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公开(公告)号:US20210020558A1
公开(公告)日:2021-01-21
申请号:US17064085
申请日:2020-10-06
Applicant: Intel Corporation
Inventor: Yikang Deng , Ying Wang , Cheng Xu , Chong Zhang , Junnan Zhao
IPC: H01L23/498 , H01L23/538
Abstract: An electronic device may include a substrate, and the substrate may include one or more layers. The one or more layers may include a first dielectric material and one or more electrical traces. A cavity may be defined in the substrate, and the cavity may be adapted to receive one or more electrical components. One or more lateral traces may extend through a wall of the cavity. The lateral traces may provide electrical communication pathways between the substrate and the electrical components.
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42.
公开(公告)号:US20190393217A1
公开(公告)日:2019-12-26
申请号:US16402588
申请日:2019-05-03
Applicant: Intel Corporation
Inventor: Cheng Xu , Rahul Jain , Seo Young Kim , Kyu Oh Lee , Ji Yong Park , Sai Vadlamani , Junnan Zhao
IPC: H01L27/07 , H01L49/02 , H01L23/64 , H01L23/522 , H01L23/00
Abstract: Disclosed embodiments include an embedded thin-film capacitor and a magnetic inductor that are assembled in two adjacent build-up layers of a semiconductor package substrate. The thin-film capacitor is seated on a surface of a first of the build-up layers and the magnetic inductor is partially disposed in a recess in the adjacent build up layer. The embedded thin-film capacitor and the integral magnetic inductor are configured within a die shadow that is on a die side of the semiconductor package substrate.
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公开(公告)号:US20190385780A1
公开(公告)日:2019-12-19
申请号:US16012259
申请日:2018-06-19
Applicant: Intel Corporation
Inventor: Cheng Xu , Yikang Deng , Kyu Oh Lee , Ji Yong Park , Srinivas Pietambaram , Ying Wang , Chong Zhang , Rui Zhang , Junnan Zhao
IPC: H01F27/28 , H01F27/24 , H04B5/00 , H01L21/822 , H01L23/522 , H01L49/02 , H01F41/04
Abstract: Techniques are provided for an inductor at a first level interface between a first die and a second die. In an example, the inductor can include a winding and a core disposed inside the winding. The winding can include first conductive traces of a first die, second conductive traces of a second die, and a plurality of connectors configured to connect the first die with the second die. Each connector of the plurality of connecters can be located between a trace of the first conductive traces and a corresponding trace of the second conductive traces.
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44.
公开(公告)号:US20190304661A1
公开(公告)日:2019-10-03
申请号:US15938119
申请日:2018-03-28
Applicant: Intel Corporation
Inventor: Cheng Xu , Kyu-Oh Lee , Junnan Zhao , Rahul Jain , Ji Yong Park , Sai Vadlamani , Seo Young Kim
Abstract: Embodiments include an inductor that comprises an inductor trace and a magnetic body surrounding the inductor trace. In an embodiment, the magnetic body comprises a first step surface and a second step surface. Additional embodiments include an inductor that includes a barrier layer. In an embodiment, an inductor trace is formed over a first surface of the barrier layer. Embodiments include a first magnetic body over the inductor trace and the first surface of the barrier layer, and a second magnetic body over a second surface of the barrier layer opposite the first surface. In an embodiment, a width of the second magnetic body is greater than a width of the first magnetic body.
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45.
公开(公告)号:US12288744B2
公开(公告)日:2025-04-29
申请号:US17742816
申请日:2022-05-12
Applicant: Intel Corporation
Inventor: Ji Yong Park , Kyu Oh Lee , Yikang Deng , Zhichao Zhang , Liwei Cheng , Andrew James Brown , Cheng Xu , Jiwei Sun
IPC: H01L23/498 , H01L21/48 , H01L23/00
Abstract: Microelectronic assemblies, and related devices and methods, are disclosed herein. For example, in some embodiments, a microelectronic assembly may include a package substrate having a core substrate with a first conductive structure having a first thickness on the core substrate, and a second conductive structure having a second thickness on the core substrate, where the first thickness is different than the second thickness.
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公开(公告)号:US12087746B2
公开(公告)日:2024-09-10
申请号:US18128952
申请日:2023-03-30
Applicant: Intel Corporation
Inventor: Chong Zhang , Cheng Xu , Junnan Zhao , Ying Wang , Meizi Jiao
IPC: H01L23/52 , H01L21/56 , H01L23/498 , H01L23/528 , H01L23/538 , H01L25/16 , H01L49/02
CPC classification number: H01L25/16 , H01L21/568 , H01L23/49811 , H01L23/528 , H01L23/5386 , H01L28/40 , H01L2224/1623 , H01L2224/16265
Abstract: Microelectronic assemblies, related devices, and methods are disclosed herein. In some embodiments, a microelectronic assembly may include a die having a first surface and an opposing second surface; a capacitor having a surface, wherein the surface of the capacitor is coupled to the first surface of the die; and a conductive pillar coupled to the first surface of the die. In some embodiments, a microelectronic assembly may include a capacitor in a first dielectric layer; a conductive pillar in the first dielectric layer; a first die having a surface in the first dielectric layer; and a second die having a surface in a second dielectric layer, wherein the second dielectric layer is on the first dielectric layer, and wherein the surface of the second die is coupled to the capacitor, to the surface of the first die, and to the conductive pillar.
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47.
公开(公告)号:US11735537B2
公开(公告)日:2023-08-22
申请号:US17852003
申请日:2022-06-28
Applicant: Intel Corporation
Inventor: Cheng Xu , Kyu-Oh Lee , Junnan Zhao , Rahul Jain , Ji Yong Park , Sai Vadlamani , Seo Young Kim
IPC: H01L23/64 , H01L23/498 , H01L23/00 , H01L21/48
CPC classification number: H01L23/645 , H01L21/4857 , H01L23/49822 , H01L23/49838 , H01L24/16 , H01L2224/16225
Abstract: Embodiments include an electronic package that includes a first layer that comprises a dielectric material and a second layer over the first layer, where the second layer comprises a magnetic material. In an embodiment, a third layer is formed over the second layer, where the third layer comprises a dielectric material. In an embodiment, the third layer entirely covers a first surface of the second layer. In an embodiment a first conductive layer and a second conductive layer are embedded within the second layer. In an embodiment, sidewalls of the first conductive layer and the second conductive layer are substantially vertical.
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公开(公告)号:US11521914B2
公开(公告)日:2022-12-06
申请号:US16233808
申请日:2018-12-27
Applicant: Intel Corporation
Inventor: Zhimin Wan , Cheng Xu , Yikang Deng , Junnan Zhao , Ying Wang , Chong Zhang , Kyu Oh Lee , Chandra Mohan Jha , Chia-Pin Chiu
IPC: H01L23/473 , H01L21/48
Abstract: Microelectronic assemblies that include a cooling channel, and related devices and methods, are disclosed herein. For example, in some embodiments, a microelectronic assembly may include a package substrate having a surface, a die having a surface, and a fluidic channel between the surface of the die and the surface of the package substrate, wherein a top surface of the fluidic channel is defined by the surface of the die and a bottom surface of the fluidic channel is defined by the surface of the package substrate. In some embodiments, a microelectronic assembly may include a package substrate having a surface; a die having a surface; and an interposer having a fluidic channel between the surface of the die and the surface of the package substrate.
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公开(公告)号:US20220230951A1
公开(公告)日:2022-07-21
申请号:US17715380
申请日:2022-04-07
Applicant: Intel Corporation
Inventor: Prithwish Chatterjee , Junnan Zhao , Sai Vadlamani , Ying Wang , Rahul Jain , Andrew J. Brown , Lauren A. Link , Cheng Xu , Sheng C. Li
IPC: H01L23/498 , H01L21/48 , H01F27/28 , H01F41/04 , H01L25/16
Abstract: Methods/structures of forming in-package inductor structures are described. Embodiments include a substrate including a dielectric material, the substrate having a first side and a second side. A conductive trace is located within the dielectric material. A first layer is on a first side of the conductive trace, wherein the first layer comprises an electroplated magnetic material, and wherein a sidewall of the first layer is adjacent the dielectric material. A second layer is on a second side of the conductive trace, wherein the second layer comprises the electroplated magnetic material, and wherein a sidewall of the second layer is adjacent the dielectric material.
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50.
公开(公告)号:US11246218B2
公开(公告)日:2022-02-08
申请号:US15910288
申请日:2018-03-02
Applicant: Intel Corporation
Inventor: Chong Zhang , Ying Wang , Junnan Zhao , Cheng Xu , Yikang Deng
IPC: H01L23/495 , H05K1/16 , H01L23/498 , H01L21/48 , H05K1/11 , H05K3/00 , H05K3/42 , H01F41/04 , H01F27/28 , H01F17/00 , H05K3/06 , H01L23/00
Abstract: Embodiments may include inductors with embedded magnetic cores and methods of making such inductors. In an embodiment, an integrated circuit package may include an integrated circuit die with a multi-phase voltage regulator electrically coupled to the integrated circuit die. In such embodiments, the multi-phase voltage regulator may include a substrate core and a plurality of inductors. The inductors may include a conductive through-hole disposed through the substrate core and a plugging layer comprising a dielectric material surrounding the conductive through-hole. In an embodiment, a magnetic sheath is formed around the plugging layer. In an embodiment, the magnetic sheath is separated from the plated through hole by the plugging layer. Additionally, a first layer comprising a dielectric material may be disposed over a first surface of the magnetic sheath, and a second layer comprising a dielectric material may be disposed over a second surface of the magnetic sheath.
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