlet passages to an optional inlet. The removal of liquid can create a pressure differential across the substrate which then clamps it in place. Liquid circulated to the inlet may be filtered by a filter to remove contaminants.
Abstract translation: 被配置为支撑衬底的工作台具有支撑衬底的一个或多个突起。 在一个实施例中，桌子还具有限定被填充有液体的空间的凸起周边。 泵构造成通过出口通道将液体从空间移除到可选的入口。 液体的去除可以在衬底上产生压差，然后将其夹在适当位置。 循环到入口的液体可以通过过滤器过滤以除去污染物。
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公开(公告)号：US20060250591A1
公开(公告)日：2006-11-09
申请号：US11120198
申请日：2005-05-03
Applicant: Alexander Straaijer
Inventor： Alexander Straaijer
IPC: G03B27/42
CPC classification number: G03F7/70341
Abstract: A lithographic projection apparatus uses a volume of a second liquid to confine a first liquid to a space between the projection system and the substrate. In an embodiment, the first and second liquids are substantially immiscible and may be a cycloalkane, such as cyclooctane, decalin, bicyclohexyl, exo-tetrahydro-dicyclopentadiene and cyclohexane, another high-index hydrocarbon, a perfluoropolyether, such as perfluoro-N-methylmorpholine and perfluoro E2, a perfluoroalkane, such as perfluorohexane, or a hydrofluoroether; and water, respectively.
Abstract translation: 光刻投影设备使用一定体积的第二液体将第一液体限制在投影系统和基底之间的空间上。 在一个实施方案中，第一和第二液体基本上是不混溶的，并且可以是环烷烃，例如环辛烷，十氢化萘，二环己基，外 - 四氢 - 二环戊二烯和环己烷，另一种高折射率烃，全氟聚醚，如全氟-N-甲基吗啉 和全氟E2，全氟烷烃如全氟己烷或氢氟醚; 和水。
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50.发明授权Lithographic apparatus for step-and-scan imaging of mask pattern with interferometer mirrors on the mask and wafer holders 失效用于在掩模和晶片保持器上用干涉仪镜进行掩模图案的步进扫描成像的平版印刷设备
公开(公告)号：US6084673A
公开(公告)日：2000-07-04
申请号：US810793
申请日：1997-03-04
Applicant: Marinus A. Van Den Brink , Alexander Straaijer
Inventor： Marinus A. Van Den Brink , Alexander Straaijer
IPC: G03F7/22 , G03F7/20 , G03F9/00 , H01L21/027 , G01B9/02
CPC classification number: G03F7/70241 , G03F7/70358 , G03F7/70716 , G03F7/70775 , G03F7/70825 , G03F7/709 , G03F9/70
Abstract: A lithographic projection apparatus for step-and-scan imaging of a mask pattern (c) on a substrate (W) is described. The synchronous movement of the mast (MA) and the substrate (W) during scanning is controlled by means of contactless measuring systems, inter alia, interferometer systems (ISR, ISW), while the measuring faces (R.sub.1,r, R.sub.1,w) associated with these systems are formed by faces of the holders (WH, MH) for the substrate (W) and the mask (MA), so that very accurate measurements are possible.
Abstract translation: 描述了用于在衬底（W）上的掩模图案（c）的步进扫描成像的光刻投影设备。 扫描期间桅杆（MA）和基板（W）的同步运动通过非接触式测量系统（尤其是干涉仪系统（ISR，ISW））进行控制，而测量面（R1，r，R1，w） 与这些系统相关联的部件由用于基板（W）和掩模（MA）的保持器（WH，MH）的表面形成，使得非常精确的测量是可能的。
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