Method and structure for sensors on glass

    公开(公告)号:US11608265B2

    公开(公告)日:2023-03-21

    申请号:US17357234

    申请日:2021-06-24

    Abstract: A method for providing a semiconductor layer arrangement on a substrate which comprises providing a semiconductor layer arrangement having a functional layer and a semiconductor substrate layer, attaching the semiconductor layer arrangement to a glass substrate layer such that the functional layer is arranged between the glass substrate layer and the semiconductor substrate layer, and removing the semiconductor substrate layer at least partially such that the glass substrate layer substitutes the semiconductor substrate layer as the substrate of the semiconductor layer arrangement.

    Support structure and method of forming a support structure

    公开(公告)号:US11292097B2

    公开(公告)日:2022-04-05

    申请号:US16402248

    申请日:2019-05-03

    Abstract: A structure for fixing a membrane to a carrier including a carrier; a suspended structure; and a holding structure with a rounded concave shape which is configured to fix the suspended structure to the carrier and where a tapered side of the holding structure physically connects to the suspended structure is disclosed. A method of forming the holding structure on a carrier to support a suspended structure is further disclosed. The method may include: forming a holding structure on a carrier; forming a suspended structure on the holding structure; shaping the holding structure such that it has a concave shape; and arranging the holding structure such that a tapered side of the holding structure physically connects to the suspended structure.

    SUPPORT STRUCTURE AND METHOD OF FORMING A SUPPORT STRUCTURE

    公开(公告)号:US20190255669A1

    公开(公告)日:2019-08-22

    申请号:US16402248

    申请日:2019-05-03

    Abstract: A structure for fixing a membrane to a carrier including a carrier; a suspended structure; and a holding structure with a rounded concave shape which is configured to fix the suspended structure to the carrier and where a tapered side of the holding structure physically connects to the suspended structure is disclosed. A method of forming the holding structure on a carrier to support a suspended structure is further disclosed. The method may include: forming a holding structure on a carrier; forming a suspended structure on the holding structure; shaping the holding structure such that it has a concave shape; and arranging the holding structure such that a tapered side of the holding structure physically connects to the suspended structure.

    METHOD FOR FORMING A MICROELECTROMECHANICAL DEVICE

    公开(公告)号:US20170297899A1

    公开(公告)日:2017-10-19

    申请号:US15629834

    申请日:2017-06-22

    CPC classification number: B81B3/0072 B81B2203/0109 B81C1/00325

    Abstract: A method for forming a microelectromechanical device may provide forming a first layer at least one of in or over a semiconductor carrier; forming a second layer at least one of in or over at least a central region of the first layer, such that a peripheral region of the first layer is at least partially free of the second layer; removing material under at least a central region of the second layer to release at least one of the central region of the second layer or a central region of the first layer; and/or removing material under at least the peripheral region of the first layer to such that the second layer is supported by the semiconductor carrier via the first layer.

    MICROELECTROMECHANICAL DEVICE AND METHOD FOR FORMING A MICROELECTROMECHANICAL DEVICE

    公开(公告)号:US20170247245A1

    公开(公告)日:2017-08-31

    申请号:US15054310

    申请日:2016-02-26

    CPC classification number: B81B3/0072 B81B2203/0109 B81C1/00325

    Abstract: A microelectromechanical device may include: a semiconductor carrier; a microelectromechanical element disposed in a position distant to the semiconductor carrier; wherein the microelectromechanical element is configured to generate or modify an electrical signal in response to a mechanical signal and/or is configured to generate or modify a mechanical signal in response to an electrical signal; at least one contact pad, which is electrically connected to the microelectromechanical element for transferring the electrical signal between the contact pad and the microelectromechanical element; and a connection structure which extends from the semiconductor carrier to the microelectromechanical element and mechanically couples the microelectromechanical element with the semiconductor carrier.

    Microelectromechanical device and method for forming a microelectromechanical device

    公开(公告)号:US09745188B1

    公开(公告)日:2017-08-29

    申请号:US15054310

    申请日:2016-02-26

    CPC classification number: B81B3/0072 B81B2203/0109 B81C1/00325

    Abstract: A microelectromechanical device may include: a semiconductor carrier; a microelectromechanical element disposed in a position distant to the semiconductor carrier; wherein the microelectromechanical element is configured to generate or modify an electrical signal in response to a mechanical signal and/or is configured to generate or modify a mechanical signal in response to an electrical signal; at least one contact pad, which is electrically connected to the microelectromechanical element for transferring the electrical signal between the contact pad and the microelectromechanical element; and a connection structure which extends from the semiconductor carrier to the microelectromechanical element and mechanically couples the microelectromechanical element with the semiconductor carrier.

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